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1. 发明授权

US07279342B2 Ferroelectric memory 有权
标题翻译：铁电存储器
公开(公告)号：US07279342B2
公开(公告)日：2007-10-09
申请号：US11210010
申请日：2005-08-23
申请人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
发明人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
IPC分类号： H01L21/00
CPC分类号： H01L27/11502 , H01L27/11507
摘要： A ferroelectric memory includes a base member, a first dielectric layer formed above the base member, a second dielectric layer formed above the first dielectric layer, a contact hole that penetrates the first and second dielectric layers, a plug formed in the contact hole, and a barrier layer formed above the plug, and a ferroelectric capacitor formed from a lower electrode, a ferroelectric layer and an upper electrode successively laminated in a region including above the plug. The second dielectric layer has a property that is more difficult to be polished than the plug and the first dielectric layer.
摘要翻译：铁电存储器包括基底构件，形成在基底构件上的第一电介质层，形成在第一电介质层上方的第二电介质层，穿透第一和第二电介质层的接触孔，形成在接触孔中的插塞，以及形成在插塞上方的阻挡层，以及由下电极，强电介质层和上电极形成的强电介质电容器，其连续地层压在包括在插塞上方的区域中。第二电介质层具有比插塞和第一电介质层更难以抛光的性质。

2. 发明申请

US20060043452A1 Ferroelectric memory and its manufacturing method 审中-公开
标题翻译：铁电记忆及其制造方法
公开(公告)号：US20060043452A1
公开(公告)日：2006-03-02
申请号：US11210011
申请日：2005-08-23
申请人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
发明人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
IPC分类号： H01L29/94
CPC分类号： H01L28/55 , H01L28/65
摘要： A ferroelectric memory includes a base member, a dielectric layer formed above the base member, a contact hole that penetrates the dielectric layer, a plug formed inside the contact hole, a barrier layer formed above the plug, and including a first portion with a portion formed in the contact hole and a second portion formed integrally with the first portion and above the dielectric layer, and a ferroelectric capacitor formed from a lower electrode, a ferroelectric layer and an upper electrode successively laminated in a region including above the plug.
摘要翻译：铁电存储器包括基底构件，形成在基底构件上方的电介质层，穿透电介质层的接触孔，形成在接触孔内部的塞子，形成在插塞上方的阻挡层，并且包括第一部分，形成在所述接触孔中的第二部分和与所述第一部分和所述介电层一体形成的第二部分，以及由下电极，强电介质层和上电极形成的强电介质电容器，所述铁电电容器依次层压在所述插塞之上的区域中。

3. 发明申请

US20060046318A1 Ferroelectric memory and its manufacturing method 有权
标题翻译：铁电记忆及其制造方法
公开(公告)号：US20060046318A1
公开(公告)日：2006-03-02
申请号：US11210010
申请日：2005-08-23
申请人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
发明人： Mamoru Ueda , Kazuhiro Masuda , Shinichi Fukada
IPC分类号： H01L21/00
CPC分类号： H01L27/11502 , H01L27/11507
摘要： A ferroelectric memory includes a base member, a first dielectric layer formed above the base member, a second dielectric layer formed above the first dielectric layer, a contact hole that penetrates the first and second dielectric layers, a plug formed in the contact hole, and a barrier layer formed above the plug, and a ferroelectric capacitor formed from a lower electrode, a ferroelectric layer and an upper electrode successively laminated in a region including above the plug. The second dielectric layer has a property that is more difficult to be polished than the plug and the first dielectric layer.
摘要翻译：铁电存储器包括基底构件，形成在基底构件上的第一电介质层，形成在第一电介质层上方的第二电介质层，穿透第一和第二电介质层的接触孔，形成在接触孔中的插塞，以及形成在插塞上方的阻挡层，以及由下电极，强电介质层和上电极形成的强电介质电容器，其连续地层压在包括在插塞上方的区域中。第二电介质层具有比插塞和第一电介质层更难以抛光的性质。

