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    • 2. 发明授权
    • Wide bandgap semiconductor device including lightly doped active region
    • 宽带隙半导体器件包括轻掺杂的有源区
    • US5536953A
    • 1996-07-16
    • US208018
    • 1994-03-08
    • David L. DreifusBradley A. FoxJesko A. von Windheim
    • David L. DreifusBradley A. FoxJesko A. von Windheim
    • H01L29/10H01L29/167H01L29/786H01L31/103H01L33/02H01L31/0312H01L29/82
    • H01L33/025H01L29/1029H01L29/1058H01L29/167H01L29/78684H01L31/103
    • A semiconductor device for providing stable operation over a relatively wide temperature range includes a wide bandgap semiconductor active region having an intentional dopant of a first conductivity type and an unintentional impurity of a second conductivity type which together produce a free carrier concentration at room temperature. The concentration of the intentional dopant in the active region is preferably less than 1.times.10.sup.16 cm.sup.-3 and the concentration of the unintentional impurity is less than 0.1 times the intentional dopant concentration so that the intentional dopant concentration will be less than 1000 times the free carrier concentration at room temperature. The intentional dopant concentration supplies substantially all the majority free carriers in the active region. The wide bandgap semiconductor active region is preferably diamond, IV-IV carbides, III-V nitrides and phosphides and II-VI selenides, tellurides, oxides and sulfides. By lightly doping the active region to a level below 1.times.10.sup.16 cm.sup.-3, relatively uniform device characteristics can be achieved over a wide temperature range extending from room temperature to 1000 K and above.
    • 用于在相当宽的温度范围内提供稳定操作的半导体器件包括宽带隙半导体有源区,其具有第一导电类型的有意掺杂物和第二导电类型的无意杂质,其共同在室温下产生游离载流子浓度。 有源区域中的有意掺杂剂的浓度优选小于1×10 16 cm -3,并且非故意杂质的浓度小于有意掺杂剂浓度的0.1倍,使得有意掺杂剂浓度将小于自由载流子浓度的1000倍 在室温下。 有意掺杂剂浓度基本上供应活性区域中所有主要的自由载体。 宽带隙半导体活性区域优选为金刚石,IV-IV碳化物,III-V族氮化物和磷化物以及II-VI族硒化物,碲化物,氧化物和硫化物。 通过将有源区轻轻掺杂到1×1016cm-3以下的水平,可以在从室温延伸到1000K以上的宽的温度范围内实现相对均匀的器件特性。