专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08081293B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US08081293B2
公开(公告)日：2011-12-20
申请号：US12191069
申请日：2008-08-13
申请人： Damian Fiolka , Nils Dieckmann
发明人： Damian Fiolka , Nils Dieckmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70966 , G02B5/001 , G03F7/70191
摘要： The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarized entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.
摘要翻译：本公开提供了微光刻投影曝光装置的照明系统以及相关的方法和组件。在一些实施例中，照明系统包括光学元件，其被配置为使得当具有角度光谱的线偏振入射光束入射在第一光学元件上时，入射光束在第一光学元件处的最大孔径角度不更大超过35 mrad。可以通过第一光学元件至少部分地补偿存在于照明系统中的双折射的关于系统的光轴旋转对称的分量。

2. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

3. 发明申请

US20050094268A1 Optical system with birefringent optical elements 审中-公开
标题翻译：具有双折射光学元件的光学系统
公开(公告)号：US20050094268A1
公开(公告)日：2005-05-05
申请号：US10922380
申请日：2004-08-19
申请人： Damian Fiolka , Olaf Dittmann , Michael Totzeck , Nils Dieckmann , Jess Koehler , Toralf Gruner , Daniel Kraehmer
发明人： Damian Fiolka , Olaf Dittmann , Michael Totzeck , Nils Dieckmann , Jess Koehler , Toralf Gruner , Daniel Kraehmer
IPC分类号： G02B17/08 , G02B27/09 , G02B27/28 , G03F7/20 , G02F1/1335
CPC分类号： G03F7/70241 , G02B27/0994 , G02B27/286 , G03F7/70191 , G03F7/70966
摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.
摘要翻译：光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟。

4. 发明申请

US20090027646A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20090027646A1
公开(公告)日：2009-01-29
申请号：US12191069
申请日：2008-08-13
申请人： Damian Fiolka , Nils Dieckmann
发明人： Damian Fiolka , Nils Dieckmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70966 , G02B5/001 , G03F7/70191
摘要： The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarised entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.
摘要翻译：本公开提供了微光刻投影曝光装置的照明系统以及相关的方法和组件。在一些实施例中，照明系统包括光学元件，其被配置为使得当具有角度光谱的线偏振入射光束入射在第一光学元件上时，入射光束在第一光学元件处的最大孔径角度不更大超过35 mrad。可以通过第一光学元件至少部分地补偿存在于照明系统中的双折射的关于系统的光轴旋转对称的分量。

5. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

6. 发明申请

US20070206381A1 System for reducing the coherence of laser radiation 有权
标题翻译：减少激光辐射相干性的系统
公开(公告)号：US20070206381A1
公开(公告)日：2007-09-06
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
IPC分类号： F21S8/00
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译：本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射。第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。然后将两个部分光束共同传递到照明平面。除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。谐振器主体设置有具有不同局部相位分布的相位板。

7. 发明申请

US20090195766A1 ILLUMINATION SYSTEM OR PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微观投影曝光装置的照明系统或投影目标
公开(公告)号：US20090195766A1
公开(公告)日：2009-08-06
申请号：US12415173
申请日：2009-03-31
申请人： Nils Dieckmann , Damian Fiolka
发明人： Nils Dieckmann , Damian Fiolka
IPC分类号： G03B27/72 , G02B5/30
CPC分类号： G03F7/70216 , G02B27/281 , G02B27/286 , G03F7/70091 , G03F7/70566
摘要： The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.
摘要翻译：本公开涉及一种光学系统，例如微光刻投影曝光设备的照明系统或投影物镜，其包括具有偏振影响光学布置的光学系统，其允许提供期望的偏振分布的增强的灵活性。

8. 发明申请

US20050146704A1 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US20050146704A1
公开(公告)日：2005-07-07
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

9. 发明授权

US09274435B2 Illumination system or projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统或投影物镜
公开(公告)号：US09274435B2
公开(公告)日：2016-03-01
申请号：US12415173
申请日：2009-03-31
申请人： Nils Dieckmann , Damian Fiolka
发明人： Nils Dieckmann , Damian Fiolka
IPC分类号： G03F7/20 , G02B27/28
CPC分类号： G03F7/70216 , G02B27/281 , G02B27/286 , G03F7/70091 , G03F7/70566
摘要： The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.
摘要翻译：本公开涉及一种光学系统，例如微光刻投影曝光设备的照明系统或投影物镜，其包括具有偏振影响光学布置的光学系统，其允许提供期望的偏振分布的增强的灵活性。

10. 发明授权

US07593095B2 System for reducing the coherence of laser radiation 有权
标题翻译：减少激光辐射相干性的系统
公开(公告)号：US07593095B2
公开(公告)日：2009-09-22
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then Passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译：本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射。第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。然后将两个部分光束共同地通向照明平面。除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。谐振器主体设置有具有不同局部相位分布的相位板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式