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1. 发明授权

US08021826B2 Copolymer and composition for organic and antireflective layer 有权
标题翻译：用于有机和抗反射层的共聚物和组合物
公开(公告)号：US08021826B2
公开(公告)日：2011-09-20
申请号：US12214430
申请日：2008-06-19
申请人： Myung-Woong Kim , Joo-Hyeon Park , Young-Taek Lim , Hyung-Gi Kim , Jun-Ho Lee , Jong-Don Lee , Seung-Duk Cho
发明人： Myung-Woong Kim , Joo-Hyeon Park , Young-Taek Lim , Hyung-Gi Kim , Jun-Ho Lee , Jong-Don Lee , Seung-Duk Cho
IPC分类号： G03F7/11 , C08F222/06 , C08L37/00
CPC分类号： C09D133/10 , C08F220/14 , C08F220/18 , C08F222/06 , C08K5/10 , C08K5/34924 , C08K5/42 , C08L31/02 , C08L33/10 , C08L35/06 , C09D131/02 , C09D135/06 , G03F7/091 , Y10S438/952 , C08L2666/04
摘要： The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05
摘要翻译：本发明提供一种有机防反射涂料组合物，其包含由下式1表示的共聚物，光吸收剂，热酸产生剂和固化剂：其中R1，R2和R3各自独立; R1表示氢或碳原子数1〜10的烷基。 R 2表示氢，碳原子数1〜10的烷基或碳原子数1〜20的芳烷基。 R3是氢或甲基; m和n是主链中的重复单元，而m + n = 1，并且它们具有0.05

2. 发明申请

US20080318167A1 Copolymer and composition for organic and antireflective layer 有权
标题翻译：用于有机和抗反射层的共聚物和组合物
公开(公告)号：US20080318167A1
公开(公告)日：2008-12-25
申请号：US12214430
申请日：2008-06-19
申请人： Myung-Woong Kim , Joo-Hyeon Park , Young-Taek Lim , Hyung-Gi Kim , Jun-Ho Lee , Jong-Don Lee , Seung-Duk Cho
发明人： Myung-Woong Kim , Joo-Hyeon Park , Young-Taek Lim , Hyung-Gi Kim , Jun-Ho Lee , Jong-Don Lee , Seung-Duk Cho
IPC分类号： G03F7/20 , C08F222/06 , C08L37/00 , C08K5/053 , C08K5/1515 , C08K5/34 , C08K5/10 , C08K5/3492 , C08K5/21 , C08K5/22
CPC分类号： C09D133/10 , C08F220/14 , C08F220/18 , C08F222/06 , C08K5/10 , C08K5/34924 , C08K5/42 , C08L31/02 , C08L33/10 , C08L35/06 , C09D131/02 , C09D135/06 , G03F7/091 , Y10S438/952 , C08L2666/04
摘要： The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05
摘要翻译：本发明提供一种有机防反射涂料组合物，其包含由下式1表示的共聚物，光吸收剂，热酸产生剂和固化剂：其中R1，R2和R3各自独立; R1表示氢或碳原子数1〜10的烷基。 R 2表示氢，碳原子数1〜10的烷基或碳原子数1〜20的芳烷基。 R3是氢或甲基; m和n是主链中的重复单元，而m + n = 1，并且它们具有0.05

3. 发明申请

US20060057490A1 Colpolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same 有权
标题翻译：具有仲羟基的脂环族烯烃和丙烯酸化合物的聚合物，以及含有该羟基的化学增幅抗蚀剂组合物
公开(公告)号：US20060057490A1
公开(公告)日：2006-03-16
申请号：US11108397
申请日：2005-04-18
申请人： Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
发明人： Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/0395 , Y10S430/168
摘要： The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
摘要翻译：本发明提供由下式1表示的聚合物和包含聚合物的化学放大型抗蚀剂组合物，该抗蚀剂组合物在C / H和L / S图案中具有优异的粘合性，储存稳定性和耐干蚀刻性，具有良好的分辨率，并且由于其良好的工艺窗口而提供了良好的图案轮廓，而不管基材的类型如何：

