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1. 发明申请

US20120246601A1 PATTERN CORRECTING METHOD, MASK FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：图案校正方法，掩模形成方法和制造半导体器件的方法
公开(公告)号：US20120246601A1
公开(公告)日：2012-09-27
申请号：US13237435
申请日：2011-09-20
申请人： Masanari KAJIWARA , Toshiya KOTANI , Sachiko KOBAYASHI , Hiromitsu MASHITA , Fumiharu NAKAJIMA
发明人： Masanari KAJIWARA , Toshiya KOTANI , Sachiko KOBAYASHI , Hiromitsu MASHITA , Fumiharu NAKAJIMA
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70 , G03F7/70441
摘要： A pattern correcting method of an embodiment computes a distribution of pattern coverages on a design layout of a circuit pattern in the vicinity of a position that becomes an error pattern in a case where an on-substrate pattern is formed. Then, an area on the design layout in which a difference in the distribution of the pattern coverages becomes small by adding an addition pattern is set as an addition area. Next, addition pattern candidates to be added to the addition area are generated, an addition pattern to be added to the design layout is selected from the candidates on the basis of a predetermined selection criterion, and the addition pattern is added to the addition area.
摘要翻译：实施例的图案校正方法在形成有衬底图案的情况下，在成为误差图案的位置附近的电路图案的设计布局上计算图案覆盖率的分布。然后，通过添加加法图案，设置图案覆盖物的分布差异变小的设计布局上的区域作为附加区域。接下来，生成要添加到相加区域的添加模式候选，并根据预定的选择标准从候选中选择要添加到设计布局的添加模式，并将添加模式添加到添加区域。

2. 发明申请

US20080216045A1 MASK DATA PROCESSING METHOD FOR OPTIMIZING HIERARCHICAL STRUCTURE 失效
标题翻译：用于优化分层结构的掩模数据处理方法
公开(公告)号：US20080216045A1
公开(公告)日：2008-09-04
申请号：US11945697
申请日：2007-11-27
申请人： Sachiko KOBAYASHI , Toshiya Kotani , Shinichiroh Ohki , Hirotaka Ichikawa
发明人： Sachiko KOBAYASHI , Toshiya Kotani , Shinichiroh Ohki , Hirotaka Ichikawa
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： Disclosed is a mask data processing method of correcting a hierarchical structure. In the case that in design data having a hierarchical structure including a plurality of cells each having a design pattern, when the total number of graphic forms or the total edge length of a design pattern on which the calculation of mask data processing is to be executed, the amount of calculation to be executed, or the expansion degree presumably becomes equal to or larger than a predetermined threshold value if the calculation of the mask data processing is executed on the design data having the initial hierarchical structure, the hierarchical structure is corrected. This correction is performed to reduce the total number of graphic forms or the total edge length of the design pattern on which the calculation is to be executed, the amount of calculation to be executed, of the expansion degree.
摘要翻译：公开了一种校正层次结构的掩模数据处理方法。在具有包括多个单元的设计数据的设计数据中，每个单元均具有设计图案时，当要执行掩模数据处理的计算的设计图案的总数或总边缘长度时如果对具有初始层次结构的设计数据执行掩模数据处理的计算，则修正了要执行的计算量或扩展度等于或大于预定阈值等于或大于预定阈值。执行该校正以减少要执行计算的设计模式的总数或总边缘长度，即要执行的计算量，扩展度。

3. 发明申请

US20090037852A1 PATTERN DATA GENERATION METHOD AND PATTERN DATA GENERATION PROGRAM 有权
标题翻译：模式数据生成方法和模式数据生成程序
公开(公告)号：US20090037852A1
公开(公告)日：2009-02-05
申请号：US12180244
申请日：2008-07-25
申请人： Sachiko KOBAYASHI , Suigen Kyoh , Shimon Maeda
发明人： Sachiko KOBAYASHI , Suigen Kyoh , Shimon Maeda
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： A pattern data generation method of an aspect of the present invention, the method includes creating at least one modification guide to modify a modification target point contained in pattern data, evaluating the modification guides on the basis of an evaluation item, the evaluation item being a change in the shape of the pattern data for the modification target point caused by the modification based on the modification guides or a change in electric characteristics of a pattern formed in accordance with the pattern data, selecting a predetermined modification guide from among the modification guides on the basis of the evaluation result of the modification guides, and modifying the modification target point in accordance with the selected modification guide.
摘要翻译：本发明的一个方式的图形数据生成方法，该方法包括创建至少一个修改指南，以修改包含在图案数据中的修改目标点，基于评估项目评估修改指南，评估项目是基于修改引导引起的修改目标点的图案数据的形状的改变或根据图案数据形成的图案的电特性的变化，从修改引导件中选择预定的修改指南修改指南的评估结果的基础，以及根据所选择的修改指南修改修改目标点。

