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1. 发明授权

US6142629A Spectral imaging using illumination of preselected spectral content 失效
标题翻译：使用预选光谱含量照明的光谱成像
公开(公告)号：US6142629A
公开(公告)日：2000-11-07
申请号：US143964
申请日：1998-08-30
申请人： Michael E. Adel , Dario Cabib , David Wine
发明人： Michael E. Adel , Dario Cabib , David Wine
IPC分类号： G02B6/00 , A61B1/06 , A61B3/12 , A61B3/14 , G01J3/10 , G01J3/12 , G01J3/28 , G02B6/04
CPC分类号： A61B3/10 , G01J3/10 , G01J3/2823 , G01J2003/1282
摘要： A device and method for spectral imaging of an object. A plurality of sets of narrow-band light sources such as LEDs are provided. Each set emits illumination radiation in a different narrow spectral band. Each set is activated sequentially to illuminate the object. Light reflected from the object or transmitted by the object is focused on a detector array to image the object. Narrower illumination bands are provided by dispersing the emitted light using a dispersive optical element such as a diffraction grating. Alternatively; selected sets or subsets are activated simultaneously with duty cycles that emulate a preselected spectral distribution. For imaging ocular fundus tissue, the illumination light is shaped into an annular beam by an appropriately shaped waveguide.
摘要翻译：用于对象的光谱成像的装置和方法。提供多组窄带光源如LED。每组发射不同窄光谱带的照射辐射。每个组被依次激活以照亮对象。从物体反射或由物体传输的光聚焦在检测器阵列上以对物体进行成像。通过使用诸如衍射光栅的分散光学元件分散发射的光来提供较窄的照明带。或者; 所选择的集合或子集与模拟预选频谱分布的占空比同时激活。为了对眼底组织进行成像，照明光通过适当形状的波导成形为环形光束。

2. 发明授权

US6082892A Temperature measuring method and apparatus 失效
标题翻译：温度测量方法和仪器
公开(公告)号：US6082892A
公开(公告)日：2000-07-04
申请号：US947502
申请日：1997-10-10
申请人： Michael E. Adel , Dario Cabib , Yaron Ish-Shalom , Shmuel Mangan
发明人： Michael E. Adel , Dario Cabib , Yaron Ish-Shalom , Shmuel Mangan
IPC分类号： G01J5/10 , G01J5/60 , G01J5/62 , G01K11/12 , G01K11/00 , G01K5/58 , G01K5/62
CPC分类号： G01K11/12 , G01J5/10 , G01J5/601 , G01J5/62
摘要： A method of remotely measuring the temperature of a body, such as a semiconductor wafer, whose transparency varies with both wavelength and temperature and is characterized by an optical absorption edge. The body is illuminated at wavelengths on either side of the optical absorption edge. Based on the measured reflectivity at wavelengths shorter than the optical absorption edge, the direct reflectivity at wavelengths longer than the optical absorption edge is predicted and used to estimate the component of total reflectivity, at wavelengths longer than the optical absorption edge, which corresponds to propagation through the body and reflection back through the body. Light reflected from the body, measured in an "active" channel, is distinguished from light emitted passively by the body and measured in a "passive" channel. In the case of an opaque body, this allows the estimation of the emissivity of the body, and a temperature estimate based on Planck's law.
摘要翻译：远程测量其透明度随波长和温度两者而变化的半导体晶片等体的温度的方法，其特征在于光吸收边缘。身体在光吸收边缘两侧的波长处照亮。基于在比光吸收边缘短的波长处的测量的反射率，预测在比光吸收边缘长的波长处的直接反射率，并且用于估计在比对应于传播的光吸收边长的波长处的总反射率的分量通过身体反射穿过身体。在“活动”通道中测量的从身体反射的光与身体被动发射的光不同，并在“被动”通道中测量。在不透明的身体的情况下，这允许估计身体的发射率，以及基于普朗克定律的温度估计。

