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1. 发明授权

US06659431B1 Fluid treatment system and cleaning apparatus therefor 有权
标题翻译：流体处理系统及其清洁设备
公开(公告)号：US06659431B1
公开(公告)日：2003-12-09
申请号：US10049378
申请日：2002-02-12
申请人： Gang Fang , Yuri Lawryshyn , Jan M. Maarschalkerweerd , Douglas Penhale
发明人： Gang Fang , Yuri Lawryshyn , Jan M. Maarschalkerweerd , Douglas Penhale
IPC分类号： G01N2175
CPC分类号： B08B9/023 , B08B1/008 , C02F1/325 , C02F2201/3223 , C02F2201/324 , Y10S422/906
摘要： A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.
摘要翻译：一种用于包括辐射源组件的流体处理系统的清洁设备，所述清洁设备包括：与所述辐射源组件（150）的外部滑动接合的至少一个清洁套筒（300）; 设置在与所述辐射源组件（150）的外部的一部分接触的所述至少一个清洁套筒中并且供应有清洁溶液的清洁室（310），所述清洁室包括开口（370）到清洁套的外部; 设置在所述开口中的压力平衡构件（355），以在所述清洁套筒的所述开口和外部之间提供密封，所述压力平衡构件可响应于其间的压力梯度而移动; 以及驱动装置，用于沿着辐射源组件的外部平移至少一个清洁套筒。还描述了一种流体处理装置，其中还描述了清洁装置。

2. 发明授权

US06863078B1 Fluid treatment system and cleaning apparatus therefor 失效
标题翻译：流体处理系统及其清洁设备
公开(公告)号：US06863078B1
公开(公告)日：2005-03-08
申请号：US09744682
申请日：2000-05-26
申请人： Vivian Dall'Armi , Gang Fang , Yuri Lawryshyn , Joseph Lem , Douglas Penhale
发明人： Vivian Dall'Armi , Gang Fang , Yuri Lawryshyn , Joseph Lem , Douglas Penhale
IPC分类号： B01J19/12 , B08B1/00 , B08B9/02 , C02F1/32 , H05B3/00 , B08B3/04
CPC分类号： C02F1/325 , B01J19/123 , B01J2219/0877 , B08B1/008 , B08B9/023 , C02F2201/324 , H05B3/0052
摘要： A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.
摘要翻译：描述了用于流体处理系统中的辐射源组件（35）的清洁设备（10）。清洁设备包括清洁室（20）和独立于清洁室的第二室（25,30），其限定流体（通常是水）缓冲层，以消除或减轻清洗液体泄漏到被处理流体中的清洁室。流体处理系统对于我们在使用紫外线辐射来处理水的清洁水应用中特别有用，同时具有当其被污染时原位清洁辐射源的优点。

3. 发明授权

US06518577B1 Optical radiation sensor system with cleaning device 失效
标题翻译：具有清洁装置的光学辐射传感器系统
公开(公告)号：US06518577B1
公开(公告)日：2003-02-11
申请号：US09676081
申请日：2000-10-02
申请人： Gang Fang , John Houghton , Yuri Lawryshyn , Joseph Lem , Michael Sasges , Alex Verdun
发明人： Gang Fang , John Houghton , Yuri Lawryshyn , Joseph Lem , Michael Sasges , Alex Verdun
IPC分类号： G01N2101
CPC分类号： A61L2/28 , A61L2/10 , C02F1/325 , C02F2201/3227 , C02F2201/324 , C02F2201/326 , G01J1/0252 , G01J1/0271 , G01J1/04 , G01J1/044 , G01N21/15 , G01N2021/152 , G01N2021/157
摘要： There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
摘要翻译：公开了一种光辐射传感器系统。该系统包括传感器装置和清洁装置。传感器装置检测并响应来自辐射场的辐射，并且包括在表面处于辐射场的第一位置和第二位置之间可相对于辐射场移动的表面，其中至少部分表面离开辐射场。清洁装置用于在第二位置从表面的至少一部分去除结垢材料。清洁装置可以是化学清洁装置，机械清洁装置或组合的化学/机械装置。

