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1. 发明申请

US20100193421A1 FLUID TREATMENT SYSTEM 有权
标题翻译：流体处理系统
公开(公告)号：US20100193421A1
公开(公告)日：2010-08-05
申请号：US12514894
申请日：2007-11-06
申请人： Li Zheng Ma , George Traubenberg , Douglas Penhale
发明人： Li Zheng Ma , George Traubenberg , Douglas Penhale
IPC分类号： C02F1/32
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/328
摘要： In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fluid deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
摘要翻译：在其一个方面，本发明涉及一种流体处理系统，包括：入口; 一个出口设置在入口和出口之间的流体处理区。流体处理区：（i）包括与第一壁表面相对的第一壁表面和第二壁表面，以及（ii）在其中设置有至少一排辐射源组件的阵列。每个辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线，并且第一壁表面和第二壁表面中的每一个包括第一流体偏转器元件和第二流体偏转器元件。所述第一流体导流元件比所述第二流体导流元件突出到所述流体处理区域更大的程度。

2. 发明授权

US09174858B2 Fluid treatment system 有权
标题翻译：流体处理系统
公开(公告)号：US09174858B2
公开(公告)日：2015-11-03
申请号：US12514894
申请日：2007-11-06
申请人： Li Zheng Ma , George Traubenberg , Douglas Penhale
发明人： Li Zheng Ma , George Traubenberg , Douglas Penhale
IPC分类号： C02F1/32
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/328
摘要： In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fluid deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
摘要翻译：在其一个方面，本发明涉及一种流体处理系统，包括：入口; 一个出口设置在入口和出口之间的流体处理区。流体处理区：（i）包括与第一壁表面相对的第一壁表面和第二壁表面，和（ii）在其中设置有至少一排辐射源组件的阵列。每个辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线，并且第一壁表面和第二壁表面中的每一个包括第一流体偏转器元件和第二流体偏转器元件。所述第一流体导流元件比所述第二流体导流元件突出到所述流体处理区域更大的程度。

3. 发明授权

US08679416B2 Fluid treatment system 有权
标题翻译：流体处理系统
公开(公告)号：US08679416B2
公开(公告)日：2014-03-25
申请号：US11840590
申请日：2007-08-17
申请人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
发明人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
IPC分类号： B01J19/08
CPC分类号： C02F1/325 , C02F1/008 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/326 , C02F2201/328 , C02F2209/42
摘要： There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.
摘要翻译：描述了一种流体处理系统。流体处理系统包括：用于接收流体流的开放通道和流体处理区。所述流体处理区包括多个细长的辐射源组件，其定向成：（i）每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向，和（ii）每个辐射的末端源组件设置在开放通道中的流体流的预定最大高度之上。第一挡板设置在流体处理区的上游。第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。在优选实施例中，本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。在所谓的“停放”位置，清洁系统可以容易地进行维修等，而不影响通过流体处理区和流体处理系统的流体的流动。这是流体处理系统的显着优点。

4. 发明申请

US20080044320A1 FLUID TREATMENT SYSTEM 有权
标题翻译：流体处理系统
公开(公告)号：US20080044320A1
公开(公告)日：2008-02-21
申请号：US11840590
申请日：2007-08-17
申请人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
发明人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
IPC分类号： B01J19/08
CPC分类号： C02F1/325 , C02F1/008 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/326 , C02F2201/328 , C02F2209/42
摘要： There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.
摘要翻译：描述了一种流体处理系统。流体处理系统包括：用于接收流体流的开放通道和流体处理区。所述流体处理区包括多个细长的辐射源组件，其定向成：（i）每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向，和（ii）每个辐射的末端源组件设置在开放通道中的流体流的预定最大高度之上。第一挡板设置在流体处理区的上游。第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。在优选实施例中，本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。在所谓的“停放”位置，清洁系统可以容易地进行维修等，而不影响通过流体处理区和流体处理系统的流体的流动。这是流体处理系统的显着优点。

