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    • 7. 发明授权
    • Spiral membrane element and process for producing the same
    • 螺旋膜元件及其制造方法
    • US07998348B2
    • 2011-08-16
    • US12282138
    • 2007-03-07
    • Shinichi ChikuraKatsumi IshiiHideki MatsudaMasashi BeppuHiroki FujiokaYasuhiro Uda
    • Shinichi ChikuraKatsumi IshiiHideki MatsudaMasashi BeppuHiroki FujiokaYasuhiro Uda
    • B01D63/10B01D61/00
    • B01D63/103B01D63/10B01D65/003B01D2313/04B01D2313/146
    • An object of the present invention is to provide a spiral membrane element that can form a uniform fiber reinforcement layer on an outer circumferential surface by a simple process without a great change in the materials, as well as a process for producing the same. The spiral membrane element of the present invention is a spiral membrane element which is provided with a cylindrical roll R in which a separation membrane, a feed-side flow passageway member, and a permeate-side flow passageway member 3 are spirally wound in a laminate state around a perforated center tube 5 and in which a sealing part for preventing mixing of feed-side fluid and permeate-side fluid is disposed, wherein at least one sheet of the permeate-side flow passageway member 3 has a fiber cloth 23a extended or connected to the outer circumferential side, and the fiber cloth 23a is wound around an outer circumference of said cylindrical roll R, impregnated with a resin and hardened to thereby form a fiber reinforcement layer.
    • 本发明的目的在于提供一种能够通过简单的工艺在外周面上形成均匀的纤维增强层的螺旋膜元件,而不会产生很大的变化,以及其制造方法。 本发明的螺旋膜元件是具有圆筒形辊R的螺旋膜元件,其中分离膜,进料侧流动通道构件和渗透侧流动通道构件3螺旋卷绕在层压体 在其中设置有用于防止进料侧流体和渗透侧流体混合的密封部,其中至少一片渗透侧流动通道构件3具有延伸的纤维布23a或 连接到外周侧,并且纤维布23a缠绕在所述圆柱形辊R的外圆周上,浸渍树脂并硬化,从而形成纤维增强层。
    • 10. 发明申请
    • EXPOSURE APPARATUS, CORRECTION METHOD, AND DEVICE MANUFACTURING METHOD
    • 曝光装置,校正方法和装置制造方法
    • US20090280418A1
    • 2009-11-12
    • US12463235
    • 2009-05-08
    • Hideki Matsuda
    • Hideki Matsuda
    • G03F7/20G03B27/42G03B27/32
    • G03B27/32G03F7/706
    • An exposure apparatus comprising a projection optical system configured to project a pattern of an original onto a substrate; and a control unit, wherein the control unit acquires a result of measuring a line width of an image of a first mark and a position of an image of a second mark, wherein the first mark and the second mark are formed on the substrate at each position while gradually changing a position of a substrate stage in an optical-axis direction, and derives a position shift amount of the image of the second mark formed on the substrate held by the substrate stage at a position, in the optical-axis direction, at which an extremum of a change of line width of the image of the first mark is measured.
    • 一种曝光装置,包括:投影光学系统,被配置为将原稿的图案投影到基板上; 以及控制单元,其中所述控制单元获取测量第一标记的图像的线宽度和第二标记的图像的位置的结果,其中,在每个所述基板上形成所述第一标记和所述第二标记 同时逐渐改变基板载物台在光轴方向上的位置,并且导出在基板载台上保持的基板上形成的第二标记的图像的位置偏移量在光轴方向上的位置, 测量第一标记的图像的线宽的变化的极值。