专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130148113A1 INSPECTION APPARATUS AND INSPECTION METHOD 审中-公开
标题翻译：检查装置和检查方法
公开(公告)号：US20130148113A1
公开(公告)日：2013-06-13
申请号：US13579965
申请日：2010-12-20
申请人： Mizuki Oku , Minori Noguchi , Hiroshi Kawaguchi , Kazuo Takahashi , Kei Shimura
发明人： Mizuki Oku , Minori Noguchi , Hiroshi Kawaguchi , Kazuo Takahashi , Kei Shimura
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/8806 , G01N21/9501 , G01N2201/062 , G01N2201/08
摘要： The light scattered from the sample surface and foreign matter is imaged on an image intensifier and detected by a lens-coupled multi-pixel sensor such as a TDI sensor or a CCD sensor. The light scattered by surface roughness is spatially eliminated to detect the light scattered from foreign matter with increased sensitivity. A mechanism for shifting the image intensifier is incorporated to prevent a signal intensity decrease, which may be caused by a decrease in the sensitivity of the image intensifier.
摘要翻译：从样品表面散射的光和异物在图像增强器上成像，并由诸如TDI传感器或CCD传感器的透镜耦合多像素传感器检测。通过表面粗糙度散射的光在空间上消除，以增加敏感度来检测从异物散射的光。并入用于移动图像增强器的机构以防止由于图像增强器的灵敏度的降低而引起的信号强度降低。

2. 发明授权

US09851548B2 Optical microscope device and testing apparatus comprising same 有权
公开(公告)号：US09851548B2
公开(公告)日：2017-12-26
申请号：US14240323
申请日：2012-07-19
申请人： Kei Shimura , Tetsuya Niibori , Mizuki Oku , Naoya Nakai
发明人： Kei Shimura , Tetsuya Niibori , Mizuki Oku , Naoya Nakai
IPC分类号： H04N7/18 , G02B21/36 , G02B21/00 , G02B21/10 , G02B21/06 , G01N23/22
CPC分类号： G02B21/361 , G01N23/2206 , G02B21/0016 , G02B21/06 , G02B21/10 , G02B21/365
摘要： The present invention allows observation or capturing of a high-contrast image of a sample for which sufficient contrast cannot be obtained in bright-field observation, such as a wafer having a pattern with a small pattern height. According to the present invention, a sample is illuminated through an objective lens used for capturing an image, and an imaging optics are provided with an aperture filter so that an image is captured while light of bright-field observation components is significantly attenuated.

3. 发明申请

US20140160470A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20140160470A1
公开(公告)日：2014-06-12
申请号：US14236888
申请日：2012-08-03
申请人： Mizuki Oku , Kei Shimura
发明人： Mizuki Oku , Kei Shimura
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/8806
摘要： Light that is scattered by a defect on a wafer is very weak, and a PMT and an MPPC are used as detection methods for measuring the weak light with high speed and sensitivity. The methods have a function of photoelectronically converting the weak light and multiplying an electron, but have a problem in that a signal light is lost and an S/N ratio is reduced because the quantum efficiency of the photoelectron conversion is as low as 50% or less. Direct light is amplified prior to the photoelectron conversion. The optical amplification is an amplification method in which the signal light and light of pump light are introduced into a rare-earth doped fiber, a stimulated emission is caused, and the signal light is amplified. In the present invention, the optical amplification is used. The amplification factor is changed according to various conditions.
摘要翻译：由于晶片上的缺陷而散射的光非常弱，并且使用PMT和MPPC作为用于以高速度和灵敏度测量弱光的检测方法。这些方法具有光电子转换弱光和乘电子的功能，但存在信号光损失并且S / N比降低的问题，因为光电子转换的量子效率低至50％或减。直接光在光电子转换之前被放大。光放大是将信号光和泵浦光的光引入到稀土掺杂光纤中的放大方法，引起受激发射，信号光被放大。在本发明中，使用光放大。放大系数根据各种条件而变化。

