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1. 发明授权

US08502175B2 Charged particle beam pattern forming apparatus and charged particle beam pattern forming method 有权
标题翻译：带电粒子束图案形成装置和带电粒子束图案形成方法
公开(公告)号：US08502175B2
公开(公告)日：2013-08-06
申请号：US13170426
申请日：2011-06-28
申请人： Noriaki Nakayamada , Seiji Wake , Hideo Inoue , Akihito Anpo
发明人： Noriaki Nakayamada , Seiji Wake , Hideo Inoue , Akihito Anpo
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/30461 , H01J2237/31766 , H01J2237/31776 , H01J2237/31796
摘要： A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a charged particle beam on a pattern forming region of a target object; a position correction unit configured to calculate, using the charge amount distribution charged, a corrected position of each pattern forming position corrected for a misregistration amount including a misregistration amount dependent on a deflection position where the charged particle beam is deflected, the misregistration amount caused by an amount of charge; and a pattern generator configured to form a pattern in the corrected position by using the charged particle beam.
摘要翻译：一种带电粒子束图案形成装置，包括：电荷量分布计算单元，被配置为计算通过在目标对象的图案形成区域上的带电粒子束垂直入射而充电的电荷量分布; 位置校正单元，被配置为使用所充电的所述充电量分配来计算校正的每个图案形成位置的校正位置，所述校正位置对于包括根据所述带电粒子束偏转的偏转位置的包括不对准量的不对准量，由一笔费用; 以及图案生成器，被配置为通过使用带电粒子束在校正位置形成图案。

2. 发明申请

US20120007002A1 CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICLE BEAM PATTERN FORMING METHOD 有权
标题翻译：充电颗粒光束图案形成装置和充电颗粒光束图案形成方法
公开(公告)号：US20120007002A1
公开(公告)日：2012-01-12
申请号：US13170426
申请日：2011-06-28
申请人： Noriaki NAKAYAMADA , Seiji Wake , Hideo Inoue , Akihito Anpo
发明人： Noriaki NAKAYAMADA , Seiji Wake , Hideo Inoue , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/30461 , H01J2237/31766 , H01J2237/31776 , H01J2237/31796
摘要： A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a charged particle beam on a pattern forming region of a target object; a position correction unit configured to calculate, using the charge amount distribution charged, a corrected position of each pattern forming position corrected for a misregistration amount including a misregistration amount dependent on a deflection position where the charged particle beam is deflected, the misregistration amount caused by an amount of charge; and a pattern generator configured to form a pattern in the corrected position by using the charged particle beam.
摘要翻译：一种带电粒子束图案形成装置，包括：电荷量分布计算单元，被配置为计算通过在目标对象的图案形成区域上的带电粒子束垂直入射而充电的电荷量分布; 位置校正单元，被配置为使用所充电的所述充电量分配来计算校正的每个图案形成位置的校正位置，所述校正位置对于包括取决于所述带电粒子束偏转的偏转位置的不对准量的不对准量，由一笔费用; 以及图案生成器，被配置为通过使用带电粒子束在校正位置形成图案。

3. 发明申请

US20120292537A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF SAME 有权
标题翻译：充电颗粒光束写字装置及其方法
公开(公告)号：US20120292537A1
公开(公告)日：2012-11-22
申请号：US13469580
申请日：2012-05-11
申请人： Jun YASHIMA , Akihito Anpo
发明人： Jun YASHIMA , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/02 , H01J37/153 , H01J37/3174 , H01J2237/31754 , H01J2237/31764 , H01J2237/31776 , Y10S430/143
摘要： A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height.
摘要翻译：一种带电粒子束写入装置，包括输入关于条带区域高度的信息的单元，并且当写入区域被划分成条形区域高度的薄矩形形状的条带区域时，判断最后条带的高度区域比条纹区域高; 以及将所述写入区域划分成所述薄矩形形状的条带区域的单元，使得所述最后条带区域和所述最后条带区域之前的条带区域被组合以产生一个条带区域和条带区域，至少两个条带区域如果最后一个条带区域的高度比条带区域高度窄，则在最后一个条带区域之前分别被创建为条带区域高度的条带区域。

