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    • 1. 发明授权
    • Barrier layer for photovoltaic devices
    • 光伏器件阻挡层
    • US4532372A
    • 1985-07-30
    • US564862
    • 1983-12-23
    • Prem NathMasatsugu Izu
    • Prem NathMasatsugu Izu
    • H01L31/0224H01L31/076H01L31/20H01L31/04
    • H01L31/076H01L31/022425H01L31/208Y02E10/548Y02P70/521
    • An improved semiconductor device, adapted to provide electrical current in response to light energy incident thereon, includes a first electrode, an active semiconductor body atop the first electrode, a second electrode atop the semiconductor body, and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes of the device. The improvement comprises a continuous transparent barrier layer (1) operatively disposed between the semiconductor body and one of the electrodes of the device and (2) adapted to decrease the flow of electrical current through the at least one defect region of the semiconductor device. The barrier layer is formed from a magnesium fluoride based material. Methods of (1) fabricating improved semiconductor devices and (2) preventing operational mode failures due to latent detents are also disclosed.
    • 一种改进的半导体器件,适于响应入射到其上的光能提供电流,包括第一电极,位于第一电极顶部的有源半导体本体,半导体本体顶部的第二电极,以及能够 提供用于装置电极之间的电流流动的低电阻分流路径。 该改进包括可操作地设置在半导体主体和该器件的一个电极之间的连续透明阻挡层(1),和(2)适于减小通过半导体器件的至少一个缺陷区域的电流的流动。 阻挡层由氟化镁基材料形成。 还公开了(1)制造改进的半导体器件的方法和(2)防止由于潜在棘爪引起的操作模式故障的方法。
    • 2. 发明授权
    • Isolation layer for photovoltaic device and method of producing same
    • 光伏器件隔离层及其制造方法
    • US4485264A
    • 1984-11-27
    • US440386
    • 1982-11-09
    • Masatsugu IzuPrem Nath
    • Masatsugu IzuPrem Nath
    • H01L31/04H01L27/142H01L31/0216H01L31/042H01L31/20H01L31/18
    • H01L31/206H01L31/02167H01L31/046Y02E10/50Y02P70/521
    • Large area photovoltaic devices are defined by applying a pattern of electrically-insulating material directly atop the exposed surface of the semiconductor material. Methods of producing these photovoltaic devices in a continuous or batch process are also disclosed herein. Each large area device may include a matrix of electrically-isolated segments, each segment including a common substrate, a semiconductor body atop the substrate, and a transparent, electrically-conductive coating atop the semiconductor layer. Each large area photovoltaic device may include additionally or independently thereof, an electrically-inactive region also defined by the insulating material. The instant method of producing the photovoltaic devices eliminates the scribing steps required by prior art processes, while the product includes a boundary which separates the adjacent, electrically-isolated segments.
    • 通过在半导体材料的暴露表面上直接施加电绝缘材料的图案来限定大面积光伏器件。 本文还公开了以连续或间歇方法生产这些光伏器件的方法。 每个大面积器件可以包括电隔离段的矩阵,每个段包括公共衬底,在衬底顶部的半导体本体,以及位于半导体层顶部的透明导电涂层。 每个大面积光伏器件可以额外地或独立地包括也由绝缘材料限定的电非活性区域。 制造光伏器件的即时方法消除了现有技术方法所需的划线步骤,而产品包括分隔相邻的电隔离段的边界。
    • 4. 发明授权
    • Upstream cathode assembly
    • 上游阴极组件
    • US4513684A
    • 1985-04-30
    • US452224
    • 1982-12-22
    • Prem NathMasatsugu Izu
    • Prem NathMasatsugu Izu
    • H01L31/04C23C16/509H01J37/32H01L21/205C23C13/10
    • H01J37/32018C23C16/509
    • An upstream cathode system for use with glow discharge deposition apparatus, said apparatus adapted for the production of large area photovoltaic devices. In such apparatus, process gases are commonly introduced into a deposition chamber from a gas manifold disposed on the upstream side of a substrate. As the process gases are drawn across the surface of the substrate, they are continuously disassociated and recombined under the influence of an electromagnetic field developed by a deposition cathode or microwave generator. By providing a precathode system, upstream of the deposition cathode or microwave generator, (1) impurities in the process gases, (2) contaminants from the walls of the deposition chamber and (3) initially disassociated and recombined process gas compositions may be deposited onto and collected from a collection plate disposed upstream of the substrate. In this manner, higher order chains of the process gases are subjected to the upstream electromagnetic field and are therefore more easily broken down by the deposition cathode and deposited onto the substrate in desired lower order chains and compositions so as to provide improved electrical properties.
