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    • 4. 发明授权
    • Photosensitive resin composition and circuit substrate employing the same
    • 感光树脂组合物和使用其的电路基板
    • US08026036B2
    • 2011-09-27
    • US11887420
    • 2006-03-24
    • Kiwamu TokuhisaKentaro HayashiHironobu Kawasato
    • Kiwamu TokuhisaKentaro HayashiHironobu Kawasato
    • G03F7/00G03F7/004
    • G03F7/037C08F283/12C08F290/14C08G73/1042C08G73/106C08G73/1075C08G73/1082C08K5/103C08L79/08C08L83/10G03F7/0387H05K3/0023H05K3/4676H05K2201/0154Y10S430/114Y10S430/12Y10S430/121Y10S430/146Y10T428/24802
    • The present invention relates to a photosensitive resin composition excellent in pliability, ultraviolet sensitivity for development, developability with an aqueous alkali solution, and storage stability at room temperature and a circuit substrate employing the same. The photosensitive resin composition includes a siloxane-containing polyamic acid resin having structural units respectively represented by the following formulae (1), (2), and (3) and a photopolymerization initiator incorporated therein. The circuit substrate is coated with the photosensitive resin composition. In the formulae, Ar represents a residue of an aromatic tetracarboxylic acid; R1 represents alkyl group having 1 to 6 carbon atoms or phenyl group; R2 represents alkylene group having 2 to 6 carbon atoms or phenylene group; l represents a number of 0 to 10; R3 represents a divalent group or a direct bond; R4 represents —CH2═CH—R6—, in which R6 represents a direct bond, alkylene group having 1 to 6 carbon atoms, or phenylene group; R5 represents a diamine residue; and m, n, and o, indicating the range of the abundant molar ratios of the respective structural units, are 0.3 to 0.95, 0.05 to 0.7, and 0 to 0.5, respectively.
    • 本发明涉及柔软性,紫外线敏感性,显色性,碱性水溶液的显影性和室温下的保存稳定性以及使用该感光性树脂组合物的电路基板。 感光性树脂组合物包含具有分别由下式(1),(2)和(3)表示的结构单元的含硅氧烷的聚酰胺酸树脂和其中引入的光聚合引发剂。 电路基板用感光性树脂组合物涂布。 式中,Ar表示芳香族四羧酸的残基, R1表示碳原子数为1〜6的烷基或苯基; R2表示碳原子数2〜6的亚烷基或亚苯基; l表示0〜10的数; R3表示二价基团或直接键; R 4表示-CH 2 = CH-R 6 - ,其中R 6表示直接键,具有1至6个碳原子的亚烷基或亚苯基; R5表示二胺残基; m,n,o表示各结构单元的摩尔比的范围分别为0.3〜0.95,0.05〜0.7,0〜0.5的范围。
    • 5. 发明申请
    • Copper-clad laminate
    • 覆铜层压板
    • US20060115671A1
    • 2006-06-01
    • US11288303
    • 2005-11-29
    • Ryuzo ShintaYasufumi MatsumuraHironobu Kawasato
    • Ryuzo ShintaYasufumi MatsumuraHironobu Kawasato
    • B21D39/00B32B15/08
    • C23C28/00H05K3/389H05K2201/0154H05K2201/0355H05K2203/124Y10T428/12556Y10T428/12569
    • This invention relate to a copper-clad laminate with good adhesion between a copper foil and a layer of polyimide resin useful for high-density printed wiring boards. The copper-clad laminate having a copper foil treated with a heterocyclic compound containing nitrogen and sulfur as an organic surface treating agent and a layer of polyimide resin satisfying either of the following requirements: the concentration of sulfur atoms derived from the organic surface treating agent in the interface of copper and polyimide is in the range of 0.01-0.24 wt % as determined by an Energy dispersive X-ray spectroscopy (EDX); the weight of sulfur atoms derived from the organic surface treating agent per unit area of the copper foil is in the range of 2.5-3.1 mg/m2; and the concentration of sulfur atoms derived from the organic surface treating agent existing in the range from the surface to a depth of 16 nm of the copper foil is in the range of 1.73-2.30 atom % as determined by X-ray photoelectron spectroscopy (XPS).
