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1. 发明申请

US20100175043A1 FAST AND ACCURATE METHOD TO SIMULATE INTERMEDIATE RANGE FLARE EFFECTS 有权
标题翻译：快速和准确的方法来模拟中间范围的瓦斯效应
公开(公告)号：US20100175043A1
公开(公告)日：2010-07-08
申请号：US12349108
申请日：2009-01-06
申请人： Maharaj Mukherjee , James A. Culp , Scott M. Mansfield , Kafai Lai , Alan E. Rosenbluth
发明人： Maharaj Mukherjee , James A. Culp , Scott M. Mansfield , Kafai Lai , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： A method is provided for modeling lithographic processes in the design of photomasks for the manufacture of semiconductor integrated circuits, and more particularly for simulating intermediate range flare effects. For a region of influence (ROI) from first ROI1 of about 5λ/NA to distance ROI2 when the point spread function has a slope that is slowly varying according to a predetermined criterion, then mask shapes at least within the distance range from ROI1 to ROI2 are smoothed prior to computing the SOCS convolutions. The method provides a fast method for simulating intermediate range flare effects with sufficient accuracy.
摘要翻译：提供了一种用于在用于制造半导体集成电路的光掩模的设计中对光刻工艺进行建模的方法，更具体地说，用于模拟中间范围闪光效应。对于当点扩散函数具有根据预定标准缓慢变化的斜率时，从约5λ/ NA的第一ROI1到距离ROI2的影响区域（ROI），则至少在从ROI1到ROI2的距离范围内的掩模形状在计算SOCS卷积之前进行平滑处理。该方法提供了一种用于以足够的精度模拟中等范围闪光效果的快速方法。

2. 发明授权

US08161422B2 Fast and accurate method to simulate intermediate range flare effects 有权
标题翻译：快速准确的模拟中程火炬效果的方法
公开(公告)号：US08161422B2
公开(公告)日：2012-04-17
申请号：US12349108
申请日：2009-01-06
申请人： Maharaj Mukherjee , James A. Culp , Scott M. Mansfield , Kafai Lai , Alan E. Rosenbluth
发明人： Maharaj Mukherjee , James A. Culp , Scott M. Mansfield , Kafai Lai , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： A method is provided for modeling lithographic processes in the design of photomasks for the manufacture of semiconductor integrated circuits, and more particularly for simulating intermediate range flare effects. For a region of influence (ROI) from first ROI1 of about 5λ/NA to distance ROI2 when the point spread function has a slope that is slowly varying according to a predetermined criterion, then mask shapes at least within the distance range from ROI1 to ROI2 are smoothed prior to computing the SOCS convolutions. The method provides a fast method for simulating intermediate range flare effects with sufficient accuracy.
摘要翻译：提供了一种用于在用于制造半导体集成电路的光掩模的设计中对光刻工艺进行建模的方法，更具体地说，用于模拟中间范围闪光效应。对于当点扩散函数具有根据预定标准缓慢变化的斜率时，从约5λ/ NA的第一ROI1到距离ROI2的影响区域（ROI），则至少在从ROI1到ROI2的距离范围内的掩模形状在计算SOCS卷积之前进行平滑处理。该方法提供了一种用于以足够的精度模拟中等范围闪光效果的快速方法。