3. 发明授权

US5322361A Method and apparatus for measuring temperature 失效
标题翻译：测量温度的方法和装置
公开(公告)号：US5322361A
公开(公告)日：1994-06-21
申请号：US10038
申请日：1993-01-28
申请人： Dario Cabib , Michael E. Adel
发明人： Dario Cabib , Michael E. Adel
IPC分类号： G01K5/52 , G01K5/50 , G01K11/00 , G01K11/18
CPC分类号： G01K5/52
摘要： A method and apparatus for measuring temperature by subjecting, to the temperature to be measured, a light-transmissive body of a material whose dimensions change in response to temperature, directing first rays of light from a light source through a first path including a predetermined distance of travel through the light-transmissive body, simultaneously directing second rays of light from the light source through a second path, parallel to the first path and of a linear length equal to that of the first path, but not including the predetermined distance of travel through the light transmissive body, and measuring the change in phases between the first and second light rays at the ends of the first and second paths, to thereby provide a measurement of the temperature to which the light-transmissive body was subjected.
摘要翻译：一种测量温度的方法和装置，所述方法和装置通过使待测温度的材料的透光体的尺寸随温度变化而变化，将来自光源的第一光线引导通过包括预定距离的第一路径通过透光体行进，同时引导来自光源的第二光线通过平行于第一路径的第二路径并且具有等于第一路径的线性长度的线性长度，但不包括预定行程距离并且测量第一和第二路径的端部处的第一和第二光线之间的相位变化，从而提供对透光体的温度的测量。

4. 发明授权

US5823681A Multipoint temperature monitoring apparatus for semiconductor wafers during processing 失效
标题翻译：加工过程中半导体晶圆的多点温度监控装置
公开(公告)号：US5823681A
公开(公告)日：1998-10-20
申请号：US604997
申请日：1996-02-29
申请人： Dario Cabib , Robert A. Buckwald , Michael E. Adel
发明人： Dario Cabib , Robert A. Buckwald , Michael E. Adel
IPC分类号： G01J5/00 , G01J5/60 , G01J5/08 , G01J5/02 , G01J5/06 , G01J5/28 , G01J5/62
CPC分类号： G01J5/0003 , G01J5/60
摘要： An emissivity compensating non-contact system for measuring the temperature of a semiconductor wafer. The system includes a semiconductor wafer emissivity compensation station for measuring the reflectivity of the wafer at discrete wavelengths to yield wafer emissivity in specific wavelength bands. The system further includes a measurement probe which is optically coupled to a semiconductor process chamber. The probe senses wafer self emission using one or more optical detectors and a light modulator. A background temperature determining mechanism independently senses the temperature of a source of background radiation. Finally, a mechanism calculates the temperature of the semiconductor wafer based on the reflectivity, self-emission and background temperature.
摘要翻译： PCT No.PCT / US95 / 08521 Sec。 371日期1996年2月29日 102（e）日期1996年2月29日PCT提交1995年7月12日PCT公布。公开号WO96 / 04534 日期1996年2月15日用于测量半导体晶片的温度的发射率补偿非接触式系统。该系统包括半导体晶片发射率补偿站，用于以离散波长测量晶片的反射率，以产生特定波长带中的晶片辐射率。该系统还包括光学耦合到半导体处理室的测量探针。探头使用一个或多个光学检测器和光调制器感测晶片自发射。背景温度测定机构独立地感测背景辐射源的温度。最后，机构基于反射率，自发射和背景温度来计算半导体晶片的温度。

5. 发明授权

US5856871A Film thickness mapping using interferometric spectral imaging 失效
标题翻译：使用干涉光谱成像的膜厚度测绘
公开(公告)号：US5856871A
公开(公告)日：1999-01-05
申请号：US776063
申请日：1997-01-21
申请人： Dario Cabib , Robert A. Buckwald , Michael E. Adel
发明人： Dario Cabib , Robert A. Buckwald , Michael E. Adel
IPC分类号： C12Q1/68 , G01B11/06 , G01J3/02 , G01J3/26 , G01J3/28 , G01J3/453 , G01N21/64 , G01N33/50 , G01N33/569 , G06K9/00 , G06K9/76 , G01B9/02
CPC分类号： G06K9/76 , C12Q1/6841 , C12Q1/6883 , G01B11/0675 , G01J3/2823 , G01J3/453 , G01N33/5005 , G01N33/56966 , G06K9/00127 , G01J2003/2866 , G01J3/02 , G01J3/26
摘要： A method of determining the thickness map of a film (14) overlying a substrate (14). This method includes illuminating (10) the film simultaneously from different angles and analyzing spectral intensity of the radiation reflected by each point on the film (14). The analysis is effected by collecting reflected radiation from the film (14), passing the radiation through an interferometer (16) which outputs modulated radiation corresponding to a predetermined set of linear combinations of the spectral intensity of the radiation emitted from each pixel, simultaneously and separately scanning optical path differences generated in the interferometer (16) for each pixel, focusing the radiation outputted from the interferometer (16) on a detector array, and processing the output of the detector array to determine the spectral intensity of each pixel thereof to obtain a spectral intensity distribution. Finally, the method includes further processing the spectral intensity distribution to determine the spatial distribution of the thickness of the film (16).
摘要翻译： PCT No.PCT / US95 / 08708 Sec。 371日期1997年1月21日 102（e）日期1997年1月21日PCT提交1995年7月12日PCT公布。公开号WO96 / 03615 日期1996年2月8日一种确定覆盖衬底（14）的膜（14）的厚度图的方法。该方法包括从不同角度同时照射（10）胶片并分析由胶片（14）上的每个点反射的辐射的光谱强度。分析是通过收集来自胶片（14）的反射辐射，使辐射通过干涉仪（16），干涉仪（16）同时输出对应于从每个像素发射的辐射的光谱强度的预定的一组线性组合的调制辐射，分别扫描针对每个像素的干涉仪（16）中产生的光程差，将从干涉仪（16）输出的辐射聚焦在检测器阵列上，并且处理检测器阵列的输出以确定其每个像素获得的光谱强度光谱强度分布。最后，该方法包括进一步处理光谱强度分布以确定薄膜（16）的厚度的空间分布。

