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1. 发明授权

US5370825A Water-soluble electrically conducting polymers, their synthesis and use 失效
标题翻译：水溶性导电聚合物，其合成和用途
公开(公告)号：US5370825A
公开(公告)日：1994-12-06
申请号：US25490
申请日：1993-03-03
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Thomas H. Newman , Niranjan M. Patel , David E. Seeger
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Thomas H. Newman , Niranjan M. Patel , David E. Seeger
IPC分类号： C08G61/12 , C08G61/10 , C08G75/02 , C08G75/04 , C08J3/28 , C08L33/00 , C08L33/02 , C08L41/00 , C08L79/00 , C08L101/00 , C08L101/02 , C08L101/12 , G03F7/038 , G03F7/09 , H01B1/12 , H01B1/00
CPC分类号： G03F7/093 , G03F7/038 , H01B1/128
摘要： Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
摘要翻译：公开了一种包含多酸和含有含有一个或多个碱性原子的重复单元的聚合物的新物质组合物。该复合物是水溶性和导电性的。该复合物可用于提供用于电子应用和制造的有机放电层。

2. 发明授权

US5721299A Electrically conductive and abrasion/scratch resistant polymeric materials, method of fabrication thereof and uses thereof 失效
标题翻译：导电和耐磨损/耐刮擦的聚合材料，其制造方法及其用途
公开(公告)号：US5721299A
公开(公告)日：1998-02-24
申请号：US193926
申请日：1994-02-09
申请人： Marie Angelopoulos , Ali Afzali-Ardakani , Jack A. Dickerson , Thomas B. Pillsbury , Karl J. Puttlitz , Jane M. Shaw , Jeffrey D. Gelorme
发明人： Marie Angelopoulos , Ali Afzali-Ardakani , Jack A. Dickerson , Thomas B. Pillsbury , Karl J. Puttlitz , Jane M. Shaw , Jeffrey D. Gelorme
IPC分类号： C08G61/12 , H01B1/12 , H01J29/86 , H01L23/498 , H01L23/60 , H01L33/38 , H01L33/42 , H05K9/00 , H01B1/06
CPC分类号： H05K9/0079 , C08G61/12 , H01B1/125 , H01B1/127 , H01B1/128 , H01J29/868 , H01L23/49894 , H01L23/60 , H01L33/40 , H01L33/42 , H01L2924/0002
摘要： Electrically conductive and abrasion resistant polymeric compositions, methods of fabrication thereof and uses thereof are described. Admixtures of abrasion resistant materials and electrically conductive polymeric materials are formed. Many of these admixtures are light transmitting and can be used as an abrasion resistant light transmitting electrostatic discharge layers. The light transmitting discharge layer is useful as a surface coating for visual displays such as CRT screens to avoid electrostatic accumulation of dust and scratching. The compositions can be admixtures of abrasion resistant silicones, polysiloxanes, acrylates, epoxies, methacrylates, epoxyacrylates, epoxymethacrylates, styrenes and electrically conductive polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenevinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted and unsubstituted polyfuranes, substituted and unsubstituted polypyrroles, substituted and unsubstituted polyselenophenes, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The compositions can be a layer of an electrically conductive polymer with an abrasion resistant layer thereover.
摘要翻译：描述了导电和耐磨聚合物组合物，其制造方法及其用途。形成耐磨材料和导电聚合材料的外加剂。这些混合物中的许多是透光性的并且可以用作耐磨光透射静电放电层。透光放电层可用作诸如CRT屏幕的视觉显示器的表面涂层，以避免灰尘和划痕的静电积累。组合物可以是耐磨硅氧烷，聚硅氧烷，丙烯酸酯，环氧树脂，甲基丙烯酸酯，环氧丙烯酸酯，环氧甲基丙烯酸酯，苯乙烯和选自取代和未取代的聚苯胺的聚合物，聚对亚苯基乙烯基，取代和未取代的聚噻吩的取代和未取代的聚对 - 取代和未取代的聚吡咯，取代和未取代的聚硒吩，可溶性前体形成的聚乙酰胺，其组合以及与其它聚合物的共混物。组合物可以是其上具有耐磨层的导电聚合物层。

3. 发明授权

US06193909B1 Cross-linked electrically conductive polymers, precursors thereof 失效
标题翻译：交联导电聚合物及其前体
公开(公告)号：US06193909B1
公开(公告)日：2001-02-27
申请号：US08595853
申请日：1996-02-02
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
IPC分类号： H01B112
CPC分类号： C08G73/1071 , H01B1/128
摘要： Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.
摘要翻译：描述了交联的导电聚合物，特别是导电的聚苯胺。使用具有侧链可交联官能团的掺杂剂和取代基，其形成交联的导电聚合物网络。交联官能团可以是氢键合以及化学上可聚合的或可交联的。还可以并入链之间的共轭路径。所得的交联导电聚合物具有增强的热和环境稳定性。掺杂剂不容易用溶剂洗涤或在暴露于热量时扩散出来。此外，交联聚合物具有增强的导电性。

