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1. 发明授权

US4832474A Microscope apparatus for examining wafer 失效
标题翻译：用于检查晶片的显微镜装置
公开(公告)号：US4832474A
公开(公告)日：1989-05-23
申请号：US198642
申请日：1988-05-26
申请人： Makoto Yoshinaga , Yoichi Iba , Noriyuki Miyahara , Masami Kawasaki , Terumasa Morita , Takashi Nagano
发明人： Makoto Yoshinaga , Yoichi Iba , Noriyuki Miyahara , Masami Kawasaki , Terumasa Morita , Takashi Nagano
IPC分类号： G02B21/00 , G02B21/24
CPC分类号： G02B21/24 , G02B21/0016 , Y10S359/90
摘要： In order to substantially reduce the time required for examination and to enable the structure of the microscope apparatus for examining a wafer to be made in a compact size, the apparatus comprises a wafer examination unit provided midway on the transportation course of the wafer transporting means for being able to move the wafer under examination independently of the direction of its transporation, and an objective disposed above the wafer examination unit for being able to move along the upper face of the wafer which is held at the position of examination and in a direction different from the direction of the transportation.
摘要翻译：为了显着减少检查所需的时间，并且能够使显微镜装置的结构用于检查制造尺寸紧凑的晶片，该装置包括在晶片传送装置的传送过程中途设置的晶片检查单元，能够独立于其运送方向移动检查晶片，以及设置在晶片检查单元上方的物镜，以便能够沿着保持在检查位置的晶片的上表面沿着不同的方向移动从运输方向。

2. 发明授权

US4744642A Microscope 失效
标题翻译：显微镜
公开(公告)号：US4744642A
公开(公告)日：1988-05-17
申请号：US928682
申请日：1986-11-07
申请人： Makoto Yoshinaga , Yoichi Iba , Noriyuki Miyahara , Masami Kawasaki , Terumasa Morita , Takashi Nagano
发明人： Makoto Yoshinaga , Yoichi Iba , Noriyuki Miyahara , Masami Kawasaki , Terumasa Morita , Takashi Nagano
IPC分类号： G02B21/24 , G02B7/02 , G02B21/00 , G02B21/06
CPC分类号： G02B21/24
摘要： A microscope wherein, in order that the observing position may be variable over a wide range of a sample to be observed without requiring a large objective, the objective optical system is so formed as to be movable in parallel with the sample surface and the light path length between the objective optical system and eyepiece optical system is made variable by moving the objective optical system.
摘要翻译：一种显微镜，其中，为了在不需要大的物镜的情况下观察位置在待观察的样品的宽范围内可以变化，物镜光学系统被形成为可以与样品表面和光路平行移动物镜光学系统与目镜光学系统之间的长度可通过移动物镜光学系统而变化。

3. 发明授权

US4732485A Optical surface profile measuring device 失效
标题翻译：光学表面轮廓测量装置
公开(公告)号：US4732485A
公开(公告)日：1988-03-22
申请号：US852845
申请日：1986-04-16
申请人： Terumasa Morita , Noriyuki Miyahara , Hisao Kitagawa
发明人： Terumasa Morita , Noriyuki Miyahara , Hisao Kitagawa
IPC分类号： G01B11/24
CPC分类号： G01B11/24
摘要： An optical surface profile measuring device adapted to be able to simultaneously or substantially simultaneously measure a same part on the surface of an object to be measured with two different measuring ranges by combining a surface profile measuring device of a high resolving power using the critical angle method with a surface profile measuring device having a wide measuring range using the astigmatism method, in order to facilitate the setting of a detecting head within a measuring range while maintaining a high resolving power and to enable to measure automatically regardless of the state of the measured surface. This optical surface profile measuring device is provided with an iris stop or liquid crystal shutter capable of varying the numerical aperture behind an objective lens to allow the free setting of the resolving power or the measuring range, and further provided with an aperture stop to make the numerical aperture on the detecting side smaller than the numerical aperture on the projecting side to thereby obtain the proper measuring result even if the measured surface inclines with respect to the optical axis.
摘要翻译：一种光学表面轮廓测量装置，其适于能够通过使用临界角方法组合具有高分辨率的表面轮廓测量装置来同时或基本上同时测量待测对象的表面上的相同部分，具有两个不同的测量范围具有使用散光法的宽测量范围的表面轮廓测量装置，以便于在保持高分辨能力的同时在检测范围内设置检测头，并且能够自动测量而不管测量表面的状态如何。该光学表面轮廓测量装置设置有能够改变物镜后面的数值孔径的光圈停止或液晶快门，以允许分辨力或测量范围的自由设定，并且还设置有孔径光阑，以使检测侧的数值孔径小于突出侧的数值孔径，从而即使测量的表面相对于光轴倾斜，也能获得适当的测量结果。

