会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Image forming apparatus addressing an abnormality in the cooling device and a method of controlling the image forming apparatus
    • 解决冷却装置异常的图像形成装置以及控制图像形成装置的方法
    • US07873287B2
    • 2011-01-18
    • US11694429
    • 2007-03-30
    • Kazuo SasamaTakaaki Suzuki
    • Kazuo SasamaTakaaki Suzuki
    • G03G15/00
    • G06F11/0793G03G21/206G06F11/0733G06F11/0748G06F11/30
    • An image forming apparatus according to the invention includes a cooling fan as a cooling device, an image formation processing unit, a changeover unit, a main control unit, a secondary control unit, and a power supply unit. The main control unit and the secondary control unit make an appropriate action in association with each other in the event of the occurrence of an abnormality in the cooling device. The changeover unit is configured to connect the image formation processing unit to the main image formation control unit in the main control unit in a case where power is supplied to the main control unit, and to connect the image formation processing unit to the secondary image formation control unit in the secondary control unit in a case where power supply to the main control unit is stopped by the power supply control unit in the secondary control unit.
    • 根据本发明的图像形成装置包括作为冷却装置的冷却风扇,图像形成处理单元,转换单元,主控制单元,次级控制单元和电源单元。 在冷却装置发生异常的情况下,主控制单元和二级控制单元相互联动。 转换单元被配置为在向主控制单元供电的情况下将图像形成处理单元连接到主控制单元中的主图像形成控制单元,并且将图像形成处理单元连接到二次图像形成 在由副控制单元中的电源控制单元停止对主控制单元供电的情况下,辅助控制单元中的控制单元。
    • 2. 发明申请
    • IMAGE FORMING APPARATUS, AND METHOD OF CONTROLLING THE SAME
    • 图像形成装置及其控制方法
    • US20080240741A1
    • 2008-10-02
    • US11694429
    • 2007-03-30
    • Kazuo SasamaTakaaki Suzuki
    • Kazuo SasamaTakaaki Suzuki
    • G03G15/00G06F11/07
    • G06F11/0793G03G21/206G06F11/0733G06F11/0748G06F11/30
    • An image forming apparatus according to the invention includes a cooling fan as a cooling device, an image formation processing unit, a changeover unit, a main control unit, a secondary control unit, and a power supply unit. The main control unit and the secondary control unit make an appropriate action in association with each other in the event of the occurrence of an abnormality in the cooling device. The changeover unit is configured to connect the image formation processing unit to the main image formation control unit in the main control unit in a case where power is supplied to the main control unit, and to connect the image formation processing unit to the secondary image formation control unit in the secondary control unit in a case where power supply to the main control unit is stopped by the power supply control unit in the secondary control unit.
    • 根据本发明的图像形成装置包括作为冷却装置的冷却风扇,图像形成处理单元,转换单元,主控制单元,次级控制单元和电源单元。 在冷却装置发生异常的情况下,主控制单元和二级控制单元相互联动。 转换单元被配置为在向主控制单元供电的情况下将图像形成处理单元连接到主控制单元中的主图像形成控制单元,并且将图像形成处理单元连接到二次图像形成 在由副控制单元中的电源控制单元停止对主控制单元供电的情况下,辅助控制单元中的控制单元。
    • 4. 发明授权
    • Method for producing microstructure
    • 生产微结构的方法
    • US08871433B2
    • 2014-10-28
    • US13501897
    • 2010-10-14
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • G03F7/20G03F7/00B81C1/00B81C99/00G03F1/00G03F1/38
    • G03F7/0037B81C1/00126B81C99/002G03F1/14G03F1/38G03F1/50G03F7/2002G03F7/201
    • The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps.A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
    • 所公开的微结构制造方法可以以几步形成复杂的三维形成的微结构。 沿着未曝光的感光性树脂(42)设置包含透光部和遮光部的第一掩模图案(22),将含有透光部和遮光部的第二掩模图案(32)配置在 第一掩模图案(22)与感光性树脂(42)的反面。 此外,通过使感光性树脂(42)和第一掩模图案(22)围绕通过感光性树脂(42)和第一掩模图案(22)的中心轴(Z)一体地旋转,并且在同一 在相对于中心轴线(Z)的方向倾斜倾斜的方向上,从第二掩模图案的背面照射来自感光性树脂(42)和第一掩模图案(22)的曝光光, 通过第二掩模图案(32)的透光部分透射的曝光光的光束和第一掩模图案(22)的透光部分暴露感光性树脂(42)。
    • 5. 发明申请
    • METHOD FOR PRODUCING MICROSTRUCTURE
    • 生产微结构的方法
    • US20120214104A1
    • 2012-08-23
    • US13501897
    • 2010-10-14
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • Takaaki SuzukiHidetoshi KoteraIsaku KannoDaisuke Hiramaru
    • G03F7/20
    • G03F7/0037B81C1/00126B81C99/002G03F1/14G03F1/38G03F1/50G03F7/2002G03F7/201
    • The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps.A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
    • 所公开的微结构制造方法可以以几步形成复杂的三维形成的微结构。 沿着未曝光的感光性树脂(42)设置包含透光部和遮光部的第一掩模图案(22),将含有透光部和遮光部的第二掩模图案(32)配置在 第一掩模图案(22)与感光性树脂(42)的反面。 此外,通过使感光性树脂(42)和第一掩模图案(22)围绕通过感光性树脂(42)和第一掩模图案(22)的中心轴(Z)一体地旋转,并且在同一 在相对于中心轴线(Z)的方向倾斜倾斜的方向上,从第二掩模图案的背面照射来自感光性树脂(42)和第一掩模图案(22)的曝光光, 通过第二掩模图案(32)的透光部分透射的曝光光的光束和第一掩模图案(22)的透光部分暴露感光性树脂(42)。
    • 10. 发明申请
    • Image processing device and image processing progam
    • 图像处理设备和图像处理程序
    • US20100119105A1
    • 2010-05-13
    • US12589595
    • 2009-10-26
    • Koichi MoriyaKazuo TaniAkira KawanakaHirokazu KobayashiTakaaki Suzuki
    • Koichi MoriyaKazuo TaniAkira KawanakaHirokazu KobayashiTakaaki Suzuki
    • G06K9/00
    • G06T1/0021G06T2201/0052
    • Provided is a technology of embedding watermark data into an arbitrarily-shaped region by applying a wavelet transform. Prepared are: image data into which the watermark data is to be embedded; a shape map that defines the arbitrarily-shaped region into which the watermark data is to be embedded within the image data; and the watermark data. An SA-DWT processing unit uses the shape map to recognize a given region included in the arbitrarily-shaped region within the image data, and subjects image data in the given region to the wavelet transform. The wavelet transform causes the image data in the arbitrarily-shaped region to be divided into frequency bands, and a watermark data embedding unit embeds the watermark data into a frequency space of the image data generated by the dividing. An SA-IDWT processing unit subjects the resultant to an inverse wavelet transform, and watermark-embedded image data is generated.
    • 提供了通过应用小波变换将水印数据嵌入到任意形状的区域中的技术。 准备的是:要嵌入水印数据的图像数据; 形状图,其定义要将水印数据嵌入图像数据内的任意形状的区域; 和水印数据。 SA-DWT处理单元使用形状图来识别包含在图像数据内的任意区域中的给定区域,并且将给定区域中的图像数据对象进行小波变换。 小波变换使得任意形状区域中的图像数据被划分为频带,并且水印数据嵌入单元将水印数据嵌入到由分割产生的图像数据的频率空间中。 SA-IDWT处理单元使得结果进行逆小波变换,并且生成嵌入水印的图像数据。