专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4935981A Cleaning apparatus having a contact buffer apparatus 失效
标题翻译：具有接触缓冲装置的清洗装置
公开(公告)号：US4935981A
公开(公告)日：1990-06-26
申请号：US294196
申请日：1989-01-06
申请人： Masami Ohtani , Masami Nishida
发明人： Masami Ohtani , Masami Nishida
IPC分类号： H01L39/24 , B01J19/12 , C23C14/34 , C30B29/22 , H01B13/00 , H01L21/00 , H01L21/203 , H01L21/683
CPC分类号： H01L21/67046 , H01L21/6838
摘要： An improved swing type substrate cleaning apparatus comprises a substrate chuck for holding the substrate while rotating the same, a cleaning brush holding apparatus for holding a cleaning brush while rotating the same, a cleaning brush elevating apparatus for holding the cleaning brush holding apparatus in a manner enabling elevation and swing of the same, and a buffer apparatus for reducing the velocity at which the cleaning brush elevating apparatus lowers the cleaning brush holding apparatus when the cleaning brush is lowered to be in contact with the substrate. Since the velocity with which the cleaning brush is lowered is reduced to be lower than a prescribed value by means of the buffer apparatus, no significant shock is created when the cleaning brush is brought into contact with the substrate.
摘要翻译：一种改进的摆动式基板清洁装置，包括用于在旋转基板的同时保持基板的基板卡盘，用于在旋转清洁刷的同时保持清洁刷的清洁刷保持装置，用于以清洁刷保持装置保持的清洁刷升降装置能够使其升降和摆动;以及缓冲装置，用于降低清洁刷升降装置降低清洁刷保持装置时的速度，当清洁刷降低以与基板接触时。由于通过缓冲装置将清洁刷降低的速度降低到低于规定值，所以当清洁刷与基板接触时不会产生显着的冲击。

2. 发明授权

US4923054A Wafer transfer apparatus having an improved wafer transfer portion 失效
标题翻译：具有改进的晶片转印部分的晶片传送装置
公开(公告)号：US4923054A
公开(公告)日：1990-05-08
申请号：US275525
申请日：1988-11-22
申请人： Masami Ohtani , Masami Nishida
发明人： Masami Ohtani , Masami Nishida
IPC分类号： B65G1/02 , B65G1/00 , B65G1/07 , B65G47/91 , B65H1/28 , B65H3/00 , B65H31/24 , H01L21/00 , H01L21/677 , H01L21/687
CPC分类号： H01L21/67778 , H01L21/67775 , H01L21/68707 , Y10S414/137 , Y10S414/141
摘要： An apparatus for storing and transferring a wafer. The apparatus includes a wafer transfer portion having a path through which a wafer can be transferred; structure for storing the wafer, the structure for storing the wafer being removably attached to the wafer transfer portion; a first elevator for elevating and lowering the wafer transfer portion and the storing structure to a predetermined level; a holder for temporarily holding the wafer in the wafer transfer portion; and a second elevator for elevating and lowering the wafer holder, the second elevator being separate and independent from the first elevator. Since the wafer storing structure and the wafer transfer portion are elevated and lowered by different elevators, the wafer can be transported while the wafer transfer portion is stationary. Thus, the apparatus has a simplified construction and replacement of the storing structure can be automated.
摘要翻译：一种用于存储和转移晶片的装置。该装置包括具有可以转移晶片的路径的晶片传送部分; 用于存储晶片的结构，用于存储晶片的结构，其可移除地附接到晶片传送部分; 第一电梯，用于将所述晶片转印部分和所述存储结构升高和降低到预定水平; 用于将晶片临时保持在晶片转移部分中的保持器; 以及用于升降所述晶片保持器的第二电梯，所述第二电梯与所述第一电梯分离并独立。由于晶片存储结构和晶片传送部分被不同的电梯升高和降低，所以晶片可以在晶片传送部分静止的同时传输。因此，该装置具有简化的结构，可以自动地更换存储结构。

