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1. 发明授权

US07442336B2 Capillary imprinting technique 有权
标题翻译：毛细管压印技术
公开(公告)号：US07442336B2
公开(公告)日：2008-10-28
申请号：US10645306
申请日：2003-08-21
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： B29C35/08 , B29C41/12 , B81C1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译：本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积，模具和基材之一。此后，使适形材料固化。具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。

2. 发明授权

US06926929B2 System and method for dispensing liquids 失效
标题翻译：用于分配液体的系统和方法
公开(公告)号：US06926929B2
公开(公告)日：2005-08-09
申请号：US10191749
申请日：2002-07-09
申请人： Michael P. C. Watts , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B05D1/26 , B05D1/36 , B05D5/00 , G03F7/00 , G06F17/00
CPC分类号： B05D7/24 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method and a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.
摘要翻译：本发明提供了一种方法和系统，该方法和系统将包含在盒中的液体分配到采用在与存储器进行数据通信的处理器的控制下的分配系统。

3. 发明授权

US08318066B2 Step and repeat imprint lithography process 有权
标题翻译：步骤和重复压印光刻工艺
公开(公告)号：US08318066B2
公开(公告)日：2012-11-27
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
IPC分类号： B29C41/12 , B29C71/00 , B81C1/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译：本发明涉及通过压印光刻对衬底图案化的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，压印工艺被设计成仅印刷基板的一部分。通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。

4. 发明授权

US07943081B2 Step and repeat imprint lithography processes 有权
标题翻译：步骤和重复刻印光刻工艺
公开(公告)号：US07943081B2
公开(公告)日：2011-05-17
申请号：US12762658
申请日：2010-04-19
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
IPC分类号： B29C33/46 , B29C35/08 , B29C41/12 , B29C41/42 , B29C41/52 , B81C1/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
摘要翻译：描述了在衬底区域上形成连续层的方法。通常，压印光刻模板可接触位于基底上的液体。液体可以固化形成掩模层，并且压印光刻模板与掩模层分离。在分离之前，加压气体和/或真空可以施加在模板和基底之间。此外，在分离期间，加压气体和/或真空可以施加在模板和基底之间。

5. 发明授权

US07224443B2 Imprint lithography substrate processing tool for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的压印光刻基板处理工具
公开(公告)号：US07224443B2
公开(公告)日：2007-05-29
申请号：US11389731
申请日：2006-03-27
申请人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
发明人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。夹持系统包括具有第一和第二相对侧的卡盘体。侧面在其间延伸。第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。第一支撑区域使第二支撑区域和第一和第二凹槽成像。第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。第二面和侧面限定外表面。主体包括使第一和第二凹槽与外表面之一流体连通的通道。

6. 发明授权

US07019835B2 Method and system to measure characteristics of a film disposed on a substrate 有权
标题翻译：测量设置在基板上的膜的特性的方法和系统
公开(公告)号：US07019835B2
公开(公告)日：2006-03-28
申请号：US10782187
申请日：2004-02-19
申请人： Ian M. McMackin , Phillip D. Schumaker , Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Ian M. McMackin , Phillip D. Schumaker , Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： G01B11/00 , G03F1/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B81C1/0046 , B81C99/004 , B82Y10/00 , B82Y40/00 , G01N21/8422 , G03F7/70625 , G03F7/7065
摘要： The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
摘要翻译：本发明旨在提供一种测量设置在基底上的膜的特性的方法和系统。该方法包括识别胶片上的多个处理区域; 测量所述多个处理区域的子集的特征，定义测量的特征; 确定测量特征之一的变化; 并且基于所测量的特征之一与与所述子集的剩余处理区域相关联的测量特征的比较来将所述变化的原因相关联。系统执行上述方法。

7. 发明授权

US07252715B2 System for dispensing liquids 有权
标题翻译：液体分配系统
公开(公告)号：US07252715B2
公开(公告)日：2007-08-07
申请号：US10868683
申请日：2004-06-15
申请人： Michael P. C. Watts , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B05C11/10
CPC分类号： B05D7/24 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.
摘要翻译：本发明提供一种系统，其将包含在盒中的液体分配到采用在与存储器进行数据通信的处理器的控制下的分配系统的基板上。

8. 发明授权

US09223202B2 Method of automatic fluid dispensing for imprint lithography processes 有权
标题翻译：压印光刻工艺的自动流体分配方法
公开(公告)号：US09223202B2
公开(公告)日：2015-12-29
申请号：US11774710
申请日：2007-07-09
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Carlton Grant Willson , Mattherw E. Colburn , Todd C. Bailey , John G. Ekerdt
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00 , G03F7/16
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16 , G03F7/164 , H01L2224/29012 , H01L2224/3003 , H01L2224/3016 , H01L2924/01067 , H01L2924/1461 , H01L2924/00
摘要： Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
摘要翻译：本文公开了一种用于在板状材料或基板的表面上分配流体的自动流体分配方法和系统，其包括用于压印光刻工艺的半导体晶片。分配方法使用流体分配器和可在流体分配器尖端基底之间产生相对侧向运动的基底台。本文还描述了使用基本上未图案化的平面模板在衬底上创建平面表面的方法和装置。

9. 发明授权

US08865046B2 Imprinting of partial fields at the edge of the wafer 有权
标题翻译：在晶片边缘印刷局部场
公开(公告)号：US08865046B2
公开(公告)日：2014-10-21
申请号：US13098959
申请日：2011-05-02
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B29C43/58 , B29C59/00 , B82Y40/00 , G03F7/00 , B29C43/00 , B82Y10/00 , B29C43/02
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
摘要翻译：具有全场和部分场的衬底的边缘场图案化可以包括使用具有多个台面的模板进行图案化，每个台面与每个台面对应于衬底上的场。可聚合材料可以仅沉积在模板和基底的整个场之间。非反应性材料可以沉积在基板的模板和部分场之间。

10. 发明申请

US20110260361A1 SAFE DEPARATION FOR NANO IMPRINTING 有权
标题翻译： NANO IMPRINTING的安全拨款
公开(公告)号：US20110260361A1
公开(公告)日：2011-10-27
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02 , B82Y30/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

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