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1. 发明申请

US20060234948A1 Lignan-containing compositions 审中-公开
标题翻译：含木素的组合物
公开(公告)号：US20060234948A1
公开(公告)日：2006-10-19
申请号：US11397239
申请日：2006-04-03
申请人： Mark Empie , Brent Flickinger , Sam Sun
发明人： Mark Empie , Brent Flickinger , Sam Sun
IPC分类号： A61K31/7048 , A61K31/7008 , A61K31/355 , A61K31/353 , A61K31/12
CPC分类号： A61K31/353 , A23L33/105 , A23L33/11 , A23L33/15 , A23L33/22 , A23V2002/00 , A61K31/122 , A61K31/355 , A61K31/726 , A61K36/48 , A61K36/55 , A61K2300/00 , A23V2250/21172 , A23V2250/642 , A23V2250/2136
摘要： Compositions are provided that includes a lignan, and an additional compound such as an isoflavone, a tocopherol, a phytosterol, a polyphenol, a catechin, an anthocyanin, an astaxanthin, or a glucosamine. The compositions can be formulated as a dietary supplement, in tablet, powder or liquid form, or can be incorporated into a food product. Methods of treating various diseases by administering the compositions are also provided.
摘要翻译：提供了包含木酚素和另外的化合物如异黄酮，生育酚，植物甾醇，多酚，儿茶素，花青素，虾青素或葡糖胺的组合物。组合物可以配制成片剂，粉末或液体形式的膳食补充剂，或可以掺入食品中。还提供了通过施用组合物治疗各种疾病的方法。

2. 发明申请

US20070141178A1 Processes for Obtaining Lignan Extracts and Compositions Containing the Lignan Extracts 审中-公开
标题翻译：获得含有木质素提取物的木质素提取物和组合物的方法
公开(公告)号：US20070141178A1
公开(公告)日：2007-06-21
申请号：US11566356
申请日：2006-12-04
申请人： Mark Empie , William Fletcher , Thomas Gottemoller , Richard Grabiel , Lawrence Karcher , Sigmund Peterson , Sam Sun
发明人： Mark Empie , William Fletcher , Thomas Gottemoller , Richard Grabiel , Lawrence Karcher , Sigmund Peterson , Sam Sun
IPC分类号： A61K31/704
CPC分类号： C07H1/08 , A61K31/7034 , A61K31/704 , A61K36/15 , A61K36/736 , A61K36/889 , A61K2300/00
摘要： Processes for obtaining lignan extracts from plant materials are disclosed. Compositions including lignan extracts as well as uses of the lignan extracts are also disclosed.
摘要翻译：公开了从植物材料获得木酚素提取物的方法。还公开了包括木酚素提取物的组合物以及木脂素提取物的用途。

3. 发明申请

US20050074699A1 Wet developable hard mask in conjunction with thin photoresist for micro photolithography 有权
标题翻译：湿可显影硬掩模与微光刻胶的薄光致抗蚀剂结合使用
公开(公告)号：US20050074699A1
公开(公告)日：2005-04-07
申请号：US10864787
申请日：2004-06-08
申请人： Sam Sun , Chenghong Li
发明人： Sam Sun , Chenghong Li
IPC分类号： G03C1/492 , G03C1/494 , G03C1/76 , G03C5/00 , G03F7/00 , G03F7/09 , G03F7/095 , G03F7/11 , G03F7/30 , H01L20060101 , H01L21/308 , H01L21/31 , H01L21/3213
CPC分类号： G03F7/091 , G03F7/094 , G03F7/095 , G03F7/11 , H01L21/3081 , H01L21/32139
摘要： A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selectively modified by reactive ion etch (RIE). The protective layer is photosensitive and anti-reflective. An extremely thin photoresist layer is coated on top of the protective layer. The stack of the films is selectively exposed to actinic radiation at a wavelength determined by the sensitivities of the protective layer and photoresist layer. The latent images on the photoresist and protective layers resulting from the exposure are developed with a common alkaline developer. The three dimensional patterns of photoresist and underlying protective layer are formed simultaneously by the single exposure and single development. When the underlying substrate is etched by RIE, the protective layer is the masking layer, not the photoresist.
摘要翻译：提供了与非常薄的光致抗蚀剂结合使用硬掩模或保护层的新颖方法。在该过程中，保护层的薄膜被涂覆在待通过反应离子蚀刻（RIE）选择性修饰的基底的表面上。保护层是光敏的和抗反射的。在保护层的顶部涂覆极薄的光致抗蚀剂层。以由保护层和光致抗蚀剂层的敏感度确定的波长选择性地暴露于光化辐射。用普通的碱性显影剂显影在光致抗蚀剂和由曝光产生的保护层上的潜像。光刻胶和下层保护层的三维图案通过单次曝光和单次显影同时形成。当通过RIE蚀刻底层衬底时，保护层是掩模层，而不是光致抗蚀剂。