4. 发明申请

US20080020492A1 Ferroelectric memory and its manufacturing method 审中-公开
标题翻译：铁电记忆及其制造方法
公开(公告)号：US20080020492A1
公开(公告)日：2008-01-24
申请号：US11893049
申请日：2007-08-14
申请人： Mamoru Ueda , Kazuhiro Masuda , Shinich Fukada
发明人： Mamoru Ueda , Kazuhiro Masuda , Shinich Fukada
IPC分类号： H01L21/20
CPC分类号： H01L27/11502 , H01L27/11507
摘要： A ferroelectric memory includes a base member, a first dielectric layer formed above the base member, a second dielectric layer formed above the first dielectric layer, a contact hole that penetrates the first and second dielectric layers, a plug formed in the contact hole, and a barrier layer formed above the plug, and a ferroelectric capacitor formed from a lower electrode, a ferroelectric layer and an upper electrode successively laminated in a region including above the plug. The second dielectric layer has a property that is more difficult to be polished than the plug and the first dielectric layer.
摘要翻译：铁电存储器包括基底构件，形成在基底构件上的第一电介质层，形成在第一电介质层上方的第二电介质层，穿透第一和第二电介质层的接触孔，形成在接触孔中的插塞，以及形成在插塞上方的阻挡层，以及由下电极，强电介质层和上电极形成的强电介质电容器，其连续地层压在包括在插塞上方的区域中。第二电介质层具有比插塞和第一电介质层更难以抛光的性质。

5. 发明授权

US07955655B2 Coating compositions and method of forming coating film 失效
标题翻译：涂料组合物和形成涂膜的方法
公开(公告)号：US07955655B2
公开(公告)日：2011-06-07
申请号：US10503127
申请日：2003-02-18
申请人： Kazutoshi Sugiura , Kazuhiro Masuda , Hiromi Katoh , Kenichi Nagai , Yoshizumi Matsuno
发明人： Kazutoshi Sugiura , Kazuhiro Masuda , Hiromi Katoh , Kenichi Nagai , Yoshizumi Matsuno
IPC分类号： C08F2/46 , B05D1/36 , C09D167/00
CPC分类号： C09D175/16 , B05D3/067 , B05D7/16 , B05D7/53 , C08G18/3206 , C08G18/8175 , C08K5/0025 , C08K5/34922 , C08L33/06 , C08L63/10 , C08L67/00 , C08L67/06 , C08L101/02 , C09D4/00 , C09D4/06 , C09D167/00 , C09D167/06 , C09D175/06 , Y10T428/31786 , C08G18/62 , C08F283/02 , C08L2666/22 , C08L2666/02 , C08L2666/04 , C08L2666/18
摘要： The present invention provides a thermosetting and photocurable coating composition comprising: (A) at least one compound selected from the group consisting of radical-polymerizable unsaturated monomers, resins containing radical-polymerizable unsaturated groups, and resins containing radical-polymerizable unsaturated groups and thermosetting functional groups; (B) a hydroxyl-containing polyester resin produced by esterifying a polybasic acid (a) and a polyhydric alcohol (b), wherein an alicyclic polybasic acid (a1) and/or an alicyclic polyhydric alcohol (b1) are included in a ratio of 20% or more based on the total weight of polybasic acid (a) and polyhydric alcohol (b); (C) a crosslinking agent; and (D) a photopolymerization initiator; and a method of forming a coating film using the coating composition.
摘要翻译：本发明提供一种热固性和光固化性涂料组合物，其包含：（A）至少一种选自可自由基聚合的不饱和单体，含有可自由基聚合的不饱和基团的树脂和含有可自由基聚合的不饱和基团的树脂和热固性官能团团体（B）通过酯化多元酸（a）和多元醇（b）而制备的含羟基的聚酯树脂，其中脂环族多元酸（a1）和/或脂环族多元醇（b1）的比例为基于多元酸（a）和多元醇（b）的总重量为20％以上。（C）交联剂; 和（D）光聚合引发剂; 以及使用该涂料组合物形成涂膜的方法。

