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1. 发明授权

US06248009B1 Apparatus for cleaning substrate 有权
标题翻译：清洗基板的设备
公开(公告)号：US06248009B1
公开(公告)日：2001-06-19
申请号：US09506320
申请日：2000-02-18
申请人： Kenya Ito , Naoki Matsuda , Mitsuhiko Shirakashi , Fumitoshi Oikawa , Koji Ato
发明人： Kenya Ito , Naoki Matsuda , Mitsuhiko Shirakashi , Fumitoshi Oikawa , Koji Ato
IPC分类号： B24B2118
CPC分类号： B24B37/345 , B08B1/007 , B08B1/04 , B08B3/04 , H01L21/67046 , H01L21/67051
摘要： The present invention relates to a substrate cleaning apparatus, and more particularly to a substrate cleaning apparatus suitable for cleaning a substrate which requires a high level of cleanliness, such as a semiconductor wafer, a glass substrate, a liquid crystal panel, etc. The substrate cleaning apparatus comprises a substrate holder for holding a substrate while rotating the substrate in a substantially horizontal plane, a cleaning device for scrubbing a surface to be cleaned of the substrate, a cleaning device holder for holding the cleaning device rotatably about its own axis, the cleaning device having a shaft and a cleaning member disposed around the shaft, the cleaning member being permeable to a cleaning liquid, the shaft having an axially extending shaft hole and a cleaning liquid ejection port extending radially therethrough from the shaft hole, and a fluid-lubricated bearing disposed between the shaft and the cleaning device holder in at least one end thereof and lubricated by a cleaning liquid as a lubricating fluid.
摘要翻译：本发明涉及一种基板清洗装置，更具体地涉及一种适用于清洗需要高清洁度的基板的基板清洗装置，例如半导体晶片，玻璃基板，液晶面板等。基板清洁装置包括用于在基本水平的平面中旋转基板的同时保持基板的基板保持件，用于洗涤基板的待清洁表面的清洁装置，用于围绕其自身轴线可旋转地保持清洁装置的清洁装置保持器，所述清洁装置具有轴和设置在所述轴周围的清洁构件，所述清洁构件可透过清洁液体，所述轴具有轴向延伸的轴孔和从所述轴孔径向延伸穿过的清洁液体喷射口，润滑轴承在其至少一端设置在轴和清洁装置保持器之间并具有润滑剂通过作为润滑液的清洗液进行。

2. 发明授权

US6092542A Cleaning apparatus 有权
标题翻译：清洁装置
公开(公告)号：US6092542A
公开(公告)日：2000-07-25
申请号：US276920
申请日：1999-03-26
申请人： Naoki Matsuda , Yoshiyuki Ohta , Kenya Ito , Takahiro Nanjo
发明人： Naoki Matsuda , Yoshiyuki Ohta , Kenya Ito , Takahiro Nanjo
IPC分类号： B08B11/02 , B08B3/02 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67051 , B08B3/02 , B08B2203/0288 , Y10S134/902
摘要： A cleaning apparatus is used for cleaning a substrate such as a semiconductor wafer, a glass substrate, or a liquid crystal panel with a cleaning member. The cleaning apparatus includes: a holding mechanism for holding a workpiece, an arm movable relative to the workpiece, a cleaning member mounted on the arm for cleaning the workpiece held by the holding mechanism, a moving mechanism for vertically moving the cleaning member with respect to the workpiece held by the holding mechanism, and a controller for controlling the moving mechanism to adjust the cleaning member to a setting height.
摘要翻译：清洁装置用于清洁诸如半导体晶片，玻璃基板或具有清洁部件的液晶面板的基板。清洁装置包括：用于保持工件的保持机构，可相对于工件移动的臂，安装在臂上的清洁构件，用于清洁由保持机构保持的工件;移动机构，用于使清洁构件相对于由保持机构保持的工件，以及用于控制移动机构以将清洁部件调整到设定高度的控制器。