3. 发明申请

US20080196658A1 SUBSTRATE PROCESSING APPARATUS INCLUDING A SUBSTRATE REVERSING REGION 审中-公开
标题翻译：基板加工装置，包括反向区域的基板
公开(公告)号：US20080196658A1
公开(公告)日：2008-08-21
申请号：US12031674
申请日：2008-02-14
申请人： Yoshiteru Fukutomi , Masami Ohtani
发明人： Yoshiteru Fukutomi , Masami Ohtani
IPC分类号： B05C11/00 , B08B13/00
CPC分类号： G11B23/0021 , G03F7/70525 , G03F7/70533 , G03F7/70916 , G03F7/70925 , H01L21/67051 , H01L21/67173 , H01L21/67178 , H01L21/68728 , H01L21/68764
摘要： A substrate processing apparatus that is arranged adjacent to an exposure device includes a processing section including a first processing unit and a second processing unit. The first processing unit includes a development region, a first cleaning region, and a first transport region. The development region and the first cleaning region are arranged opposite to each other with the first transport region interposed therebetween. The second processing unit includes a reversing region, a second cleaning region, and a second transport region. The reversing region and the second cleaning region are arranged opposite to each other with the second transport region interposed therebetween. The second processing unit is arranged between the first processing unit and the exposure device. The substrate processing apparatus also includes a transfer section coupled to the processing section and an interface configured to receive and transfer the substrate between the processing section and the exposure device.
摘要翻译：布置在曝光装置附近的基板处理装置包括具有第一处理单元和第二处理单元的处理部。第一处理单元包括显影区域，第一清洁区域和第一输送区域。显影区域和第一清洁区域彼此相对设置，其间插入有第一输送区域。第二处理单元包括反转区域，第二清洁区域和第二输送区域。反转区域和第二清洁区域彼此相对布置，其间插入第二输送区域。第二处理单元布置在第一处理单元和曝光装置之间。基板处理装置还包括耦合到处理部分的传送部分和被配置为在处理部分和曝光装置之间接收和传送基板的接口。

4. 发明授权

US6060697A Substrate processing apparatus having regulated power consumption and method therefor 失效
标题翻译：具有稳定功耗的基板处理装置及其方法
公开(公告)号：US6060697A
公开(公告)日：2000-05-09
申请号：US39141
申请日：1998-03-13
申请人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
发明人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
IPC分类号： H01L21/02 , G05D23/19 , H02J3/00 , H02J13/00 , H05B1/02
CPC分类号： G05D23/1951
摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.
摘要翻译：基板处理装置降低开启时的瞬时最大功耗。多个处理单元的受电部分分别通过开关连接到导通开关的一端。导通开关的另一端通过断路器连接到外部电源。定时器值分别在定时器中设置。当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

5. 发明授权

US4312586A Method and apparatus for the development of films in a photographic film processor 失效
标题翻译：用于在摄影胶片处理器中发展胶片的方法和装置
公开(公告)号：US4312586A
公开(公告)日：1982-01-26
申请号：US155089
申请日：1980-06-02
申请人： Masami Ohtani
发明人： Masami Ohtani
IPC分类号： G03D3/06 , G03D3/13
CPC分类号： G03D3/06 , G03D3/132 , Y10T137/85954 , Y10T137/86196
摘要： This invention is concerned with a method and apparatus for the development of photographic films in a photographic film processor in which the films are developed when the exposed films pass through a developing tank containing developer. The object of said invention is to attain uniform development with a simple method, that is, to make the change of the activity of the developer during the development of the films to be treated very small from the leading end to the trailing end of the film. The said invention makes the influence of the momentarily changing activity of the developer in contact with the films as small as possible by compensating for the decrease of the activity due to the exhaustion of the developer by gradually increasing the immersion time of the films in the developer from the leading end toward the trailing end of the photographic films by gradually changing the relative level of the liquid surface when the films are fed into the developer.
摘要翻译：本发明涉及用于在照相胶片处理器中开发照相胶片的方法和装置，其中当曝光的胶片通过含有显影剂的显影槽时，显影胶片。本发明的目的是通过简单的方法来实现均匀显影，即，使得待处理的膜的显影期间显影剂的活性从薄膜的前端到尾端变化很小。所述发明通过逐渐增加膜在显影剂中的浸渍时间来补偿由于显影剂耗尽而导致的活性降低，使得显影剂与膜接触的瞬时变化的影响尽可能小通过在将膜馈送到显影剂中时逐渐改变液面的相对水平，从照相胶卷的前端到尾端。