5. 发明授权

US09539351B2 Radiation source module and fluid treatment system 有权
标题翻译：辐射源模块和流体处理系统
公开(公告)号：US09539351B2
公开(公告)日：2017-01-10
申请号：US13994941
申请日：2011-12-13
申请人： George Traubenberg , Douglas Penhale
发明人： George Traubenberg , Douglas Penhale
IPC分类号： A61L2/10 , C02F1/32
CPC分类号： A61L2/10 , C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： There is described a radiation source module for use in a fluid treatment system. The radiation source module comprises: a housing having an inlet, an outlet and a fluid treatment zone disposed between. The fluid treatment zone comprises a first wall surface and a second wall surface interconnected by a floor surface. The first wall surface, the second wall surface and the floor surface are configured to receive a flow of fluid through the fluid treatment zone. The radiation source module further comprises at least one radiation source assembly secured with respect to the first wall surface and the second wall surface and a module motive coupling element connected to the housing and configured to be coupled to a module motive element to permit the radiation source module to be installed in and extracted from the fluid treatment system. A fluid treatment system comprising the radiation source module is also described.
摘要翻译：描述了用于流体处理系统的辐射源模块。辐射源模块包括：壳体，其具有设置在其间的入口，出口和流体处理区。流体处理区包括由地板表面互连的第一壁表面和第二壁表面。第一壁表面，第二壁表面和地板表面构造成接收通过流体处理区的流体流。所述辐射源模块还包括相对于所述第一壁表面和所述第二壁表面固定的至少一个辐射源组件和连接到所述壳体的模块运动耦合元件，并且被配置为耦合到模块运动元件以允许所述辐射源模块安装在流体处理系统中并从中提取。还描述了包括辐射源模块的流体处理系统。

6. 发明申请

US20120097187A1 CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 审中-公开
标题翻译：清洁装置，辐射源模块和流体处理系统
公开(公告)号：US20120097187A1
公开(公告)日：2012-04-26
申请号：US13256419
申请日：2010-03-05
申请人： Douglas Penhale , Joseph Elku , Ryan Moffatt , George Traubenberg
发明人： Douglas Penhale , Joseph Elku , Ryan Moffatt , George Traubenberg
IPC分类号： B08B1/00 , B08B9/38 , B08B3/00 , B08B7/00
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/328 , Y10T137/8593
摘要： There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a first longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing; and an elongate motive element coupled to the driving element. The slidable element is: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing. The elongate motive element has a second longitudinal axis that is oriented in a substantially parallel, non-coaxial relationship with respect to the first longitudinal axis. There is also disclosed a fluid treatment system comprising: a fluid treatment zone for receiving a flow of fluid; at least one elongate radiation source assembly disposed in the fluid treatment zone; a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly; and a motive element coupled to the cleaning system. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone and a distal end of the at least one elongate radiation source assembly is spaced from a surface of the fluid treatment zone to define a gap. The motive element is operable to move the cleaning system between a retracted position and an extended position. Movement of the cleaning system from the retracted position to the extended position cause debris contacting the at least one elongate radiation source assembly to be pushed into the gap.
摘要翻译：公开了一种用于流体处理系统中的辐射源组件的清洁装置。清洁系统包括：清洁托架，其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸，包括具有第一纵向轴线的细长壳体; 设置在所述细长壳体的外表面上的可滑动元件; 以及耦合到驱动元件的细长动力元件。可滑动元件是：（i）联接到清洁托架，和（ii）磁耦合到设置在细长壳体内的驱动元件。细长的动力元件具有第二纵向轴线，该第二纵向轴线相对于第一纵向轴线基本上平行，非同轴的关系。还公开了一种流体处理系统，包括：用于接收流体流的流体处理区; 设置在流体处理区域中的至少一个细长辐射源组件; 一种清洁装置，具有与所述至少一个细长辐射源组件的外表面接触的至少一个清洁元件; 以及耦合到清洁系统的动力元件。细长辐射源组件具有横向于流过流体处理区域的流体流动方向设置的纵向轴线，并且至少一个细长辐射源组件的远端与流体处理区域的表面间隔开以限定间隙。动力元件可操作以在缩回位置和延伸位置之间移动清洁系统。清洁系统从缩回位置到延伸位置的运动导致与至少一个细长辐射源组件接触的碎屑被推入间隙。

