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    • 3. 发明申请
    • Testing apparatus for carrying out inspection of a semiconductor device
    • 用于对半导体器件进行检查的测试装置
    • US20050032252A1
    • 2005-02-10
    • US10934046
    • 2004-09-03
    • Ryuji KohnoHideo MiuraMasatoshi KanamaruHiroya ShimizuHideyuki Aoki
    • Ryuji KohnoHideo MiuraMasatoshi KanamaruHiroya ShimizuHideyuki Aoki
    • G01R1/06G01R1/073G01R31/28H01L21/66G01R31/02G01R31/26
    • G01R1/07314
    • A method of manufacturing a semiconductor device has forming process for forming a semiconductor device on a major surface of a wafer, and testing process for testing defect of the semiconductor device formed on the wafer. The testing process includes a step bringing a testing apparatus into contact with test electrodes of the semiconductor device. The testing apparatus has a contactor including a plurality of probes that come into contact with the test electrodes of the semiconductor device to be tested, and secondary electrodes electrically connected to the probes and disposed on a surface opposite to the probes; a substrate on which electrodes electrically communicated to the contactor by a conducting device. The conducting device is so formed that stress applied to the conducting device in the state where the probes are in contact with the test electrodes is larger than stress applied to the conducting device in the state where the probes are not in contact with the test electrodes.
    • 制造半导体器件的方法具有在晶片的主表面上形成半导体器件的形成工艺和用于测试形成在晶片上的半导体器件的缺陷的测试过程。 测试过程包括使测试设备与半导体器件的测试电极接触的步骤。 测试装置具有接触器,该接触器包括与待测半导体器件的测试电极接触的多个探针,以及与探针电连接并设置在与探针相对的表面上的二次电极; 电极通过导电装置与接触器电连通的基板。 导电装置形成为在探针与测试电极接触的状态下施加到导电装置的应力大于在探针不与测试电极接触的状态下施加到导电装置的应力。
    • 5. 发明授权
    • Semiconductor inspection apparatus
    • 半导体检测仪器
    • US06714030B2
    • 2004-03-30
    • US10390412
    • 2003-03-18
    • Ryuji KohnoHideo MiuraYoshishige EndoMasatoshi KanamaruAtsushi HosoganeHideyuki AokiNaoto Ban
    • Ryuji KohnoHideo MiuraYoshishige EndoMasatoshi KanamaruAtsushi HosoganeHideyuki AokiNaoto Ban
    • G01R3102
    • H01L22/32G01R1/06711G01R1/06738G01R1/07314G01R3/00H01L23/13H01L2924/0002H01L2924/13091H01L2924/00
    • A semiconductor inspection apparatus which is possible to inspect a plurality of semiconductor devices collectively at one time, which has conventionally been difficult because of precision or the like of probes. A method of manufacturing the semiconductor inspection apparatus comprises the steps of forming a cover film on a surface of the silicon substrate and forming a plurality of probes of a polygonal cone shape or a circular cone shape through etching after patterning by photolithography, after the cover film is removed, again forming a cover film on the surface of the silicon substrate and forming a beam or a diaphragm for each probe through etching after patterning by photolithography, after the cover film is removed, again forming a cover film on the surface of the silicon substrate and forming a through hole corresponding to the probe through etching after patterning by photolithography, and after the cover film is removed, forming an insulating film on the surface of the silicon substrate, forming a metal film on a surface of the insulating film, and forming a wiring lead through etching after patterning by photolithography.
    • 可以一次共同地检查多个半导体器件的半导体检查装置,由于探针的精度等,以前难以进行。 一种制造半导体检查装置的方法包括以下步骤:在硅衬底的表面上形成覆盖膜,并通过光刻图案化之后通过蚀刻形成多个锥形或圆锥形的多个探针, 被去除,再次在硅衬底的表面上形成覆盖膜,并且通过光刻在图案化之后通过蚀刻形成用于每个探针的光束或隔膜,在除去覆盖膜之后,再次在硅表面上形成覆盖膜 在通过光刻图案化之后通过蚀刻形成与探针对应的通孔,并且在除去覆盖膜之后,在硅衬底的表面上形成绝缘膜,在绝缘膜的表面上形成金属膜,以及 通过光刻在图案化之后通过蚀刻形成布线引线。
    • 9. 发明授权
    • Probe structure
    • 探头结构
    • US06614246B1
    • 2003-09-02
    • US09648452
    • 2000-08-28
    • Ryuji KohnoTatsuya NagataHiroya ShimizuToshio MiyatakeHideo Miura
    • Ryuji KohnoTatsuya NagataHiroya ShimizuToshio MiyatakeHideo Miura
    • G01R1073
    • G01R1/07378
    • The invention provides a probe structure in which secondary electrodes of a main base material in which probes are formed can be electrically connected to electrodes in a substrate side even when a lot of probes are formed in a large area, so that a lot of LSIs within a wafer can be tested in one lot in a wafer test process, whereby an efficiency of the test process can be improved. In the probe structure, an interposer constituted by a high rigid material is arranged between the main base material having the probes formed therein and the substrate side, and the secondary electrodes of the main base material having the probes formed therein are electrically connected to the electrodes in the substrate side via the interposer.
    • 本发明提供了一种探针结构,其中形成探针的主要基底材料的二次电极即使在大面积形成大量探针的情况下也可以与衬底侧的电极电连接,从而使大量的LSIs 可以在晶片测试过程中一次性地测试晶片,从而可以提高测试过程的效率。 在探针结构中,由具有高刚性材料的插入体配置在其中形成有探针的主基材和基板侧之间,并且其中形成有探针的主基材的二次电极电连接到电极 在基板侧经由插入件。