专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08697320B2 Phenol compounds and positive photosensitive resin composition including the same 有权
标题翻译：苯酚化合物和包含其的正型感光性树脂组合物
公开(公告)号：US08697320B2
公开(公告)日：2014-04-15
申请号：US13242120
申请日：2011-09-23
申请人： Ji-Young Jeong , Min-Kook Chung , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
发明人： Ji-Young Jeong , Min-Kook Chung , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
IPC分类号： G03F7/023 , G03F7/022
CPC分类号： G03F7/0226 , C07C69/84 , G03F7/0233
摘要： Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.
摘要翻译：公开了包含由化学式1表示的化合物，由化学式2表示的化合物或其组合的新型酚化合物和包含其的正性感光性树脂组合物。

2. 发明授权

US08592131B2 Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same 有权
标题翻译：邻硝基苄基酯化合物和包含它们的正型感光性树脂组合物
公开(公告)号：US08592131B2
公开(公告)日：2013-11-26
申请号：US13239441
申请日：2011-09-22
申请人： Min-Kook Chung , Ji-Young Jeong , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
发明人： Min-Kook Chung , Ji-Young Jeong , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
IPC分类号： G03F7/00 , G03F7/004 , G03F7/075 , C07C69/94
CPC分类号： C07C205/42 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0751 , G03F7/0755
摘要： An ortho-nitrobenzyl ester compound including a compound represented by Chemical Formula 1, and a positive photosensitive resin composition including the same are provided.
摘要翻译：提供了包括由化学式1表示的化合物的邻硝基苄基酯化合物和包含该化合物的正性感光性树脂组合物。

3. 发明授权

US08501375B2 Positive photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US08501375B2
公开(公告)日：2013-08-06
申请号：US13241612
申请日：2011-09-23
申请人： Hyun-Yong Cho , Min-Kook Chung , Ji-Young Jeong , Jong-Hwa Lee , Yong-Sik Yoo , Jeong-Woo Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
发明人： Hyun-Yong Cho , Min-Kook Chung , Ji-Young Jeong , Jong-Hwa Lee , Yong-Sik Yoo , Jeong-Woo Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
IPC分类号： G03F7/023
CPC分类号： G03F7/0233 , H01L23/293 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. In the above Chemical Formula 1, each substituent is the same as defined in the specification.
摘要翻译：公开了一种正型感光性树脂组合物，其包含（A）包含由以下化学式1表示的重复单元的聚苯并恶唑前体; （B）光敏重氮醌化合物; （C）硅烷化合物; （D）酚化合物; 和（E）溶剂。在上述化学式1中，各取代基与说明书中的定义相同。

4. 发明授权

US08975110B2 Methods of forming a passivation layer 有权
标题翻译：形成钝化层的方法
公开(公告)号：US08975110B2
公开(公告)日：2015-03-10
申请号：US13070370
申请日：2011-03-23
申请人： Soo-Young Kim , Chang-Ho Lee , Su-Min Park
发明人： Soo-Young Kim , Chang-Ho Lee , Su-Min Park
IPC分类号： H01L51/00 , H01L21/02 , C08G73/10 , C08G73/22 , C09D179/08 , G03F7/023 , G03F7/40
CPC分类号： H01L21/02118 , C08G73/10 , C08G73/1085 , C08G73/22 , C09D179/08 , G03F7/0233 , G03F7/40 , H01L21/02282
摘要： In a composition of forming a passivation layer, the composition includes about 30 to about 60 percent by weight of a mixed polymer resin formed by blending polyamic acid and polyhydroxy amide, about 3 to about 10 percent by weight of a photoactive compound, about 2 to about 10 percent by weight of a cross-linking agent and an organic solvent. The passivation layer formed by using the composition has superior mechanical and physical properties, in which disadvantages of polyimide and polybenzoxazole are compensated by mixing both materials.
摘要翻译：在形成钝化层的组合物中，组合物包含约30至约60重量％的通过共混聚酰胺酸和多羟基酰胺形成的混合聚合物树脂，约3至约10重量％的光活性化合物，约2至约10重量％的交联剂和有机溶剂。通过使用该组合物形成的钝化层具有优异的机械和物理性能，其中通过混合两种材料补偿聚酰亚胺和聚苯并恶唑的缺点。