    • 一种用于辉光放电沉积设备的上游阴极系统,所述设备适用于生产大面积光伏器件。 在这种装置中,工艺气体通常从设置在基板的上游侧的气体歧管引入沉积室。 当工艺气体被拉过衬底的表面时,它们在由沉积阴极或微波发生器开发的电磁场的影响下被连续地分离和复合。 通过在沉积阴极或微波发生器的上游提供预制阴极系统,(1)工艺气体中的杂质,(2)来自沉积室的壁的污染物和(3)最初分离和重组的工艺气体组成可以沉积到 并从设置在基板的上游的收集板收集。 以这种方式,处理气体的较高级链经受上游电磁场,因此更容易被沉积阴极分解并以期望的低级链和组合物沉积到基底上,从而提供改善的电性能。
    • 7. 发明授权
    • Barrier layer for photovoltaic devices
    • 光伏器件阻挡层
    • US4598306A
    • 1986-07-01
    • US518184
    • 1983-07-28
    • Prem NathMasatsugu Izu
    • Prem NathMasatsugu Izu
    • H01L31/0224H01L31/076H01L31/20H01L27/14
    • H01L31/076H01L31/022425H01L31/208Y02E10/548Y02P70/521
    • An improved semiconductor device, adapted to provide electrical current in response to light energy incident thereon, includes a first electrode, an active semiconductor body atop the first electrode, a second electrode atop the semiconductor body, and at least one defect region which is capable of providing a low resistance shunt path for the flow of electrical current between the electrodes of the device. The improvement comprises a continuous transparent barrier layer (1) operatively disposed between the semiconductor body and one of the electrodes of the device and (2) adapted to decrease the flow of electrical current through the at least one defect region of the semiconductor device. The barrier layer is formed from a material chosen from the group consisting essentially of oxides, nitride and carbides of: indium, tin, cadmium, zinc, antimony, silicon, chromium and mixtures thereof. Methods of (1) fabricating improved semiconductor devices and (2) preventing operational mode failures due to latent detents are also disclosed.
    • 一种改进的半导体器件,适于响应入射到其上的光能提供电流,包括第一电极,位于第一电极顶部的有源半导体本体,半导体本体顶部的第二电极,以及能够 提供用于装置电极之间的电流流动的低电阻分流路径。 该改进包括可操作地设置在半导体主体和该器件的一个电极之间的连续透明阻挡层(1),和(2)适于减小通过半导体器件的至少一个缺陷区域的电流的流动。 阻挡层由选自以下的材料形成:基本上由氧化物,氮化物和碳化物组成:铟,锡,镉,锌,锑,硅,铬及其混合物。 还公开了(1)制造改进的半导体器件的方法和(2)防止由于潜在棘爪引起的操作模式故障的方法。
    • 8. 发明授权
    • Method of fabricating an electroplated substrate
    • 电镀基板的制造方法
    • US4565607A
    • 1986-01-21
    • US734712
    • 1985-05-16
    • Joseph J. HanakPrem NathMasatsugu IzuJames Young
    • Joseph J. HanakPrem NathMasatsugu IzuJames Young
    • C25D1/04H01L21/288C25D5/48
    • H01L21/2885C25D1/04
    • An electroplated substrate, characterized by a substantially reduced number of surface defects, for the fabrication of thin film electronic devices. The substrate is prepared in an electroforming process by electroplating onto and removing a metallic layer from the surface of a specifically prepared, substantially defect-free mandril. The substrate may be provided with a preselected surface finish by either (1) texturing the mandril or (2) controlling the parameters of the electroplating process to control the morphology of the deposit. The substrate is especially adapted for the fabrication of thin film photoresponsive devices which incorporate specular or diffuse back reflectors, since the texture may be controlled to provide for the appropriate type of reflectivity. Large area, thin film semiconductor devices incorporating the electroplated substrate are readily scribed to form electrically isolated small area segments for the fabrication of modules, arrays and the like.