    • 本发明涉及铜箔和用于高密度印刷电路板的聚酰亚胺树脂层之间具有良好粘附性的覆铜层压板。 具有用氮和硫作为有机表面处理剂的杂环化合物处理的铜箔的覆铜层压板和满足以下任一要求的聚酰亚胺树脂层:衍生自有机表面处理剂的硫原子浓度 通过能量色散X射线光谱法(EDX)测定,铜和聚酰亚胺的界面在0.01-0.24重量%的范围内; 来自有机表面处理剂的单位面积铜箔的硫原子的重量在2.5-3.1mg / m 2的范围内; 存在于铜箔表面至深度16nm范围内的有机表面处理剂的硫原子浓度为1.73〜2.30原子%的范围,通过X射线光电子能谱法(XPS )。
    • 6. 发明申请
    • Aromatic polyamic acid and polyimide
    • 芳香族聚酰胺酸和聚酰亚胺
    • US20070149758A1
    • 2007-06-28
    • US10584189
    • 2004-12-06
    • Hongyuan WangNoriko ChikaraishiHironobu Kawasato
    • Hongyuan WangNoriko ChikaraishiHironobu Kawasato
    • C08G69/08
    • H05K1/0346C08G73/10C08G73/1067
    • The present invention relates to an aromatic polyimide which has excellent heat resistance and excellent thermal dimensional stability, and which realizes low hygroscopic property, and an aromatic polyamic acid as a precursor for the aromatic polyimide. Provided are an aromatic polyamic acid including a structural unit represented by the following general formula (1), and an aromatic polyimide obtained by imidating the aromatic polyamic acid. The aromatic polyamic acid or the aromatic polyimide can be a copolymerization-type aromatic polyamic acid or aromatic polyimide having another structural unit: where, Ar1 represents a tetravalent organic group produced from a tetracarboxylic acid having one or more aromatic rings, and R represents a hydrocarbon having 2 to 6 carbon atoms.
    • 本发明涉及具有优异的耐热性和优异的热尺寸稳定性并且实现低吸湿性的芳族聚酰亚胺和作为芳族聚酰亚胺的前体的芳族聚酰胺酸。 提供包含由以下通式(1)表示的结构单元的芳族聚酰胺酸和通过酰亚胺芳族聚酰胺酸获得的芳族聚酰亚胺。 芳香族聚酰胺酸或芳香族聚酰亚胺可以是具有其他结构单元的共聚型芳香族聚酰胺酸或芳香族聚酰亚胺,其中,Ar 1表示由具有一个以上的四羧酸生成的四价有机基团 芳环,R表示碳原子数2〜6的烃。
    • 9. 发明申请
    • Photosensitive Resin Composition and Circuit Substrate Employing the Same
    • 光敏树脂组合物和使用它的电路基板
    • US20090202786A1
    • 2009-08-13
    • US11887420
    • 2006-03-24
    • Kiwamu TokuhisaKentaro HayashiHironobu Kawasato
    • Kiwamu TokuhisaKentaro HayashiHironobu Kawasato
    • B32B3/10G03F7/075
    • G03F7/037C08F283/12C08F290/14C08G73/1042C08G73/106C08G73/1075C08G73/1082C08K5/103C08L79/08C08L83/10G03F7/0387H05K3/0023H05K3/4676H05K2201/0154Y10S430/114Y10S430/12Y10S430/121Y10S430/146Y10T428/24802
    • The present invention relates to a photosensitive resin composition excellent in pliability, ultraviolet sensitivity for development, developability with an aqueous alkali solution, and storage stability at room temperature and a circuit substrate employing the same. The photosensitive resin composition includes a siloxane-containing polyamic acid resin having structural units respectively represented by the following formulae (1), (2), and (3) and a photopolymerization initiator incorporated therein. The circuit substrate is coated with the photosensitive resin composition. In the formulae, Ar represents a residue of an aromatic tetracarboxylic acid; R1 represents alkyl group having 1 to 6 carbon atoms or phenyl group; R2 represents alkylene group having 2 to 6 carbon atoms or phenylene group; l represents a number of 0 to 10; R3 represents a divalent group or a direct bond; R4 represents —CH2═CH—R6—, in which R6 represents a direct bond, alkylene group having 1 to 6 carbon atoms, or phenylene group; R5 represents a diamine residue; and m, n, and o, indicating the range of the abundant molar ratios of the respective structural units, are 0.3 to 0.95, 0.05 to 0.7, and 0 to 0.5, respectively.
