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1. 发明申请

US20110030186A1 HIGH-PRESSURE TREATMENT APPARATUS 有权
标题翻译：高压处理设备
公开(公告)号：US20110030186A1
公开(公告)日：2011-02-10
申请号：US12988680
申请日：2009-06-05
申请人： Masahiro Yamagata , Katsumi Watanabe
发明人： Masahiro Yamagata , Katsumi Watanabe
IPC分类号： B23P17/00
CPC分类号： B01J3/03 , B01J3/008 , B01J3/04 , B01J2219/00094 , B01J2219/00162 , B08B7/0021 , B30B11/002 , F27B17/0016 , Y10T29/49805
摘要： The objective is to provide a high-pressure treatment apparatus with which the pressure or temperature in a treatment chamber can be efficiently adjusted in a short period of time without an overall significant increase in the size or complication of the apparatus. The high-pressure treatment apparatus has a pressure-resistant container having pressure-resistant walls surrounding a treatment chamber, a lid member that closes an open end of the pressure-resistant container, a supply means that supplies a process fluid into the treatment chamber, a partition wall that is thinner than the pressure-resistant wall and is provided along the inside surface of said pressure-resistant container to form a partitioned chamber with said inside surface, and a heat transfer control means. Said heat transfer control means controls heat transfer between said treatment chamber and said partitioned chamber by heating or cooling a heating medium outside the container and feeding said heating medium into said partitioned chamber.
摘要翻译：目的是提供一种高压处理设备，其中可以在短时间内有效地调节处理室中的压力或温度，而不会显着增加设备的尺寸或复杂性。高压处理装置具有耐压性容器，该耐压容器具有围绕处理室的耐压壁，封闭耐压容器的开口端的盖构件，将处理流体供给到处理室的供给单元，分隔壁比所述耐压壁更薄，并且沿着所述耐压容器的内表面设置以形成具有所述内表面的分隔室，以及传热控制装置。所述传热控制装置通过加热或冷却容器外部的加热介质并将所述加热介质供入所述分隔室来控制所述处理室和所述分隔室之间的热传递。

2. 发明授权

US07080651B2 High pressure processing apparatus and method 失效
标题翻译：高压加工设备及方法
公开(公告)号：US07080651B2
公开(公告)日：2006-07-25
申请号：US10147742
申请日：2002-05-16
申请人： Ikuo Mizobata , Yusuke Muraoka , Kimitsugu Saito , Ryuji Kitakado , Yoichi Inoue , Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba
发明人： Ikuo Mizobata , Yusuke Muraoka , Kimitsugu Saito , Ryuji Kitakado , Yoichi Inoue , Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba
IPC分类号： B08B3/04
CPC分类号： B08B9/0321 , B08B7/0021 , Y10S134/902
摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.
摘要翻译：当基板清洗室5的开口打开以接收基板时，某些阀关闭，并且一个阀打开以供应CO 2以清洗基板清洗室5并排除空气。当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。此后，使用超临界CO 2 2洗涤基底并清洁循环线。超临界CO 2 2的流动被送到衬底洗涤室5。在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。残留在循环管线中的任何化学物质或有机物质与流动一起连续地送到分离/回收槽8中。

3. 发明授权

US08573962B2 High-pressure treatment apparatus 有权
标题翻译：高压处理设备
公开(公告)号：US08573962B2
公开(公告)日：2013-11-05
申请号：US12988680
申请日：2009-06-05
申请人： Masahiro Yamagata , Katsumi Watanabe
发明人： Masahiro Yamagata , Katsumi Watanabe
IPC分类号： B29C43/10 , B22F3/15
CPC分类号： B01J3/03 , B01J3/008 , B01J3/04 , B01J2219/00094 , B01J2219/00162 , B08B7/0021 , B30B11/002 , F27B17/0016 , Y10T29/49805
摘要： The objective is to provide a high-pressure treatment apparatus with which the pressure or temperature in a treatment chamber can be efficiently adjusted in a short period of time without an overall significant increase in the size or complication of the apparatus. The high-pressure treatment apparatus has a pressure-resistant container having pressure-resistant walls surrounding a treatment chamber, a lid member that closes an open end of the pressure-resistant container, a supply means that supplies a process fluid into the treatment chamber, a partition wall that is thinner than the pressure-resistant wall and is provided along the inside surface of said pressure-resistant container to form a partitioned chamber with said inside surface, and a heat transfer control means. Said heat transfer control means controls heat transfer between said treatment chamber and said partitioned chamber by heating or cooling a heating medium outside the container and feeding said heating medium into said partitioned chamber.
摘要翻译：目的是提供一种高压处理设备，其中可以在短时间内有效地调节处理室中的压力或温度，而不会显着增加设备的尺寸或复杂性。高压处理装置具有耐压性容器，该耐压容器具有围绕处理室的耐压壁，封闭耐压容器的开口端的盖构件，将处理流体供给到处理室的供给单元，分隔壁比所述耐压壁更薄，并且沿着所述耐压容器的内表面设置以形成具有所述内表面的分隔室，以及传热控制装置。所述传热控制装置通过加热或冷却容器外部的加热介质并将所述加热介质供入所述分隔室来控制所述处理室和所述分隔室之间的热传递。

