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    • 1. 发明授权
    • Carbapenem derivatives
    • 卡巴培南衍生物
    • US6037341A
    • 2000-03-14
    • US765387
    • 1996-12-18
    • Nobuaki SatoManabu SashoAtsushi KamataTakaaki SuzukiIsao SugiyamaKanemasa KatsuTakeshi Suzuki
    • Nobuaki SatoManabu SashoAtsushi KamataTakaaki SuzukiIsao SugiyamaKanemasa KatsuTakeshi Suzuki
    • C07D477/00A61K31/397A61K31/40A61K31/445A61P31/04C07D477/20C07D7/18
    • C07D477/20Y02P20/55
    • Compounds having potent antimicrobial effects over Gram-positive bacteria and Gram-negative bacteria, a high stability to .beta.-lactamases and DHP-I and a high safety for the human body and a process for producing the same. Carbapenem compounds represented by the following general formula (I) or salts thereof: ##STR1## wherein the ring A represents a 3- to 7-membered non-aromatic ring containing at least one nitrogen atom and optionally having a substituent other than R.sup.6 ; R.sup.1 represents hydrogen or methyl; R.sup.2 and R.sup.5 are the same or different and each represents hydrogen or a protecting group of the hydroxyl group; R.sup.3 represents hydrogen or a protecting group of the carboxyl group; R.sup.4 represents hydrogen, lower alkyl or a protecting group of the amino group; R.sup.6 represents: (1) hydrogen, (2) lower alkyl, optionally substituted by an optionally protected hydroxy, carbamoyl, formimidoyl, acetimidoyl or ##STR2## wherein R.sup.7 and R.sup.8 are the same or different and each represents hydrogen, lower alkyl, or a protecting group of the amino group), or (3) a protecting group of the amino group or a protecting group of the imino group; and m is 0 or 1. These compounds have antimicrobial effects and are useful as a drug.
    • PCT No.PCT / JP95 / 01233 Sec。 371日期:1996年12月18日 102(e)日期1996年12月18日PCT提交1995年6月29日PCT公布。 出版物WO96 / 01261 日期1996年1月18日具有对革兰氏阳性菌和革兰氏阴性菌具有强效抗菌作用的化合物,对β-内酰胺酶和DHP-1的高稳定性和对人体的高安全性及其制备方法。 由以下通式(I)表示的碳青霉烯化合物或其盐:其中环A表示含有至少一个氮原子且任选具有除R6以外的取代基的3-至7-元非芳族环; R1代表氢或甲基; R2和R5相同或不同,各自表示氢或羟基的保护基; R3表示氢或羧基的保护基; R4表示氢,低级烷基或氨基的保护基; R 6表示:(1)氢,(2)任选被任选保护的羟基,氨基甲酰基,亚氨基,亚氨代乙酰基取代的低级烷基,或其中R 7和R 8相同或不同,各自表示氢,低级烷基或保护基 氨基),或(3)氨基的保护基或亚氨基的保护基; 并且m为0或1.这些化合物具有抗微生物作用并且可用作药物。
    • 5. 发明授权
    • Method for producing microstructure
    • 生产微结构的方法
    • US08871433B2
    • 2014-10-28
    • US13501897
    • 2010-10-14
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • G03F7/20G03F7/00B81C1/00B81C99/00G03F1/00G03F1/38
    • G03F7/0037B81C1/00126B81C99/002G03F1/14G03F1/38G03F1/50G03F7/2002G03F7/201
    • The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps.A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
    • 所公开的微结构制造方法可以以几步形成复杂的三维形成的微结构。 沿着未曝光的感光性树脂(42)设置包含透光部和遮光部的第一掩模图案(22),将含有透光部和遮光部的第二掩模图案(32)配置在 第一掩模图案(22)与感光性树脂(42)的反面。 此外,通过使感光性树脂(42)和第一掩模图案(22)围绕通过感光性树脂(42)和第一掩模图案(22)的中心轴(Z)一体地旋转,并且在同一 在相对于中心轴线(Z)的方向倾斜倾斜的方向上,从第二掩模图案的背面照射来自感光性树脂(42)和第一掩模图案(22)的曝光光, 通过第二掩模图案(32)的透光部分透射的曝光光的光束和第一掩模图案(22)的透光部分暴露感光性树脂(42)。
    • 6. 发明申请
    • METHOD FOR PRODUCING MICROSTRUCTURE
    • 生产微结构的方法
    • US20120214104A1
    • 2012-08-23
    • US13501897
    • 2010-10-14
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • G03F7/20
    • G03F7/0037B81C1/00126B81C99/002G03F1/14G03F1/38G03F1/50G03F7/2002G03F7/201
    • The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps.A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
    • 所公开的微结构制造方法可以以几步形成复杂的三维形成的微结构。 沿着未曝光的感光性树脂(42)设置包含透光部和遮光部的第一掩模图案(22),将含有透光部和遮光部的第二掩模图案(32)配置在 第一掩模图案(22)与感光性树脂(42)的反面。 此外,通过使感光性树脂(42)和第一掩模图案(22)围绕通过感光性树脂(42)和第一掩模图案(22)的中心轴(Z)一体地旋转,并且在同一 在相对于中心轴线(Z)的方向倾斜倾斜的方向上,从第二掩模图案的背面照射来自感光性树脂(42)和第一掩模图案(22)的曝光光, 通过第二掩模图案(32)的透光部分透射的曝光光的光束和第一掩模图案(22)的透光部分暴露感光性树脂(42)。
    • 8. 发明授权
    • Image forming apparatus addressing an abnormality in the cooling device and a method of controlling the image forming apparatus
    • 解决冷却装置异常的图像形成装置以及控制图像形成装置的方法
    • US07873287B2
    • 2011-01-18
    • US11694429
    • 2007-03-30
    • Kazuo SasamaTakaaki Suzuki
    • Kazuo SasamaTakaaki Suzuki
    • G03G15/00
    • G06F11/0793G03G21/206G06F11/0733G06F11/0748G06F11/30
    • An image forming apparatus according to the invention includes a cooling fan as a cooling device, an image formation processing unit, a changeover unit, a main control unit, a secondary control unit, and a power supply unit. The main control unit and the secondary control unit make an appropriate action in association with each other in the event of the occurrence of an abnormality in the cooling device. The changeover unit is configured to connect the image formation processing unit to the main image formation control unit in the main control unit in a case where power is supplied to the main control unit, and to connect the image formation processing unit to the secondary image formation control unit in the secondary control unit in a case where power supply to the main control unit is stopped by the power supply control unit in the secondary control unit.
    • 根据本发明的图像形成装置包括作为冷却装置的冷却风扇,图像形成处理单元,转换单元,主控制单元,次级控制单元和电源单元。 在冷却装置发生异常的情况下,主控制单元和二级控制单元相互联动。 转换单元被配置为在向主控制单元供电的情况下将图像形成处理单元连接到主控制单元中的主图像形成控制单元,并且将图像形成处理单元连接到二次图像形成 在由副控制单元中的电源控制单元停止对主控制单元供电的情况下,辅助控制单元中的控制单元。