专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110265951A1 TWIN CHAMBER PROCESSING SYSTEM 审中-公开
标题翻译：双室加工系统
公开(公告)号：US20110265951A1
公开(公告)日：2011-11-03
申请号：US12908644
申请日：2010-10-20
申请人： MING XU , ANDREW NGUYEN , EVANS LEE , JARED AHMAD LEE , JAMES P. CRUSE , CORIE LYNN COBB , MARTIN JEFF SALINAS , ANCHEL SHEYNER , EZRA ROBERT GOLD , JOHN W. LANE
发明人： MING XU , ANDREW NGUYEN , EVANS LEE , JARED AHMAD LEE , JAMES P. CRUSE , CORIE LYNN COBB , MARTIN JEFF SALINAS , ANCHEL SHEYNER , EZRA ROBERT GOLD , JOHN W. LANE
IPC分类号： C23F1/08 , C23C16/458 , C23C16/52 , C23C16/455
CPC分类号： C23C16/52 , C23C16/45561 , C23C16/46 , C23C16/509 , C23C16/54
摘要： Methods and apparatus for twin chamber processing systems are disclosed, and, in some embodiments, may include a first process chamber and a second process chamber having independent processing volumes and a plurality of shared resources between the first and second process chambers. In some embodiments, the shared resources include at least one of a shared vacuum pump, a shared gas panel, or a shared heat transfer source.
摘要翻译：公开了用于双室处理系统的方法和装置，并且在一些实施例中，可以包括具有独立处理量的第一处理室和第二处理室以及第一处理室和第二处理室之间的多个共享资源。在一些实施例中，共享资源包括共享真空泵，共用气体面板或共用传热源中的至少一个。

2. 发明申请

US20110269314A1 PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF 审中-公开
标题翻译：具有共享资源的过程池及其使用方法
公开(公告)号：US20110269314A1
公开(公告)日：2011-11-03
申请号：US12905032
申请日：2010-10-14
申请人： JARED AHMAD LEE , JAMES P. CRUSE , ANDREW NGUYEN , CORIE LYNN COBB , MING XU , MARTIN JEFF SALINAS , ANCHEL SHEYNER
发明人： JARED AHMAD LEE , JAMES P. CRUSE , ANDREW NGUYEN , CORIE LYNN COBB , MING XU , MARTIN JEFF SALINAS , ANCHEL SHEYNER
IPC分类号： H01L21/3065
CPC分类号： H01L21/67109 , H01L21/6719
摘要： Process chambers having shared resources and methods of use are provided. In some embodiments, substrate processing systems may include a first process chamber having a first substrate support disposed within the first process chamber, wherein the first substrate support has a first heater and a first cooling plate to control a temperature of the first substrate support; a second process chamber having a second substrate support disposed within the second process chamber, wherein the second substrate support has a second heater and a second cooling plate to control a temperature of the second substrate support; and a shared heat transfer fluid source having an outlet to provide a heat transfer fluid to the first cooling plate and the second cooling plate and an inlet to receive the heat transfer fluid from the first cooling plate and the second cooling plate.
摘要翻译：提供了具有共享资源和使用方法的过程室。在一些实施例中，衬底处理系统可以包括第一处理室，其具有设置在第一处理室内的第一衬底支撑件，其中第一衬底支撑件具有第一加热器和第一冷却板以控制第一衬底支撑件的温度; 第二处理室，具有设置在所述第二处理室内的第二基板支撑件，其中所述第二基板支撑件具有第二加热器和第二冷却板，以控制所述第二基板支撑件的温度; 以及共用传热流体源，其具有出口以向第一冷却板和第二冷却板提供传热流体，以及从第一冷却板和第二冷却板接收传热流体的入口。

