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1. 发明授权

US06299278B1 Head wiping mechanism for ink jet printer 失效
标题翻译：喷墨打印机头擦拭机构
公开(公告)号：US06299278B1
公开(公告)日：2001-10-09
申请号：US09019192
申请日：1998-02-05
申请人： Tadashi Hanabusa , Masanori Kaneko , Makoto Takemura
发明人： Tadashi Hanabusa , Masanori Kaneko , Makoto Takemura
IPC分类号： B41J2165
CPC分类号： B41J2/16544
摘要： A printer assembly providing quick and effective wiping of print heads. The printer assembly includes a carriage for holding a print head and having a slide contact, a slide having a wiper ramp, a carriage contact contactable by the slide contact of the carriage, and a wiper assembly including a base, a post extending from the base, a wiper arm, a wiper latch, a wiper holder, and a wiper blade, wherein the wiper arm is connected to the base such that the wiper arm is raised in a case that the wiper arm ramp moves laterally relative to and while in contact with the wiper arm, the wiper latch is connected to the wiper arm such that the wiper latch latches onto the post extending from the base in a case that the wiper arm is sufficiently raised, the wiper holder is connected to the wiper arm, and the wiper blade is connected to the wiper holder.
摘要翻译：打印机组件可快速有效地擦拭打印头。打印机组件包括用于保持打印头并具有滑动接触件的滑架，具有擦拭器斜面的滑动件，可由滑架的滑动接触件接触的滑架接触件以及包括底座的刮水器组件，刮水器臂，刮水器闩锁，刮水器保持器和刮水片，其中所述雨刮臂连接到所述底座，使得所述雨刮臂在所述雨刷臂斜坡相对于和接触时横向移动的情况下升高通过刮水器臂，刮水器闩锁连接到刮水臂，使得擦拭器闩锁锁定在从刮板臂充分升高的情况下从底座延伸的柱上，刮水器保持器连接到刮水臂，并且刮水片连接到刮水器支架。

2. 发明授权

US06250735B1 Cover for print head alignment sensor 失效
标题翻译：打印头对准传感器盖
公开(公告)号：US06250735B1
公开(公告)日：2001-06-26
申请号：US09019309
申请日：1998-02-05
申请人： Masanori Kaneko , Makoto Takemura
发明人： Masanori Kaneko , Makoto Takemura
IPC分类号： B41J201
CPC分类号： B41J2/01
摘要： A cover for an alignment sensor that provides sensor output so as to align printer output from multiple print heads in an ink jet printer. The cover is preferably mounted for hinged movement between an open position and a closed position so that a sensing face of the alignment sensor is protected from ink mist during printing operations. A chassis of the printer may be provided with projections that engage with the cover when the carriage is moved to extreme rightward and leftward positions on the printer, so that the cover may be hinged to the open and closed position simply through movement of the printer carriage. Preferably, the cover is formed of an electrically conductive material with a tab that grounds the cover to a metallic portion of the printer chassis. Forming the cover from an electrically conductive material provides the additional benefit of protecting the alignment sensor from static discharge.
摘要翻译：用于对准传感器的盖子，其提供传感器输出，以便将喷墨打印机中的多个打印头的打印机输出对准。优选地，所述盖安装成在打开位置和关闭位置之间进行铰接运动，使得在打印操作期间保护对准传感器的感测面不受墨雾影响。打印机的底盘可以设置有当托架移动到打印机上的向右和向左的最右位置时与盖接合的凸起，使得盖可以简单地通过打印机托架的移动而铰接到打开和关闭位置。优选地，盖由导电材料形成，具有将盖接合到打印机底盘的金属部分的突片。从导电材料形成盖子提供了保护对准传感器免受静电放电的附加益处。