    • 本发明涉及柔软性,紫外线敏感性,显色性,碱性水溶液的显影性和室温下的保存稳定性以及使用该感光性树脂组合物的电路基板。 感光性树脂组合物包含具有分别由下式(1),(2)和(3)表示的结构单元的含硅氧烷的聚酰胺酸树脂和其中引入的光聚合引发剂。 电路基板用感光性树脂组合物涂布。 式中,Ar表示芳香族四羧酸的残基, R1表示碳原子数为1〜6的烷基或苯基; R2表示碳原子数2〜6的亚烷基或亚苯基; l表示0〜10的数; R3表示二价基团或直接键; R 4表示-CH 2 -CH-R 6 - ,其中R 6表示直接键,具有1至6个碳原子的亚烷基或亚苯基; R5表示二胺残基; m,n,o表示各结构单元的摩尔比的范围分别为0.3〜0.95,0.05〜0.7,0〜0.5的范围。
    • 10. 发明申请
    • Laminate for wiring board
    • 接线板层压板
    • US20080057299A1
    • 2008-03-06
    • US11891630
    • 2007-08-10
    • Yasuhiro AdachiHironori NagaokaHongyuan WangNaoko OsawaMasahiko TakeuchiHironobu Kawasato
    • Yasuhiro AdachiHironori NagaokaHongyuan WangNaoko OsawaMasahiko TakeuchiHironobu Kawasato
    • B32B15/08B32B27/06
    • H05K1/0346C08G73/1042H05K1/036H05K2201/0154Y10T428/264Y10T428/31681
    • The present invention aims to provide a polyimide resin excellent in heat resistance, dimensional stability, and toughness as an insulating layer, and to obtain a laminate suitable for a flexible wiring board by using the polyimide resin, the laminate being excellent in resistance to rupture and flexibility even when the thickness of a polyimide resin layer is small. Provided is a laminate for a wiring board having a metal layer on at least one surface of a polyimide resin layer, in which a polyimide resin layer (A) obtained by imidating a polyimide precursor resin having a weight average molecular weight of 150,000 to 800,000 is a main polyimide resin layer, and a polyimide resin of which the main polyimide resin layer is constituted has structural units represented by the following general formulae (1) and (2) where R represents a lower alkyl group, a phenyl group, or a halogen atom, and Ar1 represents a residue of bis(aminophenoxy)benzene or bis(aminophenoxy)naphthalene.
    • 本发明旨在提供一种作为绝缘层的耐热性,尺寸稳定性和韧性优异的聚酰亚胺树脂,并且通过使用聚酰亚胺树脂获得适用于柔性布线板的层压体,该层压板具有优异的抗断裂性和 即使当聚酰亚胺树脂层的厚度小时也是灵活的。 本发明提供一种在聚酰亚胺树脂层的至少一个表面上具有金属层的布线基板的叠层体,其中通过酰亚胺化重均分子量为150,000〜800,000的聚酰亚胺前体树脂得到的聚酰亚胺树脂层(A)为 主要聚酰亚胺树脂层和主要聚酰亚胺树脂层构成的聚酰亚胺树脂具有由以下通式(1)和(2)表示的结构单元,其中R表示低级烷基,苯基或卤素 原子和Ar 1表示双(氨基苯氧基)苯或双(氨基苯氧基)萘的残基。