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1. 发明授权

US07312449B2 Electron beam system and method of manufacturing devices using the system 失效
标题翻译：电子束系统及其制造方法
公开(公告)号：US07312449B2
公开(公告)日：2007-12-25
申请号：US11034873
申请日：2005-01-14
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要翻译：一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。成形孔径和NA孔径布置在电子枪的前部位置。由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

2. 发明授权

US08368016B1 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
标题翻译：电子束装置和使用所述电子束装置的装置制造方法
公开(公告)号：US08368016B1
公开(公告)日：2013-02-05
申请号：US12007511
申请日：2008-01-11
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： H01J37/26
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

3. 发明授权

US07361895B2 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
标题翻译：电子束装置和使用所述电子束装置的装置制造方法
公开(公告)号：US07361895B2
公开(公告)日：2008-04-22
申请号：US11304680
申请日：2005-12-16
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： H01J49/44
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

4. 发明授权

US07005641B2 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 失效
公开(公告)号：US07005641B2
公开(公告)日：2006-02-28
申请号：US10731163
申请日：2003-12-10
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： G21K7/00
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

5. 发明申请

US20130032716A1 ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING SAID ELECTRON BEAM APPARATUS 有权
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US20130032716A1
公开(公告)日：2013-02-07
申请号：US12007511
申请日：2008-01-11
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： H01J37/07
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.
摘要翻译：电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度电子束发射与光轴方向不对准。

6. 发明申请

US20050133733A1 Electron beam system and method of manufacturing devices using the system 失效
公开(公告)号：US20050133733A1
公开(公告)日：2005-06-23
申请号：US11034873
申请日：2005-01-14
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , G21G5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

7. 发明授权

US06853143B2 Electron beam system and method of manufacturing devices using the system 有权
标题翻译：电子束系统及其制造方法
公开(公告)号：US06853143B2
公开(公告)日：2005-02-08
申请号：US10337420
申请日：2003-01-07
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/04 , G21K7/00 , H01J37/28 , H01J7/24 , F16K5/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要翻译：一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。成形孔径和NA孔径布置在电子枪的前部位置。由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

8. 发明申请

US20060097200A1 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus 有权
公开(公告)号：US20060097200A1
公开(公告)日：2006-05-11
申请号：US11304680
申请日：2005-12-16
申请人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
发明人： Mamoru Nakasuji , Takao Kato , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Kenji Watanabe
IPC分类号： G21G4/00
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要： An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

9. 发明授权

US07423267B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07423267B2
公开(公告)日：2008-09-09
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G01N23/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

10. 发明授权

US07205540B2 Electron beam apparatus and device manufacturing method using same 失效
标题翻译：电子束装置及其制造方法
公开(公告)号：US07205540B2
公开(公告)日：2007-04-17
申请号：US11262844
申请日：2005-11-01
申请人： Mamoru Nakasuji , Takao Kato , Kenji Watanabe , Shoji Yoshikawa , Tohru Satake , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Kenji Watanabe , Shoji Yoshikawa , Tohru Satake , Nobuharu Noji
IPC分类号： G21K7/00 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： B82Y10/00 , G01N23/225 , G01R31/307 , H01J37/242 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24507 , H01J2237/2817
摘要： An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.
摘要翻译：提供电子束装置，用于以简单的结构以高通量可靠地测量电位对比度等。用于照射形成有电子束图案的晶片的样品（如晶片）以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱，物镜，ExB分离器和次级电子束检测器用于保持样品的阶段，并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构，用于向样品施加电压，并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。当评估样品时，对载物台移动的方向进行校正，使其与模具的排列方向一致。

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