4. 发明申请

US20080184183A1 PATTERN FORMING METHOD AND PATTERN VERIFYING METHOD 失效
标题翻译：图案形成方法和图案验证方法
公开(公告)号：US20080184183A1
公开(公告)日：2008-07-31
申请号：US12020275
申请日：2008-01-25
申请人： Sachiko KOBAYASHI
发明人： Sachiko KOBAYASHI
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： A pattern forming method including modifying design data subjected to a first design rule check in design data of a pattern to be formed in a semiconductor substrate, performing the first design rule check to the modified design data again, outputting the modified design data which does not violate the first design rule as pattern forming design data used in actual pattern formation, and performing a second design rule check having an allowable range wider than that of the first design rule to the modified design data which violates the first design rule, and outputting the modified design data which does not violate the second design rule as the pattern forming design data, and redesigning the pattern to satisfy the second design rule or adjusting the modification guideline such that the modified design data which violates the second design rule satisfies the second design rule.
摘要翻译：一种图案形成方法，包括修改经过第一设计规则的设计数据检查要在半导体衬底中形成的图案的设计数据，再次对经修改的设计数据执行第一设计规则检查，输出不改变的设计数据违反第一设计规则作为在实际图案形成中使用的图案形成设计数据，并且对违反第一设计规则的修改后的设计数据执行具有比第一设计规则宽的容许范围的第二设计规则检查，并输出修改的设计数据不违反第二设计规则作为图案形成设计数据，并且重新设计图案以满足第二设计规则或调整修改指南，使得违反第二设计规则的修改后的设计数据满足第二设计规则。

5. 发明申请

US20110275632A1 Method for preventing or treating a disease related to the glucocorticoid receptor 失效
标题翻译：预防或治疗与糖皮质激素受体有关的疾病的方法
公开(公告)号：US20110275632A1
公开(公告)日：2011-11-10
申请号：US13135765
申请日：2011-07-14
申请人： Mamoru MATSUDA , Masato NAGATSUKA , Toshiyuki MORI , Sachiko KOBAYASHI , Masatomo KATO , Miwa TAKAI
发明人： Mamoru MATSUDA , Masato NAGATSUKA , Toshiyuki MORI , Sachiko KOBAYASHI , Masatomo KATO , Miwa TAKAI
IPC分类号： A61K31/5377 , A61K31/47 , A61P29/00 , A61P3/00 , A61P27/02 , A61P37/08 , A61P25/00 , A61P9/00 , A61P43/00 , A61K31/4709 , A61P37/06
CPC分类号： C07D401/12 , C07D215/14 , C07D405/12 , C07D409/12 , C07D409/14 , C07D417/12
摘要： A method for preventing or treating a disease related to the glucocorticoid receptor involving administering a pharmacologically effective amount of a 1,2-dihydroquinoline compound.
摘要翻译：一种预防或治疗涉及糖皮质激素受体的疾病的方法，包括施用药理学有效量的1,2-二氢喹啉化合物。

6. 发明申请

US20080098341A1 DESIGN LAYOUT GENERATING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUITS 失效
标题翻译：用于半导体集成电路的设计布局生成方法
公开(公告)号：US20080098341A1
公开(公告)日：2008-04-24
申请号：US11874601
申请日：2007-10-18
申请人： Sachiko KOBAYASHI , Suigen KYOH
发明人： Sachiko KOBAYASHI , Suigen KYOH
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： A design layout generating method for generating a design pattern of a semiconductor integrated circuit is disclosed. This method comprises modifying a first modification area extracted from a design layout by a first modifying method, and modifying a second modification area extracted from the design layout so as to include the first modification area by a second modifying method on the basis of a pattern modifying guideline calculated from at least a partial design layout in the second modification area.
摘要翻译：公开了一种用于产生半导体集成电路的设计图案的设计布局生成方法。该方法包括：通过第一修改方法修改从设计布局提取的第一修改区域，以及修改从设计布局提取的第二修改区域，以便通过基于模式修改的第二修改方法来包括第一修改区域从第二修改区域中的至少部分设计布局计算出的准则。

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