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1. 发明授权

US08497395B2 Compound 有权
标题翻译：复合
公开(公告)号：US08497395B2
公开(公告)日：2013-07-30
申请号：US13313993
申请日：2011-12-07
申请人： Yoshiyuki Utsumi , Masaru Takeshita , Yoshitaka Komuro
发明人： Yoshiyuki Utsumi , Masaru Takeshita , Yoshitaka Komuro
IPC分类号： C07C211/00
CPC分类号： C07C311/09 , C07C381/12 , C07C2601/08 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0397
摘要： A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).
摘要翻译：由通式（c1）表示的化合物（R1表示可以具有取代基的碳原子数为5以上的脂环式基团; X表示二价连接基团; Y表示直链状，支链状或环状的亚烷基或亚芳基）表示含氟原子的烃基; M +表示有机阳离子或金属阳离子）。

2. 发明申请

US20120009520A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20120009520A1
公开(公告)日：2012-01-12
申请号：US13177390
申请日：2011-07-06
申请人： Masaru Takeshita , Yoshiyuki Utsumi
发明人： Masaru Takeshita , Yoshiyuki Utsumi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO2— containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y1 represents a divalent aliphatic hydrocarbon group; R1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A+ represents an organic cation.
摘要翻译：一种正型抗蚀剂组合物，其包含具有来自丙烯酸酯的结构单元（a1）的树脂组分（A1），所述结构单元（a1）可以具有除氢之外的原子或与α位上的碳原子键合的基团，并且含有酸可离解，溶解和含有-SO 2的环状基团的结构单元（a0）; 由下述通式（c1）表示的化合物（C1）和暴露后产生酸的酸发生剂组分（B），其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Y1表示二价脂族烃基; R1表示氢原子，氟原子，烷基或氟代烷基; p表示1〜10的整数，而A +代表有机阳离子。

3. 发明授权

US08614049B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US08614049B2
公开(公告)日：2013-12-24
申请号：US13313990
申请日：2011-12-07
申请人： Yoshiyuki Utsumi , Masaru Takeshita , Hiroaki Shimizu , Syo Abe , Yoshitaka Komuro
发明人： Yoshiyuki Utsumi , Masaru Takeshita , Hiroaki Shimizu , Syo Abe , Yoshitaka Komuro
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).
摘要翻译：一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。

4. 发明授权

US08535868B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08535868B2
公开(公告)日：2013-09-17
申请号：US13177390
申请日：2011-07-06
申请人： Masaru Takeshita , Yoshiyuki Utsumi
发明人： Masaru Takeshita , Yoshiyuki Utsumi
IPC分类号： G03F7/004 , G03F7/28 , G03F7/039 , G03F7/26
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO2— containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y1 represents a divalent aliphatic hydrocarbon group; R1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A+ represents an organic cation.
摘要翻译：一种正型抗蚀剂组合物，其包含具有来自丙烯酸酯的结构单元（a1）的树脂组分（A1），所述结构单元（a1）可以具有除氢之外的原子或与α位上的碳原子键合的基团，并且含有酸可离解的溶解和含有-SO 2的环状基团的结构单元（a0）; 由下述通式（c1）表示的化合物（C1）和暴露后产生酸的酸发生剂组分（B），其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Y1表示二价脂族烃基; R1表示氢原子，氟原子，烷基或氟代烷基; p表示1〜10的整数，而A +代表有机阳离子。