6. 发明授权

US4250956A Vehicle air conditioning apparatus 失效
标题翻译：车用空调机
公开(公告)号：US4250956A
公开(公告)日：1981-02-17
申请号：US075482
申请日：1979-09-14
申请人： Masami Ohtani
发明人： Masami Ohtani
IPC分类号： B60H1/00 , F24F11/02 , G05D23/24 , G05D23/00 , B60H3/04 , F25B29/00
CPC分类号： B60H1/00828 , G05D23/1931 , G05D23/24
摘要： A temperature control door (27) controls air flow through a duct (12) and is positioned in accordance with the output of a sensor (41), (42). A slider (74) of a potentiometer (72) is connected to the door (27) so that the slider (74) is in a central position when the temperature control door (27) is in a central position. A switch (86) connects the slider (74) to one end of a resistance element (73) of the potentiometer (72) when the temperature control door (27) is on one side of the central position and the apparatus (11) is in a cooling mode and to the other end of the resistance element (73) of the potentiometer (72) when the temperature control door (27) is on the other side of the central position and the apparatus (11) is in a heating mode. The speed of a blower (16) which forces air through the duct (12) is controlled in accordance with the resistance of the potentiometer (72). A switch (87) controls the blower (16) to run a maximum speed when the apparatus (11) is in a maximum cooling mode.
摘要翻译：温度控制门（27）控制通过管道（12）的空气流并且根据传感器（41）的输出（42）定位。电位器（72）的滑块（74）连接到门（27），使得当温度控制门（27）处于中心位置时，滑块（74）处于中心位置。当温度控制门（27）位于中心位置的一侧时，开关（86）将滑块（74）连接到电位器（72）的电阻元件（73）的一端，并且设备（11）是在温度控制门（27）处于中心位置的另一侧并且装置（11）处于加热模式时，处于冷却模式和电位计（72）的电阻元件（73）的另一端。根据电位器（72）的阻力来控制迫使空气通过管道（12）的鼓风机（16）的速度。当设备（11）处于最大冷却模式时，开关（87）控制鼓风机（16）运行最大速度。

7. 发明申请

US20080198341A1 SUBSTRATE PROCESSING APPARATUS WITH INTEGRATED CLEANING UNIT 有权
标题翻译：具有集成清洁单元的基板处理装置
公开(公告)号：US20080198341A1
公开(公告)日：2008-08-21
申请号：US12031667
申请日：2008-02-14
申请人： Yoshiteru Fukutomi , Masami Ohtani
发明人： Yoshiteru Fukutomi , Masami Ohtani
IPC分类号： G03B27/52
CPC分类号： H01L21/68764 , H01L21/67051 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/68707 , H01L21/68728
摘要： In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the interface block. The exposure device subjects a substrate to exposure processing by means of a liquid immersion method. Substrate platforms are provided in close proximity one above the other between the cleaning/drying processing block and the development processing block for receiving and transferring the substrate therebetween. Reversing units that reverse one surface and the other surface of the substrate are respectively stacked above and below the substrate platforms.
摘要翻译：在基板处理装置中，按顺序并排设置分度器块，抗蚀剂膜处理块，清洁/干燥处理块，显影处理块和界面块。曝光装置设置在接口块附近。曝光装置通过液浸法对基板进行曝光处理。在清洁/干燥处理块和用于在其间接收和转移基板的显影处理块之间彼此靠近地提供基板平台。将基板的一个表面和另一个表面反转的反转单元分别堆叠在基板平台的上方和下方。

