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1. 发明授权

US07803255B2 Device for plasma-activated vapor coating of large surfaces 有权
标题翻译：用于大面积等离子体激活蒸气涂层的装置
公开(公告)号：US07803255B2
公开(公告)日：2010-09-28
申请号：US10480791
申请日：2002-06-13
申请人： Manfred Neumann , Steffen Straach , Mario Krug , Nicolas Schiller
发明人： Manfred Neumann , Steffen Straach , Mario Krug , Nicolas Schiller
IPC分类号： C23C14/34 , C23C16/00
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/56
摘要： The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.
摘要翻译：本发明涉及一种用于大面积移动的基板的等离子体活化蒸气涂层的装置，包括至少一个真空接收器，一个泵系统，一个蒸发器，一个用于保持和输送待涂覆的基板的装置和至少一个电弧放电等离子体源，由此包括用于产生磁场的至少一个装置，该装置可以在蒸发器和基板之间产生磁场，其中磁场线大致垂直于运动方向排列并平行于运送平面，并且布置至少一个电弧放电等离子体源，使得电弧放电等离子体源的轴线大致垂直于磁场的场线排列。

2. 发明授权

US08470140B2 Method for the production of an ultra barrier layer system 有权
标题翻译：用于生产超级势垒层系统的方法
公开(公告)号：US08470140B2
公开(公告)日：2013-06-25
申请号：US10597625
申请日：2004-11-23
申请人： Christoph Charton , Matthias Fahland , Mario Krug , Nicolas Schiller , Steffen Straach
发明人： Christoph Charton , Matthias Fahland , Mario Krug , Nicolas Schiller , Steffen Straach
IPC分类号： C23C14/35
CPC分类号： C23C14/10 , B05D1/62 , C23C14/081 , C23C16/401
摘要： The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.
摘要翻译：本发明涉及一种制造超载体层系统的方法，该方法通过用层叠法真空涂覆衬底，该层堆叠被实施为平滑层和透明陶瓷层的交替层系统，但是包括两个透明陶瓷层之间的至少一个平滑层，其通过溅射施加，其中在平滑层的沉积期间，将单体进入其中操作磁控管等离子体的抽真空涂层室。

3. 发明申请

US20070170050A1 Method for the production of an ultra barrier layer system 有权
标题翻译：用于生产超级势垒层系统的方法
公开(公告)号：US20070170050A1
公开(公告)日：2007-07-26
申请号：US10597625
申请日：2004-11-23
申请人： Christoph Charton , Matthias Fahland , Mario Krug , Nicolas Schiller , Steffen Straach
发明人： Christoph Charton , Matthias Fahland , Mario Krug , Nicolas Schiller , Steffen Straach
IPC分类号： C23C14/00
CPC分类号： C23C14/10 , B05D1/62 , C23C14/081 , C23C16/401
摘要： The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.
摘要翻译：本发明涉及一种制造超载体层系统的方法，该方法通过用层叠法真空涂覆衬底，该层堆叠被实施为平滑层和透明陶瓷层的交替层系统，但是包括两个透明陶瓷层之间的至少一个平滑层，其通过溅射施加，其中在平滑层的沉积期间，将单体进入其中操作磁控管等离子体的抽真空涂层室。

