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1. 发明授权

US07224443B2 Imprint lithography substrate processing tool for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的压印光刻基板处理工具
公开(公告)号：US07224443B2
公开(公告)日：2007-05-29
申请号：US11389731
申请日：2006-03-27
申请人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
发明人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。夹持系统包括具有第一和第二相对侧的卡盘体。侧面在其间延伸。第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。第一支撑区域使第二支撑区域和第一和第二凹槽成像。第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。第二面和侧面限定外表面。主体包括使第一和第二凹槽与外表面之一流体连通的通道。

2. 发明授权

US06805054B1 Method, system and holder for transferring templates during imprint lithography processes 有权
标题翻译：在压印光刻过程中传输模板的方法，系统和夹持器
公开(公告)号：US06805054B1
公开(公告)日：2004-10-19
申请号：US10438224
申请日：2003-05-14
申请人： Mario J. Meissl , Byung J. Choi , Daniel Babbs , Hillman L. Bailey
发明人： Mario J. Meissl , Byung J. Choi , Daniel Babbs , Hillman L. Bailey
IPC分类号： B41L3900
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Disclosed are a method, system and holder for transferring templates during imprint lithography processes. To that end, a method for handling a template, having a patterned mold thereon, in an imprint lithography system having a motion stage with a chucking device coupled thereto, includes providing the template into a template transfer holder. The template transfer holder includes a side coupled to the motion stage and support members extending from the side. The template is disposed within the template transfer holder so as to have the patterned mold facing the side and spaced-apart therefrom. Relative movement is created between the motion stage and an imprint head to place the template transfer holder and the imprint head in superimposition. The template is removed from the template transfer holder, and the template is suspended above the wafer chuck by the imprint head. In another embodiment, a system and a template holder are described that facilitates the method.
摘要翻译：公开了一种用于在压印光刻工艺期间传送模板的方法，系统和保持器。为此，在具有与其耦合的夹紧装置的运动平台的压印光刻系统中处理具有图案化模具的模板的方法包括将模板提供到模板转印支架中。模板转印支架包括联接到运动台的侧面和从侧面延伸的支撑构件。模板设置在模板转印保持器内，以使图案化模具面向侧面并与之分开。在运动台和压印头之间产生相对运动，以使模板转印支架和压印头叠加。模板从模板转移支架上移除，模板通过压印头悬挂在晶片卡盘的上方。在另一个实施例中，描述了便于该方法的系统和模板保持器。

3. 发明授权

US06478532B1 Wafer orienting and reading mechanism 有权
标题翻译：晶圆定向阅读机制
公开(公告)号：US06478532B1
公开(公告)日：2002-11-12
申请号：US09452059
申请日：1999-11-30
申请人： Matthew W. Coady , Hillman L. Bailey
发明人： Matthew W. Coady , Hillman L. Bailey
IPC分类号： B65G4907
CPC分类号： H01L21/681 , Y10S414/136 , Y10S414/141
摘要： An aligner is disclosed including a buffer mechanism having a buffer paddle on which wafers may be buffered to increase the throughput of the aligner. The aligner is provided in general to identify a position of a notch, position and read the associated indicial mark and determine the radial runout of the wafer. The aligner includes a rotating support platform in the form of a chuck on which the wafers are received from the robot. A motor rotates the chuck so that the radial runout and notch of the wafer may be identified. According to the present invention, the aligner further includes a buffer mechanism having a buffer paddle and a drive mechanism for vertically translating the buffer paddle. The aligner further includes an analog sensor for determining the notch location, the radial runout and/or the position of the indicial mark on a wafer being rotated on the chuck.
摘要翻译：公开了一种对准器，其包括具有缓冲桨的缓冲机构，在该缓冲器上可以缓冲晶片以增加对准器的生产量。通常提供对准器以识别凹口的位置，位置并读取相关联的指示标记并确定晶片的径向跳动。对准器包括卡盘形式的旋转支撑平台，从机器人接收晶片。电动机旋转卡盘，使得可以识别晶片的径向跳动和凹口。根据本发明，对准器还包括具有缓冲桨的缓冲机构和用于垂直平移缓冲桨的驱动机构。对准器还包括用于确定在卡盘上旋转的晶片上的凹痕位置，径向跳动和/或指示标记的位置的模拟传感器。

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