3. 发明申请

US20110265883A1 METHODS AND APPARATUS FOR REDUCING FLOW SPLITTING ERRORS USING ORIFICE RATIO CONDUCTANCE CONTROL 审中-公开
标题翻译：减少流量分解误差的方法和装置
公开(公告)号：US20110265883A1
公开(公告)日：2011-11-03
申请号：US12907942
申请日：2010-10-19
申请人： JAMES P. CRUSE , EZRA ROBERT GOLD , JARED AHMAD LEE , MING XU , CORIE LYNN COBB , ANDREW NGUYEN , JOHN W. LANE
发明人： JAMES P. CRUSE , EZRA ROBERT GOLD , JARED AHMAD LEE , MING XU , CORIE LYNN COBB , ANDREW NGUYEN , JOHN W. LANE
IPC分类号： F17D3/00 , F16K7/00
CPC分类号： H01J37/3244 , Y10T137/0357 , Y10T137/877
摘要： Methods and apparatus for gas delivery to a process chamber are provided herein. In some embodiments, an apparatus for processing substrates may include a mass flow controller to provide a desired total fluid flow; a first flow control manifold comprising a first inlet, a first outlet, and a first plurality of orifices selectably coupled therebetween, wherein the first inlet is coupled to the mass flow controller; and a second flow control manifold comprising a second inlet, a second outlet, and a second plurality of orifices selectably coupled therebetween, wherein the second inlet is coupled to the mass flow controller; wherein a desired flow ratio between the first outlet and the second outlet is selectably obtainable when causing the fluid to flow through one or more of the first plurality of orifices of the first manifold and one or more of the second plurality of orifices of the second manifold.
摘要翻译：本文提供了用于气体输送到处理室的方法和装置。在一些实施例中，用于处理衬底的装置可以包括质量流量控制器以提供期望的总流体流量; 第一流量控制歧管，包括第一入口，第一出口和可选择地联接在其间的第一多个孔，其中所述第一入口联接到所述质量流量控制器; 以及第二流量控制歧管，包括第二入口，第二出口和可选择地联接在其间的第二多个孔，其中所述第二入口联接到所述质量流量控制器; 其中当所述流体流过所述第一歧管的所述第一多个孔中的一个或多个并且所述第二歧管的所述第二多个孔中的一个或多个时，可选择地获得所述第一出口和所述第二出口之间的期望流量比。

4. 发明申请

US20110265549A1 METHODS AND APPARATUS FOR CALIBRATING FLOW CONTROLLERS IN SUBSTRATE PROCESSING SYSTEMS 有权
标题翻译：用于在基板处理系统中校准流量控制器的方法和装置
公开(公告)号：US20110265549A1
公开(公告)日：2011-11-03
申请号：US12915345
申请日：2010-10-29
申请人： JAMES P. CRUSE , JOHN W. LANE , MARIUSCH GREGOR , DUC BUCKIUS , BERRIN DARAN , CORIE LYNN COBB , MING XU , ANDREW NGUYEN
发明人： JAMES P. CRUSE , JOHN W. LANE , MARIUSCH GREGOR , DUC BUCKIUS , BERRIN DARAN , CORIE LYNN COBB , MING XU , ANDREW NGUYEN
IPC分类号： G01F25/00 , F15D1/00
CPC分类号： H01L21/67253 , F16K37/00 , F16K37/0091 , G01F25/00 , Y10T29/53022 , Y10T137/8158 , Y10T137/87153 , Y10T137/87684 , Y10T137/877
摘要： Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.
摘要翻译：本文提供了用于校准衬底处理系统中的多个气流的方法和装置。在一些实施例中，衬底处理系统可以包括簇工具，其包括耦合到中心真空传送室的第一处理室和第二处理室; 第一流量控制器，用于向第一处理室提供处理气体; 第二流量控制器，用于向第二处理室提供处理气体; 质量流量验证器，用于验证来自所述第一和第二流量控制器中的每一个的流量; 用于选择性地将第一流量控制器耦合到质量流量验证器的第一导管; 以及用于选择性地将第二流量控制器耦合到质量流量验证器的第二导管。

5. 发明申请

US20120097266A1 APPARATUS FOR CONTROLLING GAS DISTRIBUTION USING ORIFICE RATIO CONDUCTANCE CONTROL 有权
标题翻译：用于控制比例控制的气体分配设备
公开(公告)号：US20120097266A1
公开(公告)日：2012-04-26
申请号：US13091827
申请日：2011-04-21
申请人： CORIE LYNN COBB , MING XU
发明人： CORIE LYNN COBB , MING XU
IPC分类号： F16K51/00
CPC分类号： F16K51/02 , Y10T137/6851 , Y10T137/87306 , Y10T137/87885
摘要： Apparatus for controlling gas distribution are provided. In some embodiments, apparatus for controlling gas distribution may include a first flow path from an inlet to a first outlet; a plurality of first orifices disposed within the first flow path; a plurality of first valves that control gas flow through the plurality of first orifices to control a total gas flow at the first outlet; a second flow path from the inlet to a second outlet; a plurality of second orifices disposed along the second flow path; a plurality of second valves that control gas flow through respective ones of the plurality of second orifices to control a total gas flow at the second outlet; and a mounting block having the plurality of first valves and second valves coupled thereto, wherein at least a portion of the first flow path and the second flow path is disposed within the mounting block.
摘要翻译：提供了用于控制气体分布的装置。在一些实施例中，用于控制气体分配的装置可以包括从入口到第一出口的第一流动路径; 设置在第一流路内的多个第一孔; 多个第一阀，其控制通过所述多个第一孔的气体流，以控制在所述第一出口处的总气流; 从入口到第二出口的第二流动路径; 沿所述第二流路布置的多个第二孔; 多个第二阀，其控制通过所述多个第二孔中的相应孔的气体流动，以控制在所述第二出口处的总气流; 以及安装块，其具有联接到其上的多个第一阀和第二阀，其中第一流动路径和第二流动路径的至少一部分设置在安装块内。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式