4. 发明申请

US20050153236A1 Novel polymer and chemically amplified resist composition containing the same 有权
标题翻译：含有其的新型聚合物和化学增幅抗蚀剂组合物
公开(公告)号：US20050153236A1
公开(公告)日：2005-07-14
申请号：US10940469
申请日：2004-09-14
申请人： Young-Taek Lim , Joo-Hyeon Park , Dong-Chul Seo , Chang-Min Kim , Seong-Duk Cho , Hyun-Sang Joo
发明人： Young-Taek Lim , Joo-Hyeon Park , Dong-Chul Seo , Chang-Min Kim , Seong-Duk Cho , Hyun-Sang Joo
IPC分类号： G03F7/033 , C08F212/08 , C08F216/12 , C08F220/10 , C08F222/06 , C08F232/00 , C08G61/04 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： The present invention provides a chemically amplified resist composition including a novel polymer, a photoacid generator, and a solvent: The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.
摘要翻译：本发明提供一种包含新型聚合物，光酸产生剂和溶剂的化学放大抗蚀剂组合物：化学增幅抗蚀剂可以形成粘合性优异，对基材的依赖性低的抗蚀剂图案，远紫外线波长的透明度范围如KrF准分子激光器或ArF准分子激光器，干蚀刻电阻，灵敏度，分辨率和显影性。此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

5. 发明授权

US07326520B2 Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same 有权
标题翻译：具有仲羟基的脂环式烯烃和丙烯酸类化合物的共聚物，以及含有该羟基的化学增幅抗蚀剂组合物
公开(公告)号：US07326520B2
公开(公告)日：2008-02-05
申请号：US11108397
申请日：2005-04-18
申请人： Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
发明人： Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
IPC分类号： G03F7/30 , G03F7/038 , C08F224/00 , C08F236/00
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/0395 , Y10S430/168
摘要： The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
摘要翻译：本发明提供由下式1表示的聚合物和包含聚合物的化学放大型抗蚀剂组合物，该抗蚀剂组合物在C / H和L / S图案中具有优异的粘合性，储存稳定性和耐干蚀刻性，具有良好的分辨率，并且由于其良好的工艺窗口而提供了良好的图案轮廓，而不管基材的类型如何：

6. 发明授权

US07285373B2 Polymer and chemically amplified resist composition containing the same 有权
标题翻译：含有其的聚合物和化学放大抗蚀剂组合物
公开(公告)号：US07285373B2
公开(公告)日：2007-10-23
申请号：US10940469
申请日：2004-09-14
申请人： Young-Taek Lim , Joo-Hyeon Park , Dong-Chul Seo , Chang-Min Kim , Seong-Duk Cho , Hyun-Sang Joo
发明人： Young-Taek Lim , Joo-Hyeon Park , Dong-Chul Seo , Chang-Min Kim , Seong-Duk Cho , Hyun-Sang Joo
IPC分类号： G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent.The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.
摘要翻译：化学放大抗蚀剂组合物包括新型聚合物，光致酸产生剂和溶剂。化学放大抗蚀剂可以形成粘合性优异，对基板的依赖性低，抗紫外波长范围如KrF准分子激光器或ArF准分子激光器的透光性，耐干蚀刻性，灵敏度，分辨率和显影性。此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

7. 发明授权

US5893007A Combination development unit and toner level detection service 失效
标题翻译：组合开发单元和墨粉量检测服务
公开(公告)号：US5893007A
公开(公告)日：1999-04-06
申请号：US984072
申请日：1997-12-03
申请人： Young-Taek Lim
发明人： Young-Taek Lim
IPC分类号： G03G15/08 , G03G15/00
CPC分类号： G03G15/0896 , G03G15/0856
摘要： A combination developer unit and toner level detection device increases the efficiency of manufacturing an electrophotographic apparatus and correspondingly lowers the cost of production. This device employs a spring biased actuator in combination with a magnet and optical sensors to provide the functions of two detection devices in a single detection device.
摘要翻译：组合显影单元和调色剂水平检测装置提高了电子照相设备的制造效率，并且相应地降低了生产成本。该装置采用与磁体和光学传感器组合的弹簧偏置致动器，以在单个检测装置中提供两个检测装置的功能。

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