7. 发明申请

US20130334438A1 RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 有权
标题翻译：辐射源模块和流体处理系统
公开(公告)号：US20130334438A1
公开(公告)日：2013-12-19
申请号：US13994941
申请日：2011-12-13
申请人： George Traubenberg , Douglas Penhale
发明人： George Traubenberg , Douglas Penhale
IPC分类号： A61L2/10
CPC分类号： A61L2/10 , C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： There is described a radiation source module for use in a fluid treatment system. The radiation source module comprises: a housing having an inlet, an outlet and a fluid treatment zone disposed between. The fluid treatment zone comprises a first wall surface and a second wall surface interconnected by a floor surface. The first wall surface, the second wall surface and the floor surface are configured to receive a flow of fluid through the fluid treatment zone. The radiation source module further comprises at least one radiation source assembly secured with respect to the first wall surface and the second wall surface and a module motive coupling element connected to the housing and configured to be coupled to a module motive element to permit the radiation source module to be installed in and extracted from the fluid treatment system. A fluid treatment system comprising the radiation source module is also described.
摘要翻译：描述了用于流体处理系统的辐射源模块。辐射源模块包括：壳体，其具有设置在其间的入口，出口和流体处理区。流体处理区包括由地板表面互连的第一壁表面和第二壁表面。第一壁表面，第二壁表面和地板表面构造成接收通过流体处理区的流体流。所述辐射源模块还包括相对于所述第一壁表面和所述第二壁表面固定的至少一个辐射源组件和连接到所述壳体的模块运动耦合元件，并且被配置为耦合到模块运动元件以允许所述辐射源模块安装在流体处理系统中并从中提取。还描述了包括辐射源模块的流体处理系统。

8. 发明授权

US06659431B1 Fluid treatment system and cleaning apparatus therefor 有权
标题翻译：流体处理系统及其清洁设备
公开(公告)号：US06659431B1
公开(公告)日：2003-12-09
申请号：US10049378
申请日：2002-02-12
申请人： Gang Fang , Yuri Lawryshyn , Jan M. Maarschalkerweerd , Douglas Penhale
发明人： Gang Fang , Yuri Lawryshyn , Jan M. Maarschalkerweerd , Douglas Penhale
IPC分类号： G01N2175
CPC分类号： B08B9/023 , B08B1/008 , C02F1/325 , C02F2201/3223 , C02F2201/324 , Y10S422/906
摘要： A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.
摘要翻译：一种用于包括辐射源组件的流体处理系统的清洁设备，所述清洁设备包括：与所述辐射源组件（150）的外部滑动接合的至少一个清洁套筒（300）; 设置在与所述辐射源组件（150）的外部的一部分接触的所述至少一个清洁套筒中并且供应有清洁溶液的清洁室（310），所述清洁室包括开口（370）到清洁套的外部; 设置在所述开口中的压力平衡构件（355），以在所述清洁套筒的所述开口和外部之间提供密封，所述压力平衡构件可响应于其间的压力梯度而移动; 以及驱动装置，用于沿着辐射源组件的外部平移至少一个清洁套筒。还描述了一种流体处理装置，其中还描述了清洁装置。