4. 发明授权

US5464927A Polyamic acid and polyimide from fluorinated reactant 失效
标题翻译：来自氟化反应物的聚酰胺酸和聚酰亚胺
公开(公告)号：US5464927A
公开(公告)日：1995-11-07
申请号：US58303
申请日：1993-05-10
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Jeffrey W. Labadie , David A. Lewis , Sally A. Swanson , Nancy C. Labianca
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Jeffrey W. Labadie , David A. Lewis , Sally A. Swanson , Nancy C. Labianca
IPC分类号： G03F7/027 , C08G73/10 , C08L79/08 , G03F7/038 , C08G69/26
CPC分类号： C08G73/1025 , C08G73/1039 , C08G73/1042 , G03F7/0387
摘要： Copolyamic acid is obtained from tetracarboxylic acid dianhydride, diamine and a fluorinated diamine and/or fluorinated tetracarboxylic acid dianhydride; and optionally ester or amine salt derivative thereof to obtain radiation sensitive polymer; and low optical high thermally stable polyimide from curing the above polyamic acid and/or derivative thereof.
摘要翻译：共聚酰胺酸由四羧酸二酐，二胺和氟化二胺和/或氟化四羧酸二酐得到; 和任选的酯或胺盐衍生物，以获得辐射敏感聚合物; 和低光学高热稳定性聚酰亚胺，其固化上述聚酰胺酸和/或其衍生物。

5. 发明授权

US6030550A Methods of fabrication of cross-linked electrically conductive polymers and precursors thereof 失效
公开(公告)号：US6030550A
公开(公告)日：2000-02-29
申请号：US594680
申请日：1996-02-02
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
IPC分类号： H01B1/12
CPC分类号： H01B1/128 , H01B1/125 , H01B1/127
摘要： Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.

6. 发明授权

US5382637A Solid state chain extension polymerization between Lewis acid oligomers and deblocked Lewis bases 失效
标题翻译：路易斯酸低聚物和解封路易斯碱之间的固态链延伸聚合
公开(公告)号：US5382637A
公开(公告)日：1995-01-17
申请号：US785734
申请日：1991-10-31
申请人： Marie Angelopoulos , Claudius Feger , Jeffrey D. Gelorme , Jane M. Shaw
发明人： Marie Angelopoulos , Claudius Feger , Jeffrey D. Gelorme , Jane M. Shaw
IPC分类号： C08G73/10 , G03F7/004 , G03F7/038 , C08L77/00 , C08L79/08
CPC分类号： C08G73/101 , G03F7/0045 , G03F7/0387
摘要： A solid state chain extension method provides for the formation of a solid state film comprised of a high molecular weight polymer by chain extending a deblocked Lewis base with Lewis acid oligomers while the reactants are in a solid state form. In one embodiment, a negative resist is prepared by selectively exposing regions of the solid state film. The Lewis base is deblocked at the exposed regions by a suitable deblocking means. The Lewis acid oligomers and the deblocked Lewis base chain extend at the exposed regions. Development of the film removes the non-polymerized reactants. Optionally, the Lewis acid oligomers, when radiation-cross-linking, are cross-linked with one another prior to deblocking the Lewis base to form a negative resist. The cross-linked oligomers polymerize with the subsequently deblocked base to provide a high molecular weight polymer film. In an alternative embodiment, a positive resist is used by degrading and removing phot-sensitive Lewis acid oligomers using selective exposure lithography techniques and, subsequently, deblocking the Lewis base and chain extending the remaining oligomers with the deblocked Lewis base at the unexposed regions.
摘要翻译：固态链延伸方法提供了通过将路易斯酸低聚物链路延伸解链路易斯碱同时反应物呈固态形式形成由高分子量聚合物构成的固态膜。在一个实施方案中，通过选择性地暴露固态膜的区域来制备负性抗蚀剂。路易斯碱通过合适的去块装置在暴露区域解封。路易斯酸低聚物和解封的路易斯碱基链在暴露的区域延伸。膜的开发除去未聚合的反应物。任选地，当辐射交联时，路易斯酸低聚物在将路易斯碱解封以形成负性抗蚀剂之前彼此交联。交联的低聚物与随后的解封底物聚合以提供高分子量聚合物膜。在替代实施方案中，通过使用选择性曝光光刻技术降解和除去光敏路易斯酸低聚物，并且随后使路易斯碱和链在未曝光区域上与解封的路易斯碱扩展剩余的低聚物，使用正性抗蚀剂。