5. 发明申请

US20110263136A1 METHODS OF FORMING A PASSIVATION LAYER 有权
标题翻译：形成钝化层的方法
公开(公告)号：US20110263136A1
公开(公告)日：2011-10-27
申请号：US13070370
申请日：2011-03-23
申请人： Soo-Young Kim , Chang-Ho Lee , Su-Min Park
发明人： Soo-Young Kim , Chang-Ho Lee , Su-Min Park
IPC分类号： H01L21/3105
CPC分类号： H01L21/02118 , C08G73/10 , C08G73/1085 , C08G73/22 , C09D179/08 , G03F7/0233 , G03F7/40 , H01L21/02282
摘要： In a composition of forming a passivation layer, the composition includes about 30 to about 60 percent by weight of a mixed polymer resin formed by blending polyamic acid and polyhydroxy amide, about 3 to about 10 percent by weight of a photoactive compound, about 2 to about 10 percent by weight of a cross-linking agent and an organic solvent. The passivation layer formed by using the composition has superior mechanical and physical properties, in which disadvantages of polyimide and polybenzoxazole are compensated by mixing both materials.
摘要翻译：在形成钝化层的组合物中，组合物包含约30至约60重量％的通过共混聚酰胺酸和多羟基酰胺形成的混合聚合物树脂，约3至约10重量％的光活性化合物，约2至约10重量％的交联剂和有机溶剂。通过使用该组合物形成的钝化层具有优异的机械和物理性能，其中通过混合两种材料补偿聚酰亚胺和聚苯并恶唑的缺点。

6. 发明申请

US20090158385A1 Apparatus and method for automatically generating SELinux security policy based on selt 审中-公开
标题翻译：基于selt自动生成SELinux安全策略的设备和方法
公开(公告)号：US20090158385A1
公开(公告)日：2009-06-18
申请号：US12076783
申请日：2008-03-21
申请人： Dong-Wook Kim , Gyu-Il Cha , Young-ho Kim , Eun-Ji Lim , Soo-Young Kim , Sung-In Jung , Myung-Joon Kim , Bong-Nam Noh , Jung-Soon Kim
发明人： Dong-Wook Kim , Gyu-Il Cha , Young-ho Kim , Eun-Ji Lim , Soo-Young Kim , Sung-In Jung , Myung-Joon Kim , Bong-Nam Noh , Jung-Soon Kim
IPC分类号： G06F21/00
CPC分类号： G06F21/6218 , G06F21/604
摘要： Provided is an apparatus and method for automatically generating a SELinux security policy based on SELT. In the method, process generation is prepared by receiving execution file names of a program destined for policy generation. A system call log, which is traced by generating a process by executing the received execution file of the program, is stored. The traced system call log is purified into data necessary for generation of a security policy. Objects are grouped in consideration of the relationship between the objects based on purified information. A normalized data structure is recorded in an SELT description language format using a security policy file. Duplication and collision between the generated SELT security policy and the previous security policy in a system are detected.
摘要翻译：提供了一种基于SELT自动生成SELinux安全策略的装置和方法。在该方法中，通过接收用于策略生成的程序的执行文件名来准备进程生成。存储通过执行程序的接收到的执行文件生成处理来追踪的系统调用日志。跟踪的系统调用日志被净化为生成安全策略所需的数据。考虑到基于纯化信息的对象之间的关系对象进行分组。使用安全策略文件以SELT描述语言格式记录归一化数据结构。检测到生成的SELT安全策略与系统中之前的安全策略之间的重复和冲突。

