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1. 发明授权

US06726954B2 Method and system for forming copper thin film 有权
标题翻译：形成铜薄膜的方法和系统
公开(公告)号：US06726954B2
公开(公告)日：2004-04-27
申请号：US09874066
申请日：2001-06-06
申请人： Minjuan Zhang , Akiko Kobayashi , Toshiaki Sasaki , Susumu Akiyama , Atsushi Sekiguchi
发明人： Minjuan Zhang , Akiko Kobayashi , Toshiaki Sasaki , Susumu Akiyama , Atsushi Sekiguchi
IPC分类号： C23C1618
CPC分类号： C23C16/45523 , C23C16/18 , C23C16/4402 , H01L21/28556
摘要： In a method and a system for forming a copper thin film in which a raw material gas is introduced into a substrate processing chamber storing a substrate and being under a reduced pressure to form a copper thin film on the substrate, an addition gas is introduced into the substrate processing chamber in addition to the raw material gas at the initial stage of deposition. Thereafter, the introduction of the addition gas is stopped, while the introduction of the raw material gas is continued. Alternatively, an addition gas is introduced into the substrate processing chamber before the start of the deposition process, and the addition gas is introduced into the substrate processing chamber in addition to the raw material gas at the initial stage of deposition. Thereafter, the introduction of the addition gas is stopped, while the introduction of the raw material gas is continued.
摘要翻译：在形成铜薄膜的方法和系统中，其中原料气体被引入存储基板并在减压下的基板处理室中，以在基板上形成铜薄膜，将加成气体引入基板处理室除了在沉积的初始阶段的原料气体之外。此后，停止引入加料气体，同时继续引入原料气体。或者，在开始沉积处理之前，将添加气体引入到基板处理室中，并且在沉积的初始阶段除了原料气体之外还将添加气体引入基板处理室。此后，停止引入加料气体，同时继续引入原料气体。

2. 发明授权

US06562219B2 Method for the formation of copper wiring films 失效
标题翻译：形成铜布线膜的方法
公开(公告)号：US06562219B2
公开(公告)日：2003-05-13
申请号：US09987940
申请日：2001-11-16
申请人： Akiko Kobayashi , Atsushi Sekiguchi , Tomoaki Koide , Minjuan Zhang , Hideki Sunayama , Shiqin Xiao , Kaoru Suzuki
发明人： Akiko Kobayashi , Atsushi Sekiguchi , Tomoaki Koide , Minjuan Zhang , Hideki Sunayama , Shiqin Xiao , Kaoru Suzuki
IPC分类号： C23C2802
CPC分类号： H01L21/76843 , C23C26/00 , C23C28/322 , C23C28/34 , C23C28/36 , C25D7/123 , H01L21/76864 , H01L21/76873
摘要： A method for the formation of copper wiring films includes the steps of forming a first copper film by a CVD method on a diffusion barrier film, which diffusion barrier film has been formed on a semiconductor substrate and in which a concavity has been established; heating the first copper film to a temperature within the range from 200 to 500° C.; and subsequently forming a second copper film on the first copper film by a plating method using the first copper film as an electrode.
摘要翻译：形成铜布线膜的方法包括以下步骤：通过CVD方法在扩散阻挡膜上形成第一铜膜，该扩散阻挡膜已经形成在半导体衬底上并且已经建立了凹陷; 将第一铜膜加热至200〜500℃的温度范围。并且随后通过使用第一铜膜作为电极的镀覆方法在第一铜膜上形成第二铜膜。

3. 发明授权

US5993679A Method of cleaning metallic films built up within thin film deposition apparatus 失效
标题翻译：在薄膜沉积设备中清洗金属膜的方法
公开(公告)号：US5993679A
公开(公告)日：1999-11-30
申请号：US72559
申请日：1998-05-05
申请人： Tomoaki Koide , Akiko Kobayashi , Ko Sang Tae , Atsushi Sekiguchi , Osamu Okada
发明人： Tomoaki Koide , Akiko Kobayashi , Ko Sang Tae , Atsushi Sekiguchi , Osamu Okada
IPC分类号： C23C16/44 , C23C16/455 , C23G5/00 , C23F1/02
CPC分类号： C23C16/45572 , C23C16/4405 , C23C16/4557 , C23G5/00
摘要： A method of cleaning metallic films built up within a thin film deposition apparatus is disclosed. The method includes an oxidation step to oxidize the metallic film and produce a film of the oxide thereof, a complexing step to complex the oxide film and produce a complex thereof, and a sublimation step to sublimate the complex. The conditions of these cleaning steps are set so that the oxidation step is the rate-determining step.
摘要翻译：公开了一种清洗在薄膜沉积设备内构建的金属膜的方法。该方法包括氧化步骤以氧化金属膜并产生其氧化物的膜，使复合氧化膜并产生其复合物的络合步骤和升华步骤使复合物升华。这些清洗步骤的条件被设定为氧化步骤是速率确定步骤。

