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    • 6. 发明授权
    • Defect inspection apparatus for phase shift mask
    • 相移掩模缺陷检查装置
    • US06879393B2
    • 2005-04-12
    • US09920450
    • 2001-08-01
    • Yasuhiro KoizumiShiaki MuraiShigeru NoguchiKatsuhide Tsuchiya
    • Yasuhiro KoizumiShiaki MuraiShigeru NoguchiKatsuhide Tsuchiya
    • G01B11/30G01N21/896G01N21/956G03F1/26G03F1/68G03F1/84G01N21/00
    • G01N21/95607G01N2021/95676G03F1/26G03F1/30G03F1/84
    • The present invention relates to a defect inspection apparatus for a phase shift mask that is capable of detecting phase shifter defects that cannot be detected by conventional inspection techniques, by a simple method using an optical method and a comparison of electric signals. In a defect inspection apparatus for a phase shift mask having a phase shifter pattern provided on a mask transparent substrate 1, after the phase shifter pattern has been formed, a phase shifter defect inspection is performed from the mask transparent substrate 1 side of the phase shift mask 1. To perform the defect inspection, light 12 is applied to the phase shift mask 1 from the mask transparent substrate 1 side thereof, and reflection images of at least two different phase shifter pattern fabricated regions are captured by photoelectric conversion light-receiving elements 15a and 15b. The respective image signals 17 and 18 of the reflection images are compared with each other to detect a defect on the mask from the difference between the signals.
    • 本发明涉及一种用于通过使用光学方法的简单方法和电信号的比较来检测常规检查技术无法检测的移相器缺陷的相移掩模的缺陷检查装置。 在具有设置在掩模透明基板1上的移相器图案的相移掩模的缺陷检查装置中,在形成移相器图案之后,从相移的掩模透明基板1侧进行移相器缺陷检查 掩模1.为了进行缺陷检查,从掩模透明基板1侧将光12施加到相移掩模1,并且通过光电转换光接收元件捕获至少两个不同的移相器图案制造区域的反射图像 15a和15b。 将反射图像的各图像信号17和18相互比较,以从信号之间的差异检测掩模上的缺陷。