7. 发明申请

US20070171248A1 Method and apparatus for compensating image skew and electro-photographic image froming apparatus incorporating the same 审中-公开
标题翻译：用于补偿图像偏斜的方法和装置以及包含该偏移的电子照相图像装置
公开(公告)号：US20070171248A1
公开(公告)日：2007-07-26
申请号：US11650487
申请日：2007-01-08
申请人： Soo-Young Kim , Heung-Sup Jeong , Se-Hyun Lyu
发明人： Soo-Young Kim , Heung-Sup Jeong , Se-Hyun Lyu
IPC分类号： B41J29/38
CPC分类号： G03G15/757
摘要： A method and apparatus for compensating image skew and an electro-photographic image forming apparatus including the same are provided. Image skew of a toner image transferred onto a paper is compensated for by inclining a photosensitive medium onto which a light beam is scanned to be parallel to a scanning line of the light beam. A first inclination member including a first inclined surface facing upward and a second inclination member including a second inclined surface contacting and facing the first inclined surface are provided, wherein a position of a shaft of the photosensitive medium is adjusted by moving at least one of the first and second inclination members. Image skew of a toner image is sensed, and a photosensitive medium onto which a light beam is scanned is inclined to correspond to a scanning line skew of the light beam.
摘要翻译：提供了一种用于补偿图像偏斜的方法和装置以及包括其的电子照相图像形成装置。通过将扫描光束的光敏介质倾斜成平行于光束的扫描线来补偿转印到纸张上的调色剂图像的图像歪斜。提供包括面向上的第一倾斜表面和包括接触并面对第一倾斜表面的第二倾斜表面的第二倾斜构件的第一倾斜构件，其中通过移动至少一个第一和第二倾斜构件。检测到调色剂图像的图像歪斜，并且其上扫描光束的光敏介质倾斜以对应于光束的扫描线歪斜。

8. 发明授权

US07206333B2 Channel transmission symbol generating system for a multi-carrier communication system for reduction of multiple access interference and method thereof 失效
标题翻译：用于减少多址干扰的多载波通信系统的信道传输符号生成系统及其方法
公开(公告)号：US07206333B2
公开(公告)日：2007-04-17
申请号：US10410832
申请日：2003-04-09
申请人： Kwon-Hue Choi , Soo-Young Kim , Kwang-Jae Lim , Deock-Gil Oh
发明人： Kwon-Hue Choi , Soo-Young Kim , Kwang-Jae Lim , Deock-Gil Oh
IPC分类号： H04B1/00
CPC分类号： H04L5/026
摘要： Disclosed is a method for using a different symbol timing for users so as to reduce a multiple access interference component in a multi-carrier code division multiple access (MC-CDMA) system. For this purpose, the presented invention involves dividing the users of the MC-CDMA system into two groups and applying an offset to the symbol timing between the user groups to cause a symbol transition of the opposite user group in the middle of the symbol interval, thereby reducing the multiple access interference component included in a symbol decision variable after a chip combination.
摘要翻译：公开了一种对于用户使用不同的符号定时以减少多载波码分多址（MC-CDMA）系统中的多址干扰分量的方法。为此，本发明涉及将MC-CDMA系统的用户划分成两组，并将偏移应用于用户组之间的符号定时，以在符号间隔的中间引起相对用户组的符号转换，从而在芯片组合之后减少包括在符号判定变量中的多址干扰分量。