4. 发明申请

US20070115521A1 HOLOGRAM RECORDING SHEET, HOLOGRAPHIC OPTICAL ELEMENT USING SAID SHEET, AND ITS PRODUCTION PROCESS 失效
公开(公告)号：US20070115521A1
公开(公告)日：2007-05-24
申请号：US11622868
申请日：2007-01-12
申请人： Kenji UEDA , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
发明人： Kenji UEDA , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
IPC分类号： G03H1/02
CPC分类号： G03H1/26 , G02B5/32 , G03H1/0236 , G03H1/18 , G03H1/24 , G03H2001/0439 , G03H2001/186 , G03H2001/2263 , G03H2001/2271 , G03H2001/263 , G03H2001/266 , G03H2001/303 , G03H2222/16 , G03H2223/18 , G03H2230/10 , G03H2250/34 , G03H2250/44 , G03H2260/12 , G03H2270/23
摘要： The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.

5. 发明授权

US06340540B1 Hologram recording sheet holographic optical element using said sheet and its production process 有权
标题翻译：全息记录纸全息光学元件使用该片及其制作工艺
公开(公告)号：US06340540B1
公开(公告)日：2002-01-22
申请号：US09606311
申请日：2000-06-29
申请人： Kenji Ueda , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
发明人： Kenji Ueda , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
IPC分类号： G03H104
CPC分类号： G03H1/26 , G02B5/32 , G03H1/0236 , G03H1/18 , G03H1/24 , G03H2001/0439 , G03H2001/186 , G03H2001/2263 , G03H2001/2271 , G03H2001/263 , G03H2001/266 , G03H2001/303 , G03H2222/16 , G03H2223/18 , G03H2230/10 , G03H2250/34 , G03H2250/44 , G03H2260/12 , G03H2270/23
摘要： The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.
摘要翻译：根据本发明的全息记录片材由基片和全息图敏感材料构成，所述基片和全息图敏感材料以所需图案形成在其中形成的不同波长区域，或薄膜和至少两个对不同波长区域敏感的全息图记录敏感材料，薄膜具有位于其间的透明塑料间隔层，从而使所需的衍射光波长能够记录在所需位置上，而不产生不必要的干涉条纹。至少两个对不同波长区域敏感的全息图记录敏感材料形成在薄膜上的不同位置上，点状或条纹形状，其尺寸高达200mm或至少是敏感材料层厚度的两倍，从而能够以不同的干涉条纹的形式形成衍射不同波长的光的区域。

6. 发明授权

US6080446A Method of depositing titanium nitride thin film and CVD deposition apparatus 失效
标题翻译：沉积氮化钛薄膜和CVD沉积设备的方法
公开(公告)号：US6080446A
公开(公告)日：2000-06-27
申请号：US63274
申请日：1998-04-21
申请人： Ryoki Tobe , Yasuaki Tanaka , Atsushi Sekiguchi , Hitoshi Jimba , So Won Kim
发明人： Ryoki Tobe , Yasuaki Tanaka , Atsushi Sekiguchi , Hitoshi Jimba , So Won Kim
IPC分类号： C23C16/34 , C23C16/44 , C23C16/455 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/34 , C23C16/45502 , C23C16/45561 , C23C16/45576 , H01L21/28568
摘要： A method for fabricating a titanium nitride thin film in a reaction vessel on a surface of a substrate heated to a prescribed temperature, includes the steps of mixing tetrakis(dialkylamino)titanium (TDAAT) and a first carrier gas to create a first mixed gas; feeding the first mixed gas into the reaction vessel through a first set of nozzles; mixing an added gas reactive with the tetrakis(dialkylamino)titanium with a second carrier gas to create a second mixed gas; feeding the second mixed gas into the reaction vessel through a second set of nozzles; while controlling the flow rates of the TDAAT, added gas, firt and second carrier gases; and depositing a titanium nitride thin film by the first mixed gas and the second mixed gas while confining the pressure inside the reaction vessel to a range of 0.1-15 Pa.
摘要翻译：在加热到规定温度的基板的表面上的反应容器中制造氮化钛薄膜的方法，包括将四（二烷基氨基）钛（TDAAT）和第一载气混合以产生第一混合气体的步骤; 通过第一组喷嘴将第一混合气体进料到反应容器中; 将与四（二烷基氨基）钛反应的添加气体与第二载气混合以产生第二混合气体; 通过第二组喷嘴将第二混合气体进料到反应容器中; 同时控制TDAAT，添加气体，细丝和第二载气的流速; 以及通过第一混合气体和第二混合气体沉积氮化钛薄膜，同时将反应容器内的压力限制在0.1-15Pa的范围内。

