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    • 4. 发明申请
    • SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
    • 表面处理剂和表面处理方法
    • US20110073011A1
    • 2011-03-31
    • US12889905
    • 2010-09-24
    • Masaaki YOSHIDAMai SUGAWARAJun KOSHIYAMA
    • Masaaki YOSHIDAMai SUGAWARAJun KOSHIYAMA
    • C09D5/00
    • C09D7/20
    • Provided are a surface treatment agent that can effectively suppress pattern collapse of an inorganic pattern or resin pattern provided on a substrate, a surface treatment method using such a surface treatment agent, as well as a surface treatment agent that can carry out silylation treatment to a high degree on the surface of a substrate, and a surface treatment method using such a surface treatment agent. A surface treatment agent is used that is employed in hydrophobization treatment of a substrate surface and includes a silylation agent containing at least one compound having a disilazane structure and a solvent containing a five- or six-membered ring lactone compound.
    • 提供了能够有效地抑制基板上设置的无机图案或树脂图案的图案塌陷的表面处理剂,使用这样的表面处理剂的表面处理方法以及可以进行甲硅烷基化处理的表面处理剂 在基材表面上的高度,以及使用这种表面处理剂的表面处理方法。 使用表面处理剂,其用于底物表面的疏水化处理,并且包括含有至少一种具有二硅氮烷结构的化合物和含有五元或六元环内酯化合物的溶剂的甲硅烷基化剂。
    • 6. 发明申请
    • MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORESIST PATTERN
    • 形成保护膜的材料和形成光电子图案的方法
    • US20110065053A1
    • 2011-03-17
    • US12879809
    • 2010-09-10
    • Masaaki YOSHIDAKiyoshi ISHIKAWAAtsushi SAWANOYuriko SHIRAITakumi NAMIKI
    • Masaaki YOSHIDAKiyoshi ISHIKAWAAtsushi SAWANOYuriko SHIRAITakumi NAMIKI
    • G03F7/20C08F32/08C08L55/00
    • G03F7/2041C08F232/08G03F7/0046G03F7/11
    • The present invention provides a material for forming a protective film that has favorable alkali solubility and gives a protective film excelling in water repellency, as well as a method for forming a photoresist pattern using this material for forming a protective film. The material for forming a protective film of the present invention contains an alkali-soluble polymer having a unit derived from a monomer represented by the following general formula (A-1) as a constitutional unit. In the general formula (A-1), R1 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; R2, R3, and R4 are each independently an alkylene chain having 1 to 6 carbon atoms or the like; R5 and R6 are each independently an alkyl group or fluoroalkyl group having 1 to 15 carbon atoms or the like; and at least one of R5 and R6 is a fluoroalkyl group; Z is an alkylene chain having 1 to 2 carbon atoms or an oxygen atom; m is 0 or 1; and n is an integer of 0 to 3.
    • 本发明提供一种形成保护膜的材料,该保护膜具有良好的碱溶性,并提供防水性优异的保护膜,以及使用该材料形成保护膜形成光刻胶图案的方法。 用于形成本发明的保护膜的材料含有具有由下述通式(A-1)表示的单体衍生的单元作为结构单元的碱溶性聚合物。 在通式(A-1)中,R 1为氢原子,碳原子数1〜6的烷基等; R 2,R 3和R 4各自独立地为具有1〜6个碳原子的亚烷基链等; R 5和R 6各自独立地为具有1〜15个碳原子的烷基或氟代烷基等; 并且R 5和R 6中的至少一个是氟代烷基; Z是具有1至2个碳原子或氧原子的亚烷基链; m为0或1; n为0〜3的整数。
    • 8. 发明申请
    • SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD
    • 表面处理剂和表面处理方法
    • US20110118494A1
    • 2011-05-19
    • US12943466
    • 2010-11-10
    • Masaaki YOSHIDAMai SUGAWARANaohisa UENOJun KOSHIYAMA
    • Masaaki YOSHIDAMai SUGAWARANaohisa UENOJun KOSHIYAMA
    • C07F7/10C07F7/21
    • C07F7/10G03F7/11
    • Provided are a surface treatment agent for which hydrophobization to a high degree is possible even in a case of the material of a substrate surface being TiN or SiN, and surface treatment method using such a surface treatment agent. The surface treatment agent according to the present invention contains a cyclic silazane compound. As this cyclic silazane compound, a cyclic disilazane compound such as 2,2,5,5-tetramethyl-2,5-disila-1-azacyclopentane and 2,2,6,6-tetramethyl-2,6-disila-1-azacyclohexane and a cyclic trisilazane compound such as 2,2,4,4,6,6-hexamethylcyclotrisilazane and 2,4,6-trimethyl-2,4,6-trivinylcyclotrisilazane are preferred. In the surface treatment, a substrate surface is exposed to a surface treatment agent according to the present invention, and the substrate surface is hydrophobized.
    • 即使在基材表面的材料为TiN或SiN的情况下,也可以使用这种表面处理剂的表面处理方法,能够高度疏水化的表面处理剂。 本发明的表面处理剂含有环状硅氮烷化合物。 作为该环状硅氮烷化合物,可以使用2,2,5,5-四甲基-2,5-二脱氧-1-氮杂环戊烷和2,2,6,6-四甲基-2,6-二脱氧-1- 氮杂环己烷和环状三硅氮烷化合物如2,2,4,4,6,6-六甲基环三硅氮烷和2,4,6-三甲基-2,4,6-三乙烯基环三氮烷是优选的。 在表面处理中,将基材表面暴露于根据本发明的表面处理剂,并且将基材表面疏水化。