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    • 1. 发明申请
    • Powder coating composition and coating method of aluminum wheel
    • 铝轮的粉末涂料组成和涂布方法
    • US20060173113A1
    • 2006-08-03
    • US11344009
    • 2006-02-01
    • Masami YabutaNobuo IgaTomoya TsujiYuji Toyoda
    • Masami YabutaNobuo IgaTomoya TsujiYuji Toyoda
    • B05D3/02C08K9/12C08K3/08
    • B05D7/532B05D1/04B05D3/0254B05D7/536B05D2202/25
    • It is an object of the present invention to provide a powder coating composition, which can exhibit a sufficient hiding power, a corrosion resistance and an excellent appearance and can reduce a coating process and is particularly suitable for coating of an aluminum wheel because of its high low temperature curability and has excellent storage stability, and a coating method of an aluminum wheel using the same. A powder coating composition consisting of a powder coating composition particle, wherein said powder coating composition particle comprises at least a thermosetting resin powder formed by binding a metallic pigment with a binder and said thermosetting resin powder comprises a β-hydroxyalkylamide curing agent expressed by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group or an ethyl group, R2 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or HOCH(R1)CH2—, and A represents a bivalent hydrocarbon group.
    • 本发明的目的是提供一种粉末涂料组合物,其可以显示出足够的遮盖力,耐腐蚀性和优异的外观,并且可以减少涂布过程,并且特别适用于铝轮的涂覆,因为其高 低温固化性和优异的储存稳定性,以及使用其的铝轮的涂布方法。 一种由粉末涂料组合物颗粒组成的粉末涂料组合物,其中所述粉末涂料组合物颗粒至少包含通过将金属颜料与粘合剂结合而形成的热固性树脂粉末和所述热固性树脂粉末包含由下列表示的β-羟基烷基酰胺固化剂 通式(1):其中R 1表示氢原子,甲基或乙基,R 2表示氢原子,具有1〜5个的烷基 碳原子或HOCH(R 1)CH 2 - ,A表示二价烃基。
    • 2. 发明申请
    • ETCHING METHOD
    • 蚀刻方法
    • US20110056910A1
    • 2011-03-10
    • US12867109
    • 2009-02-04
    • Makoto KatoYuji ToyodaKunihiro NakagawaMariko Ishida
    • Makoto KatoYuji ToyodaKunihiro NakagawaMariko Ishida
    • C23F1/04C23F1/18
    • C23F1/18H05K3/067H05K2203/075H05K2203/1476H05K2203/1563H05K2203/1572
    • Etching is carried out with an etchant that reacts with a metal to be etched to form an insoluble compound. After the etching using the above etchant, etching is carried out using an etchant that does not form an insoluble compound through a reaction with the metal to be etched, whereby the form of an etched portion comes close to a rectangular form, and the side surface of a conductor pattern becomes smooth. Further, after the etching of one surface of a material to be etched is carried out using an etchant that reacts with a metal to be etched to form an insoluble compound nearly from below, the upper and lower sides of the material to be etched is reversed, and the etching of the opposite surface is carried out nearly from below, whereby fine conductor patterns can be formed on both of the surfaces.
    • 用蚀刻剂与待蚀刻的金属反应形成不溶性化合物进行蚀刻。 在使用上述蚀刻剂进行蚀刻之后,通过与被蚀刻金属的反应不形成不溶性化合物的蚀刻剂进行蚀刻,由此蚀刻部分的形状接近矩形,并且侧面 的导体图形变得平滑。 此外,在使用与要蚀刻的金属反应的蚀刻剂蚀刻待蚀刻材料的一个表面以形成几乎从下方形成不溶性化合物之后,待蚀刻材料的上侧和下侧反转 ,并且相对表面的蚀刻几乎从下方进行,由此可以在两个表面上形成精细的导体图案。
    • 4. 发明授权
    • Method for electroconductive pattern formation
    • 导电图案形成方法
    • US08546066B2
    • 2013-10-01
    • US12865259
    • 2009-01-22
    • Munetoshi IrisawaYuji ToyodaYasuo KanedaKunihiro Nakagawa
    • Munetoshi IrisawaYuji ToyodaYasuo KanedaKunihiro Nakagawa
    • G03F7/20
    • H05K3/064G03F7/093G03F7/168G03F7/2022H05K3/0094H05K3/427H05K2203/0505H05K2203/0769H05K2203/0793H05K2203/1394H05K2203/1476
    • A method for forming a conductor pattern comprising the steps of (a) forming a photo-crosslinkable resin layer on a substrate provided with a conductive layer on its surface, (b) treating the photo-crosslinkable resin layer with an alkali aqueous solution to render it thinner, (c) carrying out exposure for a circuit pattern, (d) developing and (e) etching, the steps included in this order, said alkali aqueous solution being an aqueous solution containing 5 to 20 mass % of an inorganic alkaline compound, or method for forming a conductor pattern comprising the steps of (a′) forming a photo-crosslinkable resin layer on a substrate provide with a conductive layer on its surface and inside a hole thereof, (i) curing the photo-crosslinkable resin layer on the hole alone or on the hole and a surrounding area thereof, (b′) treating the photo-crosslinkable resin layer in an uncured portion with an alkali aqueous solution to render it thinner, (c) carrying out exposure for a circuit pattern, (d) developing and (e) etching, these steps included in this order, said alkali aqueous solution being an aqueous solution containing 5 to 20 mass % of an inorganic alkaline compound.
