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1. 发明申请

US20110223333A1 METHOD OF TREATING CATALYST FOR NANOCARBON PRODUCTION AND METHOD OF MANUFACTURING NANOCARBON 审中-公开
标题翻译：处理纳米碳生产催化剂的方法及制备纳米碳的方法
公开(公告)号：US20110223333A1
公开(公告)日：2011-09-15
申请号：US13047207
申请日：2011-03-14
申请人： Masashi Yamage , Naoya Hayamizu
发明人： Masashi Yamage , Naoya Hayamizu
IPC分类号： C23C16/26 , B01J23/755 , B01J21/18 , C23C16/44 , C23F1/00 , C23F1/16 , C23F1/28 , C23F1/30 , C23F1/40 , B82Y40/00
CPC分类号： B01J37/06 , B01J23/745 , B01J23/755 , B01J35/002 , B82Y30/00 , B82Y40/00 , C01B32/15
摘要： According to one embodiment, a method of treating catalyst for nanocarbon production comprises, bringing a surface of a catalytic material into contact with a chemical, the catalytic material containing a metallic material and being used to produce nanocarbon, corroding the surface of the catalytic material, and drying the surface of the catalytic material.
摘要翻译：根据一个实施方案，一种处理用于纳米碳生产的催化剂的方法包括：使催化材料的表面与化学品接触，所述催化材料含有金属材料并用于生产纳米碳，腐蚀催化材料的表面，并干燥催化材料的表面。

2. 发明申请

US20090081510A1 SUPPORTED CATALYST, METHOD FOR MANUFACTURING SUPPORTED CATALYST, FUEL CELL, AND METHOD FOR MANUFACTURING FUEL CELL 审中-公开
标题翻译：支持的催化剂，制造支持的催化剂的方法，燃料电池和制造燃料电池的方法
公开(公告)号：US20090081510A1
公开(公告)日：2009-03-26
申请号：US12239066
申请日：2008-09-26
申请人： Naoya Hayamizu , Yukihiro Shibata , Masashi Yamage , Jun Momma , Hideo Oota
发明人： Naoya Hayamizu , Yukihiro Shibata , Masashi Yamage , Jun Momma , Hideo Oota
IPC分类号： H01M4/88 , H01M4/96 , B01J27/20 , B01J31/02 , H01M4/08
CPC分类号： H01M4/90 , H01M4/8817 , H01M4/8882 , H01M4/8892 , H01M4/9083 , H01M4/926 , H01M8/0234 , H01M8/0243 , Y02P70/56
摘要： A supported catalyst includes: a catalyst; and a carbon body. The catalyst is supported on the carbon body, and the carbon body is linear.
摘要翻译：负载催化剂包括：催化剂; 和碳体。催化剂负载在碳体上，碳体是线性的。

3. 发明授权

US5955382A Microwave excitation plasma processing apparatus and microwave excitation plasma processing method 失效
标题翻译：微波激发等离子体处理装置和微波激发等离子体处理方法
公开(公告)号：US5955382A
公开(公告)日：1999-09-21
申请号：US5689
申请日：1998-01-13
申请人： Takeshi Yamauchi , Katsuaki Aoki , Masashi Yamage
发明人： Takeshi Yamauchi , Katsuaki Aoki , Masashi Yamage
IPC分类号： H01L21/00
CPC分类号： H01J37/32229
摘要： A microwave excitation plasma processing apparatus comprises a vacuum container having a plasma generating chamber at an upper portion thereof and a processing chamber, a gas supply pipe for supplying a process gas into the plasma generating chamber, a dielectric window arranged in an opening of an upper wall portion of the vacuum container, a rectangular waveguide arranged on the upper wall portion of the vacuum container including the dielectric window and comprising a first wall having a first surface perpendicular to a direction of electric field of a microwave to oppose the dielectric window, second walls having second surfaces parallel to the direction of electric field of the microwave and extending in a direction perpendicular to the first surface, and a third wall having a third surface which is provided on a side opposite to a microwave introducing side perpendicular to the first and second surfaces to reflect the microwave, and a microwave oscillator for introducing the microwave into the waveguide, wherein the waveguide has two slits which are formed in the first wall and located in the vicinity of the second walls, and which extend in parallel or substantially parallel to the second walls, each of the slits having a width which is smaller on a side closer to the third surface.
摘要翻译：一种微波激发等离子体处理装置，包括：上部具有等离子体发生室的真空容器，以及处理室，用于将等离子体发生室内的工序气体供给的气体供给管，布置在上部真空容器的壁部分，布置在包括电介质窗口的真空容器的上壁部分上的矩形波导，并且包括具有垂直于微波的电场方向的第一表面的第一壁以与电介质窗口相对的第二壁，第二壁具有与微波的电场方向平行的第二表面，并且在垂直于第一表面的方向上延伸，第三壁具有第三表面，第三表面设置在与第一表面垂直的微波导入侧的相对侧上，反射微波的第二表面和用于引入微波的微波振荡器波导到波导中，其中波导具有形成在第一壁中并位于第二壁附近的两个狭缝，并且其平行或大致平行于第二壁延伸，每个狭缝的宽度为在靠近第三表面的一侧较小。