4. 发明授权

US4971445A Fine surface profile measuring apparatus 失效
标题翻译：精细表面轮廓测量仪
公开(公告)号：US4971445A
公开(公告)日：1990-11-20
申请号：US191606
申请日：1988-05-09
申请人： Eiichi Sato , Kiyozo Koshiishi , Sadao Shigetomi , Syunpei Tanaka , Makoto Yoshinaga , Terumasa Morita , Chikara Nagano , Shohei Kobayashi , Chiaki Sato , Akitoshi Toda , Mitunori Kubo , Ikuo Tofukuji
发明人： Eiichi Sato , Kiyozo Koshiishi , Sadao Shigetomi , Syunpei Tanaka , Makoto Yoshinaga , Terumasa Morita , Chikara Nagano , Shohei Kobayashi , Chiaki Sato , Akitoshi Toda , Mitunori Kubo , Ikuo Tofukuji
IPC分类号： G01B9/04 , G01B11/24
CPC分类号： G01B11/24 , G01B9/04
摘要： A fine surface profile meter includes an X-Y stage, supported by a leaf spring, for supporting a sample thereon, a piezoelectric actuator for two-dimensionally scanning the X-Y stage, a positioning table, disposed below the X-Y stage, for positioning the X-Y stage at an arbitrary position, an objective lens disposed above the X-Y stage, an observation optical system for allowing an operator to observe an enlarged sample image, a measurement optical system, an optical axis of which is aligned with an optical path of the objective lens through a beam splitter, the measurement optical system for emitting a laser beam onto the sample through the objective lens and to receive the laser beam reflected by the sample, a calculator circuit for calculating height information of the sample using an output from the measurement optical system and for obtaining a two-dimensional distribution of the height information, a cover for shielding the X-Y stage, the positioning means, the objective lens, the beam splitter, the observation optical system, and the measurement optical system from an outer atmosphere, a detachable measurement unit for integrally holding the objective lens, the beam splitter, and the measurement optical system, a supporting plate supported on the X-Y stage through columns, and an arm, mounted on the supporting plate, for supporting the measurement optical system and the observation optical system.

5. 发明申请

US20070274634A1 Light source apparatus and microscope apparatus 有权
标题翻译：光源装置和显微镜装置
公开(公告)号：US20070274634A1
公开(公告)日：2007-11-29
申请号：US11803259
申请日：2007-05-14
申请人： Masato Yabe , Daisuke Yokoi , Terumasa Morita , Norio Maruyama , Yukio Eda
发明人： Masato Yabe , Daisuke Yokoi , Terumasa Morita , Norio Maruyama , Yukio Eda
IPC分类号： G02B6/34
CPC分类号： G02B21/16 , G02B6/4206
摘要： A wavelength selection unit includes a light source which emits light of at least a predetermined wavelength region, a collector lens which collects the light emitted from the light source and emits a parallel flux which is inclined relative to a light axis of an optical system of itself, a selective reflection optical system which reflects light of a predetermined wavelength region from the parallel flux selectively, and a returning optical system which returns each reflected flux reflected by the selective reflection optical system symmetrically about a reflected light axis of the selective reflection optical system. The collector lens collects a back flux which is returned by the returning optical system and which is re-reflected by the selective reflection optical system, and forms a light source image of the light source.
摘要翻译：波长选择单元包括发射至少预定波长区域的光的光源，收集从光源发射的光并发射相对于其本身的光学系统的光轴倾斜的平行磁通的集光透镜选择性地反射来自平行磁通的预定波长区域的光的选择性反射光学系统，以及使由选择反射光学系统反射的各反射光束围绕选择反射光学系统的反射光轴对称地返回的返回光学系统。收集透镜收集由返回光学系统返回并由选择性反射光学系统再反射的反向通量，并形成光源的光源图像。

