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1. 发明申请

US20100033810A1 POLARIZER PROTECTIVE FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：极化保护膜，极化板和图像显示装置
公开(公告)号：US20100033810A1
公开(公告)日：2010-02-11
申请号：US12520140
申请日：2007-12-05
申请人： Nobuyuki Haida , Daisuke Hattori , Tsutomu Hani , Hiroyuki Takao , Hitoshi Kitagishi
发明人： Nobuyuki Haida , Daisuke Hattori , Tsutomu Hani , Hiroyuki Takao , Hitoshi Kitagishi
IPC分类号： G02B5/20 , G02B5/30
CPC分类号： G02B1/14 , B32B7/12 , B32B27/08 , B32B27/18 , B32B27/285 , B32B27/302 , B32B27/306 , B32B27/308 , B32B27/32 , B32B27/34 , B32B27/36 , B32B27/365 , B32B27/42 , B32B2250/24 , B32B2307/306 , B32B2307/412 , B32B2307/42 , B32B2457/20 , G02B1/105 , G02B5/3025 , G02F1/133528 , G02F1/133615 , G02F2201/086 , G02F2201/50
摘要： Provided is a polarizer protective film of thin type, which has excellent heat resistance and excellent transparency as well as excellent UV-absorbing ability, has good external appearance of a film surface, and can be stably produced by film forming. The polarizer protective film of the present invention includes a resin layer (A) and a resin layer (B1) in the stated order, in which the resin layer (A) is a resin layer containing a (meth)acrylic resin as a main component and contains a UV absorber at a ratio of 0.5 to 10 wt % with respect to a resin component contained in the resin layer (A), and the resin layer (B1) is a resin layer containing, as a main component, a thermoplastic resin other than a (meth) acrylic resin.
摘要翻译：本发明提供一种薄型的偏振片保护膜，它具有优异的耐热性和优异的透明性以及优异的UV吸收能力，具有良好的膜表面外观，可通过成膜稳定地制造。本发明的偏振片保护膜包括树脂层（A）和树脂层（B1），其中树脂层（A）是含有（甲基）丙烯酸树脂作为主要成分的树脂层并且相对于树脂层（A）中所含的树脂成分含有0.5〜10重量％的紫外线吸收剂，树脂层（B1）是含有作为主要成分的热塑性树脂的树脂层除了（甲基）丙烯酸树脂之外。

2. 发明申请

US20100047484A1 POLARIZER PROTECTIVE FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：极化保护膜，极化板和图像显示装置
公开(公告)号：US20100047484A1
公开(公告)日：2010-02-25
申请号：US12519577
申请日：2007-12-05
申请人： Hitoshi Kitagishi , Daisuke Hattori , Nobuyuki Haida , Tsutomu Hani , Hiroyuki Takao
发明人： Hitoshi Kitagishi , Daisuke Hattori , Nobuyuki Haida , Tsutomu Hani , Hiroyuki Takao
IPC分类号： C09K19/00
CPC分类号： G02B1/14 , G02B1/105 , G02B5/208 , G02B5/305 , G02F1/133528 , G02F1/133615 , G02F2201/086 , G02F2201/50 , Y10T428/10 , Y10T428/1041
摘要： Provided is a polarizer protective film of thin type, which has excellent heat resistance and excellent transparency as well as excellent UV-absorbing ability, has good external appearance of a film surface, and can be stably produced by film forming. The polarizer protective film of the present invention includes a resin layer (A) and a resin layer (B1) in the stated order, in which the resin layer (A) is a resin layer containing a (meth) acrylic resin as a main component and contains a UV absorber at a ratio of 0.5 to 10 wt % with respect to a resin component contained in the resin layer (A), and the resin layer (B1) is a resin layer containing a (meth) acrylic resin as a main component and contains a UV absorber at a ratio of more than 0 wt % and 2 wt % or less with respect to a resin component contained in the resin layer (B1).
摘要翻译：本发明提供一种薄型的偏振片保护膜，它具有优异的耐热性和优异的透明性以及优异的UV吸收能力，具有良好的膜表面外观，可通过成膜稳定地制造。本发明的偏振片保护膜包括树脂层（A）和树脂层（B1），其中树脂层（A）是含有（甲基）丙烯酸树脂作为主要成分的树脂层相对于树脂层（A）中含有的树脂成分，含有0.5〜10重量％的紫外线吸收剂，树脂层（B1）是以（甲基）丙烯酸树脂为主体的树脂层并且相对于树脂层（B1）中所含的树脂成分，含有大于0重量％且2重量％以下的紫外线吸收剂。