3. 发明授权

US6089772A Ejection tray for a printer 失效
标题翻译：喷墨打印机
公开(公告)号：US6089772A
公开(公告)日：2000-07-18
申请号：US972139
申请日：1997-11-17
申请人： Makoto Takemura , Masanori Kaneko , Shinji Kanemitsu
发明人： Makoto Takemura , Masanori Kaneko , Shinji Kanemitsu
IPC分类号： B41J29/00 , B41J13/00 , B41J13/10 , B65H29/70 , B65H31/02
CPC分类号： B65H31/02 , B41J13/106 , B65H29/70 , B65H2405/11163 , B65H2405/11164
摘要： A printer includes a housing defining a media feed portion and a media eject port, the housing being adapted to house a print engine for printing onto recording media. Included in the printer is a base slideably receivable in the housing at a position laterally distanced from the media eject port, the base having at least a pair of recesses extending in a sliding direction of the base. A pair of flaps are included in the printer, each of which has at least one width portion corresponding to the lateral distance between the base and the eject port. Each flap is hinged into a corresponding recess of the base and is biased in an upward direction via a spring which provides for angular motion of the flap relative to the base. Upon sliding action of the base out of the housing, the flaps are biased upward out of the recesses to a height corresponding to the position of the media eject port.
摘要翻译：打印机包括限定介质进给部分和介质排出口的壳体，该壳体适于容纳用于打印到记录介质上的打印引擎。包括在打印机中的基座是在与介质排出口横向间隔开的位置处可滑动地容纳在壳体中的基座，基部具有至少一对沿基部的滑动方向延伸的凹部。打印机中包括一对翼片，每一个翼片具有至少一个宽度部分，该宽度部分对应于基座与弹出口之间的横向距离。每个翼片铰接到基座的相应的凹部中，并通过弹簧向上方向偏置，该弹簧提供翼片相对于底座的角运动。当底座从外壳滑动时，襟翼向上偏压出凹槽，至与介质排出口位置相对应的高度。

4. 发明授权

US08273623B2 Integrated high voltage capacitor having capacitance uniformity structures and a method of manufacture therefor 有权
标题翻译：具有电容均匀性结构的集成高压电容器及其制造方法
公开(公告)号：US08273623B2
公开(公告)日：2012-09-25
申请号：US13396159
申请日：2012-02-14
申请人： David L. Larkin , Lily X. Springer , Makoto Takemura , Ashish V. Gokhale , Dhaval A. Saraiya
发明人： David L. Larkin , Lily X. Springer , Makoto Takemura , Ashish V. Gokhale , Dhaval A. Saraiya
IPC分类号： H01L21/8242
CPC分类号： H01L27/0688 , H01L23/5223 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides an integrated high voltage capacitor, a method of manufacture therefore, and an integrated circuit chip including the same. The integrated high voltage capacitor, among other features, includes a first capacitor plate (120) located over or in a semiconductor substrate (105), and an insulator (130) located over the first capacitor plate (120), at least a portion of the insulator (130) comprising an interlevel dielectric layer (135, 138, 143, or 148). The integrated high voltage capacitor further includes capacitance uniformity structures (910) located at least partially within the insulator (130) and a second capacitor plate (160) located over the insulator (130).
摘要翻译：本发明提供了一种集成的高压电容器，因此制造方法和包括其的集成电路芯片。集成的高压电容器以及其它特征包括位于半导体衬底（105）上方或半导体衬底（105）中的第一电容器板（120）和位于第一电容器板（120）上方的绝缘体（130），至少一部分绝缘体（130）包括层间介电层（135,138,143或148）。集成高压电容器还包括至少部分位于绝缘体（130）内的电容均匀性结构（910）和位于绝缘体（130）上方的第二电容器板（160）。

5. 发明授权

US08114731B2 Integrated high voltage capacitor having capacitance uniformity structures and a method of manufacture therefor 有权
公开(公告)号：US08114731B2
公开(公告)日：2012-02-14
申请号：US12276507
申请日：2008-11-24
申请人： David L. Larkin , Lily X. Springer , Makoto Takemura , Ashish V. Gokhale , Dhaval A. Saraiya
发明人： David L. Larkin , Lily X. Springer , Makoto Takemura , Ashish V. Gokhale , Dhaval A. Saraiya
IPC分类号： H01L21/8244
CPC分类号： H01L27/0688 , H01L23/5223 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides an integrated high voltage capacitor, a method of manufacture therefore, and an integrated circuit chip including the same. The integrated high voltage capacitor, among other features, includes a first capacitor plate (120) located over or in a semiconductor substrate (105), and an insulator (130) located over the first capacitor plate (120), at least a portion of the insulator (130) comprising an interlevel dielectric layer (135, 138, 143, or 148). The integrated high voltage capacitor further includes capacitance uniformity structures (910) located at least partially within the insulator (130) and a second capacitor plate (160) located over the insulator (130).