7. 发明授权

US5672385A Titanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gas 失效
标题翻译：氮化钛膜-MOCVD方法结合使用四氮杂烷基氨基钛作为源气体
公开(公告)号：US5672385A
公开(公告)日：1997-09-30
申请号：US611678
申请日：1996-03-06
申请人： Hitoshi Jimba , So Won Kim , Atsushi Sekiguchi
发明人： Hitoshi Jimba , So Won Kim , Atsushi Sekiguchi
IPC分类号： C01B21/076 , C23C16/34 , C30B29/28 , H01L21/285 , H01L21/31 , H01L21/318 , C23C16/18
CPC分类号： C23C16/34
摘要： The present invention provides a method of depositing a titanium nitride thin film with good coverage even in a hole with a high aspect ratio by using tetrakisdialkylaminotitanium. In this method, a raw material gas of tetrakisdialkylaminotitanium is introduced into a reactor through a raw material gas introduction system. When the raw material gas is supplied to a substrate which is previously heated by a holder temperature control mechanism, predetermined thermally chemical reaction takes place to deposit a thin film consisting of titanium nitride as a main component. The pressure in the reactor is controlled by an exhaust system so as to be maintained at a predetermined value in the range of about 0.1 to 15 Pa.
摘要翻译：本发明提供一种通过使用四烷基氨基钛，即使在具有高纵横比的孔中沉积具有良好覆盖率的氮化钛薄膜的方法。在该方法中，通过原料气体导入系统将四烷基氨基钛的原料气体引入反应器。当原料气体被供给到由保持器温度控制机构预先加热的基板时，发生预定的热化学反应以沉积由氮化钛组成的薄膜作为主要成分。反应器中的压力由排气系统控制，以便保持在约0.1至15Pa的范围内的预定值。

8. 发明授权

US5660954A Hologram and method of and apparatus for producing the same 失效
公开(公告)号：US5660954A
公开(公告)日：1997-08-26
申请号：US370179
申请日：1995-01-09
申请人： Kazuhiro Suga , Atsushi Sekiguchi , Kenji Ueda , Hiroyuki Nishimura
发明人： Kazuhiro Suga , Atsushi Sekiguchi , Kenji Ueda , Hiroyuki Nishimura
IPC分类号： G03H1/02 , G03H1/18 , G03H1/20 , G03H1/04 , G03H1/00
CPC分类号： G03H1/202 , G03H1/0256 , G03H1/18 , G03H1/0248 , G03H1/0252 , G03H2223/25 , G03H2227/04 , G03H2240/55 , G03H2250/10 , G03H2250/12 , G03H2250/32
摘要： A duplicating photosensitive material film is brought into close contact with an ND glass reduced in thickness so as to become flexible or a flexible sheet or an ND glass coated with a cushioning layer through an optical contacting liquid containing a surface active agent. In addition, a spacer is interposed between a hologram original plate and a duplicating photosensitive material, and a space defined by the spacer is filled with an optical contacting liquid, thereby regulating the thickness of the optical contacting liquid layer with the spacer. Therefore, when pressure is applied, the optical contacting liquid is uniformly pressed, so that it can be made uniform and thin in thickness. Accordingly, it is possible to prevent a failure of duplication of a hologram image due to undesirable flow of the optical contacting liquid. In addition, the wettability of the optical contacting liquid improves, so that it is possible to prevent trapping of air and foaming and to make the optical contacting liquid uniform and thin in thickness. Thus, it becomes possible to duplicate a hologram image excellently. In addition, a cushioning layer is provided on the inner side of an AR coated ND glass or on the upper side of a photosensitive material film, and another cushioning layer is provided on the side of an original plate protecting glass which is closer to the optical contacting liquid or on the lower side of the photosensitive material film. With this arrangement, even if dust enters, it can be effectively held inside the cushioning layers. Thus, it is possible to prevent undesirable flow of the optical contacting liquid and lifting of the film due to dust and hence possible to perform duplication effectively without any hindrance. Also disclosed is a hologram producing apparatus which includes mechanisms for feeding and taking up a duplicating photosensitive material film, and a contacting liquid dropping mechanism. The apparatus further includes a mechanism for nipping an excess of contacting liquid dropped, a mechanism for drying the contacting liquid attached to the exposed duplicating photosensitive material film, a mechanism for positioning the film, etc.