3. 发明授权

US06494220B1 Apparatus for cleaning a substrate such as a semiconductor wafer 有权
标题翻译：用于清洁诸如半导体晶片的基板的装置
公开(公告)号：US06494220B1
公开(公告)日：2002-12-17
申请号：US09584091
申请日：2000-05-31
申请人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
发明人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
IPC分类号： B08B304
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/02 , Y10S134/902
摘要： A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation of the substrate by supplying a cleaning liquid thereto. The apparatus further comprises a cleaning vessel including a side wall encircling the substrate rotated by the holder to intercept the cleaning liquid supplied to and scattered from the rotating substrate and then finally drain the cleaning liquid. There is provided a vent duct for carrying gas from the inside of the cleaning vessel to the outside of the same. The vent duct includes an inlet provided at substantially the same level as that of the substrate for introducing the gas into the vent duct. The side wall may include an inner surface along which the cleaning liquid scattered from the substrate flows downward in a spiral manner, with the inner surface, being of a construction which impedes the spiral movement of the liquid in a circumferential or peripheral direction.
摘要翻译：清洁装置包括用于水平地保持诸如半导体晶片的基板并且使基板围绕其中心轴旋转的保持器，同时通过向其提供清洁液体进行清洁操作。该装置还包括一个清洁容器，该清洁容器包括围绕由保持器旋转的基板的侧壁，以拦截供应到旋转基板并从旋转基板散射的清洗液体，然后最终排出清洗液体。设置有用于将气体从清洁容器的内部输送到其外部的通风管道。排气管道包括与基板基本相同的水平设置的入口，用于将气体引入通风管道。侧壁可以包括内表面，从衬底散射的清洁液体沿着内表面以螺旋方式向下流动，内表面具有阻止液体在周向或周向上的螺旋运动的结构。

4. 发明授权

US6141812A Cleaning apparatus and cleaning member rinsing apparatus 有权
标题翻译：清洁装置和清洁构件冲洗装置
公开(公告)号：US6141812A
公开(公告)日：2000-11-07
申请号：US189985
申请日：1998-11-12
申请人： Naoki Matsuda , Kenya Ito
发明人： Naoki Matsuda , Kenya Ito
IPC分类号： B24B55/12 , B08B3/04 , H01L21/00
CPC分类号： H01L21/67051 , B08B1/007 , B08B3/04 , H01L21/67046
摘要： A rinsing apparatus comprising a rinsing sink for rinsing an article brought thereinto with a rinsing liquid which is continuously supplied thereinto, and a carrier for carrying an article to be rinsed. The rinsing sink is provided with a drain hole in the bottom wall of the sink. The carrier is adapted to move between a rinsing position where the article is positioned close to an inlet of the drain hole, thereby restricting a flow path from the sink to the drain hole so that the rinsing liquid continuously supplied into the sink fills and then overflows from the sink while a flow of the rinsing liquid through the restricted flow path is maintained, and a retracted position where the article is positioned out of the sink to allow the rinsing liquid to flow through the flow path into the drain hole without the restriction by the article.
摘要翻译：一种漂洗装置，包括用于冲洗其中连续供应的冲洗液体的物品的冲洗槽和用于承载要冲洗的物品的载体。冲洗槽在水槽底壁设有排水孔。载体适于在物品靠近排水孔的入口定位的冲洗位置之间移动，从而限制从水槽到排水孔的流动路径，使得连续供应到水槽中的冲洗液体填满然后溢出从冲洗液体流过限制流路的同时保持冲洗液体的流动以及物品位于水槽外的缩回位置，以使冲洗液体能够通过流路流入排水孔，而不受文章。

5. 发明授权

US06308361B1 Cleaning apparatus 有权
标题翻译：清洁装置
公开(公告)号：US06308361B1
公开(公告)日：2001-10-30
申请号：US09361244
申请日：1999-07-27
申请人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
发明人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
IPC分类号： B08B104
CPC分类号： H01L21/67051 , B08B1/00 , B08B3/024 , H01L21/67046
摘要： A cleaning apparatus is suitable for cleaning workpieces that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The cleaning apparatus has a holding device for holding the substrate and a cleaning unit capable of slidably contacting the surface of the substrate. The cleaning unit has a nozzle for ejecting high-pressure cleaning liquid onto the substrate, and a cleaning member surrounding the nozzle.
摘要翻译：清洁装置适用于清洁需要高度清洁度的工件，例如半导体晶片，玻璃基板或液晶显示器。清洁装置具有用于保持基板的保持装置和能够与基板的表面滑动接触的清洁单元。清洁单元具有用于将高压清洗液喷射到基板上的喷嘴和围绕喷嘴的清洁部件。