4. 发明授权

US07031849B2 On-line device for predicting at least one fluid flow parameter in a process 失效
标题翻译：用于在过程中预测至少一个流体流参数的在线设备
公开(公告)号：US07031849B2
公开(公告)日：2006-04-18
申请号：US10384782
申请日：2003-03-11
申请人： Yuri Lawryshyn , David A. Olson , Harold Wright
发明人： Yuri Lawryshyn , David A. Olson , Harold Wright
IPC分类号： G06F19/00
CPC分类号： C02F1/325 , C02F1/008 , C02F1/32 , C02F2201/326 , G01F1/00
摘要： An online device and method for predicting at least one fluid flow parameter in a process (which comprises a bounded flow domain having disposed therein a pre-determined matrix) includes a computer and/or process steps whereby: (i) a memory receives a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) input data is received from the process, and (iii) the at least one fluid flow parameter is calculated from the database and the input data. Preferably, structure and/or process steps are provided to adjust the database in the event that the input data does not correspond with at least one pre-determined flow state.
摘要翻译：一种用于在过程（其包括其中设置有预定矩阵的有界流域）中预测至少一个流体流参数的在线设备和方法包括计算机和/或处理步骤，其中：（i）存储器接收数据库所述数据库包括所述矩阵中多个节点或粒子通路的位置信息; （ii）从该过程接收输入数据，以及（iii）从数据库和输入数据计算至少一个流体流量参数。优选地，提供结构和/或处理步骤以在输入数据与至少一个预定流量状态不对应的情况下调整数据库。

5. 发明授权

US06564157B2 On-line device for predicting at least one fluid flow parameter in a process 有权
标题翻译：用于在过程中预测至少一个流体流参数的在线设备
公开(公告)号：US06564157B2
公开(公告)日：2003-05-13
申请号：US09729921
申请日：2000-12-06
申请人： David A. Olson , Yuri Lawryshyn , Harold Wright
发明人： David A. Olson , Yuri Lawryshyn , Harold Wright
IPC分类号： G01F100
CPC分类号： C02F1/325 , C02F1/008 , C02F1/32 , C02F2201/326 , G01F1/00
摘要： An on-line device for predicting at least one fluid flow parameter in a process includes structure and/or function whereby a flow domain has disposed therein a pre-determined portion in which a fluid flows. Preferably, the device includes a computer having: (i) a memory for receiving a database, the database including relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) structure to receive input data from the process, and (iii) structure to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.
摘要翻译：用于在过程中预测至少一个流体流动参数的在线装置包括结构和/或功能，其中流动域在其中设置流体流动的预定部分。优选地，该设备包括具有以下功能的计算机：（i）用于接收数据库的存储器，所述数据库包括关于预定部分中的多个节点或多个粒子路径的相关信息; （ii）从过程接收输入数据的结构，以及（iii）从数据库和输入数据计算至少一个流体流量参数的结构。该装置特别有利地用作UV剂量计。

6. 发明授权

US06500346B1 Fluid treatment device and method for treatment of fluid 失效
标题翻译：流体处理装置及其处理方法
公开(公告)号：US06500346B1
公开(公告)日：2002-12-31
申请号：US09676082
申请日：2000-10-02
申请人： Fariborz Taghipour , Yuri Lawryshyn , David A. Olson , Zhang Tan
发明人： Fariborz Taghipour , Yuri Lawryshyn , David A. Olson , Zhang Tan
IPC分类号： C02F130
CPC分类号： A61L2/08 , A61L2/10 , A61L2202/122 , B01J19/123 , B01J2219/0004 , B01J2219/0875 , B01J2219/0877 , B01J2219/182 , B08B1/008 , C02F1/325 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： A fluid treatment device, particularly useful for ultraviolet radiation treatment of fluids such as water. The device comprises a housing for receiving a flow of fluid. The housing has a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet and at least one radiation source having a longitudinal axis disposed in the fluid treatment zone substantially transverse to a direction of the flow of fluid through the housing. The fluid inlet, the fluid outlet and the fluid treatment zone are arranged substantially collinearly with respect to one another. The fluid inlet has a first opening having: (i) a cross-sectional area less than a cross-sectional area of the fluid treatment zone, and (ii) a largest diameter substantially parallel to the longitudinal axis of the at least one radiation source assembly.
摘要翻译：一种流体处理装置，特别适用于诸如水的流体的紫外线辐射处理。该装置包括用于接收流体流的壳体。壳体具有流体入口，流体出口，设置在流体入口和流体出口之间的流体处理区域和至少一个辐射源，其具有设置在流体处理区域中的纵向轴线，该纵向轴线基本上横向于流体流动的方向通过住房。流体入口，流体出口和流体处理区相对于彼此基本上共线布置。流体入口具有第一开口，该第一开口具有：（i）小于流体处理区的横截面积的横截面面积，和（ii）基本上平行于至少一个辐射源的纵向轴线的最大直径部件。

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