    • 一种形成导体图案的方法,包括以下步骤:(a)在其表面上具有导电层的基底上形成光可交联树脂层,(b)用碱水溶液处理光交联树脂层, 更薄,(c)进行电路图案的曝光,(d)显影和(e)蚀刻,依次包括的步骤,所述碱性水溶液是含有5〜20质量%的无机碱性化合物 或形成导体图案的方法包括以下步骤:(a)在基材上形成光交联性树脂层,在其表面和内部形成导电层,(i)使光交联性树脂层固化 在孔单独或孔上及其周围区域,(b')用碱性水溶液处理未固化部分中的光交联性树脂层使其变薄,(c)进行电路图案的曝光, (d )显影和(e)蚀刻,这些步骤按顺序包含,所述碱性水溶液是含有5〜20质量%的无机碱性化合物的水溶液。
    • 5. 发明申请
    • METHOD FOR ELECTROCONDUCTIVE PATTERN FORMATION
    • 电磁图形成的方法
    • US20100330504A1
    • 2010-12-30
    • US12865259
    • 2009-01-22
    • Munetoshi IrisawaYuji ToyodaYasuo KanedaKunihiro Nakagawa
    • Munetoshi IrisawaYuji ToyodaYasuo KanedaKunihiro Nakagawa
    • G03F7/20
    • H05K3/064G03F7/093G03F7/168G03F7/2022H05K3/0094H05K3/427H05K2203/0505H05K2203/0769H05K2203/0793H05K2203/1394H05K2203/1476
    • A method for forming a conductor pattern comprising the steps of (a) forming a photo-crosslinkable resin layer on a substrate provided with a conductive layer on its surface, (b) treating the photo-crosslinkable resin layer with an alkali aqueous solution to render it thinner, (c) carrying out exposure for a circuit pattern, (d) developing and (e) etching, the steps included in this order, said alkali aqueous solution being an aqueous solution containing 5 to 20 mass % of an inorganic alkaline compound, or method for forming a conductor pattern comprising the steps of (a′) forming a photo-crosslinkable resin layer on a substrate provide with a conductive layer on its surface and inside a hole thereof, (i) curing the photo-crosslinkable resin layer on the hole alone or on the hole and a surrounding area thereof, (b′) treating the photo-crosslinkable resin layer in an uncured portion with an alkali aqueous solution to render it thinner, (c) carrying out exposure for a circuit pattern, (d) developing and (e) etching, these steps included in this order, said alkali aqueous solution being an aqueous solution containing 5 to 20 mass % of an inorganic alkaline compound.
    • 一种形成导体图案的方法,包括以下步骤:(a)在其表面上具有导电层的基底上形成光可交联树脂层,(b)用碱水溶液处理光交联树脂层, 更薄,(c)进行电路图案的曝光,(d)显影和(e)蚀刻,依次包括的步骤,所述碱性水溶液是含有5〜20质量%的无机碱性化合物 或形成导体图案的方法包括以下步骤:(a)在基材上形成光交联性树脂层,在其表面和内部形成导电层,(i)使光交联性树脂层固化 在孔单独或孔上及其周围区域,(b')用碱性水溶液处理未固化部分中的光交联性树脂层使其变薄,(c)进行电路图案的曝光 ,(d)显影和(e)蚀刻这些步骤,所述碱性水溶液是含有5〜20质量%的无机碱性化合物的水溶液。