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1. 发明申请

US20080145556A1 METHOD FOR MANUFACTURING SUBSTRATE MOUNTING TABLE 审中-公开
标题翻译：制造基板安装表的方法
公开(公告)号：US20080145556A1
公开(公告)日：2008-06-19
申请号：US11954826
申请日：2007-12-12
申请人： Nobuyuki NAGAYAMA , Takehiro Ueda , Yoshiyuki Kobayashi , Kaoru Oohashi
发明人： Nobuyuki NAGAYAMA , Takehiro Ueda , Yoshiyuki Kobayashi , Kaoru Oohashi
IPC分类号： B05D1/08
CPC分类号： C23C16/4581 , C23C4/01 , C23C4/02 , C23C16/4404 , C23C16/46 , C23C16/466
摘要： A method for manufacturing a substrate mounting table having a mounting surface for mounting a substrate thereon; a plurality of gas injection openings opened on the mounting surface to supply a gas toward the mounting surface; a gas supply channel for supplying a gas to the gas injection openings; and a thermally sprayed ceramic layer covering the mounting surface is provided. The method includes forming a removable film at least on inner wall portions of the gas supply channel facing the gas injection openings; forming the thermally sprayed ceramic layer on the mounting surface; and removing the film.
摘要翻译：一种用于制造具有用于在其上安装基板的安装表面的基板安装台的方法; 多个气体注入口，其在所述安装面上开口，向所述安装面供给气体; 用于向气体注入口供给气体的气体供给通道; 并且提供覆盖安装表面的热喷涂陶瓷层。该方法包括至少在面向气体注入开口的气体供应通道的内壁部分上形成可移除膜; 在所述安装表面上形成所述热喷涂陶瓷层; 并去除胶片。

2. 发明授权

US08491752B2 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism 有权
标题翻译：基板安装台及其制造方法，基板处理装置和流体供给机构
公开(公告)号：US08491752B2
公开(公告)日：2013-07-23
申请号：US11954832
申请日：2007-12-12
申请人： Takehiro Ueda , Yoshiyuki Kobayashi , Kaoru Oohashi
发明人： Takehiro Ueda , Yoshiyuki Kobayashi , Kaoru Oohashi
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01L21/683
CPC分类号： B32B38/08 , B32B38/10 , H01L21/6831 , H01L21/68735 , H01L21/68757 , Y10T29/49359 , Y10T29/494 , Y10T29/4998 , Y10T29/49982 , Y10T279/23
摘要： A substrate mounting table includes a plate shaped member provided with a mounting surface for mounting a substrate thereon, a plurality of gas injection openings opened on the mounting surface to supply a gas toward the mounting surface, and a gas supply channel for supplying the gas through the gas injection openings; and a thermally sprayed ceramic layer covering the mounting surface. At least inner wall portions of the gas supply channel are formed in curved surface shapes, the inner wall portions facing the gas injection openings.
摘要翻译：基板安装台包括：板状部件，其设置有用于在其上安装基板的安装表面;多个气体注入开口，其在安装面上开口以朝向安装表面供应气体;以及气体供应通道，用于通过气体注入口; 以及覆盖安装表面的热喷涂陶瓷层。气体供给通道的至少内壁部分形成为曲面形状，内壁部分面对气体注入开口。

3. 外观设计

USD553104S1 Absorption board for an electric chuck used in semiconductor manufacture 有权
标题翻译：用于半导体制造的电子卡盘吸收板
公开(公告)号：USD553104S1
公开(公告)日：2007-10-16
申请号：US29215644
申请日：2004-10-19
申请人： Kaoru Oohashi , Shunsuke Mizukami , Takehiro Ueda
设计人： Kaoru Oohashi , Shunsuke Mizukami , Takehiro Ueda

4. 发明申请

US20120006492A1 PLASMA PROCESSOR AND PLASMA PROCESSING METHOD 失效
标题翻译：等离子体处理器和等离子体处理方法
公开(公告)号：US20120006492A1
公开(公告)日：2012-01-12
申请号：US13242851
申请日：2011-09-23
申请人： Akihiro KIKUCHI , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
发明人： Akihiro KIKUCHI , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
IPC分类号： C23F1/08
CPC分类号： H01J37/32724 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/32082 , H01J37/32174 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32642 , H01J37/32715 , H01J37/3411 , H01J2237/002 , H01J2237/0206 , H01J2237/334 , H01L21/67069
摘要： An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., −400 to −600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.
摘要翻译：蚀刻室1包括聚焦环9，以围绕设置在下电极4上的半导体晶片W.等离子体处理器设置有电位控制DC电源33以控制该聚焦环9的电位，以及这样构成为向下电极4提供例如-400至-600V的DC电压以控制聚焦环9的电位。这种结构防止表面电弧沿着待处理基板的表面发展。

