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1. 发明申请

US20080248422A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20080248422A1
公开(公告)日：2008-10-09
申请号：US12060695
申请日：2008-04-01
申请人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
发明人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
IPC分类号： G03F7/025 , C07D333/50
CPC分类号： C07D333/76 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R403 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).
摘要翻译：包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（其中R 401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X-O - 表示阴离子）或酸发生剂（ B1'），其包含如下所示的由通式（b1-9）表示的化合物（其中R 403和R 403）各自独立地表示氢原子，烷基或卤代烷基; R 404表示烷基或卤代烷基，其中R 403和R 404可彼此键合至形成一个戒指结构; 而X - 代表阴离子）。

2. 发明授权

US07488568B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US07488568B2
公开(公告)日：2009-02-10
申请号：US12060695
申请日：2008-04-01
申请人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
发明人： Takeshi Iwai , Hideo Hada , Masaru Takeshita , Akiya Kawaue , Keita Ishiduka , Hiroaki Shimizu , Kyoko Ohshita , Tsuyoshi Nakamura , Komei Hirahara , Yuichi Suzuki , Takehiro Seshimo , Kensuke Matsuzawa
IPC分类号： G03F7/004 , G03F7/30 , C07D333/46
CPC分类号： C07D333/76 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R402 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).
摘要翻译：包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（其中R401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X表示阴离子）或包含下述通式（b1-9）表示的化合物的酸产生剂（B1'）（其中R402和R403各自独立地表示氢原子，烷基基团或卤代烷基; R404表示烷基或卤代烷基，其中R403和R404可以彼此键合以形成环结构;并且X-表示阴离子）。

3. 发明授权

US07491485B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US07491485B2
公开(公告)日：2009-02-17
申请号：US12124013
申请日：2008-05-20
申请人： Masaru Takeshita , Komei Hirahara
发明人： Masaru Takeshita , Komei Hirahara
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , C07C311/48 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： This resist composition according to the present invention includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) represented by a general formula (b1-6-1) shown below and an acid generator (B2) represented by a general formula (b1-6-2) shown below: (wherein, R40 represents a hydrogen atom or an alkyl group; R41 represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, a carboxyl group or a hydroxyalkyl group; R42 and R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxyl group or a hydroxyalkyl group; n0 to n3 each independently represents an integer of 0 to 3, with the proviso that n0+n1 is 5 or less; R13 each independently represents a linear or branched alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, and two of R13 may be bonded mutually to form a ring structure; R14 represents a linear, branched or cyclic alkyl group, a linear, branched or cyclic halogenated alkyl group, an aryl group or an alkenyl group, which may contain a substituent group).
摘要翻译：根据本发明的抗蚀剂组合物包括在酸性作用下在碱性显影液中显示出改变的溶解性的基础组分（A）和暴露时产生酸的酸产生剂组分（B），其中酸产生剂组分 B）包括由下述通式（b1-6-1）表示的酸产生剂（B1）和由以下所示的通式（b1-6-2）表示的酸产生剂（B2）：（其中R40表示氢原子或烷基; R 41表示卤素原子，卤代烷基，烷基，乙酰基，羧基或羟烷基; R 42和R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; n0〜n3各自独立地表示0〜3的整数，条件是n0 + n1为5以下; R13各自独立地表示直链或支链烷基 p为1〜10个碳原子，其中至少一个氢原子被氟原子取代，并且R 13中的两个可以相互键合以形成环结构; R 14表示可以含有取代基的直链，支链或环状烷基，直链，支链或环状卤代烷基，芳基或烯基。

4. 发明申请

US20080292988A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20080292988A1
公开(公告)日：2008-11-27
申请号：US12124013
申请日：2008-05-20
申请人： Masaru Takeshita , Komei Hirahara
发明人： Masaru Takeshita , Komei Hirahara
IPC分类号： G03F7/004 , G03F7/26
CPC分类号： G03F7/0045 , C07C311/48 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： This resist composition according to the present invention includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) represented by a general formula (b1-6-1) shown below and an acid generator (B2) represented by a general formula (b1-6-2) shown below: (wherein, R40 represents a hydrogen atom or an alkyl group; R41 represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, a carboxyl group or a hydroxyalkyl group; R42 and R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxyl group or a hydroxyalkyl group; n0 to n3 each independently represents an integer of 0 to 3, with the proviso that n0+n1 is 5 or less; R13 each independently represents a linear or branched alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, and two of R13 may be bonded mutually to form a ring structure; R14 represents a linear, branched or cyclic alkyl group, a linear, branched or cyclic halogenated alkyl group, an aryl group or an alkenyl group, which may contain a substituent group.).
摘要翻译：根据本发明的抗蚀剂组合物包括在酸性作用下在碱性显影液中显示出改变的溶解性的基础组分（A）和暴露时产生酸的酸产生剂组分（B），其中酸产生剂组分 B）包括由下述通式（b1-6-1）表示的酸产生剂（B1）和由以下所示的通式（b1-6-2）表示的酸产生剂（B2）：（其中R40表示氢原子或烷基; R 41表示卤素原子，卤代烷基，烷基，乙酰基，羧基或羟烷基; R 42和R 43各自独立地表示卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; n0〜n3各自独立地表示0〜3的整数，条件是n0 + n1为5以下; R13各自独立地表示直链或支链烷基 p为1〜10个碳原子，其中至少一个氢原子被氟原子取代，并且R 13中的两个可以相互键合以形成环结构; R 14表示可以含有取代基的直链，支链或环状烷基，直链，支链或环状卤代烷基，芳基或烯基。