9. 发明授权

US09533060B2 Radiation source assembly 有权
标题翻译：辐射源组件
公开(公告)号：US09533060B2
公开(公告)日：2017-01-03
申请号：US13380676
申请日：2010-06-30
申请人： Douglas Penhale , Joseph Elku
发明人： Douglas Penhale , Joseph Elku
IPC分类号： A61L2/10 , C02F1/32 , H01J61/28 , H01J61/52 , H01J9/00
CPC分类号： A61L2/10 , A61L2202/11 , C02F1/325 , C02F2201/004 , C02F2201/3225 , C02F2201/3227 , H01J9/003 , H01J61/28 , H01J61/523
摘要： There is described In another of its aspects, the present invention provides a radiation source assembly comprising: (i) an elongate radiation source; (ii) a positioning element connected to a proximal portion of the elongate radiation source; and (iii) a connecting portion secured to a proximal portion of the positioning element and configured to engage a support element to maintain a distal portion of the elongate radiation source in a cantilevered position. The present radiation source assembly is configured such that the distal portion of the radiation source is cantilevered with the respect to the distal portion of the protective sleeve in which it is disposed. This feature obviates the need to use spacers, stops, springs and the like in a distal portion of the protective sleeve to maintain correct position of the radiation source within the protective sleeve. Further, the present radiation source assembly is advantageous in that allows for withdrawal of the radiation source from the radiation source assembly without the need to disengage all of the components. Thus, it is possible to replace a single radiation source by removing it from the protective sleeve during operation of the fluid treatment system. This operation can be accomplished quickly without the need to shut down the fluid treatment system or otherwise compensate for the fact that one of the radiation source is being serviced.
摘要翻译：在其另一方面，本发明提供了一种辐射源组件，其包括：（i）细长辐射源; （ii）连接到所述细长辐射源的近端部分的定位元件; 和（iii）固定到所述定位元件的近端部分并被构造成接合支撑元件以将所述细长辐射源的远侧部分保持在悬臂位置的连接部分。本辐射源组件被配置为使得辐射源的远端部分相对于其所配置的保护套筒的远端部分是悬臂的。该特征避免了在保护套管的远端部分中使用间隔件，止动件，弹簧等以保持辐射源在保护套筒内的正确位置的需要。此外，本辐射源组件的优点在于允许辐射源从辐射源组件中取出，而不需要使所有部件脱离。因此，可以在流体处理系统的操作期间将其从保护套筒中取出来替换单个辐射源。该操作可以快速完成，而不需要关闭流体处理系统或以其他方式补偿辐射源中的一个被维修的事实。

10. 发明申请

US20120181446A1 CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 有权
标题翻译：清洁装置，辐射源模块和流体处理系统
公开(公告)号：US20120181446A1
公开(公告)日：2012-07-19
申请号：US13386615
申请日：2010-07-23
申请人： Joseph Elku , Douglas Penhale
发明人： Joseph Elku , Douglas Penhale
IPC分类号： B08B3/02 , G21K5/00 , B08B3/04
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324
摘要： There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The clean apparatus comprises a cleaning sleeve moveable to remove fouling materials from an exterior portion of the radiation source assembly, the cleaning sleeve comprising at least one chamber for receiving a cleaning fluid and a cleaning sleeve inlet in fluid communication with the at least one chamber and a first conduit element for conveying the cleaning fluid to the cleaning sleeve inlet, the first conduit element being configured such that a distal portion of the first conduit element is in fluid communication with the cleaning sleeve inlet and a proximal portion of the first conduit element is disposed outside of fluid being treated in the fluid treatment system.
摘要翻译：公开了一种用于流体处理系统中的辐射源组件的清洁装置。清洁装置包括可移动以从辐射源组件的外部部分去除结垢材料的清洁套筒，所述清洁套筒包括用于接收清洁流体的至少一个腔室和与所述至少一个腔室流体连通的清洁套筒入口，用于将清洁流体输送到清洁套筒入口的第一管道元件，第一管道元件构造成使得第一管道元件的远端部分与清洁套筒入口流体连通，并且第一管道元件的近端部分是设置在流体处理系统中被处理的流体外部。

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