5. 发明申请

US20080098833A1 APPARATUS AND METHOD FOR EVALUATING A SUBSTRATE MOUNTING DEVICE 有权
标题翻译：用于评估基板安装装置的装置和方法
公开(公告)号：US20080098833A1
公开(公告)日：2008-05-01
申请号：US11925158
申请日：2007-10-26
申请人： Yasuharu Sasaki , Takehiro Ueda , Taketoshi Okajo , Kaoru Oohashi
发明人： Yasuharu Sasaki , Takehiro Ueda , Taketoshi Okajo , Kaoru Oohashi
IPC分类号： G01R31/02 , H01L21/683
CPC分类号： H01L21/67248 , H01L21/6831 , H01L21/68757
摘要： An apparatus evaluates a substrate mounting device adapted to hold a target substrate placed on a mounting surface and to control a temperature of the target substrate. The apparatus includes an evacuatable airtightly sealed chamber accommodating therein the substrate mounting device, a heat source, arranged in a facing relationship with the mounting surface, for irradiating infrared light. The apparatus further includes an evaluation-purpose substrate adapted to be mounted on the mounting surface in place of the target substrate, the evaluation-purpose substrate being made of an infrared light absorbing material, and having a unit for measuring temperatures at plural sites on a surface and/or inside of the substrate.
摘要翻译：一种装置评价适于保持放置在安装表面上的目标基板并控制目标基板的温度的基板安装装置。该装置包括可抽出的气密密封室，其容纳基板安装装置，以与安装表面相对的关系布置的用于照射红外光的热源。该装置还包括适于安装在安装表面上以代替目标基板的评估用基板，评估用基板由红外光吸收材料制成，并且具有用于测量在多个位置上的温度的单元表面和/或内部。

6. 发明授权

US08573836B2 Apparatus and method for evaluating a substrate mounting device 有权
标题翻译：用于评价基板安装装置的装置和方法
公开(公告)号：US08573836B2
公开(公告)日：2013-11-05
申请号：US11925158
申请日：2007-10-26
申请人： Yasuharu Sasaki , Takehiro Ueda , Taketoshi Okajo , Kaoru Oohashi
发明人： Yasuharu Sasaki , Takehiro Ueda , Taketoshi Okajo , Kaoru Oohashi
IPC分类号： G01N17/00 , H01L21/00
CPC分类号： H01L21/67248 , H01L21/6831 , H01L21/68757
摘要： An apparatus evaluates a substrate mounting device adapted to hold a target substrate placed on a mounting surface and to control a temperature of the target substrate. The apparatus includes an evacuatable airtightly sealed chamber accommodating therein the substrate mounting device, a heat source, arranged in a facing relationship with the mounting surface, for irradiating infrared light. The apparatus further includes an evaluation-purpose substrate adapted to be mounted on the mounting surface in place of the target substrate, the evaluation-purpose substrate being made of an infrared light absorbing material, and having a unit for measuring temperatures at plural sites on a surface and/or inside of the substrate.
摘要翻译：一种装置评价适于保持放置在安装表面上的目标基板并控制目标基板的温度的基板安装装置。该装置包括可抽出的气密密封室，其容纳基板安装装置，以与安装表面相对的关系布置的用于照射红外光的热源。该装置还包括适于安装在安装表面上以代替目标基板的评估用基板，评估用基板由红外光吸收材料制成，并且具有用于测量在多个位置上的温度的单元表面和/或内部。

7. 发明授权

US08387562B2 Plasma processor and plasma processing method 失效
标题翻译：等离子处理器和等离子体处理方法
公开(公告)号：US08387562B2
公开(公告)日：2013-03-05
申请号：US13242851
申请日：2011-09-23
申请人： Akihiro Kikuchi , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
发明人： Akihiro Kikuchi , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
IPC分类号： C23C16/50 , C23C16/52 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32724 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/32082 , H01J37/32174 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32642 , H01J37/32715 , H01J37/3411 , H01J2237/002 , H01J2237/0206 , H01J2237/334 , H01L21/67069
摘要： An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., −400 to −600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.
摘要翻译：蚀刻室1包括聚焦环9，以围绕设置在下电极4上的半导体晶片W.等离子体处理器设置有电位控制DC电源33以控制该聚焦环9的电位，以及这样构成为向下电极4提供例如-400至-600V的DC电压以控制聚焦环9的电位。这种结构防止表面电弧沿着待处理基板的表面发展。

