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    • 2. 发明授权
    • Diaphragm structure
    • 隔膜结构
    • US5965970A
    • 1999-10-12
    • US639609
    • 1996-04-29
    • Yukihisa TakeuchiKeizo MiyataTakao OhnishiNobuo Takahashi
    • Yukihisa TakeuchiKeizo MiyataTakao OhnishiNobuo Takahashi
    • G01L7/08G01L9/00G01L9/04H01L41/09H01L41/08
    • H01L41/0973
    • A diaphragm structure includes a ceramic substrate having at least one window portion and a thin diaphragm laminated onto the ceramic substrate so as to cover the window portion, wherein only a part of an interface between the ceramic substrate and the thin diaphragm is joined to form a joint of the diaphragm. A diaphragm structure is free from instability caused by a breakage or deformation of a partition wall between window portions upon punching or laminating even if a diaphragm structure employs a design in which dimensions of a diaphragm portion is maintained and simultaneously a distance between diaphragm portions is made narrow to restrain a surface area excluding a diaphragm portion of a diaphragm structure or a design in which a plurality of diaphragm portion having various configurations and dimensions are disposed.
    • 膜片结构包括陶瓷基板,其具有至少一个窗口部分和层叠在陶瓷基板上以便覆盖窗口部分的薄隔膜,其中仅陶瓷基板和薄隔膜之间的界面的一部分接合形成 隔膜的关节。 即使膜片结构采用保持隔膜部分的尺寸同时设置隔膜部分之间的距离的设计,隔膜结构也不会因冲孔或层压时窗口部分之间的隔壁的断裂或变形而引起的不稳定性 狭窄以限制除隔膜结构的隔膜部分之外的表面积或其中设置有具有各种构造和尺寸的多个隔膜部分的设计。
    • 4. 发明授权
    • Manufacturing method of piezoelectric/electrostrictive film type device
    • 压电/电致伸缩薄膜型器件的制造方法
    • US07267840B2
    • 2007-09-11
    • US10630887
    • 2003-07-30
    • Takao OhnishiMasahiro MurasatoYuki BesshoNobuo Takahashi
    • Takao OhnishiMasahiro MurasatoYuki BesshoNobuo Takahashi
    • B05D5/12
    • H01L41/314H01L41/0973H01L41/273
    • A method is provided for manufacturing a piezoelectric/electrostrictive film device including a ceramic substrate and a piezoelectric/electrostrictive operation portion including a lower electrode, a piezoelectric/electrostrictive layer, and upper electrode stacked on the substrate. The piezoelectric/electrostrictive layer is formed to extend beyond at least one of electrodes to form projected portions at its ends. The method includes the steps of forming the piezoelectric/electrostrictive layer so that ends of the piezoelectric/electrostrictive layer are projected to extend beyond ends of at least one electrode, applying a coating liquid in a sufficient amount so that the coating liquid permeates through a gap between at least the projected end portion of the piezoelectric/electrostrictive layer and the substrate, and so as to coat a predetermined portion of the at least one electrode, and drying the applied coating liquid to form a coupling member to couple the projected end portions of the piezoelectric/electrostrictive layer to the substrate.
    • 提供一种用于制造包括陶瓷基板和压电/电致伸缩操作部分的压电/电致伸缩膜装置的方法,该压电/电致伸缩操作部分包括堆叠在基板上的下电极,压电/电致伸缩层和上电极。 压电/电致伸缩层被形成为延伸超过至少一个电极以在其端部处形成突出部分。 该方法包括以下步骤:形成压电/电致伸缩层,使得压电/电致伸缩层的端部突出延伸超过至少一个电极的端部,施加足够量的涂覆液体,使得涂布液体渗透通过间隙 在压电/电致伸缩层的至少突出的端部与基板之间,并且涂覆至少一个电极的预定部分,并干燥所施加的涂覆液体以形成耦合部件,以将突出的端部 压电/电致伸缩层到基板。