6. 发明申请

US20050142297A1 Coating compositions and method of forming coating film 失效
标题翻译：涂料组合物和形成涂膜的方法
公开(公告)号：US20050142297A1
公开(公告)日：2005-06-30
申请号：US10503127
申请日：2003-02-18
申请人： Kazutoshi Sugiura , Kazuhiro Masuda , Hiromi Katoh , Kenichi Nagai , Yoshizumi Matsuno
发明人： Kazutoshi Sugiura , Kazuhiro Masuda , Hiromi Katoh , Kenichi Nagai , Yoshizumi Matsuno
IPC分类号： B05D3/06 , B05D7/00 , B05D7/16 , C08G18/32 , C08G18/81 , C08K5/00 , C08K5/3492 , C08L33/06 , C08L63/10 , C08L67/00 , C08L67/06 , C08L101/02 , C09D4/00 , C09D4/06 , C09D167/00 , C09D167/06 , C09D175/06 , C09D175/16 , C08F2/46 , B05D1/36
CPC分类号： C09D175/16 , B05D3/067 , B05D7/16 , B05D7/53 , C08G18/3206 , C08G18/8175 , C08K5/0025 , C08K5/34922 , C08L33/06 , C08L63/10 , C08L67/00 , C08L67/06 , C08L101/02 , C09D4/00 , C09D4/06 , C09D167/00 , C09D167/06 , C09D175/06 , Y10T428/31786 , C08G18/62 , C08F283/02 , C08L2666/22 , C08L2666/02 , C08L2666/04 , C08L2666/18
摘要： The present invention provides a thermosetting and photocurable coating composition comprising: (A) at least one compound selected from the group consisting of radical-polymerizable unsaturated monomers, resins containing radical-polymerizable unsaturated groups, and resins containing radical-polymerizable unsaturated groups and thermosetting functional groups; (B) a hydroxyl-containing polyester resin produced by esterifying a polybasic acid (a) and a polyhydric alcohol (b), wherein an alicyclic polybasic acid (a1) and/or an alicyclic polyhydric alcohol (b1) are included in a ratio of 20% or more based on the total weight of polybasic acid (a) and polyhydric alcohol (b); (C) a crosslinking agent; and (D) a photopolymerization initiator; and a method of forming a coating film using the coating composition.
摘要翻译：本发明提供一种热固性和光固化性涂料组合物，其包含：（A）至少一种选自可自由基聚合的不饱和单体，含有可自由基聚合的不饱和基团的树脂和含有可自由基聚合的不饱和基团的树脂和热固性官能团团体（B）通过酯化多元酸（a）和多元醇（b）而制备的含羟基的聚酯树脂，其中脂环族多元酸（a1）和/或脂环族多元醇（b1）的比例为基于多元酸（a）和多元醇（b）的总重量计为20％以上。（C）交联剂; 和（D）光聚合引发剂; 以及使用该涂料组合物形成涂膜的方法。

7. 发明授权

US08295875B2 Apparatus and method for mobile communication by using non-volatile memory device 有权
标题翻译：使用非易失性存储器件进行移动通信的装置和方法
公开(公告)号：US08295875B2
公开(公告)日：2012-10-23
申请号：US11941230
申请日：2007-11-16
申请人： Kazuhiro Masuda
发明人： Kazuhiro Masuda
IPC分类号： H04M1/00
CPC分类号： H04M19/04 , G06F12/0246
摘要： A mobile communication apparatus configured to communicate with an opposite communication device is provided. The mobile communication apparatus includes a transceiver configured to receive an incoming signal sent from the opposite communication device. The transceiver is configured to produce an interrupt signal upon receiving the incoming signal. The mobile communication apparatus includes a first memory device and a non-volatile second memory device. The mobile communication apparatus includes a controller connected to the transceiver, the first memory device and the second memory device. The controller is configured to perform garbage collection of the second memory device, to load data stored in one of the first memory device and the second memory device into another of the first memory device and the second memory device, to access the first memory device if the transceiver produces the interrupt signal.
摘要翻译：提供了一种被配置为与相对的通信设备通信的移动通信设备。移动通信装置包括：收发器，被配置为接收从相对的通信设备发送的输入信号。收发器被配置为在接收到输入信号时产生中断信号。移动通信装置包括第一存储装置和非易失性第二存储装置。移动通信设备包括连接到收发器，第一存储器设备和第二存储器设备的控制器。控制器被配置为执行第二存储器设备的垃圾收集，将存储在第一存储器设备和第二存储器设备之一中的数据加载到第一存储器设备和第二存储器设备中的另一个中以访问第一存储器设备，如果收发器产生中断信号。

