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1. 发明申请

US20070269344A1 Method for Producing Bioassay Plate by Stacking Two Substrates Together and Bioassay Plate 审中-公开
标题翻译：通过堆叠两个底物和生物测定板生产生物测定板的方法
公开(公告)号：US20070269344A1
公开(公告)日：2007-11-22
申请号：US10574214
申请日：2004-09-27
申请人： Michihiro Ohnishi , Yuichi Aki , Minoru Inagaki
发明人： Michihiro Ohnishi , Yuichi Aki , Minoru Inagaki
IPC分类号： G01N33/00
CPC分类号： G01N33/5438
摘要： A bioassay plate is provided with a pair of opposing electrodes in a reaction region, and by imposing a predetermined electric field on the reaction region, the bioassay plate makes it possible to perform high-order structural adjustment, migration, immobilization and the like of a substance as desired. A first substrate (11) is provided with a detection well (X), which is in turn equipped at least with a reaction region (R) for providing a place of interaction between the substances and also with a first electrode (E11) arranged facing the reaction region (R). A second substrate (12) is provided at least with a second electrode (E12) which can impose an electric field on the reaction region (R) in association with the first electrode (E11). The present invention provides a bioassay plate (1) formed of these two substrates (11), (12) stacked together such that the first electrode (E11) and the second electrode (E12) are located opposite to each other, and also a production method of the plate (1).
摘要翻译：生物测定板在反应区域中设置有一对相对的电极，并且通过在反应区域上施加预定的电场，生物测定板可以进行高阶结构调整，迁移，固定等物质。第一衬底（11）设置有检测孔（X），其又至少配备有用于在物质之间提供相互作用位置的反应区域（R），并且还具有第一电极（E＆ 11）面向反应区域（R）排列。第二基板（12）至少设置有可与第一电极（E11A）相关联地在反应区域（R）上施加电场的第二电极（E12S））。本发明提供一种由这两个基板（11），（12）形成的生物分析板（1），它们堆叠在一起，使得第一电极（E 11）和第二电极（E 12）＆lt; /＆gt;）彼此相对，以及板（1）的制造方法。

2. 发明授权

US5726756A Exposure apparatus with thickness and defect detection 失效
标题翻译：具有厚度和缺陷检测的曝光装置
公开(公告)号：US5726756A
公开(公告)日：1998-03-10
申请号：US739541
申请日：1996-10-30
申请人： Yuichi Aki , Minoru Inagaki , Kanji Yokomizo
发明人： Yuichi Aki , Minoru Inagaki , Kanji Yokomizo
IPC分类号： G11B7/00 , G03F7/20 , G11B7/004 , G11B7/125 , G11B7/135 , G11B7/26 , G01B11/06 , G01N21/00
CPC分类号： G03F7/70558 , G03F7/704 , G11B7/261
摘要： An optical disk master exposure apparatus employs first laser light modulated in accordance with signals to be recorded is irradiated on a resist layer to expose the resist layer in patterns corresponding to the signals to be recorded, and second laser light having a wavelength which is not sensed by the resist layer is irradiated on a predetermined surface of a predetermined member. The thickness of the resist layer is measured based on a change in output amount of the second laser light emitted by a light source, the output light amount of which is controlled so as to maintain a constant amount of second reflected light produced by irradiating the second laser light on the predetermined surface of the predetermined member. Also, the predetermined surface of the predetermined member is tested for possible defects existing thereon based on a change in amount of the second reflected light. In this way, a layer thickness test and a defect test can be conducted during an exposure stage, thereby making it possible to integrate the layer thickness testing stage, the defect testing stage, and the exposure stage into a single stage and accordingly realize an exposure apparatus which is capable of simply performing a mastering procedure at a low cost.
摘要翻译：使用根据要记录的信号调制的第一激光的光盘主曝光装置照射在抗蚀剂层上，以与要记录的信号对应的图案曝光抗蚀剂层，以及具有未被感测的波长的第二激光通过抗蚀剂层照射在预定构件的预定表面上。基于由光源发射的第二激光的输出量的变化来测量抗蚀剂层的厚度，其输出光量被控制为保持通过照射第二激光产生的恒定的第二反射光量激光在预定构件的预定表面上。此外，基于第二反射光的量的变化，对预定构件的预定表面进行测试，存在可能的缺陷。以这种方式，可以在曝光阶段进行层厚测试和缺陷测试，从而可以将层厚测试阶段，缺陷测试阶段和曝光阶段整合成单个阶段，从而实现曝光能够以低成本简单地执行母盘制作程序的装置。

