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    • 2. 发明授权
    • Electronic still camera and image recording method thereof
    • 电子静物照相机及其图像记录方法
    • US5018017A
    • 1991-05-21
    • US447858
    • 1989-12-08
    • Minoru SasakiMasafumi UmedaYoshitomo TagamiAkihiko Sugikawa
    • Minoru SasakiMasafumi UmedaYoshitomo TagamiAkihiko Sugikawa
    • H04N1/21H04N1/64
    • H04N1/2137H04N1/2112H04N1/2158H04N1/646H04N2101/00
    • An electronic still camera has a memory card, which is detachably provided, for recording photographed image data. The electronic still camera comprises a data compression unit for compressing image data to be recorded, a mode selection unit provided in association with the data compression unit to select a recording mode or compression mode, a buffer memory for once storing the image data compressed in the compression mode selected by the mode selection unit, and a determination unit for determining whether or not the image data stored in the buffer memory can be recorded on the recording medium. In the electronic still camera, when the image data was determined to be unrecordable by the determination unit, the image data stored in the memory is stored in the buffer memory till the recording medias assumes a recordable state.
    • 电子静态照相机具有可拆卸地设置的用于记录拍摄的图像数据的存储卡。 电子静物照相机包括用于压缩要记录的图像数据的数据压缩单元,与数据压缩单元相关联地设置以选择记录模式或压缩模式的模式选择单元,用于一次存储被压缩的图像数据的缓冲存储器 由模式选择单元选择的压缩模式,以及确定单元,用于确定存储在缓冲存储器中的图像数据是否可以被记录在记录介质上。 在电子静态照相机中,当确定图像数据被确定单元无法记录时,存储在存储器中的图像数据被存储在缓冲存储器中,直到记录媒体呈现可记录状态。
    • 8. 发明授权
    • Electron beam drawing apparatus
    • 电子束描绘装置
    • US06246064B1
    • 2001-06-12
    • US09605879
    • 2000-06-29
    • Minoru SasakiYuji TangeYutaka HojyoKazuyoshi OonukiHiroyuki Itoh
    • Minoru SasakiYuji TangeYutaka HojyoKazuyoshi OonukiHiroyuki Itoh
    • H01J3730
    • B82Y10/00B82Y40/00H01J37/304H01J37/3045H01J37/3174H01J2237/3045H01J2237/30455H01J2237/3175
    • An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure apparatus. At least two marks formed in each chip formed on a wafer are detected for a predetermined number of chips, and the relation between the shape distortion of each chip in the wafer plane and the wafer coordinates is determined from the positions of the detected marks and the designed positions of the marks by a statistical processing. Patterns are drawn in all chips while correcting the patterns to be drawn on the individual chips, by using the relation between the determined chip shape distortion and the wafer coordinates. As a result, the superposition exposure with the lower layer can be with a high throughput and with a high accuracy without any manual adjustment.
    • 一种高产量的电子束拉制工艺,能够应对下层曝光装置或光学还原曝光装置的静态失真和动态变形的变化。 对于预定数量的芯片,检测在晶片上形成的每个芯片中形成的至少两个标记,并且根据检测到的标记和晶片坐标的位置确定晶片平面中每个芯片的形状失真与晶片坐标之间的关系 通过统计处理设计标记的位置。 通过使用确定的芯片形状失真和晶片坐标之间的关系来校正在各个芯片上绘制的图案,在所有芯片中绘制图案。 结果,与下层的重叠曝光可以具有高产量和高精度而无需任何手动调节。