3. 发明申请

US20100020396A1 POLARIZER PROTECTIVE FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：极化保护膜，极化板和图像显示装置
公开(公告)号：US20100020396A1
公开(公告)日：2010-01-28
申请号：US12445666
申请日：2007-09-27
申请人： Hiroko Izumi , Yoshitomo Nakata , Ken-Ichi Ueda , Daisuke Hattori , Tadashi Kojima , Hiroyuki Takao , Tsutomu Hani
发明人： Hiroko Izumi , Yoshitomo Nakata , Ken-Ichi Ueda , Daisuke Hattori , Tadashi Kojima , Hiroyuki Takao , Tsutomu Hani
IPC分类号： G02B27/28 , F21V9/06
CPC分类号： G02F1/133528 , G02B5/305 , G02F2201/086 , G02F2201/50
摘要： Provided are: a polarizer protective film, which is allowed to express excellent UV-absorbing ability by using a UV-absorbing monomer as a raw material, has excellent heat resistance and excellent optical transparency, and has much less coloring and foaming; a polarizing plate with less defects in an outer appearance, using the polarizer protective film; and an image display apparatus of high quality, using the polarizing plate. The polarizer protective film of the present invention has a light transmittance at 380 nm in a thickness of 80 μm of 30% or less, and is obtained by molding a forming material that contains a resin component containing as a main component a (meth)acrylic resin obtained by polymerizing a monomer composition containing a UV-absorbing monomer and a (meth)acrylic monomer by extrusion molding.
摘要翻译：提供：通过使用紫外线吸收性单体作为原料使其表现出优异的紫外线吸收能力的偏光片保护膜具有优异的耐热性和优异的光学透明性，并且具有更少的着色和起泡性; 使用偏振片保护膜的外观较差缺陷的偏振片; 以及使用偏振片的高质量的图像显示装置。本发明的偏振片保护膜的厚度为80μm的透光率为380nm，为30％以下，通过将含有以（甲基）丙烯酸类作为主要成分的树脂成分的成型材料成型而得到通过挤出成型使包含UV吸收性单体和（甲基）丙烯酸系单体的单体组合物聚合而得到的树脂。

4. 发明申请

US20100182690A1 OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：光学膜，偏光板和图像显示装置
公开(公告)号：US20100182690A1
公开(公告)日：2010-07-22
申请号：US12668285
申请日：2008-05-20
申请人： Hiroyuki Takao , Tsutomu Hani
发明人： Hiroyuki Takao , Tsutomu Hani
IPC分类号： G02B1/08 , C08K5/315 , C08K5/3472 , C08K5/3492
CPC分类号： G02B5/223 , C08J5/18 , C08J2333/06 , G02B5/208 , G02B5/305
摘要： Provided are an optical film which has excellent heat resistance and excellent optical transparency as well as an excellent UV-absorbing ability even in the wavelength range of 200 to 350 nm, and which is free of any defect in terms of its external appearance, a polarizing plate having a few external appearance defects and using the optical film, and an image display apparatus of high quality using the polarizing plate. The optical film of the present invention is obtained through extrusion molding of a molding material containing resin components containing a (meth)acrylic resin as a main component and 0.35 to 3.0 parts by weight of a cyanoacrylate-based UV absorber with respect to 100 parts by weight of the resin components.
摘要翻译：提供了一种光学膜，其具有优异的耐热性和优异的光学透明性，并且即使在200至350nm的波长范围内也具有优异的UV吸收能力，并且其在外观方面没有任何缺陷，偏光具有少量外观缺陷并使用该光学膜的板以及使用该偏振片的高质量的图像显示装置。本发明的光学膜是通过挤出成型含有（甲基）丙烯酸树脂作为主要成分的树脂成分和0.35〜3.0重量份的氰基丙烯酸酯系UV吸收剂的成型材料相对于100份的重量的树脂组分。