5. 发明申请

US20120034561A1 RESIST POLYMER AND RESIST COMPOSITION 有权
标题翻译：耐聚合物和耐腐蚀组合物
公开(公告)号：US20120034561A1
公开(公告)日：2012-02-09
申请号：US13242879
申请日：2011-09-23
申请人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
发明人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
IPC分类号： G03F7/20 , C08F224/00 , G03F7/004
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要翻译：本发明的抗蚀剂聚合物包含具有氰基的特定结构单元，具有酸解离基的结构单元和具有内酯骨架的特定结构单元。当在DUV准分子激光光刻或电子束光刻中使用上述聚合物作为抗蚀剂树脂时，其表现出高灵敏度和高分辨率，并且提供良好的抗蚀剂图案形状，线边缘粗糙度的发生程度小或微凝胶的产生。

6. 发明授权

US08097396B2 Positive resist composition and method for forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08097396B2
公开(公告)日：2012-01-17
申请号：US11597005
申请日：2005-05-25
申请人： Hiroaki Shimizu , Masaru Takeshita
发明人： Hiroaki Shimizu , Masaru Takeshita
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , Y10S430/111
摘要： A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a copolymer (A1) that includes a structural unit (a1) derived from an acrylate that contains an acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an α-lower alkyl acrylate that contains a lactone ring, and a structural unit (a3) derived from an (α-lower alkyl)acrylate that contains a polar group-containing polycyclic group.
摘要翻译：包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）是共聚物（A1），其包含衍生自含有酸解离性溶解抑制基团的丙烯酸酯的结构单元（a1），衍生自含有内酯环的丙烯酸α-低级烷基酯的结构单元（a2）和衍生自（α-低级烷基）丙烯酸酯，含有极性基团的多环基。

7. 发明申请

US20120009520A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20120009520A1
公开(公告)日：2012-01-12
申请号：US13177390
申请日：2011-07-06
申请人： Masaru Takeshita , Yoshiyuki Utsumi
发明人： Masaru Takeshita , Yoshiyuki Utsumi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO2— containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y1 represents a divalent aliphatic hydrocarbon group; R1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A+ represents an organic cation.
摘要翻译：一种正型抗蚀剂组合物，其包含具有来自丙烯酸酯的结构单元（a1）的树脂组分（A1），所述结构单元（a1）可以具有除氢之外的原子或与α位上的碳原子键合的基团，并且含有酸可离解，溶解和含有-SO 2的环状基团的结构单元（a0）; 由下述通式（c1）表示的化合物（C1）和暴露后产生酸的酸发生剂组分（B），其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Y1表示二价脂族烃基; R1表示氢原子，氟原子，烷基或氟代烷基; p表示1〜10的整数，而A +代表有机阳离子。

8. 发明授权

US07767378B2 Method for producing resist composition and resist composition 有权
标题翻译：抗蚀剂组合物和抗蚀剂组合物的制造方法
公开(公告)号：US07767378B2
公开(公告)日：2010-08-03
申请号：US11718388
申请日：2005-11-04
申请人： Hiroaki Shimizu , Masaru Takeshita
发明人： Hiroaki Shimizu , Masaru Takeshita
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , C08F220/28 , Y10S430/111
摘要： A method for producing a resist composition including a resin component (A) that exhibits changed alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, the method including the steps of: obtaining the component (A) by mixing a plurality of copolymers, which are composed of the same structural units but have mutually different measured values for the contact angle.
摘要翻译：一种制备抗蚀剂组合物的方法，该抗蚀剂组合物包括在酸的作用下显示出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的方法，所述方法包括以下步骤：获得组分）通过混合由相同结构单元组成但具有相互不同的接触角测量值的多个共聚物。

9. 发明授权

US07682770B2 Resist composition and method for forming resist pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07682770B2
公开(公告)日：2010-03-23
申请号：US10576405
申请日：2004-10-20
申请人： Hideo Hada , Masaru Takeshita , Ryotaro Hayashi , Syogo Matsumaru , Taku Hirayama , Hiroaki Shimizu
发明人： Hideo Hada , Masaru Takeshita , Ryotaro Hayashi , Syogo Matsumaru , Taku Hirayama , Hiroaki Shimizu
IPC分类号： G03F7/039 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.
摘要翻译：提供了抗蚀剂组合物，其产生精细的分辨率，并且改善了线边缘粗糙度和聚焦深度的水平。该组合物包含在酸作用下发生碱溶解性变化的树脂成分（A）和暴露时产生酸的酸发生剂成分（B），其中，成分（A）为重均分子量由（甲基）丙烯酸酯衍生的含有结构单元（a）的重量不大于8,000，组分（B）包括至少一种由通式（b-1）或通式（b- 2）如下所示。

10. 发明申请

US20090246683A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20090246683A1
公开(公告)日：2009-10-01
申请号：US12064288
申请日：2006-08-16
申请人： Ryoji Watanabe , Masaru Takeshita
发明人： Ryoji Watanabe , Masaru Takeshita
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C08F220/28 , G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.
摘要翻译：提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基，烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

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