6. 发明申请

US20110166131A1 SUBSTITUTED PYRROLIDINE DERIVATIVE 失效
标题翻译：取代吡咯烷衍生物
公开(公告)号：US20110166131A1
公开(公告)日：2011-07-07
申请号：US13045567
申请日：2011-03-11
申请人： Hisashi TAKAHASHI , Junichi Kuroyanagi , Rie Miyauchi , Masatoshi Nagamochi , Makoto Takemura , Isao Hayakawa
发明人： Hisashi TAKAHASHI , Junichi Kuroyanagi , Rie Miyauchi , Masatoshi Nagamochi , Makoto Takemura , Isao Hayakawa
IPC分类号： A61K31/5383 , C07D498/06 , A61P31/04
CPC分类号： C07D401/04 , C07D498/06
摘要： A quinolone antibacterial compound, or a salt or hydrate of the compound, for the treatment of infectious diseases, which exhibit potent antibacterial activity and higher selective toxicity against Gram-positive and Gram-negative bacteria, which do not cause side effects (e.g., convulsion), which exhibit higher safety, and which has a structure of formula (I):
摘要翻译：用于治疗感染性疾病的喹诺酮类抗菌化合物或化合物的盐或水合物，其对革兰氏阳性和革兰氏阴性菌具有强力的抗菌活性和较高的选择性毒性，其不引起副作用（例如惊厥），其具有更高的安全性，并且具有式（I）的结构：

7. 发明授权

US07960254B2 Manufacturing method for epitaxial wafer 有权
标题翻译：外延晶圆的制造方法
公开(公告)号：US07960254B2
公开(公告)日：2011-06-14
申请号：US12645744
申请日：2009-12-23
申请人： Naoyuki Wada , Makoto Takemura
发明人： Naoyuki Wada , Makoto Takemura
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： H01L21/68742 , C23C16/4411 , C23C16/481 , C23C24/082 , H01L21/02532 , H01L21/02579
摘要： To provide a manufacturing method for an epitaxial wafer that alleviates distortions on a back surface thereof due to sticking between a wafer and a susceptor, thereby preventing decrease in flatness thereof due to a lift pin. A manufacturing method for an epitaxial wafer according to the present invention includes: an oxide film forming step in which an oxide film is formed on a back surface thereof; an etching step in which a hydrophobic portion exposing a back surface of the semiconductor wafer is provided by partially removing the oxide film; a wafer placing step in which the semiconductor wafer is placed; and an epitaxial growth step in which an epitaxial layer is grown on a main surface of the semiconductor wafer; and the diameter of the lift pin installation circle provided on a circle on a bottom face of a susceptor is smaller than that of the hydrophobic portion.
摘要翻译：为了提供一种外延晶片的制造方法，其能够缓和由于晶片和基座之间的粘附而引起的背面的变形，从而防止由于升降销引起的平坦度的降低。根据本发明的外延晶片的制造方法包括：在其背面形成有氧化膜的氧化膜形成工序; 通过部分去除氧化膜来提供暴露半导体晶片的背面的疏水部分的蚀刻步骤; 放置半导体晶片的晶片放置步骤; 以及在半导体晶片的主表面上生长外延层的外延生长步骤; 并且设置在基座的底面上的圆上的提升销安装圈的直径小于疏水部分的直径。

8. 发明授权

US07731801B2 Semiconductor wafer treatment method and apparatus therefor 有权
标题翻译：半导体晶片处理方法及其装置
公开(公告)号：US07731801B2
公开(公告)日：2010-06-08
申请号：US11213809
申请日：2005-08-30
申请人： Makoto Takemura , Yasuo Fukuda , Kazuaki Souda , Junichiro Iwahashi , Koichi Okuda
发明人： Makoto Takemura , Yasuo Fukuda , Kazuaki Souda , Junichiro Iwahashi , Koichi Okuda
IPC分类号： B08B6/00 , C25F1/00 , C25F3/30
CPC分类号： H01L21/02052 , B08B3/04 , B08B2203/005 , H01L21/304
摘要： In the ozone water treatment process, the silicon wafer is treated with the first ultra-pure water that includes ozone. The first ultra-pure water is refined by the ultraviolet ray sterilization method. The first ultra-pure water includes total organic carbon content of more than 1 μg/liter and not more than 20 μg/liter, so that the silicon wafer of the predetermined degree of cleanliness is obtained. The silicon wafer is treated by using the second ultra-pure water that has a lower TOC value than the first ultra-pure water in the ultra-pure water rinsing process (including the chemical solution cleaning process as required). The second ultra-pure water is refined by the ultraviolet ray oxidization method, and includes total organic carbon content with a concentration of 1 μg/liter or less. Thus the silicon wafer of the predetermined degree of cleanliness is obtained.
摘要翻译：在臭氧水处理工艺中，用包含臭氧的第一超纯水处理硅晶片。第一超纯水通过紫外线灭菌法精制。第一超纯水的总有机碳含量大于1μg/升且不大于20μg/升，从而获得预定清洁度的硅晶片。在超纯水冲洗过程（包括所需的化学溶液清洗过程）中，使用具有比第一超纯水低的TOC值的第二超纯水处理硅晶片。第二超纯水通过紫外线氧化法精制，其总有机碳含量为1μg/升以下。因此，获得了预定清洁度的硅晶片。