8. 发明授权

US08056503B2 Plasma procesor and plasma processing method 有权
标题翻译：等离子处理和等离子体处理方法
公开(公告)号：US08056503B2
公开(公告)日：2011-11-15
申请号：US10483251
申请日：2002-07-02
申请人： Akihiro Kikuchi , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
发明人： Akihiro Kikuchi , Satoshi Kayamori , Shinya Shima , Yuichiro Sakamoto , Kimihiro Higuchi , Kaoru Oohashi , Takehiro Ueda , Munehiro Shibuya , Tadashi Gondai
IPC分类号： C23C16/50 , C23C16/52 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32724 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/32082 , H01J37/32174 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32642 , H01J37/32715 , H01J37/3411 , H01J2237/002 , H01J2237/0206 , H01J2237/334 , H01L21/67069
摘要： An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., −400 to −600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.
摘要翻译：蚀刻室1包括聚焦环9，以围绕设置在下电极4上的半导体晶片W.等离子体处理器设置有电位控制DC电源33以控制该聚焦环9的电位，以及这样构成为向下电极4提供例如-400至-600V的DC电压以控制聚焦环9的电位。这种结构防止表面电弧沿着待处理基板的表面发展。

9. 发明授权

US07646581B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07646581B2
公开(公告)日：2010-01-12
申请号：US11668568
申请日：2007-01-30
申请人： Yasuharu Sasaki , Takehiro Ueda , Yusuke Nakagawa , Nobuyuki Nagayama , Taketoshi Okajo , Mamoru Kosakai
发明人： Yasuharu Sasaki , Takehiro Ueda , Yusuke Nakagawa , Nobuyuki Nagayama , Taketoshi Okajo , Mamoru Kosakai
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , C23C14/505 , C23C16/4581 , C23C16/4586 , H01L21/6875
摘要： An electrostatic chuck capable of widening a temperature range and reducing a variation in thermal conductivity between the electrostatic chuck and the flat substrate over time is provided. The chuck includes: a body that has an internal electrode for attracting a flat substrate by an electrostatic force provided therein, a plurality of protrusions formed on one surface of the body serving as an electrostatic attraction surface, and projections provided on the top surfaces of some or all of the plurality of protrusions. In the electrostatic chuck, a region of the top surface of each of the minute projections on which the flat substrate is loaded is referred to as a mounting surface, and the total area of the mounting surfaces of the minute projections is equal to or larger than 0.01% and equal to or smaller than 2% of the area of the electrostatic attraction surface.
摘要翻译：提供了能够随时间扩大温度范围并减少静电卡盘与平板之间的导热性变化的静电卡盘。卡盘包括：具有用于通过设置在其中的静电力吸引平坦基板的内部电极的主体，形成在作为静电吸引表面的主体的一个表面上的多个突起，以及设置在一些或所有多个突起。在静电卡盘中，将安装有平坦基板的每个微小突起的上表面的区域称为安装面，微小突起的安装面的总面积等于或大于 0.01％且等于或小于静电吸引表面积的2％。

10. 发明申请

US20070217114A1 ELECTROSTATIC CHUCK 有权
标题翻译：静电卡
公开(公告)号：US20070217114A1
公开(公告)日：2007-09-20
申请号：US11668568
申请日：2007-01-30
申请人： Yasuharu Sasaki , Takehiro Ueda , Yusuke Nakagawa , Nobuyuki Nagayama , Taketoshi OKajo , Mamoru Kosakai
发明人： Yasuharu Sasaki , Takehiro Ueda , Yusuke Nakagawa , Nobuyuki Nagayama , Taketoshi OKajo , Mamoru Kosakai
IPC分类号： H01H47/00
CPC分类号： H01L21/6831 , C23C14/505 , C23C16/4581 , C23C16/4586 , H01L21/6875
摘要： The invention provides an electrostatic chuck capable of widening a temperature range when the temperature of a flat substrate is controlled and reducing a variation in thermal conductivity between the electrostatic chuck and the flat substrate over time. According to an aspect of the invention, an electrostatic chuck includes: a body that has an internal electrode for attracting a flat substrate by an electrostatic force provided therein; a plurality of protrusions that are formed on one surface of the body, serving as an electrostatic attraction surface; and one or more minute projections that are provided on each of top surfaces of some or all of the plurality of protrusions. In the electrostatic chuck, a region of the top surface of each of the minute projections on which the flat substrate is loaded is referred to as a mounting surface, and the total area of the mounting surfaces of the minute projections is equal to or larger than 0.01% and equal to or smaller than 2% of the area of the electrostatic attraction surface.
摘要翻译：本发明提供了一种能够在平坦基板的温度被控制时能够扩大温度范围并且随着时间的推移减小静电卡盘和平坦基板之间的导热性变化的静电卡盘。根据本发明的一个方面，静电卡盘包括：主体，其具有用于通过设置在其中的静电力来吸引平坦的基板的内部电极; 多个突起，其形成在所述主体的一个表面上，用作静电吸引表面; 以及设置在多个突起中的一些或全部的每个顶表面上的一个或多个微小突起。在静电卡盘中，将安装有平坦基板的每个微小突起的上表面的区域称为安装面，微小突起的安装面的总面积等于或大于 0.01％且等于或小于静电吸引表面积的2％。

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