4. 发明授权

US6130002A Process for producing organically modified oxide, oxynitride or nitride layers by vacuum deposition 失效
标题翻译：通过真空沉积生产有机改性氧化物，氮氧化物或氮化物层的方法
公开(公告)号：US6130002A
公开(公告)日：2000-10-10
申请号：US91487
申请日：1998-07-22
申请人： Manfred Neumann , Siegfried Schiller , Henry Morgner , Nicolas Schiller , Steffen Straach
发明人： Manfred Neumann , Siegfried Schiller , Henry Morgner , Nicolas Schiller , Steffen Straach
IPC分类号： C23C14/00 , C23C14/08 , C23C14/32 , B32B9/00 , H05H1/00
CPC分类号： C23C14/08 , C23C14/0021 , C23C14/32 , Y10T428/31663
摘要： Method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of evaporation material comprising nitride-forming evaporation material and one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate. A method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate. Substrates with an organically-modified oxide, oxinitride or nitride layer, as produced by the methods, wherein the at least one layer deposited by plasma-enhanced, high-rate vapor deposition includes more than 50 wt% of inorganic molecules and less than 50 wt% of partially cross-linked organic molecules.
摘要翻译： PCT No.PCT / DE96 / 02434 Sec。 371日期：1998年7月22日 102（e）日期1998年7月22日PCT 1996年12月13日PCT PCT。公开号WO97 / 23661 日期1997年7月3日通过使包含氮化物形成蒸发材料和氧化物和低氧化物蒸发材料之一的蒸发材料的等离子体增强蒸发在衬底上真空涂覆来生产至少一种有机改性氧化物，氮氧化物或氮化物层的方法，其中通过使用气体单体和包括氧和氮中的至少一种的反应性气体，通过等离子体增强的反应性高速蒸发蒸发材料沉积至少一层，并且其中蒸发材料，气体单体和反应性气体立即在基板的前方通过高密度等离子体区域。一种用于通过氧化物和低氧化物蒸发材料之一的等离子体增强蒸发在衬底上真空涂覆来生产至少一种有机改性氧化物，氮氧化物或氮化物层的方法，其中所述至少一层通过等离子体增强的反应性沉积使用气体单体和包括至少一种氧气和氮气的反应气体蒸发材料的高速蒸发，并且其中蒸发材料，气体单体和反应性气体立即通过高密度等离子体区域底物。通过该方法制备的具有有机改性的氧化物，氮氧化物或氮化物层的衬底，其中通过等离子体增强的高速气相沉积沉积的至少一层包括超过50重量％的无机分子和小于50重量％％的部分交联的有机分子。

5. 发明申请

US20130302536A1 METHOD FOR DEPOSITING A TRANSPARENT BARRIER LAYER SYSTEM 审中-公开
标题翻译：沉积透明阻挡层系统的方法
公开(公告)号：US20130302536A1
公开(公告)日：2013-11-14
申请号：US13980257
申请日：2012-02-15
申请人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
发明人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
IPC分类号： C23C16/30
CPC分类号： C23C16/30 , C23C14/0021 , C23C14/081 , C23C14/562
摘要： The invention relates to a method for producing a transparent bather layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas and a gaseous or vaporous organic component are introduced into the vacuum chamber.
摘要翻译：本发明涉及一种制造透明沐浴层系统的方法，其中在真空室中，至少两个透明阻挡层和设置在两个阻挡层之间的透明中间层沉积在透明塑料膜上，其中为了沉积屏障层铝被蒸发并且同时至少一个第一反应气体被引入到真空室中，并且其中为了沉积中间层铝被蒸发并且同时将至少一个第二反应气体和气态或蒸气有机组分引入真空室。

6. 发明申请

US20100300731A1 FLEXIBLE CIRCUIT BOARD MATERIAL AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：柔性电路板材及其制造方法
公开(公告)号：US20100300731A1
公开(公告)日：2010-12-02
申请号：US12599651
申请日：2008-05-07
申请人： Steffen Guenther , Waldemar Schoenberger , Steffen Straach , Nicolas Schiller , Volker Kirchhoff
发明人： Steffen Guenther , Waldemar Schoenberger , Steffen Straach , Nicolas Schiller , Volker Kirchhoff
IPC分类号： H05K1/09 , C23C14/35
CPC分类号： C23C14/024 , C23C14/205 , H05K1/0393 , H05K3/388 , H05K2201/0179
摘要： A method for producing a flexible circuit board material having a polymer substrate and a copper layer. The method includes depositing a layer of titanium oxide to be between the polymer substrate and the copper layer. The layer of titanium oxide and the copper layer are deposited using vacuum methods.
摘要翻译：一种用于制造具有聚合物基底和铜层的柔性电路板材料的方法。该方法包括在聚合物基底和铜层之间沉积一层氧化钛。使用真空方法沉积氧化钛层和铜层。

7. 发明授权

US07541070B2 Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide 有权
标题翻译：用由氧化铝制成的透明阻挡层气相沉积带状基材的方法
公开(公告)号：US07541070B2
公开(公告)日：2009-06-02
申请号：US10536329
申请日：2003-10-16
申请人： Nicolas Schiller , Steffen Straach , Mathias Räbisch , Matthias Fahland , Christoph Charton
发明人： Nicolas Schiller , Steffen Straach , Mathias Räbisch , Matthias Fahland , Christoph Charton
IPC分类号： H05H1/24
CPC分类号： C23C14/0021 , C23C14/027 , C23C14/081
摘要： The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.
摘要翻译：本发明涉及一种通过在带状气相沉积设备中反应性汽化铝和引入反应性气体来将具有由氧化铝制成的透明阻挡层气相沉积的带状基板的方法。本发明提供了在用氧化铝涂覆之前，通过磁控溅射将由金属或金属氧化物制成的部分封闭层施加到基板上。