9. 发明申请

US20090270637A1 PROCESS FOR PREPARATION OF TETRASUBSTITUTED 5-AZASPIRO[2.4]- HEPTANE DERIVATIVES AND OPTICALLY ACTIVE INTERMEDIATES THEREOF 失效
标题翻译：四唑衍生物的制备方法[2.4] - 丙氨酸衍生物及其光学活性中间体
公开(公告)号：US20090270637A1
公开(公告)日：2009-10-29
申请号：US12067737
申请日：2006-09-28
申请人： Hisashi Takahashi , Rie Miyauchi , Yasuyuki Takeda , Kazuo Kanai , Junichi Kuroyanagi , Satoshi Komoriya , Makoto Takemura
发明人： Hisashi Takahashi , Rie Miyauchi , Yasuyuki Takeda , Kazuo Kanai , Junichi Kuroyanagi , Satoshi Komoriya , Makoto Takemura
IPC分类号： C07D209/54
CPC分类号： C07D209/54 , C07D207/14 , C07D207/273 , C07D207/277 , C07D471/04
摘要： The present invention provides a method for effectively producing an optically active form of tetrasubstituted-5-azaspiro[2.4]heptane derivative, which serves as a useful production intermediate for quinolonecarboxylic acid antibacterial agents, and intermediates for the derivative. The present invention is directed to a method for producing a compound (VII) according to the following scheme.
摘要翻译：本发明提供了有效地制备作为喹诺酮羧酸抗菌剂的有用的生产中间体的四取代-5-氮杂螺[2.4]庚烷衍生物的光学活性形式的方法和该衍生物的中间体。本发明涉及根据下列方案制备化合物（Ⅶ）的方法。

10. 发明申请

US20070191356A1 Pyridobenzoxazine derivative 审中-公开
标题翻译：吡啶并苯并恶嗪衍生物
公开(公告)号：US20070191356A1
公开(公告)日：2007-08-16
申请号：US10587946
申请日：2005-02-01
申请人： Makoto Takemura , Hitoshi Ohki
发明人： Makoto Takemura , Hitoshi Ohki
IPC分类号： A61K31/535 , C07D265/38
CPC分类号： C07D498/06 , A23K20/111 , A23K20/195 , A23K50/80 , A23L3/3544 , A61K31/5383
摘要： A quinolone antimicrobial agent having potent antimicrobial activity against gram positive and gram negative bacteria and having high safety is provided. A compound represented by the following formula (1): [Chemical formula 1] [wherein, R1: hydrogen, alkyl, cycloalkyl, or substituted carbonyl derived from amino acid, peptide or tripeptide; R2: hydrogen, alkyl, or cycloalkyl; R3: hydrogen, amino, halogen, or alkyl; R4: hydrogen, phenyl, acetoxymethyl, pivaloyloxymethyl, ethoxycarbonyl, choline, dimethylaminoethyl, 5-indanyl, phthalidinyl, 5-alkyl-2-oxo-1,3-dioxol-4-ylmethyl, 3-acetoxy-2-oxobutyl, alkyl, alkoxymethyl, or phenylalkyl; X, X1, X2: hydrogen or halogen] or salt thereof, or a hydrate thereof; and antimicrobial agent and therapeutic agent for infections, each containing the compound, salt thereof or a hydrate thereof.
摘要翻译：提供了对革兰氏阳性和革兰氏阴性细菌具有强抗微生物活性并具有高安全性的喹诺酮类抗微生物剂。由下式（1）表示的化合物：[化学式1] [其中，R 1，H 2，氢，烷基，环烷基或衍生自氨基酸，肽或三肽的取代的羰基; R 2：氢，烷基或环烷基; 氢，氨基，卤素或烷基; 吡啶，二甲基氨基乙基，5-茚满基，邻苯二甲酰基，5-烷基-2-氧代-1,3-二氧杂环戊烯-4-基甲基，3-甲氧基羰基，乙酰氧基-2-氧代丁基，烷基，烷氧基甲基或苯基烷基; X，X 1，X 2：氢或卤素]或其盐或其水合物; 和抗微生物剂和感染治疗剂，各自含有化合物，其盐或其水合物。

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