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    • 2. 发明授权
    • Semiconductor device
    • 半导体器件
    • US09553575B2
    • 2017-01-24
    • US14436767
    • 2012-12-21
    • Satoshi Hirose
    • Satoshi Hirose
    • H03K17/567H01L23/528H01L29/423
    • H03K17/567H01L23/528H01L29/4232H01L2224/48091H01L2224/49175H01L2924/00014
    • Two or more pads and are connected to a gate region, so that a pad for applying a gate voltage can be selected. In the case where, for example, the peripheral region is likely to overheat, a turn-on voltage is applied to the first pad to turn on the peripheral region later than the central region, and a turn-off voltage is applied to the second pad to turn off the peripheral region earlier than the central region. The problem that the peripheral region is likely to overheat can be addressed. In the case where the flow of an excess current raises the temperature, the turn-off voltage is applied to the second pad. The problem that the temperature is likely to rise in the peripheral region when an excess current flows can be addressed.
    • 两个或更多个焊盘并连接到栅极区域,从而可以选择用于施加栅极电压的焊盘。 在例如周边区域容易过热的情况下,向第一焊盘施加接通电压,使得比中心区域晚的周边区域导通,对第二焊盘施加关断电压 垫以比中央区域更早地关闭外围区域。 可以解决周边地区可能过热的问题。 在过电流的流动升高温度的情况下,关闭电压被施加到第二焊盘。 可以解决当过剩电流流动时周边区域温度可能上升的问题。
    • 3. 发明申请
    • DEVICE FOR DRIVING INVERTER
    • 用于驱动逆变器的装置
    • US20110007536A1
    • 2011-01-13
    • US12921956
    • 2009-02-23
    • Naoyoshi TakamatsuSatoshi Hirose
    • Naoyoshi TakamatsuSatoshi Hirose
    • H02M7/537
    • H02M1/08H02M2001/0029H03K17/163H03K17/166H03K17/168H03K2217/0036
    • Disclosed is a device for driving an inverter having a semiconductor switching element. A gate voltage calculating unit (20) calculates a surge voltage from the temperature, current, and DC-side voltage of each of IGBTs of the inverter and compares the surge voltage with the breakdown voltage of the element. The gate voltage calculating unit (20) commands a gate voltage control unit (22) to set a gate voltage higher than the normal value (reference value) in the case of judging that the difference between the element breakdown voltage and the surge voltage exceeds a predetermined threshold voltage and that a margin exists in the surge voltage. The voltage control unit (22) performs switching control of gates of the IGBTs according to the gate voltage command higher than the reference voltage to thereby reduce stationary losses of the IGBTs.
    • 公开了一种用于驱动具有半导体开关元件的逆变器的装置。 栅极电压计算单元(20)根据逆变器的每个IGBT的温度,电流和直流侧电压来计算浪涌电压,并将该浪涌电压与元件的击穿电压进行比较。 在判定元件击穿电压与浪涌电压之间的差异超过a的情况下,栅极电压计算单元(20)命令栅极电压控制单元(22)设定高于正常值(基准值)的栅极电压 预定的阈值电压,并且在浪涌电压中存在余量。 电压控制单元(22)根据高于基准电压的栅极电压指令来对IGBT的栅极进行开关控制,由此减小IGBT的稳定损耗。
    • 5. 发明授权
    • Semiconductor charge transfer device including charge quantity detection
    • 半导体电荷转移装置包括电荷量检测
    • US5172399A
    • 1992-12-15
    • US755774
    • 1991-09-06
    • Satoshi Hirose
    • Satoshi Hirose
    • H01L29/762G11C19/28G11C27/04H01L21/339H01L29/768
    • G11C19/285G11C27/04H01L29/76816
    • A charge transfer device includes a signal charge transfer region including a first conductivity type first low dopant concentration semiconductor region on which transfer electrodes are disposed via an insulating film, a charge storage region including a first conductivity type second low dopant concentration semiconductor region connected to the first low dopant concentration semiconductor region, a second conductivity type semiconductor region disposed on the charge storage region, a first conductivity type high dopant concentration semiconductor region disposed at the surface of and spaced from the first conductivity type second low dopant concentration semiconductor region at a region opposite the first conductivity type first low dopant concentration semiconductor region, and a detector for detecting the quantity of signal charges stored in the charge storage region from the resistance value between two points in a portion of said second conductivity type semiconductor region. The charge storage region is completely depleted during the resetting operation, reset noise is eliminated, and S/N ratio is enhanced.