8. 发明申请

US20050204196A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20050204196A1
公开(公告)日：2005-09-15
申请号：US11078192
申请日：2005-03-11
申请人： Joichi Nishimura , Masami Ohtani
发明人： Joichi Nishimura , Masami Ohtani
IPC分类号： H01L21/02 , G06F11/00 , H01L21/00
CPC分类号： H01L21/67253 , H01L21/67276
摘要： A moving image representing a maintenance method is reflected on a moving image display section in an operation panel. A worker can grasp the maintenance method by seeing the moving image displayed on the moving image display section. Consequently, maintenance can be performed in a short time and accurately in accordance with the moving image displayed on the moving image display section.
摘要翻译：表示维护方法的运动图像被反映在操作面板中的运动图像显示部分上。工人可以通过看到运动图像显示部分上显示的运动图像来掌握维护方法。因此，可以根据运动图像显示部分上显示的运动图像在短时间内准确地进行维护。

9. 发明授权

US06790287B2 Substrate processing apparatus, substrate inspection method and substrate processing system 有权
标题翻译：基板加工装置，基板检查方法及基板处理系统
公开(公告)号：US06790287B2
公开(公告)日：2004-09-14
申请号：US09942153
申请日：2001-08-29
申请人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
发明人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
IPC分类号： C23C1600
CPC分类号： H01L21/67207 , H01L21/67253
摘要： An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device and a macro defect inspection device are successively stacked and arranged from below. The inspection unit is provided on an intermediate portion of a substrate transport path formed in the substrate processing apparatus. The substrate processed in the substrate processing apparatus is selectively introduced into each inspection part. Therefore, the apparatus can properly inspect the substrate at need while suppressing reduction of the throughput. Thus provided are a substrate processing apparatus and a substrate inspection method capable of properly inspecting a substrate while suppressing reduction of the throughput.
摘要翻译：在基板上进行抗蚀剂涂布处理和显影处理的基板处理装置中设置有检查单元。在检查单元中，从下方依次堆叠并布置膜厚测量装置，线宽测量装置，覆盖测量装置和宏观缺陷检查装置。检查单元设置在形成在基板处理装置中的基板输送路径的中间部。将在基板处理装置中处理的基板选择性地导入各检查部。因此，能够在抑制生产量的降低的同时适当地检查需要的基板。这样提供了能够在抑制生产量降低的同时适当地检查基板的基板处理装置和基板检查方法。

10. 发明授权

US6099643A Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section 失效
标题翻译：用于处理衬底的装置，其提供化学处理部分的有效布置和大气隔离
公开(公告)号：US6099643A
公开(公告)日：2000-08-08
申请号：US993284
申请日：1997-12-18
申请人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
发明人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
IPC分类号： H01L21/00 , B05C13/00
CPC分类号： H01L21/67173 , H01L21/67017 , H01L21/67178 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： An atmospheric conditioning unit for supplying temperature- and humidity-controlled air to a chemical processing part (spin coater) is arranged immediately above a chemical processing part, between this chemical processing part and a heat treatment part (including a hot plate and a cool plate). Namely, the chemical processing part, the atmospheric conditioning unit and the heat treatment part are vertically arranged in a stacked manner. The atmospheric conditioning unit receives external air from an opening. A closed partition is provided to block air flow between the atmospheric conditioning unit and a transport area. The temperature- and humidity-controlled air supplied from the atmospheric conditioning unit to the spin coater forms a downflow in the spin coater, and thereafter rises through an opening and joins with the air flowing from the opening, to be introduced into the atmospheric conditioning unit again and reused.
摘要翻译：用于向化学处理部件（旋转涂布机）供给温度和湿度控制的空气的大气调节单元布置在化学处理部件的正上方，该化学处理部件和热处理部件（包括热板和冷却板）。也就是说，化学处理部分，大气调节单元和热处理部分以堆叠的方式垂直布置。大气调节装置从开口接收外部空气。提供一个封闭的隔板以阻挡大气调节单元和运输区域之间的空气流动。从大气调节单元向旋转涂布机供应的温度和湿度控制的空气在旋转涂布机中形成向下流动，然后通过开口上升并与从开口流出的空气接合，以引入大气调节单元再次重复使用。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式