6. 发明授权

US09199352B2 Polishing apparatus, polishing method and pressing member for pressing a polishing tool 有权
标题翻译：抛光装置，抛光方法和用于按压抛光工具的按压构件
公开(公告)号：US09199352B2
公开(公告)日：2015-12-01
申请号：US12986481
申请日：2011-01-07
申请人： Masaya Seki , Kenya Ito , Masayuki Nakanishi
发明人： Masaya Seki , Kenya Ito , Masayuki Nakanishi
IPC分类号： B24B9/00 , B24B9/06 , B24B21/00 , B24B37/27
CPC分类号： B24B9/065 , B24B21/004 , B24B37/27
摘要： A polishing apparatus polishes a top edge portion and/or a bottom edge portion of a substrate accurately and uniformly. The polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and to rotate the substrate and at least one polishing head disposed near the peripheral portion of the substrate. The polishing head has at least one protrusion extending along a circumferential direction of the substrate, and the polishing head is configured to press a polishing surface of a polishing tape by the protrusion against the peripheral portion of the substrate from above or below.
摘要翻译：抛光装置精确而均匀地抛光基板的顶边部分和/或底边部分。抛光装置包括旋转保持机构，其构造成水平地保持基板并旋转基板和设置在基板的周边部分附近的至少一个抛光头。抛光头具有沿着基板周向延伸的至少一个突出部，并且抛光头构造成通过突起抵靠基板的周边部分从上方或下方按压抛光带的抛光表面。

7. 发明授权

US08840992B2 Curable resin composition and optical film 有权
标题翻译：可固化树脂组合物和光学膜
公开(公告)号：US08840992B2
公开(公告)日：2014-09-23
申请号：US12908187
申请日：2010-10-20
申请人： Hiroyuki Iizuka , Kenya Ito , Koji Ohguma , Mikio Yamahiro
发明人： Hiroyuki Iizuka , Kenya Ito , Koji Ohguma , Mikio Yamahiro
IPC分类号： G11B5/708 , C09D133/08 , B32B5/16
CPC分类号： B32B5/16 , C09D133/08 , Y10T428/25 , Y10T428/257 , Y10T428/265
摘要： The curable resin composition of the present invention contains inorganic particles and a curable resin. The inorganic particles includes an inorganic particle (a-1) having a Mohs hardness of 7 or more and an average particle diameter of 1 μm or less, an inorganic particle (a-2) having a Mohs hardness of 4 or more to less than 7 and an average particle diameter of 1 μm or less, and an inorganic particle (a-3) having a Mohs hardness of less than 4 and an average particle diameter of 1 μm or less. The curable resin is at least one selected from a group consisting of a thermosetting resin and an active energy ray-curable resin.
摘要翻译：本发明的固化性树脂组合物含有无机粒子和固化性树脂。无机粒子包括莫氏硬度为7以上，平均粒径为1μm以下的无机粒子（a-1），莫氏硬度为4以上的无机粒子（a-2） 7，平均粒径为1μm以下，以及莫氏硬度小于4，平均粒径为1μm以下的无机粒子（a-3）。可固化树脂是选自热固性树脂和活性能量射线固化树脂中的至少一种。