5. 发明授权

US09914810B2 Transparent conductive film and touch panel 有权
公开(公告)号：US09914810B2
公开(公告)日：2018-03-13
申请号：US13421931
申请日：2012-03-16
申请人： Hiroki Ozawa , Hiroyuki Takao , Minoru Kanatani , Wataru Nagatake
发明人： Hiroki Ozawa , Hiroyuki Takao , Minoru Kanatani , Wataru Nagatake
IPC分类号： B32B3/00 , B32B5/16 , B32B27/06 , C08J7/04
CPC分类号： C08J7/045 , C08J7/047 , C08J2367/02 , C08J2433/00 , Y10T428/24405
摘要： A transparent conductive film having a transparent polymer substrate and a transparent conductive layer on one main surface of the transparent polymer substrate. A cured resin layer with surface irregularities is formed: at least one of: between the transparent polymer substrate and the transparent conductive layer; and on the main surface opposite to the surface with the transparent conductive layer formed thereon of the transparent polymer substrate. The cured resin layer is preferably 1 μm or more and 3 μm or less in thickness and preferably contains a resin composition containing at least two components that undergo phase separation based on a difference in physical properties and 0.01 to 5 parts by weight of fine particles to 100 parts by weight of the solid content of the resin composition. The particle size of the fine particles is preferably 25 to 80% of the thickness of the cured resin layer.

6. 发明授权

US08854577B2 Polarizer-protecting film comprising an easy-adhesion layer composition, and polarizing plate and image display apparatus each comprising the polarizing-protecting film 有权
标题翻译：包含易粘合层组合物的偏振片保护膜和各自包含偏振保护膜的偏振片和图像显示装置
公开(公告)号：US08854577B2
公开(公告)日：2014-10-07
申请号：US13056447
申请日：2009-06-01
申请人： Tatsuya Yamasaki , Takeshi Saitou , Hiroyuki Takao , Youichirou Sugino , Yuuji Yamashita
发明人： Tatsuya Yamasaki , Takeshi Saitou , Hiroyuki Takao , Youichirou Sugino , Yuuji Yamashita
IPC分类号： G02F1/1335 , G02B5/30 , B32B27/40 , B32B27/30 , B32B27/20 , B32B7/12 , B32B27/08
CPC分类号： B32B27/08 , B32B7/12 , B32B27/20 , B32B27/30 , B32B27/40 , G02B5/3025 , G02B5/305 , G02F1/133528 , G02F2201/50 , G02F2202/28 , Y10T428/25 , Y10T428/2896
摘要： The present invention provides a polarizer protective film capable of suppressing blocking that occurs in taking up the film. The polarizer protective film of the present invention includes a (meth)acrylic resin film and an easy-adhesion layer formed of an easy-adhesive composition including a urethane resin and fine particles. The fine particles include preferably colloidal silica.
摘要翻译：本发明提供一种能够抑制在卷取薄膜时发生的阻挡的偏振片保护膜。本发明的偏振片保护膜包括（甲基）丙烯酸树脂膜和由包含聚氨酯树脂和细颗粒的易粘合组合物形成的易粘合层。细颗粒优选包括胶体二氧化硅。