3. 发明授权

US06734437B2 System and method for electron beam irradiation 失效
标题翻译：电子束照射系统和方法
公开(公告)号：US06734437B2
公开(公告)日：2004-05-11
申请号：US10374764
申请日：2003-02-25
申请人： Setsuo Norioka , Toshiaki Miyokawa , Naoki Date , Jun Sasaki , Yuichi Aki , Yoshihisa Miura
发明人： Setsuo Norioka , Toshiaki Miyokawa , Naoki Date , Jun Sasaki , Yuichi Aki , Yoshihisa Miura
IPC分类号： G01N2300
CPC分类号： H01J37/305 , H01J37/18 , H01J37/21 , H01J37/3056 , H01J2237/162 , H01J2237/188 , H01J2237/216 , H01J2237/24405
摘要： An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.
摘要翻译：一种用于在母盘上拍摄电子束以进行记录的电子束照射系统。该系统能够以与母盘相对应的方式容易且准确地聚焦光束，从而允许精确的记录。该系统具有将母盘保持在其上的支撑机构部分。支撑机构部分具有放置聚焦台的滑动台。聚焦阶段有刀刃和法拉第杯。刀刃位于主盘的正上方。当进行记录时，首先在聚焦阶段拍摄电子束并进行聚焦。然后，在主盘上拍摄光束，从而进行录制。

4. 发明授权

US07095699B2 Detection apparatus, detection method and electron beam irradiation apparatus 失效
公开(公告)号：US07095699B2
公开(公告)日：2006-08-22
申请号：US10410179
申请日：2003-04-10
申请人： Yoshihisa Miura , Yuichi Aki
发明人： Yoshihisa Miura , Yuichi Aki
IPC分类号： G11B7/00
CPC分类号： G11B7/261 , H01J37/18 , H01J37/301 , H01J37/304 , H01J37/3056 , H01J2237/188 , H01J2237/24465
摘要： A detection apparatus, a detection method and an electron beam irradiation apparatus for detecting deflection electrons in order to precisely focus even if a vacuum seal valve is provided. An electron beam irradiation apparatus including a vacuum seal valve mechanism which is provided in a static pressure floating pad, and opens/closes an electron beam passage with a piston so as to switch between an electron beam irradiation state and a vacuum seal state, and a deflection electron detector which is provided between the vacuum seal valve mechanism and a master disk and detects a deflection electron signal generated from the master disk with electron beam irradiation.

5. 发明授权

US07833000B2 Optical modeling apparatus 有权
标题翻译：光学造型装置
公开(公告)号：US07833000B2
公开(公告)日：2010-11-16
申请号：US11963058
申请日：2007-12-21
申请人： Nobuhiro Kihara , Masanobu Yamamoto , Kimihiro Saito , Yuichi Aki , Takeshi Yamasaki
发明人： Nobuhiro Kihara , Masanobu Yamamoto , Kimihiro Saito , Yuichi Aki , Takeshi Yamasaki
IPC分类号： H05B6/00
CPC分类号： G03F7/2022 , B22F3/008 , B29C64/135 , B33Y30/00 , B33Y50/00 , B33Y50/02 , B33Y70/00
摘要： There is provided an optical modeling apparatus that forms a model of a desired shape by sequentially forming hardened layers by irradiating a light-curable resin with light. The apparatus includes a first light source that emits a light beam for plotting on the resin, a scanning device that scans the light beam from the first light source over the resin, a second light source that emits light that irradiates one fixed region of the resin at a time, and a spatial light modulator that spatially modulates the light from the second light source to blanket-expose a specified region of the resin. The light beam from the scanning device and the light from the spatial light modulator form each hardened layer.
摘要翻译：提供了一种通过用光照射光固化树脂依次形成硬化层来形成所需形状的模型的光学建模装置。该装置包括：第一光源，其发射用于在树脂上绘制的光束;扫描装置，其从树脂上扫描来自第一光源的光束;第二光源，发射照射树脂的一个固定区域的光; 以及空间光调制器，其空间调制来自第二光源的光，以覆盖 - 暴露树脂的指定区域。来自扫描装置的光束和来自空间光调制器的光形成每个硬化层。