8. 发明申请

US20140113115A1 TRANSFER FILM FOR IN-MOLD MOLDING AND METHOD FOR PRODUCING SAME 有权
标题翻译：用于模内成型的转印膜及其制造方法
公开(公告)号：US20140113115A1
公开(公告)日：2014-04-24
申请号：US14127964
申请日：2012-06-18
申请人： Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
发明人： Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
IPC分类号： B29C45/14 , B32B38/00
CPC分类号： B29C45/14688 , B29C45/14 , B29C45/14811 , B29C45/14827 , B32B7/06 , B32B27/16 , B32B38/0036 , B32B2270/00 , B32B2451/00 , B44C1/1729 , Y10T428/24851 , Y10T428/31511 , Y10T428/31515 , Y10T428/31551 , Y10T428/31554 , Y10T428/31598 , Y10T428/31663 , Y10T428/31946
摘要： Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The TMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.
摘要翻译：提供了一种模内成型用转印膜，其耐溶剂性，耐热性，耐久性，耐粘连性和成型性优异，并且能够抑制栅极流动的产生，并且还提供了制造这种膜的方法。膜设置有：转印层（11），其被转印到模内成型体中，并且在转印后用活性能量射线照射时被固化; 和薄膜状基板（L0）。转印层（11）包括层叠在基板（L0）上的IMD层（L2），并且在模内成型之后布置在成形体的最外表面上。 TMD层（L2）由含有至少一种活性能固化树脂和至少一种热固性树脂的混合物组合物构成。

9. 发明授权

US08641480B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08641480B2
公开(公告)日：2014-02-04
申请号：US13036114
申请日：2011-02-28
申请人： Masayuki Nakanishi , Tetsuji Togawa , Kenya Ito , Masaya Seki , Kenji Iwade , Takeo Kubota , Takeshi Nishioka
发明人： Masayuki Nakanishi , Tetsuji Togawa , Kenya Ito , Masaya Seki , Kenji Iwade , Takeo Kubota , Takeshi Nishioka
IPC分类号： B24B1/00
CPC分类号： B24B1/00 , B24B55/00
摘要： A polishing apparatus can effectively prevent abrasive particles from falling off a polishing tape during polishing. The polishing apparatus includes: a polishing head for polishing a peripheral portion of a substrate by pressing a surface of a polishing tape, having abrasive particles fixed on the surface, against the peripheral portion of the substrate while allowing the polishing tape to travel in one direction; and a conditioning apparatus, disposed upstream of the polishing head in the traveling direction of the polishing tape, for conditioning the surface of the polishing tape in advance in order to prevent the abrasive particles from falling off the surface of the polishing tape during polishing.
摘要翻译：抛光装置可以有效地防止研磨颗粒在抛光过程中从抛光带上脱落。抛光装置包括：抛光头，用于通过将具有固定在表面上的研磨颗粒的研磨带的表面按压在基板的周边部分上，同时允许研磨带沿单向移动来抛光基板的周边部分 ; 以及调整装置，其设置在研磨带的行进方向上的抛光头的上游，用于预先调整研磨带的表面，以防止研磨颗粒在抛光期间从研磨带的表面脱落。

10. 发明授权

US08506362B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08506362B2
公开(公告)日：2013-08-13
申请号：US12667891
申请日：2008-07-08
申请人： Dai Fukushima , Atsushi Shigeta , Tamami Takahashi , Kenya Ito , Masaya Seki , Hiroaki Kusa
发明人： Dai Fukushima , Atsushi Shigeta , Tamami Takahashi , Kenya Ito , Masaya Seki , Hiroaki Kusa
IPC分类号： B24B7/26
CPC分类号： B24B21/002 , B24B9/065 , H01L21/02021
摘要： A polishing apparatus includes a substrate holder configured to hold and rotate a substrate, a press pad configured to press a polishing tape having a polishing surface against a bevel portion of the substrate held by the substrate holder, and a feeding mechanism configured to cause the polishing tape to travel in its longitudinal direction. The press pad includes a hard member having a pressing surface for pressing the bevel portion of the substrate through the polishing tape, and at least one elastic member for pressing the hard member against the bevel portion of the substrate through the belt-shaped polishing tool.
摘要翻译：抛光装置包括：基板保持器，其构造成保持和旋转基板;压垫，其构造成将具有抛光表面的抛光带压靠在由基板保持器保持的基板的斜面部分上;以及馈送机构，其构造成使抛光胶带沿其纵向行进。压垫包括具有用于通过研磨带挤压基板的斜面部分的按压表面的硬质部件和用于通过带状抛光工具将硬质部件压靠在基板的斜面部分上的至少一个弹性部件。

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