6. 发明申请

US20100005442A1 Apparatus and Methods for Determining Overlay and Uses of Same 有权
标题翻译：用于确定叠加和使用的装置和方法
公开(公告)号：US20100005442A1
公开(公告)日：2010-01-07
申请号：US12560229
申请日：2009-09-15
申请人： Mark Ghinovker , Michael E. Adel , Jorge Poplawski , Joel L. Seligson
发明人： Mark Ghinovker , Michael E. Adel , Jorge Poplawski , Joel L. Seligson
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F7/70633 , G06F2217/12 , Y02P90/265
摘要： Disclosed are techniques and apparatus are provided for determining overlay error or pattern placement error (PPE) across the field of a scanner which is used to pattern a sample, such as a semiconductor wafer or device. This determination is performed in-line on the product wafer or device. That is, the targets on which overlay or PPE measurements are performed are provided on the product wafer or device itself. The targets are either distributed across the field by placing the targets within the active area or by distributing the targets along the streets (the strips or scribe areas) which are between the dies of a field. The resulting overlay or PPE that is obtained from targets distributed across the field may then be used in a number of ways to improve the fabrication process for producing the sample. For instance, the resulting overlay or PPE may be used to more accurately predict device performance and yield, more accurately correct a deviating photolithography scanning tool, or determine wafer lot disposition.
摘要翻译：公开了提供用于确定扫描仪领域的重叠误差或图案布置误差（PPE）的技术和装置，其用于对样品（例如半导体晶片或器件）进行图案化。该确定在产品晶片或器件上在线执行。也就是说，在产品晶片或器件本身上提供执行覆盖或PPE测量的目标。目标是通过将目标放置在活动区域内或通过在场的模具之间的街道（条带或划线区域）上分布目标来分布在场上。然后可以以多种方式使用从分布在场上的目标获得的所得覆盖物或PPE，以改进用于生产样品的制造过程。例如，所得覆盖层或PPE可用于更准确地预测设备性能和产量，更精确地校正偏离的光刻扫描工具，或确定晶片批次布置。

7. 发明授权

US07564557B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07564557B2
公开(公告)日：2009-07-21
申请号：US11926603
申请日：2007-10-29
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Anatoly Fabrikant
IPC分类号： G01B11/00 , G01B11/14 , G01B11/04 , G01B11/08 , G01N21/00 , G01N23/00 , G01N21/86 , G21K7/00 , G01V8/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.
摘要翻译：公开了一种组合的散射测量标记，其包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

8. 发明授权

US08390808B1 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场使能即时OVL测量方法
公开(公告)号：US08390808B1
公开(公告)日：2013-03-05
申请号：US13548656
申请日：2012-07-13
申请人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

9. 发明授权

US07310789B2 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US07310789B2
公开(公告)日：2007-12-18
申请号：US11510147
申请日：2006-08-24
申请人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

10. 发明授权

US07301634B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07301634B2
公开(公告)日：2007-11-27
申请号：US10785821
申请日：2004-02-23
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Christopher F. Bevis , John Fielden , Noah Bareket , Anatoly Fabrikant , Mark Ghinovker , Piotr Zalicki , Dan Wack
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Christopher F. Bevis , John Fielden , Noah Bareket , Anatoly Fabrikant , Mark Ghinovker , Piotr Zalicki , Dan Wack
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.
摘要翻译：公开了一种确定多层样本的两层之间的覆盖误差的方法。对于每个具有由第一层形成的第一结构和由样本的第二层形成的第二结构的多个周期性目标，使用干涉仪来调制宽带源的基本上多个波长，然后获取一个或更多图像的周期性目标。在第一和第二结构之间有预定义的偏移。然后通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性目标的一个或多个获取的图像来确定第一和第二结构之间的重叠误差。

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