4. 发明授权

US08741252B2 Process for producing porous object and apparatus therefor 有权
标题翻译：生产多孔物体的方法及其设备
公开(公告)号：US08741252B2
公开(公告)日：2014-06-03
申请号：US11547472
申请日：2005-04-25
申请人： Katsumi Watanabe , Masahiro Yamagata
发明人： Katsumi Watanabe , Masahiro Yamagata
IPC分类号： C01B33/12 , H01M8/06
CPC分类号： C01B33/1585
摘要： Disclosed is a process for producing porous materials by replacing a first solvent in a wet material containing the first solvent with a second solvent in a high pressure condition and drying the resulting wet material which process comprises a mixed solvent feeding step for feeding a mixed solvent composed of a solvent identical to or of the same kind as the first solvent and the second solvent to the wet material.
摘要翻译：公开了一种多孔材料的制造方法，其特征在于，在高压条件下用第二溶剂置换含有第一溶剂的湿物质中的第一溶剂，干燥所得到的湿物质，该方法包括：混合溶剂供给步骤，与第一溶剂和第二溶剂相同或相同类型的溶剂加到湿材料中。

5. 发明申请

US20070272126A1 Process For Producing Porous Object And Apparatus Therefor 有权
标题翻译：生产多孔物体及其设备的方法
公开(公告)号：US20070272126A1
公开(公告)日：2007-11-29
申请号：US11547472
申请日：2005-04-25
申请人： Katsumi Watanabe , Masahiro Yamagata
发明人： Katsumi Watanabe , Masahiro Yamagata
IPC分类号： C04B16/08
CPC分类号： C01B33/1585
摘要： Disclosed is a process for producing porous materials by replacing a first solvent in a wet material containing the first solvent with a second solvent in a high pressure condition and drying the resulting wet material which process comprises a mixed solvent feeding step for feeding a mixed solvent composed of a solvent identical to or of the same kind as the first solvent and the second solvent to the wet material.
摘要翻译：公开了一种多孔材料的制造方法，其特征在于，在高压条件下用第二溶剂置换含有第一溶剂的湿物质中的第一溶剂，干燥所得到的湿物质，该方法包括：混合溶剂供给步骤，与第一溶剂和第二溶剂相同或相同类型的溶剂加到湿材料中。

6. 发明授权

US07111630B2 High pressure processing apparatus and method 失效
标题翻译：高压加工设备及方法
公开(公告)号：US07111630B2
公开(公告)日：2006-09-26
申请号：US10879318
申请日：2004-06-28
申请人： Ikuo Mizobata , Yusuke Muraoka , Kimitsugu Saito , Ryuji Kitakado , Yoichi Inoue , Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba
发明人： Ikuo Mizobata , Yusuke Muraoka , Kimitsugu Saito , Ryuji Kitakado , Yoichi Inoue , Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba
IPC分类号： B08B3/04
CPC分类号： B08B9/0321 , B08B7/0021 , Y10S134/902
摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.
摘要翻译：当基板清洗室5的开口被打开以接收基板时，某些阀关闭，并且阀打开，供应CO 2以清洗基板清洗室5并排除空气。当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。此后，使用超临界CO 2 2来洗涤基底并清洁循环线。超临界CO 2 2的流动被送到衬底洗涤室5。在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。残留在循环管线中的任何化学物质或有机物质与流体一起被连续地送到分离/回收槽8中。

7. 发明授权

US06823880B2 High pressure processing apparatus and high pressure processing method 失效
标题翻译：高压加工设备及高压加工方法
公开(公告)号：US06823880B2
公开(公告)日：2004-11-30
申请号：US10131193
申请日：2002-04-25
申请人： Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba , Shogo Sarumaru , Yusuke Muraoka , Kimitsugu Saito , Ikuo Mizobata , Ryuji Kitakado
发明人： Yoshihiko Sakashita , Katsumi Watanabe , Masahiro Yamagata , Hisanori Oshiba , Shogo Sarumaru , Yusuke Muraoka , Kimitsugu Saito , Ikuo Mizobata , Ryuji Kitakado
IPC分类号： B08B1500
CPC分类号： H01L21/67017 , B08B7/0021 , H01L21/67126 , Y10S134/902
摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.
摘要翻译：高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

