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    • 1. 发明授权
    • Microelectronic diamond capacitive transducer
    • 微电子金刚石电容式换能器
    • US5453628A
    • 1995-09-26
    • US322064
    • 1994-10-12
    • Michelle L. HartsellScott R. SahaidaBrian R. StonerGlenn J. Tessmer
    • Michelle L. HartsellScott R. SahaidaBrian R. StonerGlenn J. Tessmer
    • G01L9/00H01L29/84H01L29/96
    • G01L9/0073
    • A capacitive transducer includes a first electrically conductive layer, and a diamond diaphragm mounted opposite the first electrically conductive Layer so as to be moveable relative to the first electrically conductive layer. The first electrically conductive layer defines a first plate for the transducer, while the diaphragm defines the second plate for the transducer. In one embodiment of the transducer, the diamond layer is degeneratively doped providing the second plate. The microelectronic capacitive transducer preferably also includes an insulating layer on a face of the diamond layer adjacent the electrically conductive layer defining an overpressure stop for the transducer. The transducer includes absolute or differential pressure sensing embodiments. The microelectronic capacitive transducer may also be configured as an actuator. The diamond layer may be highly oriented diamond including semiconductor devices formed therein to provide signal conditioning. A fabrication method is also disclosed.
    • 电容换能器包括第一导电层和与第一导电层相对安装的金刚石膜片,以便相对于第一导电层可移动。 第一导电层限定用于换能器的第一板,而隔膜限定用于换能器的第二板。 在换能器的一个实施例中,金刚石层退化掺杂,提供第二板。 微电子电容换能器优选地还包括在邻近导电层的金刚石层的面上的绝缘层,其限定用于换能器的超压停止。 换能器包括绝对或差压感测实施例。 微电子电容换能器也可以被配置为致动器。 金刚石层可以是包括其中形成的半导体器件的高取向金刚石以提供信号调节。 还公开了一种制造方法。
    • 8. 发明授权
    • Microelectronic structure having an array of diamond structures on a
nondiamond substrate and associated fabrication methods
    • 微电子结构在非金刚石衬底上具有金刚石结构阵列,并且具有相关的制造方法
    • US5420443A
    • 1995-05-30
    • US35643
    • 1993-03-23
    • David L. DreifusBrian R. StonerJeffrey T. Glass
    • David L. DreifusBrian R. StonerJeffrey T. Glass
    • C30B29/04C23C16/02C23C16/26C23C16/27C23C16/458C23C16/50C23C16/511C30B25/10H01L21/205H01L21/338
    • C23C16/274C23C16/02C23C16/4581C30B25/105
    • A microelectronic structure including a plurality of spaced apart diamond structures on which a plurality of semiconductor devices may be formed. The semiconductor devices include a semiconducting diamond layer on each of the diamond structures. The diamond structures are preferably oriented relative to a single crystal nondiamond substrate so that the diamond structures have a (100)-oriented outer face for forming the semiconductor devices thereon. The microelectronic structure may be diced into discrete devices, or the devices interconnected, such as to form a higher powered device. One embodiment of the microelectronic structure includes the plurality of diamond structures, wherein each diamond structure is formed of a highly oriented textured diamond layer approaching single crystal quality, yet capable of fabrication on a single crystal nondiamond substrate. A method for fabricating the nondiamond highly oriented textured diamond layer includes carburizing a face of the nondiamond substrate, nucleating the carburized face by electrical bias enhanced nucleation, and selectively growing diamond favoring growth of the (100)-oriented grains.
    • 一种微电子结构,包括多个间隔开的金刚石结构,其上可以形成多个半导体器件。 半导体器件包括在每个金刚石结构上的半导体金刚石层。 金刚石结构优选相对于单晶非金刚石基底定向,使得金刚石结构具有用于在其上形成半导体器件的(100)取向的外表面。 微电子结构可以被切割成分立的设备,或者互连的设备,以形成更高功率的设备。 微电子结构的一个实施例包括多个金刚石结构,其中每个金刚石结构由接近单晶质量的高取向纹理金刚石层形成,但能够在单晶非金刚石基底上制造。 用于制造非金刚石高取向纹理金刚石层的方法包括使非金刚石基底的表面渗碳,通过电偏压增强的成核使渗碳表面成核,以及选择性地生长有利于(100)取向晶粒生长的金刚石。
    • 9. 发明授权
    • Nucleation enhancement for chemical vapor deposition of diamond
    • 金刚石化学气相沉积的成核增强
    • US5397428A
    • 1995-03-14
    • US937481
    • 1992-08-28
    • Brian R. StonerJeffrey T. GlassWilliam M. HookeBradley E. Williams
    • Brian R. StonerJeffrey T. GlassWilliam M. HookeBradley E. Williams
    • C30B29/04C23C16/02C23C16/26C23C16/27C23C16/458C23C16/50C23C16/511C30B25/10C30B29/00
    • C23C16/274C23C16/02C23C16/4581C30B25/105
    • A method and apparatus for enhancing the nucleation of diamond by pretreating a substrate by electrically biasing a diamond film adjacent the substrate while exposing the substrate and the thus biased diamond film to a carbon-containing plasma. The bias pretreatment may be maintained for a time period in the range of about 1 hour to 2 hours to achieve a high diamond nucleation density. Alternatively, the biasing may be continued until diamond film formation is indicated by a change in reflectivity of the surface of the substrate. The biasing pretreating may be used to nucleate diamond heteroepitaxially on a substrate having a surface film formed of a material having a relatively close lattice match to diamond, such as .beta.-silicon carbide. The apparatus includes a laser reflection interferometer to monitor the surface of the substrate. The laser reflection interferometer is used to monitor growth of the diamond film and cooperates with a controller to control the processing parameters during the diamond growing process.
    • 一种用于通过在将衬底和由此偏置的金刚石膜暴露于含碳等离子体的同时电气偏置邻近衬底的金刚石膜来预处理衬底来增强金刚石成核的方法和装置。 偏置预处理可以在约1小时至2小时的范围内保持一段时间,以获得高的金刚石成核密度。 或者,可以继续施加偏压,直到金刚石膜形成由衬底的表面的反射率的变化来表示。 偏置预处理可用于使具有异质外延的金刚石成核,该基体具有由具有与金刚石相似的晶格匹配的材料形成的表面膜,例如β-碳化硅。 该装置包括用于监测基板表面的激光反射干涉仪。 激光反射干涉仪用于监测金刚石膜的生长,并与控制器配合以控制金刚石生长过程中的加工参数。