8. 发明授权

US08173781B2 Monoclonal antibody capable of binding to heparin-binding epidermal growth factor-like growth factor 失效
公开(公告)号：US08173781B2
公开(公告)日：2012-05-08
申请号：US12494472
申请日：2009-06-30
申请人： Eisuke Mekada , Ryo Iwamoto , Shingo Miyamoto , Kenya Shitara , Akiko Furuya , Kazuyasu Nakamura , Kumiko Takahashi , Hiroshi Ando , Kazuhiro Masuda , Yuka Sasaki
发明人： Eisuke Mekada , Ryo Iwamoto , Shingo Miyamoto , Kenya Shitara , Akiko Furuya , Kazuyasu Nakamura , Kumiko Takahashi , Hiroshi Ando , Kazuhiro Masuda , Yuka Sasaki
IPC分类号： C07K16/00 , A61K39/395 , C12P21/08
CPC分类号： A61K39/39558 , A61K2039/505 , C07K16/22 , C07K16/30 , C07K2317/24 , C07K2317/34 , C07K2317/56 , C07K2317/565 , C07K2317/73 , C07K2317/732 , C07K2317/76
摘要： Medicaments for treating diseases related to HB-EGF escalation are in demand. The present invention provides a monoclonal antibody or an antibody fragment thereof which binds to a cell membrane-bound HB-EGF, a membrane type HB-EGF and a secretory HB-EGF.

9. 发明授权

US08163282B2 Monoclonal antibody capable of binding to heparin-binding epidermal growth factor-like growth factor 失效
标题翻译：能够结合肝素结合表皮生长因子样生长因子的单克隆抗体
公开(公告)号：US08163282B2
公开(公告)日：2012-04-24
申请号：US12609434
申请日：2009-10-30
申请人： Eisuke Mekada , Ryo Iwamoto , Shingo Miyamoto , Kenya Shitara , Akiko Furuya , Kazuyasu Nakamura , Kumiko Takahashi , Hiroshi Ando , Kazuhiro Masuda , Yuka Sasaki
发明人： Eisuke Mekada , Ryo Iwamoto , Shingo Miyamoto , Kenya Shitara , Akiko Furuya , Kazuyasu Nakamura , Kumiko Takahashi , Hiroshi Ando , Kazuhiro Masuda , Yuka Sasaki
IPC分类号： C07K16/00
CPC分类号： C07K16/22 , C07K2317/24 , C07K2317/56 , C07K2317/565 , C07K2317/73 , C07K2317/732 , C07K2317/76
摘要： Medicaments for treating diseases related to HB-EGF escalation are in demand. The present invention provides a monoclonal antibody or an antibody fragment thereof which binds to a cell membrane-bound HB-EGF, a membrane type HB-EGF and a secretory HB-EGF.
摘要翻译：需要用于治疗与HB-EGF升高有关的疾病的药物。本发明提供了结合细胞膜结合的HB-EGF，膜型HB-EGF和分泌型HB-EGF的单克隆抗体或其抗体片段。

10. 发明授权

US07473444B2 Method of forming coating film 失效
标题翻译：涂膜成膜方法
公开(公告)号：US07473444B2
公开(公告)日：2009-01-06
申请号：US10500140
申请日：2003-01-20
申请人： Kenji Seko , Kazuhiro Masuda , Yoshizumi Matsuno
发明人： Kenji Seko , Kazuhiro Masuda , Yoshizumi Matsuno
IPC分类号： B05D3/02 , B05D3/06
CPC分类号： B05D7/16 , B05D3/0209 , B05D3/0254 , B05D3/067 , B05D5/005 , Y10T428/31681
摘要： The present invention provides a method of forming a coating film on a substrate comprising the steps of: (i) coating the substrate with a thermosetting and photocurable coating composition to form a wet coating film, (ii) heating the wet coating film to semicure the coating film, and (iii) irradiating the semicured coating film with light to cure the coating film.
摘要翻译：本发明提供了一种在基材上形成涂膜的方法，包括以下步骤：（i）用热固性和可光固化的涂料组合物涂布基材以形成湿涂膜，（ii）加热湿涂膜以使涂膜，（iii）用光照射半固化涂膜以固化涂膜。

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