4. 发明授权

US08133348B2 Plasma generating apparatus and plasma treatment apparatus 有权
标题翻译：等离子体发生装置和等离子体处理装置
公开(公告)号：US08133348B2
公开(公告)日：2012-03-13
申请号：US11914954
申请日：2006-04-26
申请人： Ivan Petrov Ganachev , Yoshikazu Tsugami , Kohei Shimatani , Masashi Yamage
发明人： Ivan Petrov Ganachev , Yoshikazu Tsugami , Kohei Shimatani , Masashi Yamage
IPC分类号： H01L21/306
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32238
摘要： A plasma generating apparatus includes a coaxial convertor for coaxial-converting a microwave, a generally annular ring slot that passes the coaxial-converted microwave, and a dielectric window that propagates the microwave passed through the ring slot. A plasma is produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.
摘要翻译：等离子体发生装置包括用于同轴转换微波的同轴转换器，通过同轴转换的微波的大致环形的环槽，以及传播通过环形槽的微波的介电窗口。通过介电窗口传播的微波产生等离子体。这使得能够在大面积上稳定地形成具有均匀分布的等离子体。

5. 发明申请

US20130147089A1 TRANSPARENT CONDUCTIVE MATERIAL, DISPERSION LIQUID, TRANSPARENT CONDUCTIVE FILM, AND METHODS FOR MANUFACTURING SAME 审中-公开
标题翻译：透明导电材料，分散液，透明导电膜及其制造方法
公开(公告)号：US20130147089A1
公开(公告)日：2013-06-13
申请号：US13710608
申请日：2012-12-11
申请人： Hirotoshi MURAYAMA , Hideaki Hirabayashi , Masashi Yamage , Tsuyoshi Noma , Masao Kon
发明人： Hirotoshi MURAYAMA , Hideaki Hirabayashi , Masashi Yamage , Tsuyoshi Noma , Masao Kon
IPC分类号： H01B1/12
CPC分类号： H01B1/12 , B82Y30/00 , H01B1/04 , Y10S977/734 , Y10S977/896
摘要： According to one embodiment, a transparent conductive material is used for a transparent conductive film. The transparent conductive material includes nanographene having a polar group at a surface of the nanographene.
摘要翻译：根据一个实施例，透明导电材料用于透明导电膜。透明导电材料包括在纳米线性荧光体的表面具有极性基团的纳米线烯。

6. 发明授权

US06184687B2 Plasma process end point determination method and apparatus, and plasma evaluation method and apparatus 失效
标题翻译：等离子体处理终点测定方法和装置，以及等离子体评估方法和装置
公开(公告)号：US06184687B2
公开(公告)日：2001-02-06
申请号：US09175344
申请日：1998-10-20
申请人： Masashi Yamage , Hiroyuki Takada , Takeshi Yamauchi
发明人： Masashi Yamage , Hiroyuki Takada , Takeshi Yamauchi
IPC分类号： G01N2762
CPC分类号： H01J37/32192 , G01N2033/0095 , H01J37/32935
摘要： A plasma process end point determination method comprises the steps of measuring a physical quantity in a circuit for producing a plasma within a reaction chamber, and determining a plasma process end point on the basis of an inflection point of the measured physical quantity in relation to the passing of time.
摘要翻译：等离子体处理终点确定方法包括以下步骤：测量用于在反应室内产生等离子体的电路中的物理量，以及基于所测量的物理量的拐点确定等离子体处理终点时间流逝

7. 发明申请

US20090045749A1 PLASMA GENERATING APPARATUS AND PLASMA TREATMENT APPARATUS 有权
标题翻译：等离子体发生装置和等离子体处理装置
公开(公告)号：US20090045749A1
公开(公告)日：2009-02-19
申请号：US11914954
申请日：2006-04-26
申请人： Ivan Petrov Ganachev , Yoshikazu Tsugami , Kohei Shimatani , Masashi Yamage
发明人： Ivan Petrov Ganachev , Yoshikazu Tsugami , Kohei Shimatani , Masashi Yamage
IPC分类号： H05B31/26
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32238
摘要： A plasma generating apparatus according to the invention includes coaxial conversion means for coaxial-converting a microwave, a generally annular ring slot for passing the coaxial-converted microwave, and a dielectric window for propagating the microwave passed through the ring slot, wherein a plasma can be produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.
摘要翻译：根据本发明的等离子体产生装置包括用于同轴转换微波的同轴转换装置，用于使同轴转换的微波通过的大致环形的环槽，以及用于传播通过环槽的微波的电介质窗口，其中等离子体可由通过介电窗口传播的微波产生。这使得能够在大面积上稳定地形成具有均匀分布的等离子体。