4. 发明授权

US07949966B2 Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program 有权
标题翻译：数据验证方法，带电粒子束写入装置和具有程序的计算机可读存储介质
公开(公告)号：US07949966B2
公开(公告)日：2011-05-24
申请号：US12042712
申请日：2008-03-05
申请人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023
摘要： A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output.
摘要翻译：带电粒子束写入装置包括：输入单元，被配置为输入写入数据，用于写入多个单元图形，所述多个单元图案包括至少一个单元图案，其中标识符被添加到每个定义至少一个单元图案的数据中，通过虚拟地分割写入区域而获得的多个小区域中的小区域;提取单元，被配置为从多个单元图案中提取添加有标识符的至少一个单元图案;输出单元，被配置为输出错误结果当仅提取一个单元图案时，以及写入单元，其被配置为基于未输出错误结果的写入数据，通过用带电粒子束照射目标工件来写入多个单元图案。

5. 发明申请

US20110068281A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF 有权
标题翻译：充电粒子束绘图装置及其近似效应校正方法
公开(公告)号：US20110068281A1
公开(公告)日：2011-03-24
申请号：US12882713
申请日：2010-09-15
申请人： Shigehiro HARA , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
发明人： Shigehiro HARA , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
IPC分类号： G21K5/10 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/31769 , H01J2237/31776
摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要翻译：带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量在每个网格中每个代表人物的面积的基础上。如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积，代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

6. 发明授权

US07698682B2 Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus 有权
标题翻译：模式写入装置的写入错误验证方法和写入模式写入装置的错误验证数据的生成装置
公开(公告)号：US07698682B2
公开(公告)日：2010-04-13
申请号：US11838542
申请日：2007-08-14
申请人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/302 , H01J2237/30416 , H01J2237/30455 , H01J2237/30472
摘要： A generation apparatus of writing error verification data for a pattern writing apparatus includes a data extraction part configured to extract, from layout data including a figure pattern to be written, part of the layout data required for an operation of a function having a writing error occurred after starting writing by the pattern writing apparatus which performs writing on a target workpiece based on the layout data, and a verification data generation part configured to perform a merge process based on extracted part of the layout data, and to generate writing error verification data, for which the merge process has been performed, for verifying the writing error of the pattern writing apparatus.
摘要翻译：一种用于写入模式写入装置的错误验证数据的生成装置包括数据提取部件，被配置为从包括要写入的图形模式的布局数据中提取出现写入错误的功能的操作所需的布局数据的一部分在通过基于布局数据对目标工件执行写入的图案写入装置开始写入之后，以及验证数据生成部，被配置为基于提取的布局数据的一部分执行合并处理，并且生成写入错误验证数据，对其进行了合并处理，以验证图案写入装置的写入错误。

7. 发明授权

US08755924B2 Charged particle beam writing method and apparatus therefor 有权
标题翻译：带电粒子束写入方法及其装置
公开(公告)号：US08755924B2
公开(公告)日：2014-06-17
申请号：US12874722
申请日：2010-09-02
申请人： Akihito Anpo
发明人： Akihito Anpo
IPC分类号： G05B13/02 , G06F19/00 , G21G5/00 , G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged particle beam writing method includes inputting layout information of a plurality of chips on which pattern formation is to be achieved, setting, using the layout information, a plurality of writing groups each being composed of at least one of the plurality of chips and each having writing conditions differing from each other, setting, for each of the plurality of writing groups, a frame which encloses a whole of all chip regions in the each of the plurality of writing groups, virtually dividing the frame into a plurality of stripe regions in a predetermined direction, with respect to the each of the plurality of writing groups, setting, using the plurality of stripe regions of all the plurality of writing groups, an order of each of the plurality of stripe regions such that a reference position of the each of the plurality of stripe regions is located in order in the predetermined direction regardless of the plurality of writing groups, and writing a pattern in the each of the plurality of stripe regions onto a target workpiece according to the order which has been set, by using a charged particle beam.
摘要翻译：带电粒子束写入方法包括输入要在其上实现图案形成的多个芯片的布局信息，使用布局信息设置多个写入组，每个写入组由多个芯片中的至少一个和每个芯片组成具有彼此不同的写入条件，对于所述多个写入组中的每一个设置包围所述多个写入组中的每一个的所有芯片区域的整体的帧，将所述帧实际上划分为多个条带区域相对于所述多个写入组中的每个写入组的预定方向，使用所述多个写入组中的所述多个条带区域设置所述多个条带区域中的每一个的顺序，使得每个多个条带区域中的多个条带区域按照预定方向依次排列，而与多个写入组无关，并且在每个写入组中写入图案根据已经通过使用带电粒子束设置的顺序将多个条带区域放置在目标工件上。