9. 发明授权

US5594280A Method of forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling means 失效
标题翻译：利用温度控制装置形成薄膜的方法和形成金属薄膜的装置
公开(公告)号：US5594280A
公开(公告)日：1997-01-14
申请号：US9446
申请日：1993-01-27
申请人： Atsushi Sekiguchi , Tsukasa Kobayashi , Shinji Takagi
发明人： Atsushi Sekiguchi , Tsukasa Kobayashi , Shinji Takagi
IPC分类号： C23C16/20 , C23C16/44 , C23C16/452 , C23C16/455 , H01L21/285 , H01L21/768 , H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： C23C16/4557 , C23C16/20 , C23C16/452 , C23C16/45565 , H01L21/28556 , H01L21/76838 , H01L21/76877
摘要： In an electronic device, an interconnect utilizes a flat substrate and a layer bonded to the substrate. The layer may have a through hole formed therein or be formed from parallel spaced layers. An aluminum or aluminum alloy film having single crystallinity is deposited within the through hole or void step created between parallel spaced layers.
摘要翻译：在电子设备中，互连使用平坦基板和结合到基板的层。该层可以具有形成在其中的通孔或者由平行隔开的层形成。具有单一结晶度的铝或铝合金膜沉积在平行隔开的层之间形成的通孔或空隙台阶内。

10. 发明授权

US5453338A Hologram and method of and apparatus for producing the same 失效
标题翻译：全息图及其制造方法和装置
公开(公告)号：US5453338A
公开(公告)日：1995-09-26
申请号：US39854
申请日：1993-03-30
申请人： Kazuhiro Suga , Atsushi Sekiguchi , Kenji Ueda , Hiroyuki Nishimura
发明人： Kazuhiro Suga , Atsushi Sekiguchi , Kenji Ueda , Hiroyuki Nishimura
IPC分类号： G03H1/02 , G03H1/18 , G03H1/20 , G03H1/04 , G03H1/00
CPC分类号： G03H1/202 , G03H1/0256 , G03H1/18 , G03H1/0248 , G03H1/0252 , G03H2223/25 , G03H2227/04 , G03H2240/55 , G03H2250/10 , G03H2250/12 , G03H2250/32
摘要： A duplicating photosensitive material film is placed into close contact with a thin flexible ND glass or an ND glass coated with a cushioning layer through an optical contacting liquid containing a surface active agent. A spacer is interposed between a hologram original plate and the duplication photosensitive material, and the space defined by the spacer is filled with an optical contacting liquid, the spacer thereby regulating the thickness of the optical contacting liquid layer. In addition, a cushioning layer is provided on the inner side of an AR coated ND glass or on the upper side of the photosensitive material film, and another cushioning layer is provided on the side of an original plate protecting glass of the hologram original plate which is closer to the optical contacting liquid or on the lower side of the photosensitive material film. With this arrangement, even if dust enters, it can be effectively held inside the cushioning layers. Thus, it is possible to prevent undesirable flow of the optical contacting liquid and lifting of the film due to dust and hence possible to perform duplication effectively without any hindrance.
摘要翻译：将复制的感光材料膜通过含有表面活性剂的光学接触液体与薄的柔性ND玻璃或涂有缓冲层的ND玻璃紧密接触。在全息图原版和复制感光材料之间插入间隔物，并且由间隔物限定的空间填充有光学接触液体，间隔物由此调节光学接触液体层的厚度。此外，在AR涂覆的ND玻璃的内侧或感光材料膜的上侧上设置缓冲层，在全息原版的原版保护玻璃的侧面设置另一缓冲层，更靠近光学接触液体或感光材料膜的下侧。通过这种布置，即使灰尘进入，也可以有效地保持在缓冲层内。因此，可以防止光学接触液体的不期望的流动和由于灰尘而导致的膜的提升，从而可能在没有任何障碍的情况下有效地进行重复。

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