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    • 2. 发明申请
    • LIGHT-EMITTING DIODE
    • 发光二极管
    • US20120104354A1
    • 2012-05-03
    • US13283985
    • 2011-10-28
    • Hiroyuki TANAKANobuaki NAGAOTakahiro HAMADAEiji FUJII
    • Hiroyuki TANAKANobuaki NAGAOTakahiro HAMADAEiji FUJII
    • H01L33/04
    • H01L33/42H01L33/32
    • A light-emitting diode includes an n-type nitride semiconductor layer, a multiple quantum well, a p-type nitride semiconductor layer, a window electrode layer, a p-side electrode, and an n-side electrode, which are stacked in this order. The window electrode layer comprises an n-type single-crystalline ITO transparent film and an n-type single-crystalline ZnO transparent film. The p-type nitride semiconductor layer is in contact with the n-type single-crystalline ITO transparent film, the n-type single-crystalline ITO transparent film is in contact with the n-type single-crystalline ZnO transparent film, and the p-side electrode is in connected with the n-type single-crystalline ZnO transparent film. The n-type single-crystalline ITO transparent film contains Ga, a molar ratio of Ga/(In+Ga) being not less than 0.08 and not more than 0.5. Thickness of the n-type single-crystalline ITO transparent film is not less than 1.1 nm and not more than 55 nm.
    • 发光二极管包括堆叠在其中的n型氮化物半导体层,多量子阱,p型氮化物半导体层,窗口电极层,p侧电极和n侧电极 订购。 窗口电极层包括n型单晶ITO透明膜和n型单晶ZnO透明膜。 p型氮化物半导体层与n型单晶ITO透明膜接触,n型单晶ITO透明膜与n型单晶ZnO透明膜接触,p型 侧电极与n型单晶ZnO透明膜连接。 n型单晶ITO透明膜含有Ga,Ga /(In + Ga)的摩尔比不小于0.08且不大于0.5。 n型单晶ITO透明膜的厚度不小于1.1nm且不大于55nm。