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    • 10. 发明申请
    • Heat treatment apparatus
    • 热处理设备
    • US20060021582A1
    • 2006-02-02
    • US10528704
    • 2003-08-29
    • Takanori SaitoKenichi YamagaKen Nakao
    • Takanori SaitoKenichi YamagaKen Nakao
    • C23C16/00
    • H01L21/67109
    • The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace body; a gas-discharging-unit connecting portion formed at an upper portion of the reaction tube, the gas-discharging-unit connecting portion having a narrow diameter; a substrate-to-be-processed supporting member for supporting a substrate to be processed, contained in the heating-furnace body; and a heating unit for heating the substrate to be processed supported by the substrate-to-be-processed supporting member. The heating unit has: a first heating portion arranged around the reaction tube, a second heating portion arranged around the gas-discharging-unit connecting portion, a third heating portion arranged around an upper portion of the reaction tube, a fourth heating portion arranged around a lower portion of the reaction tube, and a fifth heating portion arranged under the substrate-to-be-processed supporting member.
    • 本发明是一种热处理单元,包括:上端具有开口的加热炉体; 由包含在加热炉体内的单个管构成的反应管; 气体排出单元连接部,形成在反应管的上部,气体排出单元连接部具有窄直径; 用于支撑加热炉体内所包含的待处理基板的待处理基板的支撑部件; 以及加热单元,用于加热由要处理的基板支撑构件支撑的待处理基板。 所述加热单元具有:设置在所述反应管周围的第一加热部,配置在所述排气单元连接部周围的第二加热部,配置在所述反应管的上部的第三加热部, 反应管的下部,以及配置在被处理基板的支撑部件的下方的第五加热部。