6. 发明授权

US06754161B1 Manufacturing method for optical recording medium and manufacturing device thereof 失效
标题翻译：光记录介质的制造方法及其制造装置
公开(公告)号：US06754161B1
公开(公告)日：2004-06-22
申请号：US09626283
申请日：2000-07-25
申请人： Shin Masuhara , Yuichi Aki , Kenji Yamamoto
发明人： Shin Masuhara , Yuichi Aki , Kenji Yamamoto
IPC分类号： G11B700
CPC分类号： G11B7/126 , G11B7/1378 , G11B7/13925 , G11B7/261
摘要： This invention relates to a manufacturing method for an optical information recording medium and a manufacturing device for an optical information recording medium, and is applicable for instance to devices for optical disks, capable of focusing a laser beam from an exposure semiconductor laser at high density onto a base disk. This invention compensates the chromatic aberrations of the objective lens with a chromatic aberration optical system or compensates for fluctuations in the wavelength by regulating the temperature of the semiconductor laser.
摘要翻译：光信息记录介质的制造方法和光信息记录介质的制造装置技术领域本发明涉及光信息记录介质的制造方法和光信息记录介质的制造装置，并且可应用于例如能够将来自曝光半导体激光器的激光束以高密度聚焦的光盘装置基盘。本发明通过色差光学系统补偿物镜的色差，或通过调节半导体激光器的温度来补偿波长的波动。

7. 发明授权

US06737660B2 Electron beam irradiation apparatus and electron beam irradiating method 失效
标题翻译：电子束照射装置和电子束照射法
公开(公告)号：US06737660B2
公开(公告)日：2004-05-18
申请号：US10372419
申请日：2003-02-24
申请人： Yoshihisa Miura , Yuichi Aki , Hiroshi Kawase , Masanobu Yamamoto , Naoki Date , Setsuo Norioka , Mitsuru Koizumi , Gakuo Komatsubara
发明人： Yoshihisa Miura , Yuichi Aki , Hiroshi Kawase , Masanobu Yamamoto , Naoki Date , Setsuo Norioka , Mitsuru Koizumi , Gakuo Komatsubara
IPC分类号： G11B910
CPC分类号： H01J37/18 , G11B7/261 , H01J37/305 , H01J37/3056 , H01J2237/162 , H01J2237/188
摘要： An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.
摘要翻译：部分真空法中的电子束照射装置由连接到包含电子束柱15的真空室14的静压浮动垫18构成，并且在将静压浮动垫18附着到被检体1的状态下照射不经接触的电子束，以及通过静压浮动垫18的电子束路径19照射待被检体1的电子束，由此即使在真空室和电子束柱中也可以将真空室和电子束柱保持在所需的真空度条件是静压浮动垫18与待照射的被检体1分离。在静压浮动垫18内设置包括打开和关闭电子束通道19的活塞的真空密封阀30.当静压浮动垫18与被检体1分离时，真空密封阀30构成为激活以闭合电子束路径19，以防止空气流入真空室14.在该结构中，真空密封阀30形成为圆形截面并具有窄尖端的锥形形状，以便实现高真空密封而没有间隙，从而可以确保真空室和电子束柱中的真空度。