7. 发明授权

US07968183B2 Hard-coated film, method of manufacturing the same, optical device, and image display 有权
标题翻译：硬涂膜，其制造方法，光学装置和图像显示
公开(公告)号：US07968183B2
公开(公告)日：2011-06-28
申请号：US11727394
申请日：2007-03-26
申请人： Katsunori Takada , Hiroyuki Takao , Seiichi Kusumoto , Daisuke Hamamoto , Takayuki Shigematsu
发明人： Katsunori Takada , Hiroyuki Takao , Seiichi Kusumoto , Daisuke Hamamoto , Takayuki Shigematsu
IPC分类号： B32B27/30 , B32B27/40 , B32B5/16
CPC分类号： C08J7/047 , C08J2301/10 , C08J2433/00 , Y10T428/249974 , Y10T428/259 , Y10T428/31551 , Y10T428/31598 , Y10T428/31663 , Y10T428/31667 , Y10T428/31935
摘要： A hard-coating layer is formed on at least one surface of a transparent plastic film substrate using a material for forming a hard-coating layer. The material contains Components A, B, and C. Component A is at least one of urethane acrylate and urethane methacrylate. Component B is at least one of polyol acrylate and polyol methacrylate. Component C is a polymer containing a repeating unit represented by General Formula 1 indicated below.
摘要翻译：使用形成硬涂层的材料在透明塑料膜基材的至少一个表面上形成硬涂层。该材料含有组分A，B和C.组分A是聚氨酯丙烯酸酯和氨基甲酸酯甲基丙烯酸酯中的至少一种。组分B是多元醇丙烯酸酯和多元醇甲基丙烯酸酯中的至少一种。成分C是含有下述通式1表示的重复单元的聚合物。

8. 发明授权

US07803228B2 Process for producing high-resistance silicon wafers and process for producing epitaxial wafers and SOI wafers 有权
标题翻译：用于生产高电阻硅晶片的方法和用于制造外延晶片和SOI晶片的工艺
公开(公告)号：US07803228B2
公开(公告)日：2010-09-28
申请号：US10576321
申请日：2004-08-02
申请人： Kazunari Kurita , Shinsuke Sadamitsu , Hiroyuki Takao , Masataka Hourai
发明人： Kazunari Kurita , Shinsuke Sadamitsu , Hiroyuki Takao , Masataka Hourai
IPC分类号： C30B15/14
CPC分类号： H01L21/324 , C30B29/06 , C30B33/02 , H01L21/322 , H01L21/76243
摘要： By using oxygen-containing silicon wafers obtained by the CZ method and by combining the first heat treatment comprising controlled heat-up operation (ramping) with the second heat treatment comprising high-temperature heat treatment and medium temperature heat treatment in accordance with the process for producing high-resistance silicon wafers according to the present invention, it is possible to obtain high-resistance silicon wafers capable of maintaining their high resistance even after heat treatment in the process of device manufacture while efficiently inhibiting the formation of oxygen donors and preventing changes in resistivity. Further, excellent epitaxial wafers and SOI wafers can be produced using those high-resistance silicon wafers and, therefore, they can be applied in a wide field including high-frequency communication devices and analog/digital hybrid devices, among others.
摘要翻译：通过使用通过CZ方法获得的含氧硅晶片，并且通过将包括受控加热操作（斜面）的第一热处理与包括高温热处理和中温热处理的第二热处理组合，制造根据本发明的高电阻硅晶片，可以获得能够在器件制造过程中即使在热处理之后也能够保持高电阻的高电阻硅晶片，同时有效地抑制氧供体的形成并防止电阻率。此外，可以使用这些高电阻硅晶片来制造优异的外延晶片和SOI晶片，因此可以应用于包括高频通信装置和模拟/数字混合装置等的广泛领域。