3. 发明授权

US07343582B2 Optical proximity correction using progressively smoothed mask shapes 失效
标题翻译：使用逐渐平滑的掩模形状的光学邻近校正
公开(公告)号：US07343582B2
公开(公告)日：2008-03-11
申请号：US11138172
申请日：2005-05-26
申请人： Maharaj Mukherjee , Scott M. Mansfield , Alan E. Rosenbluth , Kafai Lai
发明人： Maharaj Mukherjee , Scott M. Mansfield , Alan E. Rosenbluth , Kafai Lai
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/36 , G03F7/70441 , G06F2217/12 , Y02P90/265
摘要： A method, program product and system is disclosed for performing optical proximity correction (OPC) wherein mask shapes are fragmented based on the effective image processing influence of neighboring shapes on the shape to be fragmented. Neighboring shapes are smoothed prior to determining their influence on the fragmentation of the shape of interest, where the amount of smoothing of a neighboring shape increases as the influence of the neighboring shape on the image process of the shape of interest decreases. A preferred embodiment includes the use of multiple regions of interactions (ROIs) around the shape of interest, and assigning a smoothing parameter to a given ROI that increases as the influence of shapes in that ROI decreases with respect to the shape to be fragmented. The invention provides for accurate OPC that is also efficient.
摘要翻译：公开了一种用于执行光学邻近校正（OPC）的方法，程序产品和系统，其中基于相邻形状对要分段的形状的有效图像处理影响，掩模形状被分段。相邻形状在确定其对感兴趣的形状的碎片的影响之前被平滑，其中相邻形状的平滑化量随着相关形状对感兴趣形状的图像处理的影响而增加。优选实施例包括使用感兴趣的形状周围的多个交互区域（ROI），以及为给定的ROI分配平滑参数，随着该ROI中的形状的影响相对于待分割的形状而减小。本发明提供了也是有效的精确OPC。

4. 发明授权

US07434196B2 Renesting interaction map into design for efficient long range calculations 有权
标题翻译：将交互图重新设计成有效的长距离计算
公开(公告)号：US07434196B2
公开(公告)日：2008-10-07
申请号：US11242723
申请日：2005-10-03
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68 , G06F17/5068
摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchical arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchical arrangement to ultimately correct for optical lithography.
摘要翻译：方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。该布局代表了所需的设计数据层次结构。然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。使用这些桶生成分层布置，并且使用分层布置强制执行所需的设计数据层级以最终校正光刻。

5. 发明申请

US20080127027A1 PRINTABILITY VERIFICATION BY PROGRESSIVE MODELING ACCURACY 失效
标题翻译：可靠性验证通过逐步建模精度
公开(公告)号：US20080127027A1
公开(公告)日：2008-05-29
申请号：US11555854
申请日：2006-11-02
申请人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
摘要翻译：提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。逐步准确的光学模型包括提供连续影响较小的SOCS内核。构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场模拟。

6. 发明授权

US07343271B2 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare 有权
标题翻译：将相位图并入基于快速模型的光学邻近校正模拟内核，以解决近距离和中等范围的闪光
公开(公告)号：US07343271B2
公开(公告)日：2008-03-11
申请号：US10694465
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F7/60 , G06F17/50 , G06F19/00 , G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/705
摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.
摘要翻译：计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。第二种方法使用来自光学工具的测量数据。通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。滤波函数要求阵列的每个元素的幅度乘以高斯函数。然后将幂律应用于阵列。数组的元素被洗牌，并从相量形式转换为实数/虚数形式。应用二维快速傅立叶变换。然后数组被清洗，并转换回到相量形式。

7. 发明授权

US07761839B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 失效
标题翻译：在基于模型的OPC引擎中使用高效多边形钉扎方法的性能
公开(公告)号：US07761839B2
公开(公告)日：2010-07-20
申请号：US11874274
申请日：2007-10-18
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.
摘要翻译：方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。然后使用这个折叠的第二个多边形来校正光学接近度。

8. 发明授权

US07512927B2 Printability verification by progressive modeling accuracy 失效
标题翻译：可打印性验证通过逐步建模精度
公开(公告)号：US07512927B2
公开(公告)日：2009-03-31
申请号：US11555854
申请日：2006-11-02
申请人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
摘要翻译：提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。逐步准确的光学模型包括提供连续影响较小的SOCS内核。构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场模拟。

9. 发明授权

US07774737B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 失效
公开(公告)号：US07774737B2
公开(公告)日：2010-08-10
申请号：US11756883
申请日：2007-06-01
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

10. 发明授权

US07840057B2 Simultaneous computation of multiple points on one or multiple cut lines 有权
标题翻译：在一条或多条切割线上同时计算多个点
公开(公告)号：US07840057B2
公开(公告)日：2010-11-23
申请号：US11874281
申请日：2007-10-18
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06K9/00 , G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.
摘要翻译：方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。确定角位置，并且切割线的位于切割线和多边形的侧边缘之间的交叉点的相对侧上的切割线的第一和第二部分，然后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

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