9. 发明授权

US06365734B1 Cucurbituril derivatives, their preparation methods and uses 有权
标题翻译：葫芦素衍生物，其制备方法和用途
公开(公告)号：US06365734B1
公开(公告)日：2002-04-02
申请号：US09605635
申请日：2000-06-28
申请人： Kimoon Kim , Jaheon Kim , In-Sun Jung , Soo-Young Kim , Eunsung Lee , Jin-Koo Kang
发明人： Kimoon Kim , Jaheon Kim , In-Sun Jung , Soo-Young Kim , Eunsung Lee , Jin-Koo Kang
IPC分类号： C07D24504
CPC分类号： C07D245/04 , B01D53/34 , B01D53/50 , B01D53/56 , B01D53/62 , B01J31/0237 , B01J31/0247 , B01J31/0249 , B01J31/0251 , C02F1/58 , C07D487/22 , Y02C10/08
摘要： Cucurbituril derivatives, their preparation methods and uses. The cucurbituril derivatives have the formula (1) where X is O, S or NH; R1 and R2 are independently selected from the group consisting of hydrogen, alkyl groups of 1 to 30 carbon atoms, alkenyl groups of 1 to 30 carbon atoms, alkynyl groups of 1 to 30 carbon atoms, alkylthio groups of 1 to 30 carbon atoms, alkylcarboxyl groups of 1 to 30 carbon atoms, hydroxyalkyl groups of 1 to 30 carbon atoms, alkylsilyl groups of 1 to 30 carbon atoms, alkoxy groups of 1 to 30 carbon atoms, haloalkyl groups of 1 to 30 carbon atoms, nitro group, alkylamine groups of 1 to 30 carbon atoms, amine group, aminoalkyl groups of 1 to 30 carbon atoms, unsubstituted cycloalkyl groups of 5 to 30 carbon atoms, cycloalkyl groups of 4 to 30 carbon atoms with hetero atoms, unsubstituted aryl groups of 6 to 30 carbon atoms, and aryl groups of 6 to 30 carbon atoms with hetero atoms; and n is an integer from 4 to 20, wherein the cucurbituril derivatives having the formula (1), where n=6, R1=H, R2=H and X=O, and n=5, R1=CH3, R2=H and X=O, are excluded. The cucurbituril derivatives are easily prepared as a mixture by one of the three new methods, and each cucurbituril derivative can be separated from the mixture by fractional crystallization. The cucurbituril derivatives having the formula (1) or their mixtures are very useful in removing dyes and heavy metal ions dissolved in water or waste water.
摘要翻译：葫芦素衍生物，其制备方法和用途。葫芦巴衍生物具有式（1）其中X是O，S或NH; R1和R2独立地选自氢，1〜30个碳原子的烷基，1〜30个碳原子的烯基，1〜30个碳原子的炔基，1〜30个碳原子的烷硫基，烷基羧基 1〜30个碳原子的基团，1〜30个碳原子的羟基烷基，1〜30个碳原子的烷基甲硅烷基，1〜30个碳原子的烷氧基，1〜30个碳原子的卤代烷基，硝基， 1至30个碳原子，胺基，1至30个碳原子的氨基烷基，5至30个碳原子的未取代环烷基，4至30个碳原子的杂原子环烷基，6至30个碳原子的未取代芳基，和具有6-10个碳原子的杂原子的芳基; n为4〜20的整数，式中，n = 6，R1 = H，R2 = H，X = O，n = 5，R1 = CH3，R2 = H的葫芦巴脲衍生物和X = O。通过三种新方法之一容易地制备葫芦巴脲衍生物作为混合物，并且可以通过分级结晶从混合物中分离出每种葫芦巴脲衍生物。具有式（1）的葫芦巴衍生物或其混合物非常适用于去除溶于水或废水中的染料和重金属离子。

10. 发明授权

US09053936B2 Layout method of semiconductor device with junction diode for preventing damage due to plasma charge 有权
标题翻译：具有结二极管的半导体器件的布局方法，用于防止等离子体电荷引起的损坏
公开(公告)号：US09053936B2
公开(公告)日：2015-06-09
申请号：US13613976
申请日：2012-09-13
申请人： Soo-Young Kim , Jong-Hak Won
发明人： Soo-Young Kim , Jong-Hak Won
IPC分类号： H01L27/02 , H01L27/06
CPC分类号： H01L27/0255 , H01L27/0629
摘要： A method for forming a unit layout pattern includes: forming first through third active regions in the unit layout pattern, each of the first through third active regions aligning and extending along a length in a first direction and having a width in a second direction perpendicular to the first direction; forming first and second gate regions on the first and second active regions, the first and second gate regions electrically connected to each other; forming the first active region of a first conductive type within a second conductive type well region; forming the second active region of a second conductive type; and forming the third active region connected with the first and second gate regions to form a junction diode, the third active region being located between the first or the second active region and an end of the length in the first direction of the unit pattern.
摘要翻译：一种用于形成单元布局图案的方法包括：以单元布局图案形成第一至第三有源区域，第一至第三有源区域中的每一个沿着第一方向的长度对准并延伸，并且具有垂直于第一方向的第二方向的宽度第一个方向在所述第一和第二有源区上形成第一和第二栅极区，所述第一和第二栅极区彼此电连接; 在第二导电类型阱区内形成第一导电类型的第一有源区; 形成第二导电类型的第二有源区; 以及形成与所述第一和第二栅极区域连接以形成结二极管的所述第三有源区，所述第三有源区位于所述第一或第二有源区之间，并且位于所述单位图案的所述第一方向上的长度的端部。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式