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1. 发明授权

US08188449B2 Charged particle beam drawing method and apparatus 有权
标题翻译：带电粒子束的绘制方法和装置
公开(公告)号：US08188449B2
公开(公告)日：2012-05-29
申请号：US12816773
申请日：2010-06-16
申请人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
发明人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
IPC分类号： G21K5/10 , G06F19/00
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.
摘要翻译：用于绘制与绘图数据中的图形对应的图案的带电粒子束描绘装置具有用于将工件上的绘图区域划分成块框架的部分，用于将至少第一块框架和第二块框架组合成虚拟的部分以及用于将虚拟块帧的数据从输入数据划分模块传送到第一转换器和第二转换器的公共存储器的部分。第一转换器将包括在第一块帧中的第一图形的数据转换成第一绘图装置内部格式数据。第二转换器将包括在第二块帧中的第二图形的数据转换为第二绘图装置内部格式数据。第一图和第二图被包括在延伸超过第一块帧和第二块帧的单元中。

2. 发明申请

US20110012031A1 CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS 有权
标题翻译：充电颗粒光束绘图方法和装置
公开(公告)号：US20110012031A1
公开(公告)日：2011-01-20
申请号：US12816773
申请日：2010-06-16
申请人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
发明人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
IPC分类号： G21K5/04
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.
摘要翻译：用于绘制与绘图数据中的图形对应的图案的带电粒子束描绘装置具有用于将工件上的绘图区域划分成块框架的部分，用于将至少第一块框架和第二块框架组合成虚拟的部分以及用于将虚拟块帧的数据从输入数据划分模块传送到第一转换器和第二转换器的公共存储器的部分。第一转换器将包括在第一块帧中的第一图形的数据转换成第一绘图装置内部格式数据。第二转换器将包括在第二块帧中的第二图形的数据转换为第二绘图装置内部格式数据。第一图和第二图被包括在延伸超过第一块帧和第二块帧的单元中。

3. 发明授权

US07750324B2 Charged particle beam lithography apparatus and charged particle beam lithography method 有权
标题翻译：带电粒子束光刻设备和带电粒子束光刻法
公开(公告)号：US07750324B2
公开(公告)日：2010-07-06
申请号：US12204382
申请日：2008-09-04
申请人： Susumu Oogi , Hitoshi Higurashi , Akihito Anpo , Toshiro Yamamoto
发明人： Susumu Oogi , Hitoshi Higurashi , Akihito Anpo , Toshiro Yamamoto
IPC分类号： G21K5/10 , G21K5/00 , H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal; an area density calculator configured to calculate, using a plurality of small areas obtained by virtually dividing the pattern forming area into mesh areas of a predetermined size smaller than all of the first block areas, a pattern area density of each small area positioned therein for each of the first block areas; a second block area divider configured to re-divide the pattern forming area divided into the plurality of first block areas into a plurality of second block areas of a uniform size, which is larger than the small area; a corrected dose calculator configured to calculate, using the pattern area density of each small area, a proximity effect-corrected dose in each corresponding small area positioned inside the second block area for each of the second block areas; a beam dose calculator configured to calculate, using the proximity effect-corrected dose of each small area, a beam dose of a charged particle beam in each corresponding small area; and a pattern generator configured to form a predetermined pattern on a target object by irradiating a charged particle beam of the beam dose calculated for each of the small areas.
摘要翻译：带电粒子束光刻设备包括第一块区域分配器，其被配置为将图案形成区域划分成多个第一块区域，以便在形成基本相等的图案时进行多次拍摄; 区域密度计算器，被配置为使用通过将图案形成区域实际上划分为比所有第一块区域小的预定尺寸的网格区域而获得的多个小区域，计算每个小区域的每个小区域的图案区域密度的第一块区域; 第二块区域分配器，被配置为将划分为多个第一块区域的图案形成区域重新划分为大于所述小区域的均匀尺寸的多个第二块区域; 校正剂量计算器，被配置为使用每个小区域的图案区域密度来计算每个所述第二块区域中位于所述第二块区域内的每个对应小区域中的邻近效应校正剂量; 光束剂量计算器，被配置为使用每个小区域的邻近效应校正剂量来计算每个对应的小区域中的带电粒子束的束剂量; 以及图案生成器，被配置为通过照射针对每个小区域计算的光束剂量的带电粒子束来在目标物体上形成预定图案。