8. 发明申请

US20110157446A1 IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME, AND SENSOR DEVICE 审中-公开
标题翻译：图像传感器及其制造方法和传感器装置
公开(公告)号：US20110157446A1
公开(公告)日：2011-06-30
申请号：US12970065
申请日：2010-12-16
申请人： Hiroto Kasai , Tatsuya Minakawa , Yuichi Aki , Makoto Hashimoto , Ayumu Taguchi , Takeshi Yamasaki , Isao Ichimura , Keiichi Maeda
发明人： Hiroto Kasai , Tatsuya Minakawa , Yuichi Aki , Makoto Hashimoto , Ayumu Taguchi , Takeshi Yamasaki , Isao Ichimura , Keiichi Maeda
IPC分类号： H04N5/335 , H01L31/18
CPC分类号： H01L27/14632 , G01N21/0303 , G01N21/6454 , G01N2021/6482 , H01L27/14629 , H01L27/14634 , H01L27/14687 , H01L2224/48091 , H01L2924/00014
摘要： An image sensor is provided. The image sensor includes a photoelectric conversion portion including a light receiving element; and a well region defined by a wall structure that is formed integrally on the photoelectric conversion portion, wherein the well region is positioned to correspond to the light receiving element of the photoelectric conversion portion. An image sensor device and methods of manufacture are also provided.
摘要翻译：提供图像传感器。图像传感器包括：光电转换部分，包括光接收元件; 以及由光电转换部一体地形成的壁结构限定的阱区域，其中，所述阱区域被定位成对应于所述光电转换部分的光接收元件。还提供了一种图像传感器装置和制造方法。

9. 发明授权

US06573511B2 Electron beam irradiation system and electron beam irradiation method 失效
公开(公告)号：US06573511B2
公开(公告)日：2003-06-03
申请号：US10083383
申请日：2002-02-27
申请人： Jun Sasaki , Yuichi Aki , Yoshihisa Miura
发明人： Jun Sasaki , Yuichi Aki , Yoshihisa Miura
IPC分类号： G01K510
CPC分类号： G21K5/10 , G11B7/261 , H01J37/3056 , H01J2237/188 , H01J2237/202
摘要： A focusing stage is provided on a slide table of a support mechanism portion on which a master is supported, at a position adjacent to the master. At the time of recording, first, the focusing stage is irradiated with an electron beam to thereby focus the electron beam, and thereafter recording is conducted by irradiating the master with the electron beam.

10. 发明授权

US06438074B1 Optical recording medium manufacturing master recording apparatus 失效
标题翻译：光记录介质制造主记录装置
公开(公告)号：US06438074B1
公开(公告)日：2002-08-20
申请号：US09375658
申请日：1999-08-17
申请人： Yuichi Aki , Takao Kondo , Masanobu Yamamoto
发明人： Yuichi Aki , Takao Kondo , Masanobu Yamamoto
IPC分类号： G11B1100
CPC分类号： G11B7/261
摘要： A master recording apparatus includes a revolving base (31) for revolving a substrate (1) coated with resist thereon, an irradiating mechanism (32), an elevator mechanism (33) for making the irradiating mechanism (32) capable of moving in a vertical direction and in a surface direction which is perpendicular to the vertical direction relative to the revolving base (31) and a height position displacement mechanism (35) interposing between the irradiating mechanism (32) and the elevator mechanism (33), and in which the irradiating mechanism (32) is connected with the elevator mechanism (33) through the height position displacement mechanism (35) and the irradiating mechanism (32) has such a structure in which at least a converging lens system (36) and a displacement driving mechanism (37) for adjusting a focus are supported by a gas static pressure pad housing (38), in the gas static pressure pad housing (38) a gas feeding pad (39) is disposed facing a bottom surface opposing the substrate and gas is made to be fed between the irradiating mechanism (32) and the said substrate (1) through the gas feeding pad (39), whereby the contact between the substrate and the irradiating mechanism is avoided at a time of carrying out a recording of a predetermined pattern by irradiating a beam.
摘要翻译：主记录装置包括用于旋转涂覆有抗蚀剂的基板（1）的旋转基座（31），照射机构（32），用于使照射机构（32）能够垂直移动的升降机构（33）方向和相对于旋转基座31垂直于垂直方向的表面方向和位于照射机构32和升降机构33之间的高度位置偏移机构35，其中，照射机构（32）通过高度位置移动机构（35）与升降机构（33）连接，照射机构（32）具有至少会聚透镜系统（36）和位移驱动机构用于调节焦点的调色剂（37）由气体静压垫壳体（38）支撑，在气体静压垫壳体（38）中，气体供给垫（39）被设置为面向与基体 te和气体通过气体供给垫（39）被供给到照射机构（32）和所述基板（1）之间，从而在执行基板和照射机构时避免基板和照射机构之间的接触通过照射光束来记录预定图案。

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