4. 发明授权

US08976347B2 Inspection apparatus 有权
标题翻译：检验仪器
公开(公告)号：US08976347B2
公开(公告)日：2015-03-10
申请号：US14236888
申请日：2012-08-03
申请人： Mizuki Oku , Kei Shimura
发明人： Mizuki Oku , Kei Shimura
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806
摘要： Light that is scattered by a defect on a wafer is very weak, and a PMT and an MPPC are used as detection methods for measuring the weak light with high speed and sensitivity. The methods have a function of photoelectronically converting the weak light and multiplying an electron, but have a problem in that a signal light is lost and an S/N ratio is reduced because the quantum efficiency of the photoelectron conversion is as low as 50% or less. Direct light is amplified prior to the photoelectron conversion. The optical amplification is an amplification method in which the signal light and light of pump light are introduced into a rare-earth doped fiber, a stimulated emission is caused, and the signal light is amplified. In the present invention, the optical amplification is used. The amplification factor is changed according to various conditions.
摘要翻译：由于晶片上的缺陷而散射的光非常弱，并且使用PMT和MPPC作为用于以高速度和灵敏度测量弱光的检测方法。这些方法具有光电子转换弱光和乘电子的功能，但存在信号光损失并且S / N比降低的问题，因为光电子转换的量子效率低至50％或减。直接光在光电子转换之前被放大。光放大是将信号光和泵浦光的光引入到稀土掺杂光纤中的放大方法，引起受激发射，信号光被放大。在本发明中，使用光放大。放大系数根据各种条件而变化。

5. 发明申请

US20140210983A1 OPTICAL MICROSCOPE DEVICE AND TESTING APPARATUS COMPRISING SAME 有权
标题翻译：光学显微镜装置和包含其的测试装置
公开(公告)号：US20140210983A1
公开(公告)日：2014-07-31
申请号：US14240323
申请日：2012-07-19
申请人： Kei Shimura , Tetsuya Niibori , Mizuki Oku , Naoya Nakai
发明人： Kei Shimura , Tetsuya Niibori , Mizuki Oku , Naoya Nakai
IPC分类号： G02B21/36 , G02B21/06
CPC分类号： G02B21/361 , G01N23/2206 , G02B21/0016 , G02B21/06 , G02B21/10 , G02B21/365
摘要： The present invention allows observation or capturing of a high-contrast image of a sample for which sufficient contrast cannot be obtained in bright-field observation, such as a wafer having a pattern with a small pattern height. According to the present invention, a sample is illuminated through an objective lens used for capturing an image, and an imaging optics are provided with an aperture filter so that an image is captured while light of bright-field observation components is significantly attenuated.
摘要翻译：本发明允许在诸如具有小图案高度的图案的晶片的明视场观察中不能获得足够对比度的样品的高对比度图像的观察或捕获。根据本发明，通过用于拍摄图像的物镜照射样品，并且成像光学器件设置有孔径滤光器，使得在明视野观察成分的光被显着衰减的同时拍摄图像。

6. 发明授权

US08743357B2 Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device 有权
标题翻译：光源装置，使用该装置的表面检查装置以及使用该装置校准表面检查装置的方法
公开(公告)号：US08743357B2
公开(公告)日：2014-06-03
申请号：US13058081
申请日：2009-07-15
申请人： Shigeru Matsui , Mizuki Oku
发明人： Shigeru Matsui , Mizuki Oku
IPC分类号： G01N21/00 , G02B27/20
CPC分类号： G01N21/93 , G01N21/94 , G01N21/9501
摘要： A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.
摘要翻译：表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。然而，PSL的粒径受到限制。因此，在传统的表面检查装置中，在半导体制造步骤的检查中，不考虑如何检查在不久的将来需要的PSL中未设置的这种小粒径的缺陷。本发明具有用于产生光的光源装置，其模拟由检查对象散射，衍射或反射的光的波长，光强度，时间依赖性变化和光的偏振中的至少一个并且光被输入到表面检查装置的光电检测器。可以检查较小的缺陷。

7. 发明申请

US20110134418A1 LIGHT SOURCE DEVICE, SURFACE INSPECTING APPARATUS USING THE DEVICE, AND METHOD FOR CALIBRATING SURFACE INSPECTING APPARATUS USING THE DEVICE 有权
标题翻译：光源装置，使用装置的表面检查装置以及使用装置校正表面检查装置的方法
公开(公告)号：US20110134418A1
公开(公告)日：2011-06-09
申请号：US13058081
申请日：2009-07-15
申请人： Shigeru Matsui , Mizuki Oku
发明人： Shigeru Matsui , Mizuki Oku
IPC分类号： G01N21/88
CPC分类号： G01N21/93 , G01N21/94 , G01N21/9501
摘要： A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.
摘要翻译：表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。然而，PSL的粒径受到限制。因此，在传统的表面检查装置中，没有考虑如何检查在半导体制造步骤的检查中在不久的将来需要的PSL中未设置的这种小粒径的缺陷。本发明具有用于产生光的光源装置，其模拟由检查对象散射，衍射或反射的光的波长，光强度，时间依赖性变化和光的偏振中的至少一个并且光被输入到表面检查装置的光电检测器。可以检查较小的缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式