8. 发明申请

US20060257585A1 Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide 有权
公开(公告)号：US20060257585A1
公开(公告)日：2006-11-16
申请号：US10536329
申请日：2003-10-16
申请人： Nicolas Schiller , Steffen Straach , Mathias Rabisch , Matthias Fahland
发明人： Nicolas Schiller , Steffen Straach , Mathias Rabisch , Matthias Fahland
IPC分类号： C23C16/00 , C23C14/32
CPC分类号： C23C14/0021 , C23C14/027 , C23C14/081
摘要： The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

9. 发明申请

US20130287969A1 METHOD FOR DEPOSITING A TRANSPARENT BARRIER LAYER SYSTEM 审中-公开
标题翻译：沉积透明阻挡层系统的方法
公开(公告)号：US20130287969A1
公开(公告)日：2013-10-31
申请号：US13980245
申请日：2012-02-15
申请人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
发明人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
IPC分类号： C23C16/18 , C23C16/40 , C23C16/511 , C23C16/34
CPC分类号： C23C16/18 , C23C14/0021 , C23C14/081 , C23C16/34 , C23C16/345 , C23C16/40 , C23C16/401 , C23C16/50 , C23C16/511 , C23C28/42
摘要： The invention relates to a method for producing a transparent barrier layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas is introduced into the vacuum chamber, and a silicon-containing layer is deposited as intermediate layer by means of a PECVD process.
摘要翻译：本发明涉及一种透明阻挡层系统的制造方法，其中在真空室中，至少两个透明阻挡层和设置在两个阻挡层之间的透明中间层沉积在透明塑料膜上，其中为了沉积屏障层铝被蒸发并且同时至少一个第一反应气体被引入真空室中，并且其中为了中间层的沉积，铝被汽化并且同时至少一个第二反应气体被引入到真空室中，并且含硅层通过PECVD工艺沉积为中间层。

10. 发明申请

US20050196548A1 Component protected against corrosion and method for the production thereof and device for carrying out the method 审中-公开
标题翻译：防腐蚀部件和其制造方法以及执行该方法的装置
公开(公告)号：US20050196548A1
公开(公告)日：2005-09-08
申请号：US11064964
申请日：2005-02-25
申请人： Klaus Goedicke , Fred Fietzke , Steffen Straach , Volker Kirchhoff , Klaus-Dieter Hofmann , Frank Hollstein
发明人： Klaus Goedicke , Fred Fietzke , Steffen Straach , Volker Kirchhoff , Klaus-Dieter Hofmann , Frank Hollstein
IPC分类号： F16B35/00 , C23C14/14 , C23C14/16 , C23C14/22 , C23C14/24 , C23C14/32 , C23C14/50 , C23C16/00 , C23C28/00 , H01L21/302 , H05H1/24
CPC分类号： C23C14/16 , C23C14/32 , C23C14/505 , C23C28/321 , C23C28/322 , C23C28/345
摘要： Component having corrosion protection and including a base body made of one of a steel material and a light metal material. A corrosion-inhibiting surface layer that is a dense, fine-grained, largely pore-free structure formed by plasma-based vapor deposition. The surface layer having an average thickness of between 1 μm and 50 μm and being at least one layer of at least one of aluminum, an aluminum alloy, and an aluminum compound. This Abstract is not intended to define the invention disclosed in the specification, nor intended to limit the scope of the invention in any way.
摘要翻译：具有腐蚀保护的部件，包括由钢材和轻金属材料之一制成的基体。由等离子体气相沉积形成的致密，细粒度，大部分无孔结构的腐蚀抑制表面层。所述表面层的平均厚度在1μm和50μm之间，并且是铝，铝合金和铝化合物中的至少一个的至少一个层。本摘要不旨在限定说明书中公开的发明，也不旨在以任何方式限制本发明的范围。

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