    • 一种电镀基板,其特征在于用于制造薄膜电子器件的表面缺陷的数量明显减少。 通过电镀从特定制备的,基本上无缺陷的曼陀罗的表面上去除金属层并在电铸工艺中制备基底。 可以通过(1)将曼尼尔纹理化或(2)控制电镀工艺的参数来控制沉积物的形态,来为衬底提供预选的表面光洁度。 该衬底特别适用于制造包含镜面或漫反射反射器的薄膜光响应器件,因为可以控制纹理以提供适当类型的反射率。 结合电镀基板的大面积薄膜半导体器件易于划刻以形成用于制造模块,阵列等的电隔离的小区域段。
    • 9. 发明授权
    • Upstream cathode assembly
    • 上游阴极组件
    • US4483883A
    • 1984-11-20
    • US549054
    • 1983-11-07
    • Prem NathMasatsugu Izu
    • Prem NathMasatsugu Izu
    • H01L31/04C23C16/509H01J37/32H01L21/205B05D3/06
    • H01J37/32018C23C16/509
    • An upstream or predeposition cathode system for use with glow discharge deposition apparatus, said apparatus adapted for the continuous production of large area photovoltaic devices. In such apparatus, process gases are commonly introduced into a deposition chamber from a gas manifold disposed upstream of a substrate. As the process gases are drawn across the surface of the substrate, they are disassociated and recombined under the influence of an electromagnetic field developed by a deposition cathode or microwave generator. By providing a precathode system upstream of the deposition cathode or microwave generator, (1) impurities in the process gases, (2) contaminants from the walls of the deposition chamber and (3) initially disassociated and recombined process gas compositions may be deposited onto and collected from a collection plate disposed upstream of the substrate. In this manner, the process gases subjected to the upstream electromagnetic field are more easily broken down by the deposition cathode and deposited onto the substrate in desired chemical combinations and compositions so as to provide improved electrical, chemical and optical properties. Also disclosed herein is the use of such a precathode assembly to aid in the high speed deposition of homogeneous, amorphous, powder-free semiconductor material of uniform thickness across the entire width of the substrate.
    • 用于辉光放电沉积设备的上游或预沉积阴极系统,所述设备适于连续生产大面积光伏器件。 在这种装置中,工艺气体通常从设置在基板上游的气体歧管引入沉积室。 当工艺气体被拉过衬底的表面时,它们在由沉积阴极或微波发生器开发的电磁场的影响下被解离并重组。 通过在沉积阴极或微波发生器的上游提供预制阴极系统,(1)处理气体中的杂质,(2)来自沉积室的壁的污染物和(3)最初分离和重组的工艺气体组成可以沉积到 从设置在基板上游的收集板收集。 以这种方式,受到上游电磁场的处理气体更容易被沉积阴极分解,并以所需的化学组合和组合物沉积到衬底上,以提供改进的电学,化学和光学性质。 这里还公开了使用这样的预阴极组件来帮助在衬底的整个宽度上均匀的,无定形的,无粉末的均匀厚度的半导体材料的高速沉积。