7. 发明授权

US06383415B1 Methods of fabrication of cross-linked electrically conductive polymers and precursors thereof 有权
标题翻译：交联导电聚合物及其前体的制备方法
公开(公告)号：US06383415B1
公开(公告)日：2002-05-07
申请号：US09444985
申请日：1999-11-22
申请人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
发明人： Marie Angelopoulos , Jeffrey D. Gelorme , Yun Hsin Liao , Jane M. Shaw
IPC分类号： H01B112
CPC分类号： H01B1/128 , H01B1/125 , H01B1/127
摘要： Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.
摘要翻译：描述了交联的导电聚合物，特别是导电的聚苯胺。使用具有侧链可交联官能团的掺杂剂和取代基，其形成交联的导电聚合物网络。交联官能团可以是氢键合以及化学上可聚合的或可交联的。还可以并入链之间的共轭路径。所得的交联导电聚合物具有增强的热和环境稳定性。掺杂剂不容易用溶剂洗涤或在暴露于热量时扩散出来。此外，交联聚合物具有增强的导电性。

8. 发明授权

US6132644A Energy sensitive electrically conductive admixtures 失效
标题翻译：能量敏感的导电外加剂
公开(公告)号：US6132644A
公开(公告)日：2000-10-17
申请号：US086238
申请日：1998-05-28
申请人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
发明人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
IPC分类号： H01B1/12 , H01L23/532 , H01B1/20
CPC分类号： H01B1/12 , H01L23/5328 , H01L2924/0002
摘要： The present invention is an admixture of an electrically conductive material and an energy sensitive material resulting in a conductive energy sensitive composition. The structures are useful for lithography in microelectronic fabrication to avoid the effects of charging on resists from electron beams. The compositions are also useful in applications of scanning electron metrology and static dissipation.
摘要翻译：本发明是导电材料和能量敏感材料的混合物，导致导电能量敏感组合物。该结构可用于微电子制造中的光刻，以避免对来自电子束的抗蚀剂充电的影响。该组合物也可用于扫描电子测量和静电消散的应用中。

9. 发明授权

US06685853B1 Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith 有权
标题翻译：能量敏感的导电掺合物，其用途，制造方法和用其制造的结构
公开(公告)号：US06685853B1
公开(公告)日：2004-02-03
申请号：US09614230
申请日：2000-07-12
申请人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
发明人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
IPC分类号： H01B112
CPC分类号： H01B1/12 , H01L23/5328 , H01L2924/0002 , H01L2924/00
摘要： The present invention is an admixture of an electrically conductive material and an energy sensitive material resulting in a conductive energy sensitive composition. The structures are useful for lithography in microelectronic fabrication to avoid the effects of charging on resists from electron beams. The compositions are also useful in applications of scanning electron metrology and static dissipation.
摘要翻译：本发明是导电材料和能量敏感材料的混合物，导致导电能量敏感组合物。该结构可用于微电子制造中的光刻，以避免对来自电子束的抗蚀剂充电的影响。该组合物也可用于扫描电子测量和静电消散的应用中。

10. 发明申请

US20130017486A1 PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MATERIALS 有权
标题翻译：使用抗反射材料制作光刻结构的方法
公开(公告)号：US20130017486A1
公开(公告)日：2013-01-17
申请号：US13617634
申请日：2012-09-14
申请人： Marie Angelopoulos , Katherina E. Babich , Sean D. Burns , Allen H. Gabor , Scott D. Halle , Arpan P. Mahorowala , Dirk Pfeiffer
发明人： Marie Angelopoulos , Katherina E. Babich , Sean D. Burns , Allen H. Gabor , Scott D. Halle , Arpan P. Mahorowala , Dirk Pfeiffer
IPC分类号： G03F7/004 , B32B7/02 , B32B27/06 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0757 , Y10T428/24942 , Y10T428/31663
摘要： A lithographic structure comprising: an organic antireflective material disposed on a substrate, and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.
摘要翻译：一种光刻结构，包括：设置在基板上的有机抗反射材料和设置在有机抗反射材料上的硅抗反射材料。硅抗反射材料包括具有SiO x主链，发色团和对193nm或157nm辐射基本上透明的透明有机基团的交联聚合物。组合地，有机抗反射材料和硅抗反射材料提供适用于深紫外光刻的抗反射材料。本发明还涉及制备光刻结构的方法。

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