8. 发明授权

US08995942B2 Radio communication device, signal strength output method and radio communication system 有权
标题翻译：无线通信装置，信号强度输出方式和无线通信系统
公开(公告)号：US08995942B2
公开(公告)日：2015-03-31
申请号：US12890768
申请日：2010-09-27
申请人： Katsumi Watanabe
发明人： Katsumi Watanabe
IPC分类号： H04B17/00 , H04W56/00 , H04B1/40
CPC分类号： H04W56/00 , H04B1/40
摘要： There is provided a radio communication device including a radio receiving unit to receive a radio signals, a synchronization unit to detect synchronization based on a result of a correlation for received signals output from the radio receiving unit, and a signal strength output unit to output, as signal strength of the received signals that is RSSI (Received Signal Strength Indicator) value, a level of a correlation signal that is output as a result of the correlation by the synchronization unit.
摘要翻译：提供一种无线电通信装置，包括：无线电接收单元，用于接收无线电信号;基于从无线电接收单元输出的接收信号的相关结果来检测同步的同步单元;以及信号强度输出单元，作为RSSI（接收信号强度指示符）值的接收信号的信号强度，作为由同步单元进行相关的结果输出的相关信号的电平。

9. 再颁专利

USRE41511E1 Semiconductor device having a thin-film circuit element provided above an integrated circuit 失效
标题翻译：具有设置在集成电路上方的薄膜电路元件的半导体器件
公开(公告)号：USRE41511E1
公开(公告)日：2010-08-17
申请号：US11726763
申请日：2007-03-22
申请人： Yutaka Aoki , Ichiro Mihara , Takeshi Wakabayashi , Katsumi Watanabe
发明人： Yutaka Aoki , Ichiro Mihara , Takeshi Wakabayashi , Katsumi Watanabe
IPC分类号： H01L23/522 , H01L23/50
CPC分类号： H01L23/3114 , H01L23/5223 , H01L23/5225 , H01L23/5227 , H01L23/5228 , H01L23/525 , H01L2924/0002 , H01L2924/1423 , H01L2924/19041 , H01L2924/00
摘要： In a semiconductor device, re-wiring is provided on a circuit element formation region of a semiconductor substrate. A columnar electrode for connection with a circuit board is provided on the rewiring. A first insulating film is provided over the semiconductor substrate excluding a connection pad, and a ground potential layer connected to a ground potential is provided on an upper surface of the first insulating film. A re-wiring is provided over the ground potential layer with a second insulating film interposed. The ground potential layer serves as a barrier layer for preventing crosstalk between the re-wiring and circuit element formation region. A thin-film circuit element is provided on the second insulating film, and a second ground potential layer is provided as a second barrier layer over the thin-film circuit element with an insulating film interposed. Re-wiring is provided over the second ground potential layer.
摘要翻译：在半导体器件中，在半导体衬底的电路元件形成区域上设置再布线。在重新布线时提供用于与电路板连接的柱状电极。第一绝缘膜设置在除了连接焊盘之外的半导体衬底上，并且在第一绝缘膜的上表面上设置连接到接地电位的接地电位层。在地电位层上提供再布线，其中插入有第二绝缘膜。地电位层用作防止重新布线和电路元件形成区域之间的串扰的阻挡层。薄膜电路元件设置在第二绝缘膜上，第二接地电位层设置在薄膜电路元件上，作为第二阻挡层，绝缘膜被插入。在第二接地电位层上提供重新布线。

10. 发明授权

US07751472B2 Wireless communication apparatus, wireless communication method and computer program therefor 失效
标题翻译：无线通信装置，无线通信方法及其计算机程序
公开(公告)号：US07751472B2
公开(公告)日：2010-07-06
申请号：US11530328
申请日：2006-09-08
申请人： Katsumi Watanabe
发明人： Katsumi Watanabe
IPC分类号： H04B1/66 , H04L5/12 , H04L23/02
CPC分类号： H04L25/03171 , H04B1/71632 , H04B1/71637 , H04L25/067 , H04L27/2602 , H04L27/261 , H04L27/3872 , H04W12/06 , H04W60/00
摘要： In one embodiment a wireless communication device is provided that: acquires a phase rotation angle in the propagation channel which phase rotation angle is contained in a received symbol and that performs rotation compensation of the acquired phase rotation angle for the received symbol; generates a coordinate value of the respective I, Q axis in the signal constellation on which the information of the respective reference signal point is set; for the respective transmission bit, obtains respective probabilities that the transmission bit is 0 and 1 by making a distance determination of the distance between the received symbol after the rotation compensation and the respective reference signal level on only one of the I and Q axes; and makes a likelihood determination of the bit value of the respective transmission bit in accordance with a probability value obtained.
摘要翻译：在一个实施例中，提供一种无线通信装置：获取所述传播信道中的相位旋转角度，所述相位旋转角度包含在接收符号中，并且对于所接收的符号执行所获取的相位旋转角度的旋转补偿; 产生在其上设置相应参考信号点的信息的信号星座中的相应I，Q轴的坐标值; 对于各个传输位，通过仅在I轴和Q轴中的一个上进行旋转补偿后的接收符号与各个参考信号电平之间的距离的距离确定来获得传输位为0和1的各自的概率; 并且根据获得的概率值对各个传输比特的比特值进行似然确定。

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