8. 发明申请

US20080012462A1 ELECTRON EMISSION ELEMENT, METHOD OF MANUFACTURING ELECTRON EMISSION ELEMENT, AND DISPLAY DEVICE WITH ELECTRON EMISSION ELEMENT 审中-公开
标题翻译：电子发射元件，制造电子发射元件的方法和具有电子发射元件的显示装置
公开(公告)号：US20080012462A1
公开(公告)日：2008-01-17
申请号：US11684851
申请日：2007-03-12
申请人： Masashi Yamage
发明人： Masashi Yamage
IPC分类号： H01J1/02 , H01J9/02
CPC分类号： H01J9/025 , H01J2329/00
摘要： An electron emission element includes a substrate, a first conductive layer provided on the substrate, an electron emission part formed on the first conductive layer, an insulating layer formed on the first conductive layer and having a first opening part arranged such that the electron emission part is located within the first opening part, and a second conductive layer formed on the insulating layer and having a second opening part such that the electron emission part is located within the second opening part, wherein an electric-field concentration part which concentrates an electric field is provided within the second opening part.
摘要翻译：电子发射元件包括衬底，设置在衬底上的第一导电层，形成在第一导电层上的电子发射部分，形成在第一导电层上的绝缘层，并且具有布置成使得电子发射部分位于第一开口部内，第二导电层形成在绝缘层上，具有第二开口部，使得电子发射部位于第二开口部内，其中集中电场的电场集中部设置在第二开口部内。

9. 发明授权

US6059922A Plasma processing apparatus and a plasma processing method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US6059922A
公开(公告)日：2000-05-09
申请号：US966243
申请日：1997-11-07
申请人： Osamu Yamazaki , Shigeyuki Takagi , Kaoru Taki , Noboru Okamoto , Yutaka Uchida , Naoki Tajima , Masashi Yamage
发明人： Osamu Yamazaki , Shigeyuki Takagi , Kaoru Taki , Noboru Okamoto , Yutaka Uchida , Naoki Tajima , Masashi Yamage
IPC分类号： H05H1/00
CPC分类号： H05H1/00
摘要： A plasma processing apparatus according to the present invention includes a microwave guide for introducing a microwave, an air-tight chamber for internally setting an object to be processed, for generating a plasma by introducing the microwave introduced by the microwave guide and by supplying a reaction gas, and for processing the object by an active species generated by the plasma, a dielectric window provided between the microwave guide and the air-tight chamber, for enclosing the air-tight chamber, a top plate provided with a microwave guide port arranged with a gap maintained from the dielectric window, and cooling means provided for the top plate, for cooling heat caused by generation of the plasma, e.g., a cooling means for causing a cooling gas to flow in the gap between the dielectric window and the top plate.
摘要翻译：根据本发明的等离子体处理装置包括用于引入微波的微波引导器，用于内部设置待加工物体的气密室，用于通过引入微波引导的微波并通过提供反应产生等离子体气体，并且用于通过由等离子体产生的活性物质处理物体，设置在微波导管和气密室之间的用于封闭气密室的电介质窗，设置有布置有从电介质窗口保持的间隙和为顶板设置的用于冷却等离子体产生的热量的冷却装置，例如用于使冷却气体在电介质窗和顶板之间的间隙中流动的冷却装置。

10. 发明申请

US20080030122A1 Electron emitting element, manufacturing method for electron emitting element, and display device having electron emitting element 审中-公开
标题翻译：电子发射元件，电子发射元件的制造方法和具有电子发射元件的显示装置
公开(公告)号：US20080030122A1
公开(公告)日：2008-02-07
申请号：US11708343
申请日：2007-02-21
申请人： Masashi Yamage
发明人： Masashi Yamage
IPC分类号： H01J1/62 , H01J19/02 , H01J9/02
CPC分类号： H01J1/304 , B82Y10/00 , H01J9/025 , H01J31/127 , H01J2201/30469
摘要： An electron emitting element includes a substrate, an electrically conductive layer located on the substrate and formed with a protrusion or a recess, and an electron emitting layer formed over the protrusion or the recess on the conductive layer and having a plurality of linear conductors, a height of the protrusion or a depth of the recess being greater than a thickness of the electron emitting layer.
摘要翻译：电子发射元件包括基板，位于基板上并形成有突起或凹陷的导电层，以及形成在导电层上的突起或凹部上的电子发射层，并且具有多个线性导体，突起的高度或凹部的深度大于电子发射层的厚度。

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