4. 发明授权

US07949966B2 Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program 有权
标题翻译：数据验证方法，带电粒子束写入装置和具有程序的计算机可读存储介质
公开(公告)号：US07949966B2
公开(公告)日：2011-05-24
申请号：US12042712
申请日：2008-03-05
申请人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023
摘要： A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output.
摘要翻译：带电粒子束写入装置包括：输入单元，被配置为输入写入数据，用于写入多个单元图形，所述多个单元图案包括至少一个单元图案，其中标识符被添加到每个定义至少一个单元图案的数据中，通过虚拟地分割写入区域而获得的多个小区域中的小区域;提取单元，被配置为从多个单元图案中提取添加有标识符的至少一个单元图案;输出单元，被配置为输出错误结果当仅提取一个单元图案时，以及写入单元，其被配置为基于未输出错误结果的写入数据，通过用带电粒子束照射目标工件来写入多个单元图案。

5. 发明申请

US20110068281A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF 有权
标题翻译：充电粒子束绘图装置及其近似效应校正方法
公开(公告)号：US20110068281A1
公开(公告)日：2011-03-24
申请号：US12882713
申请日：2010-09-15
申请人： Shigehiro HARA , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
发明人： Shigehiro HARA , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
IPC分类号： G21K5/10 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/31769 , H01J2237/31776
摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要翻译：带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量在每个网格中每个代表人物的面积的基础上。如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积，代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

6. 发明授权

US07698682B2 Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus 有权
标题翻译：模式写入装置的写入错误验证方法和写入模式写入装置的错误验证数据的生成装置
公开(公告)号：US07698682B2
公开(公告)日：2010-04-13
申请号：US11838542
申请日：2007-08-14
申请人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/302 , H01J2237/30416 , H01J2237/30455 , H01J2237/30472
摘要： A generation apparatus of writing error verification data for a pattern writing apparatus includes a data extraction part configured to extract, from layout data including a figure pattern to be written, part of the layout data required for an operation of a function having a writing error occurred after starting writing by the pattern writing apparatus which performs writing on a target workpiece based on the layout data, and a verification data generation part configured to perform a merge process based on extracted part of the layout data, and to generate writing error verification data, for which the merge process has been performed, for verifying the writing error of the pattern writing apparatus.
摘要翻译：一种用于写入模式写入装置的错误验证数据的生成装置包括数据提取部件，被配置为从包括要写入的图形模式的布局数据中提取出现写入错误的功能的操作所需的布局数据的一部分在通过基于布局数据对目标工件执行写入的图案写入装置开始写入之后，以及验证数据生成部，被配置为基于提取的布局数据的一部分执行合并处理，并且生成写入错误验证数据，对其进行了合并处理，以验证图案写入装置的写入错误。