8. 发明授权

US08188449B2 Charged particle beam drawing method and apparatus 有权
标题翻译：带电粒子束的绘制方法和装置
公开(公告)号：US08188449B2
公开(公告)日：2012-05-29
申请号：US12816773
申请日：2010-06-16
申请人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
发明人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
IPC分类号： G21K5/10 , G06F19/00
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.
摘要翻译：用于绘制与绘图数据中的图形对应的图案的带电粒子束描绘装置具有用于将工件上的绘图区域划分成块框架的部分，用于将至少第一块框架和第二块框架组合成虚拟的部分以及用于将虚拟块帧的数据从输入数据划分模块传送到第一转换器和第二转换器的公共存储器的部分。第一转换器将包括在第一块帧中的第一图形的数据转换成第一绘图装置内部格式数据。第二转换器将包括在第二块帧中的第二图形的数据转换为第二绘图装置内部格式数据。第一图和第二图被包括在延伸超过第一块帧和第二块帧的单元中。

9. 发明申请

US20120001097A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF 有权
标题翻译：充电颗粒光束绘图装置及其控制方法
公开(公告)号：US20120001097A1
公开(公告)日：2012-01-05
申请号：US13163111
申请日：2011-06-17
申请人： Jun YASHIMA , Yasuo Kato , Akihito Anpo
发明人： Jun YASHIMA , Yasuo Kato , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31771 , H01J2237/31776
摘要： A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect correction dose is obtained, wherein a proximity effect correction dose is incorporated in the predetermined dose, and the fogging effect correction dose is not incorporated in the predetermined dose, then, the charged particle beam drawing apparatus applies a predetermined dose of the charged particle beam for drawing the patterns which overlap the patterns drawn before the result of calculation of the fogging effect correction dose is obtained, in the whole of the drawing area of the workpiece, after the calculation of the fogging effect correction dose, wherein the proximity effect correction dose and the fogging effect correction dose are incorporated in the predetermined dose.
摘要翻译：带电粒子束描绘装置在雾化效应校正剂量的计算结果是在工件的整个绘图区域中之前，将预定剂量的带电粒子束用于绘制对应于包括在绘图数据中的图形的图案得到的，其中以预定剂量并入接近效应校正剂量，并且雾化效应校正剂量不包含在预定剂量中，然后，带电粒子束描绘装置施加预定剂量的带电粒子束以绘制图案在计算雾化效果校正剂量之前，在整个绘图区域中获得在雾化效果校正剂量的计算结果之前绘制的图案重叠，其中邻近效应校正剂量和起雾效果校正剂量以预定剂量掺入。

10. 发明授权

US09006691B2 Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block 有权
标题翻译：使用围绕第一数据处理块的生成帧的带电粒子束写入装置和带电粒子束写入方法
公开(公告)号：US09006691B2
公开(公告)日：2015-04-14
申请号：US13465221
申请日：2012-05-07
申请人： Jun Yashima , Akihito Anpo
发明人： Jun Yashima , Akihito Anpo
IPC分类号： B82Y10/00 , H01J37/304 , H01J37/317 , B82Y40/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/31762 , H01J2237/31764 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated.
摘要翻译：带电粒子束写入装置包括：将芯片区域划分为第一数据处理块的单元，在每个块中单元提取其参考位置位于相关块中的小区，每个小区包括至少一个图形模式，对于每个块，单元产生围绕所涉及的块并且提取的单元的第一帧，对于每个第一帧的单元，将有关的第一帧的内部划分为网格区域并计算图形的面积密度每个网格中的图案，用于组合彼此重叠并且在不同第一帧之间的网格区域的区域密度的单位，通过使用面积密度来计算光束的剂量的单元以及在目标上写入图案的单元工件通过照射光束的剂量计算。

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