6. 发明申请

US20070115457A1 Lens evaluation device 有权
标题翻译：镜头评估装置
公开(公告)号：US20070115457A1
公开(公告)日：2007-05-24
申请号：US11598446
申请日：2006-11-13
申请人： Toshiaki Matsuzawa , Go Ryu , Yukio Eda , Terumasa Morita
发明人： Toshiaki Matsuzawa , Go Ryu , Yukio Eda , Terumasa Morita
IPC分类号： G01B9/00
CPC分类号： G01M11/0264
摘要： This lens evaluation device comprises a plurality of point light sources arranged on the plane, an imaging unit for picking up an object and obtaining its image, a movement unit for changing the relative distance between the point light source or the imaging unit and the optical system to be evaluated, a storage medium for recording stack images obtained by the imaging unit picking up the images of the plurality of point light sources via the optical system every time the movement unit changes the relative distance, an image position calculation unit for calculating a plurality of image positions from the plurality of pieces of point light source image in the stack image recorded on the storage medium and an aberration acquisition unit for fitting an aberration model function to the plurality of image positions calculated and obtaining an aberration measurement value.
摘要翻译：该透镜评价装置包括布置在平面上的多个点光源，用于拾取物体并获得其图像的成像单元，用于改变点光源或成像单元与光学系统之间的相对距离的移动单元要被评估的存储介质，用于记录通过该成像单元获得的堆叠图像，每当移动单元改变相对距离时，通过该光学系统拾取多个点光源的图像;图像位置计算单元，用于计算多个从记录在存储介质上的堆叠图像中的多个点光源图像的图像位置和用于将像差模型函数拟合到所计算的多个图像位置并获得像差测量值的像差获取单元。

7. 发明授权

US07747101B2 Lens evaluation device 有权
标题翻译：镜头评估装置
公开(公告)号：US07747101B2
公开(公告)日：2010-06-29
申请号：US11598446
申请日：2006-11-13
申请人： Toshiaki Matsuzawa , Go Ryu , Yukio Eda , Terumasa Morita
发明人： Toshiaki Matsuzawa , Go Ryu , Yukio Eda , Terumasa Morita
IPC分类号： G06K9/40 , G01B9/00
CPC分类号： G01M11/0264
摘要： This lens evaluation device comprises a plurality of point light sources arranged on the plane, an imaging unit for picking up an object and obtaining its image, a movement unit for changing the relative distance between the point light source or the imaging unit and the optical system to be evaluated, a storage medium for recording stack images obtained by the imaging unit picking up the images of the plurality of point light sources via the optical system every time the movement unit changes the relative distance, an image position calculation unit for calculating a plurality of image positions from the plurality of pieces of point light source image in the stack image recorded on the storage medium and an aberration acquisition unit for fitting an aberration model function to the plurality of image positions calculated and obtaining an aberration measurement value.
摘要翻译：该透镜评价装置包括布置在平面上的多个点光源，用于拾取物体并获得其图像的成像单元，用于改变点光源或成像单元与光学系统之间的相对距离的移动单元要被评估的存储介质，用于记录通过该成像单元获得的堆叠图像，每当移动单元改变相对距离时，通过该光学系统拾取多个点光源的图像;图像位置计算单元，用于计算多个从记录在存储介质上的堆叠图像中的多个点光源图像的图像位置和用于将像差模型函数拟合到所计算的多个图像位置并获得像差测量值的像差获取单元。

