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1. 发明申请

US20090323043A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20090323043A1
公开(公告)日：2009-12-31
申请号：US12509738
申请日：2009-07-27
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/72
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

2. 发明申请

US20070206381A1 System for reducing the coherence of laser radiation 有权
标题翻译：减少激光辐射相干性的系统
公开(公告)号：US20070206381A1
公开(公告)日：2007-09-06
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
IPC分类号： F21S8/00
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译：本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射。第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。然后将两个部分光束共同传递到照明平面。除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。谐振器主体设置有具有不同局部相位分布的相位板。

3. 发明授权

US09116441B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09116441B2
公开(公告)日：2015-08-25
申请号：US13438179
申请日：2012-04-03
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效果。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

4. 发明授权

US08169594B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US08169594B2
公开(公告)日：2012-05-01
申请号：US12509738
申请日：2009-07-27
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

5. 发明申请

US20120188527A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20120188527A1
公开(公告)日：2012-07-26
申请号：US13438179
申请日：2012-04-03
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/72
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器）。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

6. 发明授权

US07593095B2 System for reducing the coherence of laser radiation 有权
标题翻译：减少激光辐射相干性的系统
公开(公告)号：US07593095B2
公开(公告)日：2009-09-22
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then Passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译：本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射。第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。然后将两个部分光束共同地通向照明平面。除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。谐振器主体设置有具有不同局部相位分布的相位板。

7. 发明申请

US20060290913A1 Microlithography exposure method and projection exposure apparatus for carrying out the method 审中-公开
标题翻译：微光曝光方法和投影曝光装置进行该方法
公开(公告)号：US20060290913A1
公开(公告)日：2006-12-28
申请号：US11475871
申请日：2006-06-28
申请人： Nils Dieckmann , Manfred Maul
发明人： Nils Dieckmann , Manfred Maul
IPC分类号： G03B27/42
CPC分类号： G03F7/70308 , G03F7/70566
摘要： In an exposure method for producing an image of a pattern, arranged in the object surface of a projection objective, in the image surface of the projection objective, the mask is illuminated with illumination radiation with the aid of the illumination system. The radiation varied by the mask and which enters the projection objective is thereby produced downstream of the mask. The projection objective is transirradiated with this radiation. An astigmatic variation of the radiation varied by the mask is effected in the region of at least one pupil surface of the projection objective, the astigmatic variation being designed such that an anisotropy of properties of the radiation striking the image surface that leads to direction-dependent contrast differences is at least partially compensated. The astigmatic variation can be achieved, for example, with the aid of an elliptical diaphragm or an elliptical transmission filter.
摘要翻译：在布置在投影物镜的物体表面上的图形图像的曝光方法中，在投影物镜的图像表面中，借助于照明系统照射照射的掩模。由掩模变化并进入投影物镜的辐射由此在掩模的下游产生。投射物镜用这种辐射进行辐照。由掩模变化的辐射的散光变化在投影物镜的至少一个瞳孔表面的区域中进行，散光变化被设计成使得射入图像表面的辐射的各向异性导致方向依赖对比差异至少部分得到补偿。像散变化可以例如借助椭圆形光阑或椭圆形透射滤光片来实现。

8. 发明授权

US08081293B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US08081293B2
公开(公告)日：2011-12-20
申请号：US12191069
申请日：2008-08-13
申请人： Damian Fiolka , Nils Dieckmann
发明人： Damian Fiolka , Nils Dieckmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70966 , G02B5/001 , G03F7/70191
摘要： The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarized entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.
摘要翻译：本公开提供了微光刻投影曝光装置的照明系统以及相关的方法和组件。在一些实施例中，照明系统包括光学元件，其被配置为使得当具有角度光谱的线偏振入射光束入射在第一光学元件上时，入射光束在第一光学元件处的最大孔径角度不更大超过35 mrad。可以通过第一光学元件至少部分地补偿存在于照明系统中的双折射的关于系统的光轴旋转对称的分量。

9. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明申请

US20060061886A1 System for setting and maintaining a gas atmosphere in an optical system 审中-公开
标题翻译：用于在光学系统中设置和维持气体气氛的系统
公开(公告)号：US20060061886A1
公开(公告)日：2006-03-23
申请号：US11247925
申请日：2005-10-11
申请人： Bernhard Gellrich , Nils Dieckmann
发明人： Bernhard Gellrich , Nils Dieckmann
IPC分类号： G02B7/02
CPC分类号： G03F7/70916 , G03F7/70933
摘要： Arranged in a system for setting and maintaining a gas atmosphere in an objective having at least one optical element is a first, inner gas compartment that is separated from a second, outer gas compartment by an inner casing. Both gas compartments are provided with gas inlet and gas outlet openings. At least one of the two gas compartments is under a pressure that is higher than the ambient pressure.
摘要翻译：布置在用于在具有至少一个光学元件的物镜中设置和维持气体气氛的系统中，是通过内壳与第二外部气体隔室分离的第一内部气体隔室。两个气室都设有气体入口和气体出口。两个气体室中的至少一个处于高于环境压力的压力下。

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