    • 电荷转移装置包括信号电荷转移区域,该信号电荷转移区域包括通过绝缘膜设置有转移电极的第一导电类型的第一低掺杂浓度半导体区域;电荷存储区域,包括连接到第一导电类型的第一低掺杂剂浓度半导体区域 第一低掺杂剂浓度半导体区域,设置在电荷存储区域上的第二导电类型半导体区域,设置在第一导电类型第二低掺杂剂浓度半导体区域的表面并与其间隔的第一导电型高掺杂剂浓度半导体区域 与第一导电类型的第一低掺杂剂浓度半导体区域相对,以及检测器,用于从所述第二导电类型半导体区域的一部分中的两个点之间的电阻值检测存储在电荷存储区域中的信号电荷的量。 在复位操作期间,电荷存储区域完全耗尽,消除了复位噪声,并且提高了S / N比。
    • 6. 发明授权
    • Coating method for magnetic recording medium
    • 磁记录介质涂层方法
    • US5132132A
    • 1992-07-21
    • US714426
    • 1991-06-12
    • Masaru WatanabeSatoshi Hirose
    • Masaru WatanabeSatoshi Hirose
    • B05D1/26B05D5/12G11B5/842G11B5/848
    • G11B5/842G11B5/848Y10S428/90
    • An apparatus for coating on a support a first magnetic coating solution so as to form a lower layer on the support continuously travelling and then coating a second magnetic coating solution on the first magnetic coating solution, which is in a non-dried state, so as to form an upper layer thereon to thereby produce a two-layer type magnetic recording medium. The apparatus comprises a first die for coating the first magnetic coating solution which includes first and second lip portions, the second lip portion having a top surface curved. The apparatus further comprises a second die for coating the second magnetic coating solution which includes first and second lip portions, the second lip portion similarly having a top surface curved. The first lip portion of each of said first and second dies has an edge A and the second lip portion has at both ends of the curved top surface edges B and C. The edge B is formed to be in confronting relation to the edge A of the first lip portion. The edge A of the first lip portion is arranged to be substantially on a tangential line of the edge B of the second lip portion and the support is arranged to be travelled so as to approach each die at a loading angle to be substantially parallel to the tangential line of the edge B of the second lip portion and to be separated therefrom at an unloading angle to be substantially parallel to an tangential line of the edge C of said second lip portion.
    • 7. 发明授权
    • Solid-state image sensor
    • 固态图像传感器
    • US5040038A
    • 1991-08-13
    • US262056
    • 1988-10-24
    • Naoki YutaniSotoju AsaiShiro HineSatoshi HiroseHidekazu YamamotoMasashi Ueno
    • Naoki YutaniSotoju AsaiShiro HineSatoshi HiroseHidekazu YamamotoMasashi Ueno
    • H01L27/148H04N5/335H04N5/365H04N5/372
    • H01L27/14831
    • A solid-state image sensor comprises photoelectric converting devices (22) formed on a p type semiconductor substrate (1), transfer gates (26) for reading signal charges therefrom, scanning lines (21) for selecting the transfer gates (26), and transfer electrodes (11) of the first layer and transfer electrodes (12) of the second layer alternately disposed for transferring in the vertical direction the read signal charges. All the electrodes of the transfer gates (26) are formed integrally with the transfer electrodes (12) of the second layer, with the result that all the electrodes of the transfer gates (26) are common to the transfer electrodes of the same layer (the second layer). Although the potential wall (340) is formed in the transfer channel (3) beneath the transfer electrode (12) connected to the transfer gate (26), the same is insulated from adjacent the transfer electrode (11) on the charge transfer direction side. As a result, when a voltage is applied to the transfer electrode adjacent thereto, the signal charges are fully transferred.