4. 发明申请

US20080236033A1 Slow-release floating fertilizer 审中-公开
标题翻译：缓释浮游肥料
公开(公告)号：US20080236033A1
公开(公告)日：2008-10-02
申请号：US12077921
申请日：2008-03-24
申请人： Yao Sun , Sam Sun
发明人： Yao Sun , Sam Sun
IPC分类号： A01G7/00 , C01B25/00 , C01B21/00 , C01B35/02 , C05D5/00 , C05D9/00
CPC分类号： C05G3/0047 , C05G3/0035 , Y02A40/226 , Y02P20/134 , Y02P60/12 , C05G3/0041
摘要： Floating slow-release fertilizer is designed to significantly reduce carbon dioxide in the atmosphere. This granulated fertilizer has a density lighter than seawater. Therefore its pellets can float on the surface of seawater. After being dispensed into water, the pellets are able to continually release certain nutrients for a period of time. During this period, an otherwise inanimate water region is temporarily suitable for plant growth. Floating slow-release fertilizer enables the growth of planting phytoplankton in ocean to remove CO2 from atmosphere. The advantages of the fertilizer are as following: all nature, effective, no byproduct, no land using, no pollution, using solar energy mainly, small investment, easy to control, low operation cast.
摘要翻译：浮选缓释肥料旨在大大减少大气中的二氧化碳。这种颗粒肥料的密度比海水轻。因此，其颗粒可以漂浮在海水表面。在分配到水中之后，颗粒能够持续释放某些营养物质一段时间。在此期间，无生命的水域暂时适合植物生长。浮游缓释肥料使海洋中种植浮游植物的生长从大气中去除CO 2。化肥的优点如下：一切自然，有效，无副产品，无土地利用，无污染，主要采用太阳能，投资少，易于控制，操作压力低。

5. 发明申请

US20080076064A1 METHOD OF CREATING PHOTOLITHOGRAPHIC STRUCTURES WITH DEVELOPER-TRIMMED HARD MASK 有权
标题翻译：用开发者 - 修剪硬掩模创建光刻结构的方法
公开(公告)号：US20080076064A1
公开(公告)日：2008-03-27
申请号：US11858546
申请日：2007-09-20
申请人： Sam Sun
发明人： Sam Sun
IPC分类号： G03C5/08 , G03C1/73
CPC分类号： G03F7/11 , H01L21/0271 , H01L21/312
摘要： Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.
摘要翻译：提供了新颖的显影剂可溶性硬掩模组合物和使用这些组合物形成微电子结构的方法。该组合物包含化合物，用于控制显影速率的化合物和溶剂体系中的交联剂。所述方法包括将组合物施用于基材并固化组合物。将成像层施加到组合物上，然后曝光和显影，在此期间，除去成像层的光曝光部分以及邻近所述光曝光部分的硬掩模组合物的部分。硬掩模组合物结构的尺寸由显影速率控制，并且它们产生作为成像层特征尺寸的一部分的特征尺寸，以产生最终可以转移到基底的图案。

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