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    • 1. 发明授权
    • Surface acoustic wave device comprising langasite single crystal substrate
    • 表面声波装置,包括硅藻土单晶基板
    • US06285112B1
    • 2001-09-04
    • US09038006
    • 1998-03-11
    • Masao TakeuchiMitsuhiro TanakaYuichiro Imanishi
    • Masao TakeuchiMitsuhiro TanakaYuichiro Imanishi
    • H01L4108
    • H03H9/0259
    • A surface acoustic wave device including a substrate and an electrode structure formed on the substrate, said substrate being made of an X-cut Langasite single crystal, a rotation Y-cut Langasite single crystal or a double rotation Y-cut Langasite single crystal. When the X-cut Langasite crystal having a large reflection coefficient is used, the electrode structure is formed to constitute a surface acoustic wave resonator. When the rotation Y-cut Langasite crystal having a large electro-mechanical coupling coefficient and a small reflection coefficient is used, the electrode structure is formed to constitute a surface acoustic wave filter. When the double rotation Y-cut Langasite crystal having an NSPUDT property is used, the electrode structure is formed to constitute a surface acoustic wave filter having a low insertion loss and an excellent phase property.
    • 一种表面声波装置,包括在基板上形成的基板和电极结构,所述基板由X切割朗氏石单晶,旋转Y切割斜长石单晶或双旋转Y切割朗氏石单晶制成。 当使用具有大反射系数的X切割朗氏硅酸盐晶体时,形成电极结构以构成表面声波谐振器。 当使用具有大的机电耦合系数和小的反射系数的旋转Y切割朗氏硅酸盐晶体时,形成电极结构以构成表面声波滤波器。 当使用具有NSPUDT特性的双旋转Y型朗氏硅酸盐晶体时,形成电极结构以构成具有低插入损耗和优异的相位特性的表面声波滤波器。
    • 2. 发明申请
    • surface treatment apparatus
    • 表面处理装置
    • US20080193330A1
    • 2008-08-14
    • US11826957
    • 2007-07-19
    • Eiki HottaNaohiro ShimizuYuichiro Imanishi
    • Eiki HottaNaohiro ShimizuYuichiro Imanishi
    • A61L2/14
    • H01J37/3244H01J37/32009
    • A surface treatment apparatus encompasses a gas introducing system configured to introduce a process gas from one end of a tubular treatment object; a vacuum evacuating system configured to evacuate the process gas from other end of the treatment object; an excited particle supplying system disposed at the gas supply upstream side to the treatment object, configured to supply excited particles for inducing initial discharge in a main body of the treatment object; and a first main electrode and a second main electrode disposed oppositely to each other, defining a treating region of the treatment object as a main plasma generating region disposed therebetween, wherein the excited particle supplying system is driven at least until generation of main plasma, and main pulse of duty ratio of 10−7 to 10−1 is applied between the first main electrode and second main electrode, to generate a non-thermal equilibrium plasma flow inside the treatment object, and thereby an inner surface of the treatment object is treated.
    • 表面处理装置包括:气体导入系统,其构造成从管状处理物体的一端引入处理气体; 真空排气系统,其构造成从处理对象的另一端抽出处理气体; 设置在处理对象的气体供给上游侧的激发粒子供给系统,被配置为在被处理体的主体中供给用于引发初始排出的激发粒子; 以及相对设置的第一主电极和第二主电极,将处理对象的处理区域设定为设置在其间的主等离子体产生区域,其中所述激发粒子供给系统至少被驱动至主等离子体的产生,以及 在第一主电极和第二主电极之间施加占空比为10 -7至10 -1的主脉冲,以在第一主电极和第二主电极之间产生非热平衡等离子体流 处理对象,从而处理对象的内表面。
    • 9. 发明申请
    • Sterilization/Aseptization Apparatus
    • 灭菌/消毒装置
    • US20100221155A1
    • 2010-09-02
    • US12084038
    • 2006-10-24
    • Naohiro ShimizuMasahiro WakitaYuichiro Imanishi
    • Naohiro ShimizuMasahiro WakitaYuichiro Imanishi
    • A61L2/02B01J19/12A61L2/10A61L2/14
    • A61L2/10A61L2/14
    • An aseptization apparatus 1 includes a sealed container 11 forming an aseptization space 191, a nitrogen gas supplying system 12 for converting atmosphere of the aseptization space 191 into nitrogen atmosphere, an electrode pair 13 disposed in the aseptization space 191, a pulse power supply 14 for repeatedly applying an electric pulse to the electrode pair 13, and a mirror 15 for returning a short-wavelength ultraviolet ray going from inside of the aseptization space 191 to outside to inside of the aseptization space 191. In a state where an aseptization object substance ST1 is present in a plasma generation region 192 between the electrode pair 13, the aseptization apparatus 1 causes a pulse electric field generated by electric pulse application to the electrode pair 13, a nitrogen radical 195 contained in plasma generated in nitrogen atmosphere resulting from fine streamer discharge, and a short-wavelength ultraviolet ray 196 emitted by nitrogen atmosphere resulting from fine streamer discharge to act on bacteria for aseptization of the aseptization object substance ST1.
    • 无菌化装置1包括形成无菌空间191的密闭容器11,将无菌空间191的气氛转换成氮气的氮气供给系统12,设置在无菌空间191内的电极对13,用于 向电极对13反复施加电脉冲,以及将从无菌化空间191的内部返回的短波长的紫外线返回到无菌化空间191的外部至内部的反射镜15.在无菌化物质ST1 存在于电极对13之间的等离子体产生区域192中,无菌化装置1使通过电脉冲施加到电极对13产生的脉冲电场,由氮气气氛中产生的等离子体中产生的细流光放电产生的氮自由基195 和由细流引起的氮气气体发射的短波长紫外线196 排出作用于细菌以对无菌物质ST1进行无菌化处理。