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    • 2. 发明授权
    • Microwave excitation plasma processing apparatus and microwave
excitation plasma processing method
    • 微波激发等离子体处理装置和微波激发等离子体处理方法
    • US5955382A
    • 1999-09-21
    • US5689
    • 1998-01-13
    • Takeshi YamauchiKatsuaki AokiMasashi Yamage
    • Takeshi YamauchiKatsuaki AokiMasashi Yamage
    • H01L21/00
    • H01J37/32229
    • A microwave excitation plasma processing apparatus comprises a vacuum container having a plasma generating chamber at an upper portion thereof and a processing chamber, a gas supply pipe for supplying a process gas into the plasma generating chamber, a dielectric window arranged in an opening of an upper wall portion of the vacuum container, a rectangular waveguide arranged on the upper wall portion of the vacuum container including the dielectric window and comprising a first wall having a first surface perpendicular to a direction of electric field of a microwave to oppose the dielectric window, second walls having second surfaces parallel to the direction of electric field of the microwave and extending in a direction perpendicular to the first surface, and a third wall having a third surface which is provided on a side opposite to a microwave introducing side perpendicular to the first and second surfaces to reflect the microwave, and a microwave oscillator for introducing the microwave into the waveguide, wherein the waveguide has two slits which are formed in the first wall and located in the vicinity of the second walls, and which extend in parallel or substantially parallel to the second walls, each of the slits having a width which is smaller on a side closer to the third surface.
    • 一种微波激发等离子体处理装置,包括:上部具有等离子体发生室的真空容器,以及处理室,用于将等离子体发生室内的工序气体供给的气体供给管,布置在上部 真空容器的壁部分,布置在包括电介质窗口的真空容器的上壁部分上的矩形波导,并且包括具有垂直于微波的电场方向的第一表面的第一壁以与电介质窗口相对的第二壁,第二 壁具有与微波的电场方向平行的第二表面,并且在垂直于第一表面的方向上延伸,第三壁具有第三表面,第三表面设置在与第一表面垂直的微波导入侧的相对侧上, 反射微波的第二表面和用于引入微波的微波振荡器 波导到波导中,其中波导具有形成在第一壁中并位于第二壁附近的两个狭缝,并且其平行或大致平行于第二壁延伸,每个狭缝的宽度为 在靠近第三表面的一侧较小。