9. 发明申请

US20070066033A1 Process for producing high-resistance silicon wafers and process for producing epitaxial wafers and soi wafers (as amended) 有权
标题翻译：用于生产高电阻硅晶片的方法和用于生产外延晶片和硅晶片的工艺（经修改）
公开(公告)号：US20070066033A1
公开(公告)日：2007-03-22
申请号：US10576321
申请日：2004-08-02
申请人： Kazunari Kurita , Shinsuke Sadamitsu , Hiroyuki Takao , Masataka Hourai
发明人： Kazunari Kurita , Shinsuke Sadamitsu , Hiroyuki Takao , Masataka Hourai
IPC分类号： H01L21/322
CPC分类号： H01L21/324 , C30B29/06 , C30B33/02 , H01L21/322 , H01L21/76243
摘要： By using oxygen-containing silicon wafers obtained by the CZ method and by combining the first heat treatment comprising controlled heat-up operation (ramping) with the second heat treatment comprising high-temperature heat treatment and medium temperature heat treatment in accordance with the process for producing high-resistance silicon wafers according to the present invention, it is possible to obtain high-resistance silicon wafers capable of maintaining their high resistance even after heat treatment in the process of device manufacture while efficiently inhibiting the formation of oxygen donors and preventing changes in resistivity. Further, excellent epitaxial wafers and SOI wafers can be produced using those high-resistance silicon wafers and, therefore, they can be applied in a wide field including high-frequency communication devices and analog/digital hybrid devices, among others.
摘要翻译：通过使用通过CZ方法获得的含氧硅晶片，并且通过将包括受控加热操作（斜面）的第一热处理与包括高温热处理和中温热处理的第二热处理组合，制造根据本发明的高电阻硅晶片，可以获得能够在器件制造过程中即使在热处理之后也能够保持高电阻的高电阻硅晶片，同时有效地抑制氧供体的形成并防止电阻率。此外，可以使用这些高电阻硅晶片来制造优异的外延晶片和SOI晶片，因此可以应用于包括高频通信装置和模拟/数字混合装置等的广泛领域。

10. 发明授权

US06601655B1 Piercing apparatus 失效
标题翻译：穿刺装置
公开(公告)号：US06601655B1
公开(公告)日：2003-08-05
申请号：US09567640
申请日：2000-05-09
申请人： Manabu Gotou , Keisuke Morimitsu , Hiromi Kawakami , Tuneo Iwasaki , Kazuo Haga , Yoshiichi Yatagai , Manpei Hontani , Hiroyuki Takao
发明人： Manabu Gotou , Keisuke Morimitsu , Hiromi Kawakami , Tuneo Iwasaki , Kazuo Haga , Yoshiichi Yatagai , Manpei Hontani , Hiroyuki Takao
IPC分类号： B25D918
CPC分类号： F27D3/1527 , B25D9/145 , C21B7/12
摘要： A piercing apparatus compact in size having a decreased number of hoses is suited for use as an iron runner port-opening machine for a blast furnace or the like furnace in an iron mill. The piercing apparatus executes the piercing by moving back and forth, by using a feed unit, a drifter equipped with a forward-blowing unit, a reverse-blowing unit and a rotary unit, and wherein cylinders containing a cylindrical blowing piston are provided in front of, and at the back of, a drifter body maintaining a distance relative to each other; a shank rod having, formed as a unitary structure, a blowing portion of a large diameter with blowing surfaces formed on the front and rear portions thereof and rod-like small-diameter portions protruding forward and backward beyond the blowing portion, is provided along the axial direction of the drifter body in a manner that the blowing portion is positioned between the front cylinder and rear cylinder and that the small-diameter portions on both sides are fitted to the cylindrical blowing pistons of the respective sides; and valves are provided in the outer peripheral portions of the front and rear cylinders to supply hydraulic pressure into the cylinders.
摘要翻译：具有减少数量的软管的紧凑的穿孔装置适合用作铁磨机中的高炉或类似炉的铁流道开口机。穿刺装置通过使用进给单元，配备有前吹单元，反吹单元和旋转单元的漂流器来前后移动来执行穿孔，并且其中包含圆柱形吹出活塞的气缸设置在前面一个相对于彼此保持距离的漂浮体的背面和背面; 具有形成为整体结构的杆杆，其具有形成在其前部和后部上的吹制表面的大直径吹塑部分和沿着吹塑部分向前和向后突出的杆状小直径部分沿着以使吹风部位于前气缸和后气缸之间并且两侧的小直径部分嵌合到各侧的圆筒形吹出活塞的方式，使得漂流体的轴向方向; 并且在前缸和后气缸的外周部分设置有阀，以将液压供应到气缸中。

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