    • 固态图像传感器包括形成在p型半导体衬底(1)上的光电转换器件(22),用于读取信号电荷的传输门(26),用于选择传输门(26)的扫描线(21) 交替地设置第一层的电极(11)和第二层的传输电极(12),用于在垂直方向上传送读取信号电荷。 传输栅极(26)的所有电极与第二层的传输电极(12)整体形成,结果是传输栅极(26)的所有电极对同一层的传输电极是共同的( 第二层)。 尽管在连接到传输栅极(26)的传输电极(12)下方的传输沟道(3)中形成了电位壁(340),但是在电荷转移方向侧上与传输电极(11)相邻的电位壁 。 结果,当对与其相邻的转印电极施加电压时,信号电荷被完全转印。
    • 8. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20150288357A1
    • 2015-10-08
    • US14436767
    • 2012-12-21
    • Satoshi HIROSE
    • Satoshi Hirose
    • H03K17/567H01L23/528H01L29/423
    • H03K17/567H01L23/528H01L29/4232H01L2224/48091H01L2224/49175H01L2924/00014
    • Two or more pads and are connected to a gate region, so that a pad for applying a gate voltage can be selected. In the case where, for example, the peripheral region is likely to overheat, a turn-on voltage is applied to the first pad to turn on the peripheral region later than the central region, and a turn-off voltage is applied to the second pad to turn off the peripheral region earlier than the central region. The problem that the peripheral region is likely to overheat can be addressed. In the case where the flow of an excess current raises the temperature, the turn-off voltage is applied to the second pad. The problem that the temperature is likely to rise in the peripheral region when an excess current flows can be addressed.
    • 两个或更多个焊盘并连接到栅极区域,从而可以选择用于施加栅极电压的焊盘。 在例如周边区域容易过热的情况下,向第一焊盘施加接通电压,使得比中心区域晚的周边区域导通,对第二焊盘施加关断电压 垫以比中央区域更早地关闭外围区域。 可以解决周边地区可能过热的问题。 在过电流的流动升高温度的情况下,关闭电压被施加到第二焊盘。 可以解决当过剩电流流动时周边区域温度可能上升的问题。
    • 9. 发明授权
    • Metallic hollow columnar member
    • 金属中空柱状构件
    • US08783721B2
    • 2014-07-22
    • US14008269
    • 2012-03-30
    • Satoshi HiroseTakashi ArigaShigeru Yonemura
    • Satoshi HiroseTakashi ArigaShigeru Yonemura
    • B62D21/15
    • B62D21/15
    • A metallic hollow columnar member with a polygonal cross-section having at least five vertices and sides extending between the vertices, is disclosed. The polygonal cross-section is divided by two vertices (A, B) with small inside angles into two perimeter segments with a perimeter comprising one or more sides, and at least one of the two perimeter segments contains at least four sides. The respective inside angles of at least three vertices (V(i)) included in the perimeter segment which includes the at least four sides are equal to or less than 180°, the distance (SS(i)) between each of the at least three vertices (V(i)) and a straight line (L) connecting the two vertices (A, B) is shorter than ½ of the distance between the two vertices (A, B), and the inside angle of the vertex (C) with the smallest inside angle among the at least three vertices (V(i)) is larger than the inside angles of the two vertices (A, B). Vertices (VI) are present on the perimeter segment including the at least four sides, respectively between the vertex (C) with the smallest inside angle among the at least three vertices (V(i)) and one (A) of the two vertices (A, B), and between the vertex (C) with the smallest inside angle and the other (B) of the two vertices (A, B), said vertices (VI) having inside angles larger than the inside angle of the vertex (C) with the smallest inside angle.
    • 公开了具有至少五个顶点和在顶点之间延伸的侧面的具有多边形横截面的金属中空柱状构件。 多边形横截面被具有小内角的两个顶点(A,B)分成两个周边段,周边包括一个或多个边,并且两个周边段中的至少一个包含至少四个边。 包括至少四个边的周边段中包括的至少三个顶点(V(i))的相应内角度等于或小于180°,至少在每一个之间的距离(SS(i)) 连接两个顶点(A,B)的三个顶点(V(i))和直线(L)短于两个顶点(A,B)之间的距离的一半,顶点的内角 )在所述至少三个顶点(V(i))中具有最小内角的大于所述两个顶点(A,B)的内角度。 顶点(VI)分别位于包括至少四个侧面的周边区段上,分别位于至少三个顶点(V(i))中的最小内角的顶点(C)和两个顶点中的一个(A)之间 (A,B),并且具有最小内角的顶点(C)和两个顶点(A,B)的顶点(C)之间,所述顶点(VI)的内角大于顶点的内角 (C)内角最小。