8. 发明授权

US06707546B2 Apparatus for inspecting a substrate 失效
标题翻译：用于检查基板的装置
公开(公告)号：US06707546B2
公开(公告)日：2004-03-16
申请号：US10042032
申请日：2001-10-25
申请人： Hiroyuki Okahira , Yuzo Nakamura , Terumasa Morita , Nobuo Fujisaki
发明人： Hiroyuki Okahira , Yuzo Nakamura , Terumasa Morita , Nobuo Fujisaki
IPC分类号： G01N2188
CPC分类号： G01N21/958 , G02F1/1303 , G02F1/1309
摘要： An apparatus for inspecting a substrate includes a substrate holding member for holding a substrate to be inspected, a driving mechanism for raising the substrate holding member to a predetermined angle or less, a position coordinate detecting section provided at side edge of the substrate in at least two directions for detecting coordinates of a defect present in the substrate, an observation system supporting section provided for supporting a micro observation system and moving on the surface of the substrate, and a controlling section for controlling of the movement of the micro observation system of the observation system supporting section to correspond to a defect present in the substrate, on the basis of the position coordinates of the defect detected by the position coordinate detecting section.
摘要翻译：用于检查基板的装置包括用于保持待检查的基板的基板保持部件，用于将基板保持部件升高至规定角度的驱动机构，至少设置在基板的侧缘的位置坐标检测部用于检测存在于基板中的缺陷的坐标的两个方向，用于支撑微观察系统并在基板的表面上移动的观测系统支撑部，以及用于控制基板的微观观察系统的运动的控制部基于由所述位置坐标检测部检测出的所述缺陷的位置坐标来对应于存在于所述基板中的缺陷的观测系统支撑部。

9. 发明授权

US07764424B2 Light source apparatus and microscope apparatus 有权
标题翻译：光源装置及显微镜装置
公开(公告)号：US07764424B2
公开(公告)日：2010-07-27
申请号：US11803259
申请日：2007-05-14
申请人： Masato Yabe , Daisuke Yokoi , Terumasa Morita , Norio Maruyama , Yukio Eda
发明人： Masato Yabe , Daisuke Yokoi , Terumasa Morita , Norio Maruyama , Yukio Eda
IPC分类号： G02B21/06 , F21V7/00 , F21V9/00
CPC分类号： G02B21/16 , G02B6/4206
摘要： A wavelength selection unit includes a light source which emits light of at least a predetermined wavelength region, a collector lens which collects the light emitted from the light source and emits a parallel flux which is inclined relative to a light axis of an optical system of itself, a selective reflection optical system which reflects light of a predetermined wavelength region from the parallel flux selectively, and a returning optical system which returns each reflected flux reflected by the selective reflection optical system symmetrically about a reflected light axis of the selective reflection optical system. The collector lens collects a back flux which is returned by the returning optical system and which is re-reflected by the selective reflection optical system, and forms a light source image of the light source.
摘要翻译：波长选择单元包括发射至少预定波长区域的光的光源，收集从光源发射的光并发射相对于其本身的光学系统的光轴倾斜的平行磁通的集光透镜选择性地反射来自平行磁通的预定波长区域的光的选择性反射光学系统，以及使由选择反射光学系统反射的各反射光束围绕选择反射光学系统的反射光轴对称地返回的返回光学系统。收集透镜收集由返回光学系统返回并由选择性反射光学系统再反射的反向通量，并形成光源的光源图像。

10. 发明申请

US20060289410A1 Laser machining apparatus 审中-公开
标题翻译：激光加工设备
公开(公告)号：US20060289410A1
公开(公告)日：2006-12-28
申请号：US11512550
申请日：2006-08-30
申请人： Terumasa Morita , Susumu Takahashi
发明人： Terumasa Morita , Susumu Takahashi
IPC分类号： B23K26/38 , B23K26/06
CPC分类号： B23K26/03 , B23K26/032 , B23K26/04 , B23K26/043 , B23K26/0617 , B23K26/0652 , B23K26/0665 , B23K26/067 , B23K26/0861 , B23K26/40 , B23K26/53 , B23K2101/40 , B23K2103/50 , B28D1/221 , G02B27/283
摘要： A laser machining apparatus, provided with a stage on which a workpiece is placed, an emission device for emitting laser light toward a surface of the workpiece, an optical system for splitting the laser light into a plurality of beams, and for focusing the beams as a plurality of spots on the surface of or within the workpiece, and a movement device for moving the plurality of spots in a horizontal direction relative to the workpiece.
摘要翻译：一种激光加工设备，其具有放置工件的台，用于朝向工件的表面发射激光的发射装置，用于将激光分裂成多个光束的光学系统，并且用于将光束聚焦为工件表面上或工件内的多个点，以及用于相对于工件在水平方向上移动多个点的移动装置。

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