7. 发明授权

US07592611B2 Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam 有权
标题翻译：带电粒子束写入数据的创建方法和转换方法，带电粒子束的写入方法
公开(公告)号：US07592611B2
公开(公告)日：2009-09-22
申请号：US11470113
申请日：2006-09-05
申请人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
发明人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
IPC分类号： G11B11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762 , H01J2237/31776
摘要： A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the location data being defined for locating one of a plurality of pattern data composed of one or more elementary patterns in each block area of a plurality of block areas, the plurality of block areas being made by virtually dividing a writing area, creating, based on the design data, a pattern data file including pattern data composed of one or more elementary patterns, as part of the writing data, and creating, based on the design data, a link file including link data for linking each of the location data and each of the pattern data, as part of the writing data.
摘要翻译：基于电路的设计数据，使用带电粒子束写入图案的带电粒子束写入数据的创建方法包括基于设计数据创建包括位置数据的位置数据文件作为写入数据的一部分，位置数据被定义用于定位由多个块区域的每个块区域中的一个或多个基本图案组成的多个图案数据之一，所述多个块区域通过虚拟地划分写入区域而形成，基于所述设计数据，包括由一个或多个基本图案组成的图案数据的图案数据文件，作为写入数据的一部分，以及基于设计数据创建包括用于链接每个位置数据和每个位置数据的链接数据的链接文件模式数据，作为写入数据的一部分。

8. 发明申请

US20070053242A1 CREATION METHOD AND CONVERSION METHOD OF CHARGED PARTICLE BEAM WRITING DATA, AND WRITING METHOD OF CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒光束数据的创建方法和转换方法以及充电粒子束的写入方法
公开(公告)号：US20070053242A1
公开(公告)日：2007-03-08
申请号：US11470113
申请日：2006-09-05
申请人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
发明人： Jun Kasahara , Shigehiro Hara , Hitoshi Higurashi , Akihito Anpo
IPC分类号： G11B11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762 , H01J2237/31776
摘要： A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the location data being defined for locating one of a plurality of pattern data composed of one or more elementary patterns in each block area of a plurality of block areas, the plurality of block areas being made by virtually dividing a writing area, creating, based on the design data, a pattern data file including pattern data composed of one or more elementary patterns, as part of the writing data, and creating, based on the design data, a link file including link data for linking each of the location data and each of the pattern data, as part of the writing data.
摘要翻译：基于电路的设计数据，使用带电粒子束写入图案的带电粒子束写入数据的创建方法包括基于设计数据创建包括位置数据的位置数据文件作为写入数据的一部分，位置数据被定义用于定位由多个块区域的每个块区域中的一个或多个基本图案组成的多个图案数据之一，所述多个块区域通过虚拟地划分写入区域而形成，基于所述设计数据，包括由一个或多个基本图案组成的图案数据的图案数据文件，作为写入数据的一部分，以及基于设计数据创建包括用于链接每个位置数据和每个位置数据的链接数据的链接文件模式数据，作为写入数据的一部分。

9. 发明授权

US08207514B2 Charged particle beam drawing apparatus and proximity effect correction method thereof 有权
标题翻译：带电粒子束绘图装置及其接近效应校正方法
公开(公告)号：US08207514B2
公开(公告)日：2012-06-26
申请号：US12882713
申请日：2010-09-15
申请人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
发明人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/31769 , H01J2237/31776
摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要翻译：带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量在每个网格中每个代表人物的面积的基础上。如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积，代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

10. 发明授权

US07504645B2 Method of forming pattern writing data by using charged particle beam 有权
标题翻译：使用带电粒子束形成图案写入数据的方法
公开(公告)号：US07504645B2
公开(公告)日：2009-03-17
申请号：US11678703
申请日：2007-02-26
申请人： Akihito Anpo , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F19/00 , G03F1/00
CPC分类号： H01J37/3174 , H01J37/3026 , H01J2237/31764 , H01J2237/31776
摘要： A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, generating a partial pattern which can be deflected in a self region in the ranging pattern for each of the plurality of deflection regions on the basis of the input layout data, and converting layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data to output the charged particle beam pattern writing data.
摘要翻译：一种形成图案写入数据的方法，通过使带电粒子束在电荷粒子束的偏转的同时通过使用带电粒子束从电路的布局数据写入预定图案，包括输入包括在多个偏转区域上范围的图案的布局数据，基于输入布局数据，可以在多个偏转区域中的每一个的测距图案中的自区域中偏转的图案，以及将包括每个偏转区域的部分图案的布局数据转换为带电粒子束图案写入数据输出带电粒子束图案写入数据。

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