5. 发明申请

US20120264058A1 RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：负面发展的阻力组成和形成耐力图的方法
公开(公告)号：US20120264058A1
公开(公告)日：2012-10-18
申请号：US13440090
申请日：2012-04-05
申请人： Yoshiyuki Utsumi , Hiroaki Shimizu
发明人： Yoshiyuki Utsumi , Hiroaki Shimizu
IPC分类号： G03F7/027 , G03F7/20 , G03F7/004
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes: forming a resist film on a substrate using the resist composition; conducting exposure of the resist film; and patterning the resist film by negative development using a developing solution containing the organic solvent to form a resist pattern, wherein the acid generator component (B) contains an acid generator (B1) that generates an acid having a log P value of 2.7 or less and also a pKa value of at least −3.5.
摘要翻译：用于阴性显影的抗蚀剂组合物，包括在酸的作用下在有机溶剂中显示降低的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B）; 以及在形成抗蚀剂图案的方法中使用的抗蚀剂组合物，其包括：使用抗蚀剂组合物在基板上形成抗蚀剂膜; 进行抗蚀剂膜的曝光; 并使用含有有机溶剂的显影溶液通过负显影对抗蚀剂膜进行图案化以形成抗蚀剂图案，其中酸产生剂组分（B）含有产生logP值为2.7以下的酸的酸产生剂（B1）并且pKa值至少为-3.5。

6. 发明授权

US08206891B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08206891B2
公开(公告)日：2012-06-26
申请号：US12573686
申请日：2009-10-05
申请人： Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Takahiro Dazai , Tomoyuki Hirano , Fumitake Kaneko , Kotaro Endo
发明人： Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Takahiro Dazai , Tomoyuki Hirano , Fumitake Kaneko , Kotaro Endo
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111 , Y10S430/123
摘要： A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).
摘要翻译：一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A）酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。

7. 发明授权

US08206890B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US08206890B2
公开(公告)日：2012-06-26
申请号：US12499610
申请日：2009-07-08
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/039 , C07C381/12 , C07C309/04 , C07C309/17
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

8. 发明申请

US20100075249A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20100075249A1
公开(公告)日：2010-03-25
申请号：US12447432
申请日：2007-10-15
申请人： Yoshiyuki Utsumi , Hiroaki Shimizu , Kyoko Ohshita , Yasuhiro Yoshii
发明人： Yoshiyuki Utsumi , Hiroaki Shimizu , Kyoko Ohshita , Yasuhiro Yoshii
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041 , H01L21/0276 , Y10S430/108 , Y10S430/111
摘要： A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).
摘要翻译：一种正型抗蚀剂组合物，其包含在酸作用下表现出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含含有结构由通式（II）表示的单元（a1）或由通式（II）表示的结构单元（a1）组成的聚合物（A2）（其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上，并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构）。

9. 发明授权

US07682772B2 Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
公开(公告)号：US07682772B2
公开(公告)日：2010-03-23
申请号：US12265607
申请日：2008-11-05
申请人： Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
发明人： Takehiro Seshimo , Yoshiyuki Utsumi , Akiya Kawaue , Hideo Hada , Hiroaki Shimizu , Tsuyoshi Nakamura
IPC分类号： G03F7/004 , G03F7/30 , C07D327/02
CPC分类号： G03F7/0045 , C07D327/02 , C07D327/04 , C07D497/08 , C08K5/36 , C08K5/42 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1] X-Q1-Y1—SO3−M+ (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
摘要翻译：由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 [化学式1]其中Q1表示二价连接基团或单键的X-Q1-Y1-SO3-M +（I）X-Q1-Y1-SO3-A +（b1-1） Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

10. 发明申请

US20090208871A1 NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：新型化合物及其制造方法，酸发生器，耐蚀组合物和形成耐蚀图案的方法
公开(公告)号：US20090208871A1
公开(公告)日：2009-08-20
申请号：US12371876
申请日：2009-02-16
申请人： Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
发明人： Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
IPC分类号： G03F7/20 , G03F7/004 , C07D307/77
CPC分类号： C07D493/08 , C07D493/18 , G03F7/0045 , G03F7/0397
摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z− (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
摘要翻译：一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸发生器（B1）由以下所示的通式（b1-2）表示的化合物组成：<？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] < -line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> A + Z-（b1-2） <？in-line-formula description =“In-line formula”end =“tail”？>其中A +表示有机阳离子; Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成酯键直接键合到环结构上，另一个基团包括阴离子部分。

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